Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
  • Publication number: 20240139704
    Abstract: Provided is an oxygen absorber including an unsaturated group-containing liquid oligomer, an oxygen absorption-promoting substance, a carrier supporting the unsaturated group-containing liquid oligomer and the oxygen absorption-promoting substance, gas-absorbing inorganic particles, and activated carbon. An amount of the unsaturated group-containing liquid oligomer adsorbed on the gas-absorbing inorganic particles is 6.5 parts by mass or less per 100 parts by mass of the gas-absorbing inorganic particles.
    Type: Application
    Filed: April 11, 2022
    Publication date: May 2, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masao SOMEYA, Yota YOSHIDA, Keisuke WATANABE
  • Publication number: 20240140924
    Abstract: Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, and a phenolic polymerization inhibitor, wherein a content of the quaternary ammonium salt is 1.00 ppm or less; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, including adjusting a content of a quaternary ammonium salt in the glycidyl (meth)acrylate composition to 1.00 ppm or less.
    Type: Application
    Filed: January 19, 2022
    Publication date: May 2, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Michihiro YURI, Kouji SUZUKI, Shu SUZUKI
  • Publication number: 20240139706
    Abstract: Provided is an oxygen absorber containing: a liquid oligomer of an unsaturated hydrocarbon; a transition metal catalyst; a carrier supporting the liquid oligomer of the unsaturated hydrocarbon and the transition metal catalyst; granular activated carbon; and crystalline thermoplastic resin particles. In an analysis curve derived by subjecting the crystalline thermoplastic resin particles and the granular activated carbon to a pyrolysis-gas chromatography analysis under a pyrolysis condition of 600° C., a ratio [Cref/Pref] of a peak area (Cref) of a decomposition product of a low molecular weight component of the crystalline thermoplastic resin particles adsorbed on the granular activated carbon per unit mass of the activated carbon to a peak area (Pref) of the crystalline thermoplastic resin particle decomposition product per unit mass of the crystalline thermoplastic resin particles is 0.20 or less.
    Type: Application
    Filed: April 11, 2022
    Publication date: May 2, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Masao SOMEYA, Keisuke WATANABE
  • Publication number: 20240138447
    Abstract: Provided is an oxygen scavenger powder containing an iron powder, a metal halide, and an alkaline agent, in which the alkaline agent has a solubility of less than 0.1 g in 100 g of water at 25° C., and an aqueous dispersion of the alkaline agent has a pH of from 8 to 12 at 25° C.
    Type: Application
    Filed: February 17, 2022
    Publication date: May 2, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Naoki OKA, Takayoshi ITOH
  • Publication number: 20240140890
    Abstract: A production method for producing a target compound represented by the following formula (1), the production method including: a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability, wherein, in the step (A), water is removed from the reaction system: wherein R represents H, CH3, or C2H5, wherein R represents H, CH3, or C2H5, and R1 represents CH3, C2H5, C3H7, or C4H9.
    Type: Application
    Filed: March 30, 2022
    Publication date: May 2, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Mitsuharu KITAMURA
  • Patent number: 11970442
    Abstract: To achieve a method for producing a carbonic ester at a high yield by a simple process while suppressing formation of by-products, for example, a method for producing an aliphatic carbonic ester. The above problem is solved by a method for producing a carbonic ester, the method including a carbonic ester formation reaction in which an alcohol and carbon dioxide are reacted in the presence of an aromatic nitrile compound and a catalyst, wherein the water content in the alcohol used in the carbonic ester formation reaction is 0.10% by mass or less.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: April 30, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hidefumi Harada, Takehiko Isobe, Hongyu Liu, Yousuke Shinkai, Ryotaro Umezu
  • Publication number: 20240132434
    Abstract: An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 25, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toru SHISHIMI, Tatsuya UTAMURA, Yutaka MATSUURA, Shinichi NAGAO
  • Publication number: 20240132634
    Abstract: Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, a strong acid salt, and a phenolic polymerization inhibitor; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, the method including adjusting the content of a strong acid salt in the glycidyl (meth)acrylate composition to a certain amount relative to an amount of a quaternary ammonium salt by mole.
    Type: Application
    Filed: January 19, 2022
    Publication date: April 25, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Michihiro YURI, Kouji SUZUKI, Shu SUZUKI
  • Publication number: 20240132805
    Abstract: A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.
    Type: Application
    Filed: March 4, 2022
    Publication date: April 25, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroaki TAKAKUWA, Akinobu HORITA, Takahiro KIKUNAGA
  • Patent number: 11965058
    Abstract: An oxymethylene-copolymer manufacturing method includes: polymerizing a polymerization raw material containing trioxane and a comonomer in the presence of an acid catalyst in a quantity that is 1.0×10?8 moles to 5.0×10?6 moles with respect to 1 mole of trioxane; adding a hydroxylamine compound represented by general formula (1) (in the formula, R1 and R2 are, independently of each other, a hydrogen atom or an organic group having 1-20 carbon atoms) to a reaction product obtained during the polymerizing of the polymerization raw material at 50-5000 times the quantity of the acid catalyst, in terms of the molar quantity, and mixing the hydroxylamine compound with the reaction product; and subjecting the mixture of the reaction product and the hydroxylamine compound, which is obtained during the adding of the hydroxylamine compound, to an additional melt-kneading.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: April 23, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yuuta Yamamoto, Daisuke Sunaga, Takuya Okada
  • Publication number: 20240124648
    Abstract: According to the present invention, a resin composition can be provided, which comprises a solvent represented by general formula (1) and a polycarbonate resin containing a structural unit (a) represented by general formula (A) (provided that a polycarbonate homopolymer composed only of a structural unit represented by formula (i) is excluded). (In formula (1), Ra represents a hydrogen atom or the like; Rb represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or the like; Rc to Rf independently represent a hydrogen atom or the like; and n represents an integer of 1 to 10.) (In formula (A), R1 to R8 independently represent a hydrogen atom or the like; and X represents —O— or the like.
    Type: Application
    Filed: February 10, 2022
    Publication date: April 18, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toshihito GOTO, Noriyoshi OGAWA
  • Publication number: 20240123425
    Abstract: A carbon dioxide absorbent containing a polyamine compound (A) having an alicyclic hydrocarbon structure, wherein a content of the polyamine compound (A) is 60% by mass or more.
    Type: Application
    Filed: December 14, 2021
    Publication date: April 18, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Yuki KAWASHIMA
  • Publication number: 20240124712
    Abstract: A polycarbonate copolymer which has siloxane constituent units represented by any of formulae (1-1) to (1-4) and prescribed polycarbonate constituent units.
    Type: Application
    Filed: November 21, 2023
    Publication date: April 18, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuyoshi UERA, Kohei KAMATANI, Keisuke TOMITA, Hisato AKIMOTO
  • Patent number: 11960056
    Abstract: Provided is an optical lens formed by integrally molding a lens part that is an optically effective portion and has a light incidence/emission surface, and a lens edge part that is an optically ineffective portion and has a surface thereof except the light incidence/emission surface. The lens edge part includes a non-transparent region in part or all thereof, the lens part and the lens edge part include a thermoplastic resin, and the non-transparent region in the lens edge part contains a total of 0.1-5 mass % of one or more of a black dye and a black pigment.
    Type: Grant
    Filed: December 24, 2019
    Date of Patent: April 16, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi Motegi, Kentaro Ishihara, Katsushi Nishimori, Shinya Ikeda, Noriyuki Kato, Mitsuteru Kondo, Kensuke Oshima, Masahiro Kanda, Shoko Suzuki, Tatsunobu Ogata, Mitsutake Suematsu
  • Patent number: 11961971
    Abstract: Provided is a production method for an all-solid-state battery having a solid electrolyte layer between a positive electrode layer and a negative electrode layer, the production method including: coating or impregnating the positive electrode layer and/or the negative electrode layer with a solid electrolyte solution in which a boron hydride compound serving as the solid electrolyte has been dissolved in a solvent; and removing the solvent from the coated or impregnated solid electrolyte solution and causing the solid electrolyte to precipitate on the positive electrode layer and/or the negative electrode layer.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: April 16, 2024
    Assignees: MITSUBISHI GAS CHEMICAL COMPANY, INC., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Genki Nogami, Masahiro Shimada, Tomohiro Ito, Aki Katori, Keita Noguchi, Naoto Yamashita, Takashi Mukai, Masahiro Yanagida
  • Publication number: 20240117277
    Abstract: Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity. The composition for cleaning semiconductor substrates, comprising an oxidizing agent (A), a fluorine compound (B), a metallic tungsten corrosion inhibiter (C), and a tungsten oxide etching accelerator (D), wherein the addition ratio of the oxidizing agent (A) is from 0.0001 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; the addition ratio of the fluorine compound (B) is from 0.005 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; and the addition ratio of the metallic tungsten corrosion inhibiter (C) is from 0.0001 to 5% by mass relative to the total mass of the composition for cleaning semiconductor substrates.
    Type: Application
    Filed: February 4, 2022
    Publication date: April 11, 2024
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toshiyuki OIE, Tomoyuki ADANIYA
  • Publication number: 20240117234
    Abstract: A composition for an oil or gas well formation, containing a viscoelastic surfactant; and a modified nanomaterial and a producing method of the composition, and a forming method of the oil or gas well. The modified nanomaterial optionally contains a nanocellulose. The modified nanomaterial optionally has, on its surface, a sulfate group, a sulfite group, a carboxy group, an ethylene oxide chain, an amino group, an ester group, a silane group, a tertiary ammonium group or a mixture thereof.
    Type: Application
    Filed: October 7, 2020
    Publication date: April 11, 2024
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Rigoberto C. ADVINCULA, Kunitoshi MIMURA, Daisuke OHNO, Masahiro SHIMADA
  • Patent number: 11952460
    Abstract: A polycarbonate resin having a high refractive index, a low Abbe number and a high moisture and heat resistance is provided. In an embodiment, a polycarbonate resin including a structural unit represented by general formula (1) below is provided.
    Type: Grant
    Filed: July 29, 2022
    Date of Patent: April 9, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Munenori Shiratake, Kentaro Ishihara, Koji Hirose, Shinya Ikeda, Noriyuki Kato, Mitsuteru Kondo, Shoko Suzuki, Kensuke Oshima, Shuya Nagayama
  • Patent number: 11951720
    Abstract: Provided is a thermoplastic resin laminate suitable for optical applications of transparent substrate materials and protective materials. The thermoplastic resin laminate includes a first layer including an amorphous polyester resin (A) as the main component, and a second layer including a (meth)acrylic resin (B) as the main component on the first layer.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: April 9, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Ken Taguwa, Nobuyuki Koike
  • Patent number: 11945906
    Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A), a compound (B) represented by the specific formula (1), and a compound (C) represented by the specific formula (2), and wherein a mass ratio of the component (B) to the component (C) [(B)/(C)] is from 0.01 to 5.0, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent.
    Type: Grant
    Filed: August 19, 2021
    Date of Patent: April 2, 2024
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke Ikeuchi, Kazuki Kouno, Yuma Ohno, Emi Ota, Aoi Yokoo