Patents Assigned to Mitsui
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Patent number: 8361605Abstract: A photosensitive resin composition which is effective in avoiding troubles in the step of plating with various metals in printed wiring board production, such as under-film metal deposition and film peeling, and which forms a wiring-protecting film excellent in adhesion, flexibility, insulation reliability, and heat resistance. The photosensitive resin composition comprises (A) a carboxylated polymer, (B) a compound having at least two photopolymerizable unsaturated double bonds, (C) a photopolymerization initiator, and (D) a nitrogen compound represented by a specific feature.Type: GrantFiled: April 23, 2008Date of Patent: January 29, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
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Publication number: 20130020010Abstract: A method of manufacturing laminated core segments including: a process to blank and laminate, wherein the segment core sheets formed in the adjacent virtual lines are aligned so that directions of the segment core sheets alternate, each of the segment core sheets are blanked and formed by a die device, and the laminated core segments are formed by laminating the blanked segment core sheets in the die device; a process to eject, wherein each of the laminated core segments formed by blanking and laminating in each virtual line is ejected from the die device; and a process to identify a blanking position, wherein the distinguishing marks are provided for the laminated core segments to identify the virtual lines therefor.Type: ApplicationFiled: July 11, 2012Publication date: January 24, 2013Applicant: MITSUI HIGH-TEC, INC.Inventors: Kazuki Namaike, Tadashi Shibuta, Akikazu Higuchi, Takeshi Sato
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Publication number: 20130018169Abstract: Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.Type: ApplicationFiled: September 14, 2012Publication date: January 17, 2013Applicant: MITSUI CHEMICALS, INC.Inventors: Masakazu Murakami, Tomoyuki Ando, Hironori Kuboi, Hidetoshi Hayashi, Osamu Kohgo, Seiichi Kobayashi
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Patent number: 8355142Abstract: For work in which reflecting mirrors (or facets (31)) to be mounted on a heliostat 3 coincide with a pseudo toroid (53), an adjustment method of, and a mounting posture measuring device for, accurately measuring mounting postures of the respective facets (31) are provided for performing mounting adjustment efficiently and simply. In a method of installing the reflecting mirrors (or the facets (31)) constituting the heliostat 3 for sunlight condensation, each facet (31) is installed in such so that a reflected laser beam (52) reflected by the facet 31 can reach a virtual passage point (52b) in a laser point measuring unit (12).Type: GrantFiled: December 4, 2008Date of Patent: January 15, 2013Assignee: Mitsui Engineering & Shipbuilding Co., Ltd.Inventors: Kazuaki Ezawa, Kazumasa Fujiwara
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Patent number: 8354470Abstract: Resin compositions of the invention contain an olefin polymer wax having higher heat resistance than achieved heretofore, high compatibility with resins and excellent mold-releasing properties. A resin composition (X) of the invention is obtained by blending a resin (A) having a melting point Tm of not less than 200° C. and an olefin polymer wax component (B), the olefin polymer wax component (B) including a cyclic olefin polymer wax (B-1) having structural units (a) and (b) described below, the cyclic olefin polymer wax (B-1) containing the structural units (b) at 0.05 to 50 mol % based on all the structural units in the polymer; (a) units derived from ethylene (b) units derived from a cyclic olefin.Type: GrantFiled: June 12, 2009Date of Patent: January 15, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Mai Kurihara, Kuniaki Kawabe, Akinori Etoh, Toshiyuki Itou
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Patent number: 8353409Abstract: A gas hydrate slurry dewatering apparatus adapted to feed a raw as into a cylindrical main body of dewatering column so gas to attain pressuriation and so suction any gas from the interior of a drainage chamber disposed around the cylindrical main body so as to attain depressurization. An internal tube (8) as a constituent of a dewatering apparatus (6) in which the gas hydrate slurry (S) is introduced is provided with a separating section (7). A drainage chamber (10) is formed by the internal tube (8) and, disposed with a given spacing therefrom, an external tube (9). An exhaust blower (B2) and a drainage pump (P2) are connected to the drainage chamber (10). A gas feed blower (B3) for a raw gas (G1) is connected to the internal tube (8). A differential pressure detector (x1) is provided for detecting any pressure difference between the interior of the internal tube (8) and the interior of the drainage chamber (10).Type: GrantFiled: March 25, 2008Date of Patent: January 15, 2013Assignee: Mitsui Engineering & Shipbuilding Co., Ltd.Inventors: Tetsuro Murayama, Kiyoshi Horiguchi, Takashi Arai, Toru Iwasaki, Hidenori Moriya
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Publication number: 20130008382Abstract: This thin-film forming device includes: a deposition vessel in which a reduced-pressure deposition space, to which a raw material gas and a reactant gas are alternately supplied on different timings, is formed in order to form a thin film on the substrate; and a gas supply unit configured to supply the raw material gas and the reactant gas to the deposition vessel. The gas supply unit is provided with at least one partition that bends a gas passage from an inlet port of each of the raw material gas and the reactant gas toward the deposition space.Type: ApplicationFiled: March 17, 2011Publication date: January 10, 2013Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.Inventors: Nozomu Hattori, Yasunari Mori
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Publication number: 20130008517Abstract: Provided are a gas hydrate percentage measuring device and a method of controlling the same which are capable of measuring a gas hydrate percentage with high accuracy even if source gas exists dissolved in gas hydrate slurry or as gas bubble therein.Type: ApplicationFiled: November 5, 2010Publication date: January 10, 2013Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.Inventor: Tetsuro Murayama
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Publication number: 20130012632Abstract: Provided is a process for producing an aqueous dispersion liquid, wherein, in an aqueous medium, an ethylene/(meth)acrylic acid copolymer (A) containing (meth)acrylic acid-derived constituent units in an amount of 8% by mass or more is neutralized by using an alkanolamine (B) and dispersed. The above-described alkanolamine (B) is preferably represented by general formula (1) below. [In general formula (1) above, R1 to R3 represent independently of each other a hydrogen atom, an alkyl group, or a saturated aliphatic hydrocarbon group having one hydroxyl group, and at least one of R1 to R3 represents a saturated aliphatic hydrocarbon group having one hydroxyl group.Type: ApplicationFiled: January 28, 2011Publication date: January 10, 2013Applicant: DU PONT-MITSUI POLYCHEMICALS CO., LTD.Inventors: Toshihiro Ito, Akira Fujiwara
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Patent number: 8349957Abstract: The present invention provides a polyolefin resin composition which is excellent in mechanical properties and dimensional stability and is particularly excellent in heat resistance, a film which is excellent in mechanical properties, dimensional stability and heat resistance because it is obtained from the polyolefin resin composition and which is particularly excellent in meltdown properties, a macroporous membrane which is excellent in permeability and shutdown properties in addition to the above properties, and uses thereof. The polyolefin resin composition of the present invention (C) comprises 85 to 50% by mass of ultrahigh-molecular weight polyethylene (A) having a specific intrinsic viscosity and 15 to 50% by mass of a polymer (B) containing a repeating unit derived from 4-methyl-1-pentene, in 100% by mass of the polyolefin resin composition (C).Type: GrantFiled: November 18, 2009Date of Patent: January 8, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Shota Abe, Atsushi Morita, Kazuoto Sugiyama, Mineo Kubo
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Patent number: 8350147Abstract: The present invention provides a process for producing an encapsulating material for solar cell which makes high-speed crosslinking possible and causes no blister phenomenon without significant restrictions being imposed on the conditions for molding the encapsulating material. The present invention provides a process for producing the encapsulating material for solar cell including impregnating a molded form of an ethylene copolymer with an organic peroxide in a liquid state at normal temperature which shows a decomposition temperature (a temperature at which the half-life period is one hour) of not higher than 150° C. A process for producing the encapsulating material for solar cell in which dialkyl peroxide (A) and an organic peroxide (B) selected from peroxycarbonate and peroxyketal at a ratio by weight of 10/90 to 90/10 of (A) and (B) in a liquid state impregnate the molded form of the ethylene copolymer is a preferable embodiment of the present invention.Type: GrantFiled: February 10, 2006Date of Patent: January 8, 2013Assignee: Du Pont-Mitsui Polychemicals Co., Ltd.Inventors: Koichi Nishijima, Manabu Kawamoto, Rie Sato, Tetsuya Nakamura
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Patent number: 8349656Abstract: In order to remove plating burrs generated in etching step, there is provided a manufacturing method of semiconductor devices on each of unit leadframes in a leadframe material in which a plurality of the unit leadframes are arranged in plural rows or a single row, wherein at least two types of plating burr removals are conducted after a half-etching is performed onto a front surface side of the leadframe material, using a first plating layer as resist film.Type: GrantFiled: September 8, 2010Date of Patent: January 8, 2013Assignee: Mitsui High-Tec, Inc.Inventors: Yusuke Etou, Naoki Fukami, Kiyoshi Matsunaga
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Patent number: 8349996Abstract: Disclosed is a compound represented by the following general formula (1), wherein, in the formula, M1 represents Sb or Bi; X1 and X2 each independently represent a sulfur atom or an oxygen atom; R1 represents a divalent organic group; Y1 represents a monovalent inorganic or organic group; a represents a number of 1 or 2; b represents a number of 0 or an integer of not less than 1; c represents an integer of not less than 1 and not more than d; d represents a valence of M1; when d?c is not less than 2, a plurality of Y1s each independently represent a monovalent inorganic or organic group and may be bonded to each other to form an M1-containing ring; and e represents a number of 0 or an integer of not less than 1.Type: GrantFiled: July 23, 2009Date of Patent: January 8, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Masakazu Murakami, Tomoyuki Ando, Seiichi Kobayashi
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Patent number: 8349451Abstract: To provide capsular fine particles comprising an olefinic polymer which have a uniform particle size distribution and a uniform particle size, and which are spherical and free from the coagulation between particles. Capsular fine particles comprising the olefinic polymer, of which the ratio (L/M) of the outer diameter (L) to the inner diameter (M) is 1.1 to 6.0, and the average diameter is 0.6 to 40 ?m.Type: GrantFiled: April 7, 2006Date of Patent: January 8, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Yasushi Nakayama, Naoto Matsukawa, Junji Saito, Susumu Murata, Makoto Mitani, Terunori Fujita
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COATING COMPOSITION, METHOD FOR MANUFACTURING FILM USING THE SAME, AND COATED ARTICLE USING THE SAME
Publication number: 20130004755Abstract: A chromium-free fluoropolymer-containing primer composition, which can provide a coated article having excellent higher corrosion resistance by forming a fluoropolymer coating film, and a primer layer having sufficient adhesive strength to the fluoropolymer coating film on the surface of a substrate such as metal, glass, ceramic and heat resistant plastics, a method for manufacturing a coating film using the same, and a coated article using the same. The coating composition contains at least one kind of a fluoropolymer component selected from a reactive functional group-containing fluoropolymer, and a fluoropolymer having a melt flow rate (MFR), measured under a load of 5 kg and at 372° C., in accordance with ASTM D1238, of 10 to 100 g/10 minutes, and an organic titanate, wherein content of titanium contained in the organic titanate, relative to the fluoropolymer component, is 1 to 40% by weight.Type: ApplicationFiled: March 22, 2011Publication date: January 3, 2013Applicants: DU PONT-MITSUI FLUOROCHEMICALS CO., LTD.,, NIPPON FUSSO CO., LTD.Inventors: Naoki Fukumura, Masahiro Takeyama, Ryo Nakazawa -
Publication number: 20130005934Abstract: A polymerizable composition including a compound represented by following General Formula (1): (in Formula (1), M represents a metal atom; X1 and X2 each independently represents a sulfur atom or an oxygen atom; R1 represents a divalent organic group; m represents an integer of 0 or 1 or greater; p represents an integer of 1 to n; n represents a valence of a metal atom M; and Y's each independently represents an inorganic or organic residue, where when n?p is 2 or greater, Y's may be bonded to each other to form a ring containing a metal atom M), a thiol compound and an episulfide compound.Type: ApplicationFiled: September 12, 2012Publication date: January 3, 2013Applicant: MITSUI CHEMICALS, INCInventors: Mitsuo Nakamura, Hiroshi Naruse, Atsuo Otsuji, Shinichi Usugi, Masao Imai, Hidetoshi Hayashi, Osamu Kohgo, Hideki Yamamoto, Seiichi Kobayashi
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Patent number: 8344156Abstract: A halogenating agent is added to a mixture including a base, a fluoroalkylcarboxylic acid derivative and an acrylate derivative to produce a fluoroaclyacetic acid derivative represented by the following Formula (3): wherein Rf represents a fluorine containing alkyl group, R1 and R2 represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group or an acyl group, or together represent an atomic group that forms a 5- or 6-membered ring containing a nitrogen atom to which R1 and R2 are bonded; R3 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an arylalkyl group; and R4 represents an alkyl group, a cycloalkyl group, an aryl group, or an aryl alkyl group.Type: GrantFiled: March 11, 2009Date of Patent: January 1, 2013Assignee: Mitsui Chemicals Agro, Inc.Inventors: Hideki Umetani, Takeshi Kakimoto, Yoji Aoki
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Publication number: 20120325810Abstract: A synthetic resin hollow body (A) that has a satisfactory decorating property and a satisfactory recycle property in a disposal and that is hardly damaged. In addition, a product cost and an operation cost thereof can be suppressed. The synthetic resin hollow body (A) includes: a hollow molding body (a) made of a resin, the hollow molding body (a) capable of holding a liquid material; and a resin sheathing body formed outside the hollow molding body (a) in an integrating manner with the hollow molding body (a), wherein the resin sheathing body is made of a highly transparent synthetic resin having a total ray transmittance of at least 80%.Type: ApplicationFiled: December 13, 2011Publication date: December 27, 2012Applicant: DU PONT-MITSUI POLYCHEMICAL CO., LTD.Inventors: Sadaki Yamamoto, Kazuyuki Oogi, Masanobu Sato
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Publication number: 20120324719Abstract: A method including: a first step of preheating a rotor core body 12; a second step of attaching a cull plate 21 onto a surface of the body 12 removed from a preheating device 20; a third step of placing the body 12 in a resin-sealing mold 19; a fourth step of heating and liquefying resin 15 in resin reservoir pots 29 by the mold 19; a fifth step of extruding the liquefied resin 15 into plural magnet insertion holes 13 and curing the resin 15; and a sixth step of ejecting a laminated rotor core 10 from the mold 19 and detaching the plate 21, wherein the second step of attaching the plate 21 and the sixth step of detaching the plate 21 are performed at a same station 22, and the plate 21 detached at the sixth step is used as the plate 21 at the second step.Type: ApplicationFiled: June 20, 2012Publication date: December 27, 2012Applicant: MITSUI HIGH-TEC, INC.Inventors: Hidemi Sasaki, Masayuki Okabe
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Patent number: 8338557Abstract: Olefin polymer with narrow molecular weight distribution and specific molecular weight, olefin polymer having functional group introduced at terminal, tapered polymer containing segment wherein monomer composition continuously changes in the polymer chain, olefin polymer having different segments bonded to each other, and process for preparing these polymers. The olefin polymers are polymers of C2-20 carbon atom olefins and have a number-average molecular weight of ?500 and Mw/Mn of ?1.5. In syntheses, an olefin of 2-20 carbon atoms is polymerized in the presence of a catalyst comprising a transition metal compound represented by the formula LmMXn wherein M is a transition metal atom of Group 3-11, m is 1-5, n is a number satisfying a valence of M, L is a ligand—coordinated to the central metal M—which contains a heteroatom having no direct bond to the central metal, and X is e.g. halogen or a hydrocarbon.Type: GrantFiled: December 1, 2008Date of Patent: December 25, 2012Assignee: Mitsui Chemicals, Inc.Inventors: Makoto Mitani, Yasunori Yoshida, Junichi Mohri, Kazutaka Tsuru, Seiichi Ishii, Shinichi Kojoh, Tomoaki Matsugi, Junji Saito, Naoto Matsukawa, Shigekazu Matsui, Takashi Nakano, Hidetsugu Tanaka, Norio Kashiwa, Terunori Fujita