Patents Assigned to Nanotechnologies, Inc.
  • Publication number: 20180028418
    Abstract: A preparation provides light or radiation attenuation between about 190 and 800 nm has an amount of diamond nanoparticles in a medium, where the diamond nanoparticles have a size between about 1 nm and 1000 nm are modified to enhance absorption or photoluminescence. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.
    Type: Application
    Filed: October 3, 2017
    Publication date: February 1, 2018
    Applicants: International Technology Center, Adámas Nanotechnologies Inc.
    Inventors: Olga Aleksandrovna Shenderova, Varvara Grichko
  • Patent number: 9879151
    Abstract: Fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”) copolymers and terpolymers useful in the field of coatings for enhancing performance of materials surfaces. Also disclosed are methods for making such copolymers and terpolymers.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: January 30, 2018
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Perry L. Catchings, Sr., Bong June Zhang
  • Patent number: 9855551
    Abstract: The present invention provides a catalyst precursor and a catalyst suitable for preparing multi-wall carbon nanotubes. The resulting multi-wall carbon nanotubes have a narrow distribution as to the number of walls forming the tubes and a narrow distribution in the range of diameters for the tubes. Additionally, the present invention provides methods for producing multi-wall carbon nanotubes having narrow distributions in the number of walls and diameters. Further, the present invention provides a composition of spent catalyst carrying multi-wall nanotubes having narrow distribution ranges of walls and diameters.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: January 2, 2018
    Assignee: Southwest Nanotechnologies, Inc.
    Inventors: Ricardo Prada Silvy, Yongqiang Tan
  • Patent number: 9786947
    Abstract: Li-ion batteries are provided that include a cathode, an anode comprising active particles, an electrolyte ionically coupling the anode and the cathode, a separator electrically separating the anode and the cathode, and at least one hydrofluoric acid neutralizing agent incorporated into the anode or the separator. Li-ion batteries are also provided that include a cathode, an anode comprising active particles, an electrolyte ionically coupling the anode and the cathode, and a separator electrically separating the anode and the cathode, where the electrolyte may be formed from a mixture of an imide salt and at least one salt selected from the group consisting of LiPF6, LiBF4, and LiClO4. Li-ion battery anodes are also provided that include an active material core and a protective coating at least partially encasing the active material core, where the protective coating comprises a material that is resistant to hydrofluoric acid permeation.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: October 10, 2017
    Assignees: Sila Nanotechnologies Inc., Georgia Tech Research Corporation
    Inventors: Gleb Nikolayevich Yushin, Bogdan Zydrko, Kara Evanoff
  • Patent number: 9778578
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • Patent number: 9775907
    Abstract: Unpurified or low pure soy phosphatidylserine is used to make cochleates. The cochleates contain about 40-74% soy phosphatidylserine, a multivalent cation and a biological active. A preferred cochleate contains the antifungal agent amphotericin B.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: October 3, 2017
    Assignee: MATINAS BIOPHARMA NANOTECHNOLOGIES, INC.
    Inventors: Raphael Mannino, Ruying Lu
  • Patent number: 9778562
    Abstract: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Byung Jin Choi, Niyaz Khusnatdinov, Anshuman Cherala, Kosta S. Selinidis
  • Patent number: 9770850
    Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.
    Type: Grant
    Filed: April 16, 2014
    Date of Patent: September 26, 2017
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., MOLECULAR IMPRINTS, INC.
    Inventors: Makoto Mizuno, Tsuyoshi Arai, Yukio Takabayashi, Steven C. Shackleton, Byung-Jin Choi
  • Publication number: 20170271659
    Abstract: Described herein are improved composite anodes and lithium-ion batteries made therefrom. Further described are methods of making and using the improved anodes and batteries. In general, the anodes include a porous composite having a plurality of agglomerated nanocomposites. At least one of the plurality of agglomerated nanocomposites is formed from a dendritic particle, which is a three-dimensional, randomly-ordered assembly of nanoparticles of an electrically conducting material and a plurality of discrete non-porous nanoparticles of a non-carbon Group 4A element or mixture thereof disposed on a surface of the dendritic particle. At least one nanocomposite of the plurality of agglomerated nanocomposites has at least a portion of its dendritic particle in electrical communication with at least a portion of a dendritic particle of an adjacent nanocomposite in the plurality of agglomerated nanocomposites.
    Type: Application
    Filed: June 2, 2017
    Publication date: September 21, 2017
    Applicants: Sila Nanotechnologies Inc., Georgia Tech Research Corporation
    Inventors: Gleb YUSHIN, Oleksandr MAGAZYNSKYY, Patrick DIXON, Benjamin HERTZBERG
  • Patent number: 9673448
    Abstract: Described herein are improved composite anodes and lithium-ion batteries made therefrom. Further described are methods of making and using the improved anodes and batteries. In general, the anodes include a porous composite having a plurality of agglomerated nanocomposites. At least one of the plurality of agglomerated nanocomposites is formed from a dendritic particle, which is a three-dimensional, randomly-ordered assembly of nanoparticles of an electrically conducting material and a plurality of discrete non-porous nanoparticles of a non-carbon Group 4A element or mixture thereof disposed on a surface of the dendritic particle. At least one nanocomposite of the plurality of agglomerated nanocomposites has at least a portion of its dendritic particle in electrical communication with at least a portion of a dendritic particle of an adjacent nanocomposite in the plurality of agglomerated nanocomposites.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: June 6, 2017
    Assignees: Sila Nanotechnologies Inc., Georgia Tech Research Corporation
    Inventors: Gleb Yushin, Oleksandr Magazynskyy, Patrick Dixon, Benjamin Hertzberg
  • Patent number: 9651862
    Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: May 16, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Edward Brian Fletcher, Gerard M. Schmid, Se-Hyuk Im, Niyaz Khusnatdinov, Yeshwanth Srinivasan, Weijun Liu, Frank Y. Xu
  • Patent number: 9630981
    Abstract: The present disclosure relates to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane compounds. The present disclosure also relates to methods of making such fluorinated polyhedral oligomeric silsesquioxane compounds from such synthetic blends. The present disclosure also relates to uses of such fluorinated polyhedral oligomeric silsesquioxane compounds.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: April 25, 2017
    Assignee: NBD Nanotechnologies, Inc.
    Inventors: John C. Warner, Jean R. Loebelenz, Srinivasa Rao Cheruku, Thomas Woodrow Gero
  • Patent number: 9616614
    Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: April 11, 2017
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan
  • Patent number: 9529274
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: December 27, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Patent number: 9514950
    Abstract: Methods of increasing etch selectivity in imprint lithography are described which employ material deposition techniques that impart a unique morphology to the multi-layer material stacks, thereby enhancing etch process window and improving etch selectivity. For example, etch selectivity of 50:1 or more between patterned resist layer and deposited metals, metalloids, or non-organic oxides can be achieved, which greatly preserves the pattern feature height prior to the etch process that transfers the pattern into the substrate, allowing for sub-20 nm pattern transfer at high fidelity.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: December 6, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Zhengmao Ye, Dwayne L. LaBrake
  • Patent number: 9452574
    Abstract: Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: September 27, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Michael N. Miller, Frank Y. Xu
  • Patent number: 9409933
    Abstract: The present disclosure relates, in exemplary embodiments, to compositions of matter comprising synthetic blends of at least two feedstocks that produce a distribution of fluorinated polyhedral oligomeric silsesquioxane molecule structures. The present disclosure also relates, in exemplary embodiments, to methods of making such synthetic blends.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: August 9, 2016
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventor: John Charles Warner
  • Patent number: 9373838
    Abstract: Described herein are improved composite anodes and lithium-ion batteries made therefrom. Further described are methods of making and using the improved anodes and batteries. In general, the anodes include a porous composite having a plurality of agglomerated nanocomposites. At least one of the plurality of agglomerated nanocomposites is formed from a dendritic particle, which is a three-dimensional, randomly-ordered assembly of nanoparticles of an electrically conducting material and a plurality of discrete non-porous nanoparticles of a non-carbon Group 4A element or mixture thereof disposed on a surface of the dendritic particle. At least one nanocomposite of the plurality of agglomerated nanocomposites has at least a portion of its dendritic particle in electrical communication with at least a portion of a dendritic particle of an adjacent nanocomposite in the plurality of agglomerated nanocomposites.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: June 21, 2016
    Assignees: Georgia Tech Research Corporation, Sila Nanotechnologies, Inc.
    Inventors: Gleb Yushin, Oleksandr Magazynskyy, Patrick Dixon, Benjamin Hertzberg
  • Patent number: 9323143
    Abstract: A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: April 26, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Weijun Liu
  • Patent number: 9227361
    Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
    Type: Grant
    Filed: September 13, 2013
    Date of Patent: January 5, 2016
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Byung-Jin Choi, Yeong-Jun Choi, Kosta S. Selinidis, Steven C. Shackleton