Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
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Publication number: 20230374191Abstract: A composition containing: a compound (a) represented by Formula (1): wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and 1,2,3,5,6-pentathiepane (b).Type: ApplicationFiled: September 10, 2021Publication date: November 23, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yousuke IMAGAWA, Kouhei TAKEMURA, Ryosuke SUGIHARA, Mariko SADO
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Patent number: 11819930Abstract: The present invention provides a material for built up edge formation having a resin block containing a high molecular weight compound having a weight average molecular weight of 5×104 or higher and 1×106 or lower, a medium molecular weight compound having a weight average molecular weight of 1×103 or higher and lower than 5×104, and a carbon.Type: GrantFiled: October 31, 2017Date of Patent: November 21, 2023Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Yousuke Matsuyama, Shigeru Horie
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Patent number: 11821092Abstract: An etchant capable of selectively etching copper and a copper alloy while suppressing dissolution of nickel, tin, gold, and an alloy thereof. The etchant contains: (A) 5-10.5% by mass of hydrogen peroxide with respect to the total mass of the etchant; (B) 0.3-6% by mass of nitric acid with respect to the total mass of the etchant; (C) at least one nitrogen-containing 5-membered ring compound selected from triazoles and tetrazoles, which may have at least one substituent selected from a C1-6 alkyl group, an amino group, and a substituted amino group having a substituent selected from a C1-6 alkyl group and a phenyl group; and (D) (d1) one or more pH adjusters selected from an alkali metal hydroxide, ammonia, an amine, and an ammonium salt, (d2) a phosphoric acid compound, or (d3) a combination of (d1) and (d2).Type: GrantFiled: November 19, 2019Date of Patent: November 21, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Shun Fukazawa, Tomoko Fujii, Hiroshi Matsunaga
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Patent number: 11820857Abstract: The present invention provides a method for producing an oxymethylene copolymer resin composition, comprising: adding to an oxymethylene copolymer (A), an Mn micromole of an amine-substituted triazine compound (B) per gram of the oxymethylene copolymer (A), an Mc micromole of a choline hydroxide (C) per gram of the oxymethylene copolymer (A), and 0.05 to 1.1 parts by weight of an antioxidant (D) with respect to 100 parts by weight of the oxymethylene copolymer (A), and melt kneading a mixture of the oxymethylene copolymer (A), amine-substituted triazine compound (B), the choline hydroxide (C), and the antioxidant (D), wherein Mn (?mol/g-POM) and Mc (?mol/g-POM) satisfy: 6.5<(Mn+Mc×8)<25, 0.5<Mn<7.0, and 0.0<Mc.Type: GrantFiled: August 6, 2021Date of Patent: November 21, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Mika Nakashima, Daisuke Sunaga
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Publication number: 20230365893Abstract: A cleaning composition for semiconductor substrates. The cleaning composition comprises hydrogen peroxide, a hydrogen peroxide stabilizing agent, an alkaline compound, and water. The hydrogen peroxide stabilizing agent is oxalic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, potassium oxalate, 5-phenyl-1H-tetrazole, triethylenetetraminehexaacetic acid, trans-1,2-cyclohexanediaminetetraacetic acid, 8-quinolinol, L(+)-isoleucine, DL-valine, L(-)-proline, hydroxyethylethylenediaminetriacetic acid, N,N-di(2-hydroxyethyl)glycine, glycine, L-tryptophan, 2,6-pyridinedicarboxylic acid, benzothiazole, or DL-alanine. The alkaline compound is a quaternary ammonium hydroxide or potassium hydroxide.Type: ApplicationFiled: September 22, 2021Publication date: November 16, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Hiroaki HORIE, Akinobu HORITA, Makoto HAMANAKA, Kenji SHIMADA, Takahiro KIKUNAGA
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Patent number: 11814471Abstract: Provided is a gas barrier packaging material including a base and a cured resin layer, the base having a surface constituted of an inorganic substance. The cured resin layer is a cured product of an epoxy resin composition including an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and an acidic compound, and a ratio (basic nitrogen/acid groups) of a molar equivalent of basic nitrogen in the epoxy resin composition to a molar equivalent of acid groups derived from the acidic compound is from 0.60 to 20.Type: GrantFiled: July 13, 2020Date of Patent: November 14, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuki Kouno, Ryoma Hashimoto
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Publication number: 20230357511Abstract: The present invention provides, for example, a method for efficiently producing a polysiloxane having a siloxane constituent unit while making it possible to improve safety and reduce environmental burden. The above-mentioned problem is solved by a method comprising a polymerization step of polymerizing a silane-based compound and a diol compound in the presence of a transesterification catalyst including at least a phosphorus compound, in which the silane-based compound is selected from a specific diaryloxysilane compound, a specific dialkoxysilane compound, and a specific silicon compound, and in the polymerization step, a polysiloxane having a siloxane constituent unit represented by any of formula (1-1) to formula (1-4) is produced. (In the formulas, R1-R10, R30-R33, Z1, Z2, J1, K1, A1, A2, L1, L2, and X are as described in the description of the present application.Type: ApplicationFiled: September 22, 2021Publication date: November 9, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Hisato AKIMOTO, Kohei KAMATANI, Daisuke TAGUCHI, Kazuyoshi UERA
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Publication number: 20230348367Abstract: The present invention provides a method for producing an aromatic nitrile compound, the method comprising a dehydration reaction wherein a desired compound can be selectively obtained with high yield while suppressing the generation of byproducts during the regeneration of an aromatic amide compound into the corresponding aromatic nitrile compound. In addition, the present invention realizes a method for efficiently producing a carbonate ester by applying the abovementioned production method to a method for producing a carbonate ester. The above are achieved by means of a method for producing an aromatic nitrile compound involving a dehydration reaction wherein an aromatic amide compound is dehydrated, the method having a contact step for bringing the aromatic amide compound into contact with a catalyst in a gas phase during the dehydration reaction.Type: ApplicationFiled: April 27, 2023Publication date: November 2, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Hidefumi HARADA, Takehiko ISOBE, Keisuke SHIMOKAWA, Ryotaro UMEZU
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Publication number: 20230340263Abstract: A polyimide resin composition having a polyimide resin (A) and a polyether sulfone resin (B), wherein the polyimide resin (A) comprises a repeating structural unit of formula (1) and a repeating structural unit of formula (2), a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %, and a mass ratio of the component (A) to the component (B), [(A)/(B)], is 0.1/99.9 to 65/35; and a molded article containing the same: where R1 represents a divalent group of 6 to 22 carbon atoms with an alicyclic hydrocarbon structure; R2 represents a divalent chain aliphatic group of 5 to 16 carbon atoms; and X1 and X2 each independently represent a tetravalent group of 6 to 22 carbon atoms and having an aromatic ring.Type: ApplicationFiled: September 10, 2021Publication date: October 26, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Atsushi SAKAI, Yuuki SATO, Takuya FUKUSHIMA
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Publication number: 20230340177Abstract: To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially.Type: ApplicationFiled: September 22, 2021Publication date: October 26, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuyoshi UERA, Kohei KAMATANI, Hisato AKIMOTO, Daisuke TAGUCHI
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Publication number: 20230340270Abstract: Provided is a cyanine compound being bound counterions consisting of an anion and a cation, wherein the anion is represented by the following formula (I-1): wherein R1 and R2 each independently represent a hydrogen atom or a monovalent organic group; R3 and R4 each independently represent a monovalent group such as a phenyl group; X represents a hydrogen atom, a halogen atom or a monovalent organic group; and Y represents a divalent group such as a n-propenyl group.Type: ApplicationFiled: September 1, 2021Publication date: October 26, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Takashi YAMAMOTO, Kazumasa FUNABIKI, Yuta ARISAWA, Kenyu AOTANI
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Publication number: 20230339921Abstract: A composition containing: a compound (a) represented by Formula (1): wherein Ar represents an aromatic ring, m represents an integer of 2 to 8, n represents an integer of 0 to 6, provided that m+n is equal to or less than a number of carbon atoms that constitute the aromatic ring, and R1 each independently represents an alkylthio group, an epoxyalkylthio group, a thiol group, a halogen group, a hydroxy group, a dialkylthiocarbamoyl group, or a dialkylcarbamoylthio group; and a polythiol (b).Type: ApplicationFiled: September 10, 2021Publication date: October 26, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yousuke IMAGAWA, Kouhei TAKEMURA, Ryosuke SUGIHARA, Mariko SADO
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Patent number: 11795137Abstract: A manufacturing method of a nitrile compound comprising a first step of introducing a raw material gas containing a cyclic compound having an organic substituent, ammonia, and air into a reactor and reacting the raw material gas in the presence of a catalyst to generate the nitrile compound, a second step of discharging a reacted gas from the reactor and separating the nitrile compound from the reacted gas, and a third step of collecting mist from a first residual gas obtained by separating the nitrile compound from the reacted gas to remove water and ammonium carbonate in the first residual gas.Type: GrantFiled: March 25, 2020Date of Patent: October 24, 2023Assignee: Mitsubishi Gas Chemical Company, Inc.Inventor: Masayoshi Ueno
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Patent number: 11799128Abstract: The present invention is able to provide an LGPS-based solid electrolyte characterized by: satisfying a composition of LiuSnvP2SyXz (6?u?14, 0.8?v?2.1, 9?y?16, 0<z?1.6; X represents Cl, Br, or I); and having, in X-ray diffraction (CuK?: ?=1.5405 ?), peaks at least at positions of 2?=19.80°±0.50°, 20.10°±0.50°, 26.60°±0.50°, and 29.10°±0.50°.Type: GrantFiled: June 4, 2019Date of Patent: October 24, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventor: Tomohiro Ito
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Publication number: 20230331925Abstract: The problem of the present invention is to provide: a thermoplastic resin having excellent heat resistance and excellent flame retardancy and having a siloxane constituent unit, particularly a thermoplastic resin suitable for optical applications; a composition containing the thermoplastic resin; and others. The problem is solved by a thermoplastic resin containing a structural unit (A) represented by general formula (I).Type: ApplicationFiled: September 22, 2021Publication date: October 19, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Daisuke TAGUCHI, Kohei KAMATANI, Hisato AKIMOTO, Kazuyoshi UERA
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Publication number: 20230331917Abstract: A bisimide phenol compound represented by the following formula (1): wherein R1 and R2 each independently represent a hydrogen atom, a hydroxy group, or an organic group having 1 to 10 carbon atoms; two or more of both R1 and R2 are hydroxy groups; and each n is independently an integer of 1 to 5.Type: ApplicationFiled: March 7, 2022Publication date: October 19, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Tatsuya HIKICHI, Daiki WAKAHARA, Nobuyoshi OHNISHI
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Publication number: 20230323018Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A), a compound (B) represented by the specific formula (1), and a compound (C) represented by the specific formula (2), and wherein a mass ratio of the component (B) to the component (C) [(B)/(C)] is from 0.01 to 5.0, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent.Type: ApplicationFiled: August 19, 2021Publication date: October 12, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kousuke IKEUCHI, Kazuki KOUNO, Yuma OHNO, Emi OTA, Aoi YOKOO
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Publication number: 20230323017Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A) and a compound (B) represented by the following formula (1), and wherein the content of the component (B) based on 100 parts by mass of the component (A) is from 1.5 to 20.0 parts by mass, an epoxy resin composition, and an epoxy resin curing agent for an amine composition. In the formula (1), R1 is an alkyl group having 1 to 6 carbon atoms optionally having a hydroxy group, R2NHCH2—, where R2 represents an alkyl group having 1 to 6 carbon atoms, or a group represented by the following formula (1A), and p is a number of 0 to 2. In the formula (1A), R3 represents a hydrogen atom or NH2—.Type: ApplicationFiled: August 19, 2021Publication date: October 12, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yuma OHNO, Kazuki KOUNO, Kousuke IKEUCHI, Emi OTA, Aoi YOKOO
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Publication number: 20230324405Abstract: An allergic disease determination method includes contacting probes selected from an allergen and a fragment thereof and a biological sample collected from a subject; detecting a reaction between the probes and an antibody contained in the biological sample; determining a type of the antibody reacted with the probes; inputting data associated with the reaction of each of the at least two types of probes with the antibody and data associated with a type of the bound antibody into a prediction model and acquiring a prediction result; and determining an allergic disease on the basis of the prediction result. The prediction model is a nonlinear model or a model having two or more explanatory variables and two or more terms, the model being created using training data associated with the reaction of at least the probes with the antibody and training data associated with the type of the bound antibody.Type: ApplicationFiled: September 6, 2021Publication date: October 12, 2023Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., NATIONAL UNIVERSITY CORPORATION CHIBA UNIVERSITYInventors: Erika SAWANO, Yuki TAKASE, Naoki SHIMOJO, Fumiya YAMAIDE, Taiji NAKANO
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Publication number: 20230312973Abstract: - - - Provided is an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order: a substrate layer (A), a hard coating layer (B), a light absorbing layer (C), and a low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, where the film thickness of the light absorbing layer (C) is 1 to 20 nm.Type: ApplicationFiled: May 31, 2021Publication date: October 5, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yoshiaki YAMAMOTO, Shota WAKAYAMA