Abstract: The purpose of this invention is to provide: a hard-coat composition with which it is possible to produce a hard-coat layer having excellent hardness and abrasion-resistance when cured, and having excellent moldability during processing; and a laminate film and the like having such a hard-coat composition. This problem is solved by a curable hard-coat composition containing a (meth)acryloyl polymer and inorganic oxide nanoparticles, wherein the (meth)acryloyl polymer has a (meth)acrylic equivalent of 200-500 g/eq and a weight-average molecular weight of 5,000-200,000.

Abstract: Provided are an epoxy resin curing agent containing an amine composition or a modified product thereof, wherein the amine composition contains bis(aminomethyl)cyclohexane (A) and a compound (B) represented by the following formula (1), and wherein the content of the component (B) based on 100 parts by mass of the component (A) is from 0.01 to 2.0 parts by mass, an epoxy resin composition, and use of an amine composition for an epoxy resin curing agent, wherein R1 represents an alkyl group having 1 to 6 carbon atoms, and p is a number of 1 to 3.

Abstract: Provided is an oxygen absorber including an unsaturated group-containing liquid oligomer, an oxygen absorption-promoting substance, a carrier supporting the unsaturated group-containing liquid oligomer and the oxygen absorption-promoting substance, gas-absorbing inorganic particles, and activated carbon. An amount of the unsaturated group-containing liquid oligomer adsorbed on the gas-absorbing inorganic particles is 6.5 parts by mass or less per 100 parts by mass of the gas-absorbing inorganic particles.

Abstract: Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, and a phenolic polymerization inhibitor, wherein a content of the quaternary ammonium salt is 1.00 ppm or less; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, including adjusting a content of a quaternary ammonium salt in the glycidyl (meth)acrylate composition to 1.00 ppm or less.

Abstract: Provided is an oxygen absorber containing: a liquid oligomer of an unsaturated hydrocarbon; a transition metal catalyst; a carrier supporting the liquid oligomer of the unsaturated hydrocarbon and the transition metal catalyst; granular activated carbon; and crystalline thermoplastic resin particles. In an analysis curve derived by subjecting the crystalline thermoplastic resin particles and the granular activated carbon to a pyrolysis-gas chromatography analysis under a pyrolysis condition of 600° C., a ratio [Cref/Pref] of a peak area (Cref) of a decomposition product of a low molecular weight component of the crystalline thermoplastic resin particles adsorbed on the granular activated carbon per unit mass of the activated carbon to a peak area (Pref) of the crystalline thermoplastic resin particle decomposition product per unit mass of the crystalline thermoplastic resin particles is 0.20 or less.

Abstract: A production method for producing a target compound represented by the following formula (1), the production method including: a step (A) of subjecting a mixed liquid containing a starting compound represented by the following formula (2) and a solvent to a hydrogenation reduction in the presence of a catalyst having hydrogenation ability, wherein, in the step (A), water is removed from the reaction system: wherein R represents H, CH3, or C2H5, wherein R represents H, CH3, or C2H5, and R1 represents CH3, C2H5, C3H7, or C4H9.

Abstract: Provided is an oxygen scavenger powder containing an iron powder, a metal halide, and an alkaline agent, in which the alkaline agent has a solubility of less than 0.1 g in 100 g of water at 25° C., and an aqueous dispersion of the alkaline agent has a pH of from 8 to 12 at 25° C.

Abstract: To achieve a method for producing a carbonic ester at a high yield by a simple process while suppressing formation of by-products, for example, a method for producing an aliphatic carbonic ester. The above problem is solved by a method for producing a carbonic ester, the method including a carbonic ester formation reaction in which an alcohol and carbon dioxide are reacted in the presence of an aromatic nitrile compound and a catalyst, wherein the water content in the alcohol used in the carbonic ester formation reaction is 0.10% by mass or less.

Abstract: An object of the present invention is to provide a method for producing 2,4-dialkylbenzaldehyde with excellent conversion rate and yield, and excellent regioselectivity for formylation, by allowing carbon monoxide to react on a starting material containing a specific m-dialkylbenzene in the presence of hydrogen fluoride and boron trifluoride. The method for producing 2,4-dialkylbenzaldehyde according to the present invention comprises a step of allowing carbon monoxide to react on a starting material containing m-dialkylbenzene represented by formula (1) in the presence of hydrogen fluoride and boron trifluoride for formylation at least at a position (a), wherein the starting material is a dialkylbenzene containing more than 90 mol % of m-dialkylbenzene represented by formula (1), and the number of moles of boron trifluoride relative to 1 mole of m-dialkylbenzene represented by formula (1) is 0.7 mol or more and 3.

Abstract: A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.

Abstract: Provided are a glycidyl (meth)acrylate composition, which includes a phenolic polymerization inhibitor that is unlikely to deteriorate such that the glycidyl (meth)acrylate composition can be stably stored for a long period of time, and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate resin composition. More specifically, provided are: a glycidyl (meth)acrylate composition including a glycidyl (meth)acrylate, a quaternary ammonium salt, a strong acid salt, and a phenolic polymerization inhibitor; and a method for suppressing deactivation of a phenolic polymerization inhibitor in a glycidyl (meth)acrylate composition, the method including adjusting the content of a strong acid salt in the glycidyl (meth)acrylate composition to a certain amount relative to an amount of a quaternary ammonium salt by mole.

Abstract: An oxymethylene-copolymer manufacturing method includes: polymerizing a polymerization raw material containing trioxane and a comonomer in the presence of an acid catalyst in a quantity that is 1.0×10?8 moles to 5.0×10?6 moles with respect to 1 mole of trioxane; adding a hydroxylamine compound represented by general formula (1) (in the formula, R1 and R2 are, independently of each other, a hydrogen atom or an organic group having 1-20 carbon atoms) to a reaction product obtained during the polymerizing of the polymerization raw material at 50-5000 times the quantity of the acid catalyst, in terms of the molar quantity, and mixing the hydroxylamine compound with the reaction product; and subjecting the mixture of the reaction product and the hydroxylamine compound, which is obtained during the adding of the hydroxylamine compound, to an additional melt-kneading.

Abstract: According to the present invention, a resin composition can be provided, which comprises a solvent represented by general formula (1) and a polycarbonate resin containing a structural unit (a) represented by general formula (A) (provided that a polycarbonate homopolymer composed only of a structural unit represented by formula (i) is excluded). (In formula (1), Ra represents a hydrogen atom or the like; Rb represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or the like; Rc to Rf independently represent a hydrogen atom or the like; and n represents an integer of 1 to 10.) (In formula (A), R1 to R8 independently represent a hydrogen atom or the like; and X represents —O— or the like.

Abstract: A carbon dioxide absorbent containing a polyamine compound (A) having an alicyclic hydrocarbon structure, wherein a content of the polyamine compound (A) is 60% by mass or more.

Abstract: A polycarbonate copolymer which has siloxane constituent units represented by any of formulae (1-1) to (1-4) and prescribed polycarbonate constituent units.

Abstract: Provided is an optical lens formed by integrally molding a lens part that is an optically effective portion and has a light incidence/emission surface, and a lens edge part that is an optically ineffective portion and has a surface thereof except the light incidence/emission surface. The lens edge part includes a non-transparent region in part or all thereof, the lens part and the lens edge part include a thermoplastic resin, and the non-transparent region in the lens edge part contains a total of 0.1-5 mass % of one or more of a black dye and a black pigment.

Abstract: Provided is a production method for an all-solid-state battery having a solid electrolyte layer between a positive electrode layer and a negative electrode layer, the production method including: coating or impregnating the positive electrode layer and/or the negative electrode layer with a solid electrolyte solution in which a boron hydride compound serving as the solid electrolyte has been dissolved in a solvent; and removing the solvent from the coated or impregnated solid electrolyte solution and causing the solid electrolyte to precipitate on the positive electrode layer and/or the negative electrode layer.

Abstract: Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity. The composition for cleaning semiconductor substrates, comprising an oxidizing agent (A), a fluorine compound (B), a metallic tungsten corrosion inhibiter (C), and a tungsten oxide etching accelerator (D), wherein the addition ratio of the oxidizing agent (A) is from 0.0001 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; the addition ratio of the fluorine compound (B) is from 0.005 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; and the addition ratio of the metallic tungsten corrosion inhibiter (C) is from 0.0001 to 5% by mass relative to the total mass of the composition for cleaning semiconductor substrates.

Abstract: A composition for an oil or gas well formation, containing a viscoelastic surfactant; and a modified nanomaterial and a producing method of the composition, and a forming method of the oil or gas well. The modified nanomaterial optionally contains a nanocellulose. The modified nanomaterial optionally has, on its surface, a sulfate group, a sulfite group, a carboxy group, an ethylene oxide chain, an amino group, an ester group, a silane group, a tertiary ammonium group or a mixture thereof.

Abstract: A polycarbonate resin having a high refractive index, a low Abbe number and a high moisture and heat resistance is provided. In an embodiment, a polycarbonate resin including a structural unit represented by general formula (1) below is provided.