Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
  • Publication number: 20240391859
    Abstract: Provided is an aldehyde composition including an aldehyde represented by General Formula (1) below and an aldehyde represented by General Formula (2) below, and a mass ratio between the aldehyde represented by Formula (1) and the aldehyde represented by Formula (2), [(1)/(2)], is from 96/4 to 99.9/0.1: where R represents a methyl group or a hydrogen atom.
    Type: Application
    Filed: September 6, 2022
    Publication date: November 28, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Tatsuya UTAMURA, Junya NISHIUCHI
  • Publication number: 20240384097
    Abstract: A polyimide resin composition containing a polyimide resin (A) and an amorphous resin (B), wherein the polyimide resin (A) contains a repeating structural unit represented by the following formula (1) and a repeating structural unit represented by the following formula (2), a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %, and the amorphous resin (B) comprises a repeating structural unit represented by a predetermined formula (I), and a molded article containing the same: wherein R1 represents a divalent group having from 6 to 22 carbon atoms containing at least one alicyclic hydrocarbon structure; R2 represents a divalent chain aliphatic group having from 5 to 16 carbon atoms; and X1 and X2 each independently represent a tetravalent group having from 6 to 22 carbon atoms containing at least one aromatic ring.
    Type: Application
    Filed: August 18, 2022
    Publication date: November 21, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi SAKAI, Yuuki SATO, Takuya FUKUSHIMA
  • Patent number: 12145903
    Abstract: An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: November 19, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toru Shishimi, Tatsuya Utamura, Yutaka Matsuura, Shinichi Nagao
  • Publication number: 20240376286
    Abstract: Provided is a method of recycling a waste resin composition containing a synthetic resin and organic impurities.
    Type: Application
    Filed: October 3, 2022
    Publication date: November 14, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Noriyuki KATO, Katsushi NISHIMORI, Atsushi MOTEGI, Kentaro ISHIHARA, Shoko MURATA SUZUKI, Kazutaka TAKAMATSU
  • Patent number: 12139583
    Abstract: A resin molded article having a microphase-separated structure, the resin molded article containing a polyimide resin (A) and a polyether ketone resin (B), the polyimide resin (A) containing repeating structural units of formulae (1) and (2): wherein R1 represents a divalent group having from 6 to 22 carbon atoms containing at least one alicyclic hydrocarbon structure; R2 represents a divalent chain aliphatic group having from 5 to 16 carbon atoms; and X1 and X2 each independently represent a tetravalent group having from 6 to 22 carbon atoms containing at least one aromatic ring, a content ratio of the repeating structural unit of formula (1) with respect to the total of the repeating structural unit of formula (1) and the repeating structural unit of formula (2) is 20 to 70 mol %, and a weight average molecular weight Mw is 40,000 to 150,000.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: November 12, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi Sakai, Yuuki Sato
  • Publication number: 20240367098
    Abstract: A carbon dioxide absorbent containing a cyclic amine compound (A) and a porous material (B), wherein the cyclic amine compound (A) has 35% by mol or more of a primary amino group with respect to total amino groups; a method for capturing carbon dioxide using the carbon dioxide absorbent; and a carbon dioxide separation and capture apparatus.
    Type: Application
    Filed: July 19, 2022
    Publication date: November 7, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Takashi MAKINOSHIMA, Yuki KAWASHIMA
  • Publication number: 20240369924
    Abstract: A resist composition includes: (A) a resin; and (B) a solvent containing: (B1) a compound represented by the following general formula (b-1), wherein the content of the active component is 45% by mass or less based on the total amount of the resist composition: wherein R1 is an alkyl group having 1 to 10 carbon atoms.
    Type: Application
    Filed: July 25, 2022
    Publication date: November 7, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takumi OKADA, Ryosuke HOSHINO, Hideyuki SATO, Masayuki KATAGIRI, Shu SUZUKI, Masatoshi ECHIGO
  • Publication number: 20240369925
    Abstract: A resist auxiliary film composition includes: (A) a resin; and (B) a solvent containing: (B1) a compound represented by the following general formula (b-1), wherein the content of the active component is 45% by mass or less based on the total amount of the resist auxiliary film composition: wherein R1 is an alkyl group having 1 to 10 carbon atoms.
    Type: Application
    Filed: July 25, 2022
    Publication date: November 7, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takumi OKADA, Ryosuke HOSHINO, Hideyuki SATO, Masayuki KATAGIRI, Shu SUZUKI, Masatoshi ECHIGO
  • Patent number: 12134596
    Abstract: A compound represented by the following formula (1). The compound can be used as a film forming material for lithography or an optical component forming material. A resin may also be obtained using this compound as a monomer, a composition, a method for forming a resist pattern, a method for forming an insulating film, a method for forming a circuit pattern, and a method for purifying the above compound or resin.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 5, 2024
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Makinoshima, Junya Horiuchi, Masatoshi Echigo
  • Patent number: 12134696
    Abstract: An object is to provide a resin composition having a high permittivity and a low dissipation factor, and also a low coefficient of thermal expansion and a good appearance, and suitably used for producing an insulation layer of a printed wiring board, and a prepreg, a resin sheet, a laminate, a metal foil-clad laminate, and a printed wiring board obtainable by using the resin composition. The resin composition contains: (A) BaTi4O9; (B) a filler different from the BaTi4O9 (A); and (C) a thermosetting resin; wherein a median particle size of the BaTi4O9 (A) is 0.10 to 1.00 ?m, and a volume ratio of the BaTi4O9 (A) to the filler (B), the BaTi4O9(A):the filler (B), ranges from 15:85 to 80:20.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: November 5, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takaaki Ogashiwa, Tetsuro Miyahira, Tatsuro Takamura, Sayaka Ito
  • Publication number: 20240361693
    Abstract: A thinner composition includes: (B) a solvent containing: (B1) a compound represented by the following general formula (b-1): wherein R1 is an alkyl group having 1 to 10 carbon atoms. A method for manufacturing a semiconductor device includes applying the thinner composition to a substrate, before applying a photoresist film material or a photoresist underlayer film material to the substrate.
    Type: Application
    Filed: July 25, 2022
    Publication date: October 31, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takumi OKADA, Ryosuke HOSHINO, Hideyuki SATO, Masayuki KATAGIRI, Shu SUZUKI, Masatoshi ECHIGO
  • Publication number: 20240360289
    Abstract: An epoxy resin foam (D) obtained by foaming an epoxy resin composition (C) including an amine curing agent (A) and an epoxy resin (B), wherein the amine curing agent (A) includes a reaction product (a2) of an amine compound including a cyclic amine compound (a1) and carbon dioxide, and the cyclic amine compound (a1) has an amino group bonded to a primary carbon atom.
    Type: Application
    Filed: August 18, 2022
    Publication date: October 31, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Yuki KAWASHIMA, Kousuke IKEUCHI
  • Patent number: 12129230
    Abstract: Provided is a dialkyl carbonate production method that enables a dialkyl carbonate to be produced in a simple manner and in a short reaction time and enables easy processing of by-products. This dialkyl carbonate production method involves generation reaction of a carbonate ester through reaction between carbon dioxide and an alcohol represented by formula (1), wherein the generation reaction of a carbonate ester is performed in the presence of a carbodiimide compound represented by formula (2) (R1-R3 in the formula are as described in the description of the present application).
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: October 29, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hongyu Liu, Takehiko Isobe, Yousuke Shinkai, Hidefumi Harada
  • Patent number: 12133339
    Abstract: A resin composition of the present invention contains: a maleimide compound (A) having a transmittance of 5% or more at a wavelength of 405 nm (h-line); a particular carboxylic acid containing compound (B); and a photo initiator (C) having an absorbance of 0.1 or more at a wavelength of 405 nm (h-line).
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: October 29, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yune Kumazawa, Takuya Suzuki, Seiji Shika
  • Patent number: 12129357
    Abstract: Provided is a cellulose solution (a composition) in which decomposition of cellulose does not easily proceed even if heated. Further, provided is a method for producing a cellulose fiber excellent in mechanical strength. The composition includes cellulose and a compound represented by the following formula (1), a concentration of 1-methylimidazolium chloride being 300 ppm or less on a mass basis with respect to the compound represented by the formula (1). In the formula (1), R is an alkyl group having 2 to 6 carbon atoms, and Me is a methyl group.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: October 29, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kimihiro Aoyama, Tetsuhiko Mizusaka, Yasuyoshi Nakayasu, Yasuo Gotoh
  • Publication number: 20240351770
    Abstract: A fruit and vegetable package includes at least one fruit and/or vegetable, at least one atmosphere conditioner package, and a packaging material for accommodating them, and the atmosphere conditioner package has an oxygen absorption capacity, a carbon dioxide absorption capacity, and a moisture generation capacity .
    Type: Application
    Filed: August 19, 2022
    Publication date: October 24, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Ken SUGIMOTO
  • Publication number: 20240343854
    Abstract: A method for producing an oxymethylene copolymer includes copolymerizing trioxane and a comonomer copolymerizable with the trioxane in a presence of a cationic polymerization catalyst and a polymerization controlling agent, wherein the polymerization controlling agent is a cyclic ether with a 4- or more-membered ring containing one oxygen atom.
    Type: Application
    Filed: August 17, 2022
    Publication date: October 17, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Mika NAKASHIMA
  • Patent number: 12115760
    Abstract: Provided is a resin laminate having: a polyester layer containing a polyester resin (A); and a mixed resin layer containing a polyamide resin (B) and a polyester resin (C). The polyamide resin (B) includes a constituent unit derived from a diamine and a constituent unit derived from a dicarboxylic acid, with 70 mol % or greater of the constituent derived from a diamine being a constituent unit derived from xylylenediamine, and 70 mol % or greater of the constituent unit derived from a dicarboxylic acid being a constituent unit derived from an ?,?-linear aliphatic dicarboxylic acid having from 4 to 20 carbons. Further, a radical concentration in the mixed resin layer is 1×10?12 mol/g or greater. Also provided are a multilayered film and a multilayered container formed from the resin laminate.
    Type: Grant
    Filed: August 6, 2020
    Date of Patent: October 15, 2024
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Jin Nakamura, Takanori Miyabe, Takafumi Oda
  • Patent number: 12119277
    Abstract: A method for producing a package substrate for mounting a semiconductor device includes: forming a first substrate by forming a laminate in which a first metal layer that has a thickness of 1 ?m to 70 ?m and that is peelable from a core resin layer, a first insulating resin layer, and a second metal layer are arranged on both sides of the core resin layer having a thickness of 1 ?m to 80 ?m, and heating and pressurizing the laminate simultaneously; forming a pattern on the second metal layer; forming a second substrate by heating and pressurizing a laminate formed by arranging a second insulating resin layer and a third metal layer on a surface of the second metal layer; and peeling, from the core resin layer, a third substrate including the first metal and insulating resin layers, the second metal and insulating layers, and the third metal layer.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: October 15, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Syunsuke Hirano, Yoshihiro Kato, Takaaki Ogashiwa
  • Patent number: 12116338
    Abstract: Provided are a novel aldehyde compound suitable for a fragrance and a fragrance ingredient, or a raw material thereof, and a method for producing the aldehyde compound, as well as a fragrance composition containing the aldehyde compound as an active ingredient, and use of the aldehyde compound as a fragrance. A compound represented by Formula (1): where in Formula (1), R is a hydrogen atom or a methyl group.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: October 15, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toru Shishimi, Yutaka Matsuura, Shinichi Nagao