Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
  • Publication number: 20220363622
    Abstract: An object of the present invention is to provide a method for producing m-dialkylbenzaldehyde by using a reaction starting material containing 1,4-dialkylbenzene. The method for producing m-dialkylbenzaldehyde represented by formula (3), comprising a step of allowing carbon monoxide to react on a reaction starting material containing 1,4-dialkylbenzene represented by formula (1) in the presence of a Bronsted acid and a Lewis acid, wherein the reaction starting material is 1,4-dialkylbenzene represented by formula (1), or a mixture of 1,4-dialkylbenzene represented by formula (1) and 1,3-dialkylbenzene represented by formula (2), containing 10 mol % or more of the 1,4-dialkylbenzene represented by formula (1), wherein in formulae (1) to (3), R1 represents a methyl group or an ethyl group, and R2 represents a chain or cyclic alkyl group having 3 or more and 6 or less carbon atoms that has a tertiary carbon at the benzyl position.
    Type: Application
    Filed: July 27, 2020
    Publication date: November 17, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toru SHISHIMI, Tatsuya UTAMURA, Yutaka MATSUURA, Tatsuyuki KUMANO
  • Patent number: 11499005
    Abstract: A curable composition containing an alkenyl phenol A, an epoxy-modified silicone B, and an epoxy compound C other than the epoxy-modified silicone B.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: November 15, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Katsuya Tomizawa, Mayumi Kikuchi, Hidetoshi Kawai
  • Patent number: 11498310
    Abstract: A sheet formed from a carbon fiber reinforced thermoplastic resin with a simplified production process and excellent mechanical characteristics, and a production method of said sheet is provided. This sheet is formed from a carbon fiber reinforced thermoplastic resin that contains carbon fibers, dichloromethane, and a thermoplastic resin containing at least one of a polycarbonate resin and a polyarylate resin, and the content of the dichloromethane contained in the sheet is 10-10,000 ppm by mass.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: November 15, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Genki Sugiyama, Kohei Yoshiya, Hidetaka Shimizu, Hiroyoshi Maruyama
  • Patent number: 11499022
    Abstract: To provide a novel material that maintains suppleness which is the advantage of a material using fibers and has a low thermal shrinkage ratio, and a method for producing the material, a partially welded material using the material, a composite material, and a method for producing a molded product.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: November 15, 2022
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Asami Nakai, Masataka Kaji, Mitsuro Takagi, Nobuhiko Matsumoto
  • Publication number: 20220356346
    Abstract: The present application provides: a polycarbonate resin which has heat resistance and is able to be produced using a starting material that is derived from natural products; and a monomer compound which enables the achievement of this resin. A polycarbonate resin which includes a constituent unit represented by general formula (1); a monomer compound which enables the achievement of this resin; and a polycarbonate resin which includes a constituent unit represented by general formula (1) and a constituent unit represented by general formula (2).
    Type: Application
    Filed: September 11, 2020
    Publication date: November 10, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Keisuke SHIMOKAWA, Hidefumi HARADA, Takehiko ISOBE
  • Publication number: 20220356290
    Abstract: The present invention provides a method for producing an oxymethylene copolymer resin composition, comprising: adding to an oxymethylene copolymer (A), an Mn micromole of an amine-substituted triazine compound (B) per gram of the oxymethylene copolymer (A), an Mc micromole of a choline hydroxide (C) per gram of the oxymethylene copolymer (A), and 0.05 to 1.1 parts by weight of an antioxidant (D) with respect to 100 parts by weight of the oxymethylene copolymer (A), and melt kneading a mixture of the oxymethylene copolymer (A), amine-substituted triazine compound (B), the choline hydroxide (C), and the antioxidant (D), wherein Mn (?mol/g-POM) and Mc (?mol/g-POM) satisfy: 6.5<(Mn+Mc×8)<25, 0.5<Mn<7.0, and 0.0<Mc.
    Type: Application
    Filed: August 6, 2021
    Publication date: November 10, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Mika NAKASHIMA, Daisuke SUNAGA
  • Patent number: 11489194
    Abstract: A method for producing an LGPS-type solid electrolyte can be provided, the method includes preparing a homogeneous solution by mixing and reacting Li2S and P2S5 in an organic solution such that the molar ratio of Li2S/P2S5 is 1.0-1.85; forming a precipitate by adding, to the homogeneous solution, at least one MS2 (M is selected from the group consisting of Ge, Si, and Sn) and Li2S and then mixing; obtaining a precursor by removing the organic solution from the precipitate; and obtaining the LGPS-type solid electrolyte by heating the precursor at 200-700° C.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: November 1, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Aki Katori, Tomohiro Ito, Masahiro Shimada, Kotaro Kawakami
  • Patent number: 11485932
    Abstract: A fragrance composition comprising a compound represented by Formula (1) as an active ingredient: wherein, in Formula (1), R1 represents a linear, branched, or cyclic alkyl group having 1 to 5 carbon atoms.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: November 1, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi Okamoto, Eriko Kushida, Umi Yokobori, Kyoko Kimura
  • Patent number: 11485931
    Abstract: A fragrance composition comprising a compound represented by Formula (1) as an active ingredient: wherein, in Formula (1), R1 represents a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: November 1, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi Okamoto, Eriko Kushida, Umi Yokobori
  • Publication number: 20220344227
    Abstract: The present application provides a film containing: a compound (A) containing at least one selected from the group consisting of a maleimide compound and a citraconimide compound; an organic peroxide (B) containing at least one selected from the group consisting of organic peroxides represented by specific formulae; and a hydroperoxide (C).
    Type: Application
    Filed: June 26, 2020
    Publication date: October 27, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masashi OKANIWA, Kohei HIGASHIGUCHI, Takahito SEKIDO, Kentaro TAKANO, Tsuyoshi KIDA
  • Publication number: 20220340808
    Abstract: A viscoelastic surfactant fluid composition comprising: a surfactant; a counterion; and a modified nanoparticle.
    Type: Application
    Filed: April 12, 2019
    Publication date: October 27, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kunitoshi MIMURA, Rigoberto C. ADVINCULA
  • Patent number: 11480877
    Abstract: The present invention is a compound represented by the following general formula (1).
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: October 25, 2022
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takumi Toida, Masatoshi Echigo, Takashi Sato, Youko Shimizu
  • Patent number: 11479744
    Abstract: The present invention pertains to: a composition capable of removing dry etching residue present on the surface of a semiconductor integrated circuit, while suppressing alumina damage in a production process for the semiconductor integrated circuit; a cleaning method for semiconductor substrates that use alumina; and a production method for a semiconductor substrate having an alumina layer. This composition is characterized by containing 0.00005%-1% by mass of a barium compound (A) and 0.01%-20% by mass of a fluorine compound (B) and having a pH of 2.5-8.0.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: October 25, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toshiyuki Oie, Akinobu Horita, Kenji Yamada, Takahiro Kikunaga
  • Patent number: 11479738
    Abstract: A fragrance composition comprising a compound represented by Formula (1): wherein, in Formula (1), R represents a linear or branched alkyl group having from 2 to 3 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: October 25, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi Okamoto, Umi Yokobori, Eriko Kushida, Masaki Takemoto
  • Publication number: 20220332868
    Abstract: A film containing: a propenyl group-containing resin (A) including, at an end of a molecule, a constituent unit represented by the following formula (1); a radical polymerizable resin or compound (B) other than the propenyl group-containing resin (A); and a curing accelerator (C), wherein the radical polymerizable resin or compound (B) includes at least one selected from the group consisting of a maleimide group and a citraconimide group. In the formula (1), —* represents a bonding hand.
    Type: Application
    Filed: June 26, 2020
    Publication date: October 20, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takahito SEKIDO, Masashi OKANIWA, Genki SUGIYAMA, Kentaro TAKANO, Tsuyoshi KIDA
  • Publication number: 20220332916
    Abstract: A flame-retardant polyimide molding material containing a semi-aromatic polyimide resin (A) and further containing 15 to 80 mass % of either of the following component (B1) or component (B2): (B1) graphite (B2) a combination of two or more selected from the group consisting of graphite, a fluorine resin, and carbon fiber; and a molded article including the same.
    Type: Application
    Filed: June 22, 2020
    Publication date: October 20, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi SAKAI, Yuuki SATO
  • Publication number: 20220332885
    Abstract: Provided is a gas barrier packaging material including a base and a cured resin layer, the base having a surface constituted of an inorganic substance. The cured resin layer is a cured product of an epoxy resin composition including an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and an acidic compound, and a ratio (basic nitrogen/acid groups) of a molar equivalent of basic nitrogen in the epoxy resin composition to a molar equivalent of acid groups derived from the acidic compound is from 0.60 to 20.
    Type: Application
    Filed: July 13, 2020
    Publication date: October 20, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Ryoma HASHIMOTO
  • Patent number: 11472906
    Abstract: An active energy ray-curable resin composition containing: a reaction product (X) of a component (A) and a component (B) below: (A) at least one selected from the group consisting of meta-xylylenediamine and para-xylylenediamine; (B) at least one selected from the group consisting of unsaturated carboxylic acids represented by the following general formula (1) and derivatives of the unsaturated carboxylic acids: wherein, in the formula (1), R1 and R2 each independently represent a hydrogen atom, an alkyl group having from 1 to 8 carbon atoms, an aryl group having from 6 to 12 carbon atoms, or an aralkyl group having from 7 to 13 carbon atoms; (C) a compound having at least one group selected from the group consisting of a glycidyl group and an isocyanate group, and an ethylenically unsaturated bond-containing group; and (D) a phosphoric acid derivative having an ethylenically unsaturated bond-containing group.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: October 18, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Ryoma Hashimoto, Kazuki Kouno
  • Patent number: 11472765
    Abstract: A production method for producing a 1,4-cyclohexanedicarboxylic acid derivative, involves subjecting an aqueous ammonia solution of 1,4-cyclohexanedicarboxylic acid to heat concentration, thereby precipitating a 1,4-cyclohexanedicarboxylic acid derivative as a crystal.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: October 18, 2022
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akifumi Iida, Aoi Yamazoe
  • Publication number: 20220325224
    Abstract: A gas concentration regulator for use in culture of anaerobic bacteria, including: (a) dehydroascorbic acid; (c) a transition metal catalyst; (d) activated carbon; (e) at least one selected from the group consisting of an alkali metal carbonate, an alkali metal hydroxide, and an alkaline earth metal hydroxide; and (f) water.
    Type: Application
    Filed: June 8, 2020
    Publication date: October 13, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Tatsuya CHINZEI, Masao SOMEYA