Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
  • Publication number: 20210371367
    Abstract: The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1, R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH?CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).
    Type: Application
    Filed: February 1, 2019
    Publication date: December 2, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Karl Reuter, Vasyl Andrushko, Mark Kantor, Florian Stolz, Munenori Shiratake, Kentaro Ishihara, Koji Hirose, Shinya Ikeda, Noriyuki Kato, Mitsuteru Kondo, Shoko Suzuki, Kensuke Oshima
  • Patent number: 11186673
    Abstract: The purpose of the present invention is to appropriately control the rate of polymerization of a composition in which a thiol compound and an isocyanate compound are added to an episulfide compound and thereby provide an optical material which has high transparency. This composition for use as optical material comprises (a) an episulfide compound, (b) an isocyanate compound, (c) a thiol compound, and (d) a benzyl halide compound represented by formula (1): wherein: X is a halogen; L is selected from the group consisting of a hydrogen atom, a methyl group, a halogen, a mercaptomethyl group, and an isocyanate methyl group; and n is 1 or 2.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: November 30, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kariyazono, Takashi Aoki, Kouhei Takemura, Kikuo Furukawa
  • Patent number: 11186537
    Abstract: Provided are: a method for producing a compound that excels in storage stability and handleability; the compound; and an epoxy curing agent containing the compound. The method for producing a compound represented by Formula (1-1) includes subjecting the compound represented by Formula (5-1) to an addition reaction to add ethylene and/or propylene in the presence of a base. In Formula (5-1), RX to RZ each independently represent a hydrogen atom, an ethyl group, an n-propyl group, or an isopropyl group, and n is an integer of from 1 to 3. In Formula (1-1), RA to RD each independently represent a hydrogen atom, an ethyl group, an n-propyl group, or an isopropyl group, and n is an integer of from 1 to 3.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: November 30, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoichi Takano, Kazuyoshi Uera
  • Publication number: 20210363295
    Abstract: The present application provides a polycarbonate resin composition which has a high refractive index and a low Abbe number, and high thermal stability. The polycarbonate resin composition according to one embodiment of the present application includes a polycarbonate resin and an antioxidant, wherein the polycarbonate resin contains a constituent unit represented by general formula (1) (in general formula (1), X represents an alkylene group having 1-4 carbon atoms, and a and b each independently represent an integer of 1-10), and the antioxidant content is 1-3000 ppm.
    Type: Application
    Filed: January 18, 2019
    Publication date: November 25, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Munenori SHIRATAKE, Kentaro ISHIHARA, Koji HIROSE, Shinya IKEDA, Noriyuki KATO, Mitsuteru KONDO, Shoko SUZUKI, Kensuke OSHIMA, Shuya NAGAYAMA
  • Publication number: 20210360949
    Abstract: The present invention provides a beverage containing pyrroloquinoline quinone and/or a salt thereof, an amino acid and/or a salt thereof, and ascorbic acid and/or a salt thereof, wherein the content of ascorbic acid and/or a salt thereof is two or more mass times the content of pyrroloquinoline quinone and/or a salt thereof.
    Type: Application
    Filed: May 28, 2019
    Publication date: November 25, 2021
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventor: Kazuto IKEMOTO
  • Patent number: 11174269
    Abstract: An object of the present invention is to provide a method for producing 1,2,4,5-cyclohexanetetracarboxylic dianhydride, which is capable of stably achieving a high dehydration rate. The method for producing 1,2,4,5-cyclohexanetetracarboxylic dianhydride of the present invention is a method for producing 1,2,4,5-cyclohexanetetracarboxylic dianhydride by subjecting 1,2,4,5-cyclohexanetetracarboxylic acid to a dehydration reaction in a slurry state in the presence of a dehydrating agent, wherein an average particle size of the 1,2,4,5-cyclohexanetetracarboxylic acid is 20 ?m or more.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: November 16, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shinyo Shirai, Tatsuyuki Kumano, Shinya Saito
  • Patent number: 11174399
    Abstract: According to the present invention, a method for treating the surface of a semiconductor substrate can be provided, the method including bringing the semiconductor substrate into contact with a liquid composition to impart alcohol repellency to the semiconductor substrate, wherein the liquid composition is characterized by containing: 0.01 to 15% by mass of each of at least two compounds selected from surfactants respectively represented by formulae (1) to (6) and salts thereof; and water.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: November 16, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kenji Shimada, Priangga Perdana Putra
  • Publication number: 20210347937
    Abstract: A polyester carbonate resin is provided and includes a constituent unit represented by the following general formula (1), a constituent unit represented by the following general formula (2), and a constituent unit represented by the following general formula (3): wherein R represents hydrogen or an alkyl group containing 1 to 4 carbon atoms, wherein Q represents the following: wherein n and m each independently represent an integer of 0 to 5, and
    Type: Application
    Filed: October 8, 2019
    Publication date: November 11, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Manabu HIRAKAWA, Noriyuki KATO, Eiichi HONDA, Yasuaki YOSHIMURA, Yuichiro SATAKE
  • Publication number: 20210339436
    Abstract: A method for producing a press-molded body of a polycarbonate sheet including resin layers (A) and (B) respectively containing a polycarbonate resin, and a high hardness resin (B) and a hard coat layer (C) sequentially stacked on at least one surface of the resin layer (A). The method includes pre-heating the polycarbonate sheet to a temperature between a glass transition point of the resin layer (A)?45° C. or higher and the glass transition point or lower; locating the pre-heated polycarbonate sheet between an upper and lower die of a mold, wherein a time period after the pre-heating is finished until the polycarbonate sheet is located between the upper and lower die of the mold is 90 seconds or shorter; and clamping the mold to press the upper and lower die to obtain the press-molded body of the polycarbonate sheet.
    Type: Application
    Filed: October 3, 2019
    Publication date: November 4, 2021
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., MGC FILSHEET CO., LTD.
    Inventors: Atsuhiro TOKITA, Masato TAKASAKI
  • Publication number: 20210340129
    Abstract: Provided is a composition for optical materials that gives optical materials which can have at least one improved property selected from among satisfactory mold releasability after polymerization and curing, unsusceptibility to separation from the mold during polymerization and curing, transparency, and low-level striae. The present invention further provides a compound represented by formula (1). The composition for optical materials comprises the compound represented by formula (1) and a compound represented by formula (2). (In formula (1), X1 and X2 represent O or S, provided that both X1 and X2 are O or that X1 is O and X2 is S.
    Type: Application
    Filed: June 27, 2019
    Publication date: November 4, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei TAKEMURA, Yousuke IMAGAWA, Hiroshi HORIKOSHI
  • Patent number: 11166370
    Abstract: A resin composition according to the present invention contains: (i) a reactant of a cyanate compound (A) and polybutadiene (B) and/or (ii) a reactant of a polymerized product of the cyanate compound (A) and the polybutadiene (B); and a maleimide compound (C).
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: November 2, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shota Koga, Kentaro Takano
  • Patent number: 11161816
    Abstract: Provided is a method for regenerating an aromatic amide compound into a corresponding aromatic nitrile compound, the method realizing a dehydration reaction of providing a target compound selectively at a high yield, with generation of a by-product being suppressed. Also provided is a method for producing an aromatic nitrile compound that decreases the number of steps of the dehydration reaction and significantly improves the reaction speed even at a pressure close to normal pressure. In addition, the above-described production method is applied to a carbonate ester production method to provide a method for producing a carbonate ester efficiently. The above-described methods are realized by a method for producing an aromatic nitrile compound including a dehydration reaction of dehydrating an aromatic amide compound, in which the dehydration reaction uses, as a solvent, any of 1,2-dimethoxybenzene, 1,3-dimethoxybenzene and 1,3,5-trimethoxybenzene.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: November 2, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hidefumi Harada, Yousuke Shinkai, Hongyu Liu, Takehiko Isobe, Yoshinori Isahaya
  • Patent number: 11161979
    Abstract: A resin composition including an inorganic filler (B) having an aluminosilicate (A) having a silicon atom content of from 9 to 23% by mass, an aluminum atom content of from 21 to 43% by mass, and an average particle diameter (D50) of from 0.5 to 10 ?m; and any one or more thermosetting compounds selected from the group consisting of an epoxy resin (C), a cyanate compound (D), a maleimide compound (E), a phenolic resin (F), an acrylic resin (G), a polyamide resin (H), a polyamideimide resin (I), and a thermosetting polyimide resin (J), wherein a content of the inorganic filler (B) is from 250 to 800 parts by mass based on 100 parts by mass of resin solid content.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: November 2, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kentaro Nomizu, Mitsuru Ohta, Masanobu Sogame, Yoshinori Mabuchi
  • Publication number: 20210321645
    Abstract: The present invention provides a stabilizer for pyrroloquinoline quinone and/or a salt thereof, wherein the stabilizer comprises one or more sweetening components as active ingredients selected from the group consisting of erythritol, acesulfame potassium, and a reduced starch syrup.
    Type: Application
    Filed: August 29, 2019
    Publication date: October 21, 2021
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazuto IKEMOTO, Satoko IMARUOKA
  • Publication number: 20210324223
    Abstract: The purpose of this invention is to provide: a hard-coat composition with which it is possible to produce a hard-coat layer having excellent hardness and abrasion-resistance when cured, and having excellent moldability during processing; and a laminate film and the like having such a hard-coat composition. This problem is solved by a curable hard-coat composition containing a (meth)acryloyl polymer and inorganic oxide nanoparticles, wherein the (meth)acryloyl polymer has a (meth)acrylic equivalent of 200-500 g/eq and a weight-average molecular weight of 5,000-200,000.
    Type: Application
    Filed: August 5, 2019
    Publication date: October 21, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasutaka FUKUNAGA, Fumiaki KAKEYA
  • Patent number: 11149249
    Abstract: The present invention provides a base material for cell culture comprising a polyester resin comprising a dicarboxylic acid unit and a diol unit, wherein 1 to 80% by mol of the diol unit is a diol unit having a cyclic acetal structure.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: October 19, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Haruna Ando, Shin Iida, Yasunori Yamaguchi
  • Publication number: 20210317264
    Abstract: The purpose of the present invention is to provide: a polycarbonate resin which has a narrow molecular weight distribution and in which the formation of low molecular weight oligomers is suppressed; and a method for producing the polycarbonate resin. According to the present invention, provided are a polycarbonate resin containing a structural unit represented by general formula (1), wherein the molecular weight distribution value (Mw/Mn) is 6.0 or less, and the content of oligomers having a molecular weight of less than 1,000 is suppressed to 0.50 mass % or less; and a method for producing the polycarbonate. (In general formula (1), R1-26 represent hydrogen, fluorine, chlorine, bromine, iodine, a C1-9 alkyl group, a C6-12 aryl group, a C1-5 alkoxy group, a C2-5 alkenyl group, or a C7-17 aralkyl group.
    Type: Application
    Filed: July 17, 2019
    Publication date: October 14, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Shun ISHIKAWA
  • Publication number: 20210316542
    Abstract: The problem addressed by this invention is to provide a laminate for molding having excellent moldability and post-curing properties of the hard-coat layer, and which can maintain the surface of the hard-coat layer in a satisfactory state while uncured. This problem is solved by a laminate for molding containing a hard-coat layer and a masking film affixed to the surface of the hard-coat layer, having an adhesive surface, which is the hard-coat layer-side surface of the masking film, with a surface free energy of at least 30.0 (mN/m) measured in accordance with the OWRK method, before being affixed. The hard-coat layer is in an uncured state.
    Type: Application
    Filed: August 5, 2019
    Publication date: October 14, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasutaka FUKUNAGA, Fumiaki KAKEYA
  • Patent number: 11143962
    Abstract: The present embodiment provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1), wherein R1 represents a 2n-valent group having 1 to 60 carbon atoms, or a single bond, each R2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, a hydroxyl group, or a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, and may be the same or different in the same naphthalene ring or benzene ring, in which at least one R2 represents a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, n is an integer of 1 to 4, and structural formulae of n struct
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: October 12, 2021
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takumi Toida, Takashi Makinoshima, Takashi Sato, Masatoshi Echigo
  • Patent number: 11142506
    Abstract: Disclosed are a diaryl carbonate containing a compound of the following formula (I) in an amount of less than 1,000 ppm by mass, and a method for producing the same: wherein Rl represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group. Disclosed methods include reacting urea with an alkyl alcohol to provide a dialkyl carbonate; reacting the dialkyl carbonate with an aryl alcohol to provide an alkylaryl carbonate; subjecting the alkylaryl carbonate to disproportionation to yield a mixture comprising a diaryl carbonate; and purifying the mixture.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: October 12, 2021
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hidefumi Harada, Jungo Taguchi, Yoshinori Isahaya