Patents Assigned to MKS Instruments, Inc.
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Publication number: 20170013678Abstract: A trimmable heater mat has a plurality of heater mat segments that together comprise a length of the heater mat. Each of the heater mat segments has a segment heater element connected to a power bus for generating heat. One or more of the heater mat segments can be severed from the others and removed from the heater mat to trim the length of the heater mat to a desired length. Heater mat segment boundary indicia on the heater mat indicate locations where one of the heater mat segments can be severed from the other remaining heater mat segments of the heater mat without interfering with the segment heater elements of the remaining heater mat segments or with the connections of the remaining segment heater elements to the power bus.Type: ApplicationFiled: July 8, 2015Publication date: January 12, 2017Applicant: MKS INSTRUMENTS, INC.Inventors: Jeffrey D. Kiernan, Karl Hausmann, Paul Dozoretz
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Patent number: 9541471Abstract: A method and system for predicting prospective behavior of a manufacturing process are described. Measured values of multiple variables, including at least one dependent variable, are received. A partial least squares (PLS) regression approach is used to estimate an unknown future value of the at least one dependent variable at a future point in time in a current batch run.Type: GrantFiled: January 20, 2014Date of Patent: January 10, 2017Assignee: MKS Instruments, Inc.Inventor: Chris Peter McCready
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Patent number: 9509266Abstract: A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.Type: GrantFiled: July 7, 2014Date of Patent: November 29, 2016Assignee: MKS Instruments, Inc.Inventors: David J. Coumou, Richard Pham
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Patent number: 9499393Abstract: Stress relief structures and methods that can be applied to MEMS sensors requiring a hermetic seal and that can be simply manufactured are disclosed. The system includes a sensor having a first surface and a second surface, the second surface being disposed away from the first surface, the second surface also being disposed away from a package surface and located between the first surface and the package surface, a number of support members, each support member extending from the second surface to the package surface, the support members being disposed on and operatively connected to only a portion of the second surface. The support member are configured to reduce stress produced by package-sensor interaction.Type: GrantFiled: February 6, 2015Date of Patent: November 22, 2016Assignee: MKS Instruments, Inc.Inventors: Lei Gu, Stephen F. Bart
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Patent number: 9488570Abstract: Described herein is a spectroscopic system and method for measuring and monitoring the chemical composition and/or impurity content of a sample or sample stream using absorption light spectroscopy. Specifically, in certain embodiments, this invention relates to the use of sample pressure variation to alter the magnitude of the absorption spectrum (e.g., wavelength-dependent signal) received for the sample, thereby obviating the need for a reference or ‘zero’ sample. Rather than use a reference or ‘zero’ sample, embodiments described herein obtain a spectrum/signal from a sample-containing cell at both a first pressure and a second (different) pressure.Type: GrantFiled: October 10, 2014Date of Patent: November 8, 2016Assignees: Pason Systems Corp., MKS Instruments, Inc.Inventor: Vidi A. Saptari
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Patent number: 9477851Abstract: A combiner includes N coaxial cables each configured to connect to a respective output of N radio frequency power amplifiers, where N is an integer greater than one. Each of the N coaxial cables is configured to receive an amplified radio frequency signal from a respective one of the N radio frequency power amplifiers. A board includes capacitances and is configured to connect to each of the N coaxial cables and combine the radio frequency signals. The N coaxial cables and the capacitances provide N inductance and capacitance combinations. A connector is configured to connect an output of the board to a load.Type: GrantFiled: July 28, 2014Date of Patent: October 25, 2016Assignee: MKS Instruments, Inc.Inventor: Christopher Michael Owen
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Patent number: 9476517Abstract: Pilot valve structures are described as including a main valve having a main flow body and having an inlet and outlet, and a diaphragm, with a perimeter, a moveable portion, and first and second sides. A main flow orifice is located in the flow body between the inlet and outlet. A main valve plug is attached to and/or disposed in the moveable portion of the diaphragm and opens and closes the flow orifice when the moveable portion of the diaphragm is in first and second positions. The pilot valve also includes a pilot valve inlet that is connected to the flow path of the main flow body. A pilot valve outlet/orifice is disposed within and co-located with the main valve plug. The pilot valve includes a pilot valve plug, which is moveable to open and close the pilot valve orifice. Related mass flow controllers with such pilot valve structures are further described.Type: GrantFiled: February 28, 2014Date of Patent: October 25, 2016Assignee: MKS Instruments, Inc.Inventor: Richard Gomes, II
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Patent number: 9471066Abstract: A mass flow controller comprises: a pressure-based flow meter, a thermal-based flow meter, a control valve, and a system controller. The pressure-based flow meter and thermal-based flow meter each measure flow rate of mass through the mass flow controller. The control valve controls the flow rate in response to a control signal generated as a function of the flow rate as measured by thermal-based flow meter when the measured flow rate is relatively low, and as a function of the flow rate as measured by the pressure-based flow meter when the flow rate is relatively high. A comparison of the flow measurements of the two flow meters can be used to (a) sense pressure disturbances at low flow rates, and (b) sense when the thermal-based flow meter is out of calibration so that a zero offset signal can be applied to the thermal-based flow meter.Type: GrantFiled: February 13, 2014Date of Patent: October 18, 2016Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Michael L'Bassi
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Patent number: 9429939Abstract: A method, controller, and system for monitoring a manufacturing process are described. Measured values of multiple variables, including dependent variables, manipulated variables, or both, are received. Future values of the manipulated variables, future values of the dependent variables, or both, are predicted. A multivariate analysis is performed on a combination of (1) the measured values of the variables and (2) the future values of the manipulated variables, the future values of the dependent variables, or both, to generate multivariate statistics.Type: GrantFiled: April 6, 2012Date of Patent: August 30, 2016Assignee: MKS Instruments, Inc.Inventor: Christopher Peter McCready
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Publication number: 20160229688Abstract: Stress relief structures and methods that can be applied to MEMS sensors requiring a hermetic seal and that can be simply manufactured are disclosed. The system includes a sensor having a first surface and a second surface, the second surface being disposed away from the first surface, the second surface also being disposed away from a package surface and located between the first surface and the package surface, a number of support members, each support member extending from the second surface to the package surface, the support members being disposed on and operatively connected to only a portion of the second surface. The support member are configured to reduce stress produced by package-sensor interaction.Type: ApplicationFiled: February 6, 2015Publication date: August 11, 2016Applicant: MKS INSTRUMENTS, INC.Inventors: Lei Gu, Stephen F. Bart
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Patent number: 9404827Abstract: An ionization gauge to measure pressure and to reduce sputtering yields includes at least one electron source that generates electrons. The ionization gauge also includes a collector electrode that collects ions formed by the collisions between the electrons and gas molecules. The ionization gauge also includes an anode. An anode bias voltage relative to a bias voltage of a collector electrode is configured to switch at a predetermined pressure to decrease a yield of sputtering collisions.Type: GrantFiled: February 6, 2014Date of Patent: August 2, 2016Assignee: MKS Instruments, Inc.Inventor: Gerardo A. Brucker
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Patent number: 9383286Abstract: An ionization gauge that measures pressure has an electron source that emits electrons, and an anode that defines an ionization space. The gauge also includes a collector electrode to collect ions formed by an impact between the electrons and a gas and to measure pressure based on the collected ions. The electron source is dynamically varied in emission current between a plurality of emission levels dependent on pressure and a second parameter other than pressure. The ionization gauge may also vary various operating parameters of the gauge components according to parameters stored in a non-volatile memory and selected by a user.Type: GrantFiled: December 24, 2014Date of Patent: July 5, 2016Assignee: MKS Instruments, Inc.Inventors: Larry K. Carmichael, Jesse A. Weber, John H. Henry, Michael N. Schott, Gerardo A. Brucker
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Publication number: 20160181063Abstract: Improvements in the supply of high-frequency electrical power to ozone-producing cells can be accomplished using the systems and techniques described herein. Application of a DC-DC converter operating at a switching frequency substantially greater than a load frequency, supports generation of a high-voltage AC for powering such cells, while allowing for reductions in component size and reductions in a quality factor of a load tuning circuit. Controllable power inverters used in obtaining one or more of the switching and load frequencies can be controlled using feedback techniques to provide stable, high-quality power to ozone-producing cells under variations in one or more of externally supplied power and load conditions. An inrush protection circuit can also be provided to selectively introduce a current-limiting resistance until an input DC bus has been sufficiently initialized as determined by measurements obtained from the DC bus.Type: ApplicationFiled: February 29, 2016Publication date: June 23, 2016Applicant: MKS Instruments, Inc.Inventors: Ken Tran, Feng Tian, Xing Chen, Franklin Lee
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Patent number: 9372152Abstract: A method is provided for monitoring one or more silicon-containing compounds present in a biogas. The method includes generating a first absorption spectrum based on a ratio of a first spectral measurement and a second spectral measurement. The first spectral measurement is from a non-absorptive gas having substantially no infrared absorptions in a specified wavelength range of interest and the second spectral measurement is from a sample gas comprising the biogas. The method includes generating at least one surrogate absorption spectrum based on, at least, individual absorption spectrum for each of a subset of one or more silicon-containing compounds selected from a larger set of known silicon-containing compounds with known concentrations. A total concentration of the one or more silicon-containing compounds in the biogas can be calculated based on the first absorption spectrum and the at least one surrogate absorption spectrum.Type: GrantFiled: March 3, 2015Date of Patent: June 21, 2016Assignee: MKS Instruments, Inc.Inventors: Charles Mark Phillips, Barbara Marshik-Geurts, Leonard I. Kamlet, Martin L. Spartz, Vidi Saptari
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Patent number: 9348339Abstract: A pulse gas delivery system for delivering a sequence of pulses of prescribed amounts of gases to a process tool, comprises: (a) a plurality of channels, each including (i) a gas delivery chamber; (ii) an inlet valve connected so as to control gas flowing into the corresponding gas delivery chamber; and (iii) an outlet valve connected so as to control the amount of gas flowing out of the corresponding gas delivery chamber; and (b) a dedicated multiple channel controller configured so as to control the inlet and outlet valves of each of the channels so that pulses of gases in prescribed amounts can be provided to the process tool in a predetermined sequence in accordance with a pulse gas delivery process.Type: GrantFiled: February 25, 2011Date of Patent: May 24, 2016Assignee: MKS Instruments, Inc.Inventors: Junhua Ding, Scott Benedict, Jaroslaw Pisera
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Patent number: 9335231Abstract: Micro-Pirani gauge vacuum gauges are described that use low-thermal conductivity support elements. A micro-Pirani gauge or vacuum sensor can include a heating element operative to heat a gas and to produce a signal corresponding to the pressure of the gas; a platform configured to receive the heating element, with the platform having a first coefficient of thermal conductivity; and a support element connected to a substrate and configured to support the platform with the heating element within an aperture disposed in the substrate, with the support element having a second coefficient of thermal conductivity, where the second coefficient of thermal conductivity is less than the first coefficient of thermal conductivity. Multimode pressure sensing including a micro-Pirani gauge are also described.Type: GrantFiled: March 25, 2014Date of Patent: May 10, 2016Assignee: MKS Instruments, Inc.Inventors: Lei Gu, Stephen F. Bart, Ole Wenzel
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Patent number: 9336995Abstract: A system has a first RF generator and a second RF generator. The first RF generator controls the frequency of the second RF generator. The first RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit scales the frequency of the first RF generator to control the frequency of the second RF generator.Type: GrantFiled: April 10, 2014Date of Patent: May 10, 2016Assignee: MKS Instruments, Inc.Inventors: David J. Coumou, Michael L. Kirk, Daniel M. Gill
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Patent number: 9322738Abstract: A gas analyzer for a vacuum chamber includes processing electronics configured to receive mass spectral data, receive input of total pressure in the vacuum chamber, receive external input from at least one sensor, and employ the mass spectral data, the total pressure in the vacuum chamber, and the external input from the at least one sensor to calculate a vacuum quality index based on at least one criteria of quality.Type: GrantFiled: November 8, 2010Date of Patent: April 26, 2016Assignee: MKS Instruments, Inc.Inventors: Gerardo A. Brucker, Kenneth D. Van Antwerp, Jr.
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Patent number: 9316675Abstract: A system includes a control module, a detection module, and a reaction module. The control module is configured to receive a sensor signal indicating a power characteristic of an output power provided from a power generator to a load. The load is separate from the control module and the power generator. The detection module is configured to (i) detect a shift parameter of the power characteristic based on the sensor signal, (ii) compare the shift parameter to a first threshold, and (iii) indicate whether the shift parameter has exceeded the first threshold and not a second threshold. The reaction module is configured to indicate that a low-level abnormality exists in the load in response to the shift parameter exceeding the first threshold and not the second threshold.Type: GrantFiled: March 14, 2013Date of Patent: April 19, 2016Assignee: MKS Instruments, Inc.Inventors: Jesse N. Klein, Richard Pham
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Patent number: 9314824Abstract: Powder and deposition control in a throttle valve includes nozzle inserts in the valve body that form annular plenums and annular nozzles for injecting annular flows of cleaning gas adjacent to the inside wall surface of the valve body for cleaning powders and depositions off surfaces in the valve body and off the closure member of the throttle valve. The annular flows of cleaning gas can be in intermittent, periodic, or in pulsed bursts or at a steady-state flow rates to dislodge powder particles stuck to the inside surface of the throttle valve, to etch or reactively clean solid deposits, or to prevent or minimize build-up of powder particles or solid deposits in the throttle valve.Type: GrantFiled: November 8, 2013Date of Patent: April 19, 2016Assignee: MKS Instruments, Inc.Inventors: Youfan Gu, Matthew C. Grout