Patents Assigned to Nanotechnology, Inc.
  • Dual zone template chuck
    Patent number: 9164375
    Abstract: A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: October 20, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan Ganapathisubramanian, Byung-Jin Choi
  • Master template replication
    Patent number: 9122148
    Abstract: Systems and methods for providing multiple replicas from a master template are described. Replicas may be formed having a mesa. In one embodiment, a dummy fill region may be included on master template and/or replicas.
    Type: Grant
    Filed: October 28, 2009
    Date of Patent: September 1, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Michael N. Miller, Cynthia B. Brooks, Laura Anne Brown, Gerard M. Schmid
  • High throughput imprint based on contact line motion tracking control
    Patent number: 9090014
    Abstract: Systems for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: July 28, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Xiaoming Lu, Philip D. Schumaker
  • Catalyst and methods for producing multi-wall carbon nanotubes
    Patent number: 9084990
    Abstract: The present invention provides a catalyst precursor and a catalyst suitable for preparing multi-wall carbon nanotubes. The resulting multi-wall carbon nanotubes have a narrow distribution as to the number of walls forming the tubes and a narrow distribution in the range of diameters for the tubes. Additionally, the present invention provides methods for producing multi-wall carbon nanotubes having narrow distributions in the number of walls and diameters. Further, the present invention provides a composition of spent catalyst carrying multi-wall nanotubes having narrow distribution ranges of walls and diameters.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: July 21, 2015
    Assignee: SOUTHWEST NANOTECHNOLOGIES, INC.
    Inventors: Ricardo Prada Silvy, Yongqiang Tan
  • Nano-imprint lithography templates
    Patent number: 9063409
    Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: June 23, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Weijun Liu, Frank Y. Xu, Edward Brian Fletcher, Fen Wan
  • ELECTRODES, LITHIUM-ION BATTERIES, AND METHODS OF MAKING AND USING SAME
    Publication number: 20150162603
    Abstract: Described herein are improved composite anodes and lithium-ion batteries made therefrom. Further described are methods of making and using the improved anodes and batteries. In general, the anodes include a porous composite having a plurality of agglomerated nanocomposites. At least one of the plurality of agglomerated nanocomposites is formed from a dendritic particle, which is a three-dimensional, randomly-ordered assembly of nanoparticles of an electrically conducting material and a plurality of discrete non-porous nanoparticles of a non-carbon Group 4A element or mixture thereof disposed on a surface of the dendritic particle. At least one nanocomposite of the plurality of agglomerated nanocomposites has at least a portion of its dendritic particle in electrical communication with at least a portion of a dendritic particle of an adjacent nanocomposite in the plurality of agglomerated nanocomposites.
    Type: Application
    Filed: October 14, 2014
    Publication date: June 11, 2015
    Applicants: GEORGIA TECH RESEARCH CORPORATION, SILA NANOTECHNOLOGIES, INC.
    Inventors: Gleb Yushin, Oleksandr MAGAZYNSKYY, Patrick DIXON, Benjamin HERTZBERG
  • IMPRINT LITHOGRAPHY TEMPLATE AND METHOD FOR ZERO-GAP IMPRINTING
    Publication number: 20150158240
    Abstract: Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
    Type: Application
    Filed: December 10, 2014
    Publication date: June 11, 2015
    Applicant: Canon Nanotechnologies, Inc.
    Inventors: Gaddi S. Haase, Kosta S. Selinidis, Zhengmao Ye
  • LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION
    Publication number: 20150131072
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 14, 2015
    Applicants: TOSHIBA CORPORATION, CANON NANOTECHNOLOGIES, INC.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • Methods and systems of material removal and pattern transfer
    Patent number: 8980751
    Abstract: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: March 17, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Gerard M. Schmid, Michael N. Miller, Byung-Jin Choi, Douglas J. Resnick, Sidlgata V. Sreenivasan, Frank Y. Xu, Darren D. Donaldson
  • Optically absorptive material for alignment marks
    Patent number: 8967992
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: March 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
  • Safe separation for nano imprinting
    Patent number: 8968620
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: March 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Templates having high contrast alignment marks
    Patent number: 8961852
    Abstract: Described are systems and methods for formation of templates having alignment marks with high contrast material. High contrast material may be positioned within recesses of alignment marks.
    Type: Grant
    Filed: February 4, 2011
    Date of Patent: February 24, 2015
    Assignee: Canon Nanotechnologies, Inc.
    Inventor: Kosta S. Selinidis
  • High throughput imprint based on contact line motion tracking control
    Patent number: 8945444
    Abstract: Systems and methods for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
    Type: Grant
    Filed: December 3, 2008
    Date of Patent: February 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Xiaoming Lu, Philip D. Schumaker
  • High contrast alignment marks through multiple stage imprinting
    Patent number: 8935981
    Abstract: Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: January 20, 2015
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Joseph Michael Imhof, Kosta S. Selinidis, Dwayne L. LaBrake
  • DROP PATTERN GENERATION FOR IMPRINT LITHOGRAPHY WITH DIRECTIONALLY-PATTERNED TEMPLATES
    Publication number: 20150017329
    Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
    Type: Application
    Filed: July 11, 2014
    Publication date: January 15, 2015
    Applicants: Toshiba Corporation, Canon Nanotechnologies, Inc.
    Inventors: Edward Brian Fletcher, Gerard M. Schmid, Se-Hyuk Im, Niyaz Khusnatdinov, Yeshwanth Srinivasan, Weijun Liu, Frank Y. Xu
  • Core-shell composites for sulfur-based cathodes in metal-ion batteries
    Patent number: 8932764
    Abstract: A battery electrode composition is provided comprising core-shell composites. Each of the composites may comprise a sulfur-based core and a multi-functional shell. The sulfur-based core is provided to electrochemically react with metal ions during battery operation to store the metal ions in the form of a corresponding metal-sulfide during discharging or charging of the battery and to release the metal ions from the corresponding metal-sulfide during charging or discharging of the battery. The multi-functional shell at least partially encases the sulfur-based core and is formed from a material that is (i) substantially permeable to the metal ions of the corresponding metal-sulfide and (ii) substantially impermeable to electrolyte solvent molecules and metal polysulfides.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: January 13, 2015
    Assignee: Sila Nanotechnologies, Inc.
    Inventors: Gleb Nikolayevich Yushin, Bogdan Zdyrko, Igor Luzinov, Vojtech Svoboda, Alexander Thomas Jacobs, Eugene Michael Berdichevsky, Hyea Kim
  • Transmission X-ray analyzer and transmission X-ray analysis method
    Patent number: 8912503
    Abstract: A transmission X-ray analyzer for detecting a transmission X-ray image of a sample that moves relatively in a predetermined scanning direction includes; a time delay and integration (TDI) sensor including a plurality of stages of line sensors including the plurality of two-dimensionally arranged image pickup devices arranged in a direction perpendicular to the predetermined scanning direction, being configured to transfer charge accumulated in one line sensor to an adjacent subsequent line sensor; a shield unit for shielding a part of the image of light entering the TDI sensor by moving back and forth in the predetermined scanning direction, the shield unit being disposed between the TDI sensor and the sample; and a shield unit position control unit for controlling a position of the shield unit so as to shield a predetermined number of stages of line sensors among the plurality of stages of line sensors.
    Type: Grant
    Filed: August 2, 2012
    Date of Patent: December 16, 2014
    Assignee: SII NanoTechnology Inc.
    Inventor: Yoshiki Matoba
  • Chucking system with recessed support feature
    Patent number: 8913230
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: December 16, 2014
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Polymalic acid-based multifunctional drug delivery system
    Patent number: 8911717
    Abstract: A drug delivery system for delivering a drug payload to a specific tissue or cell type is disclosed. The system includes a polymalic acid molecular scaffold which can be used for attaching a plurality of molecular modules. Molecular modules include targeting antibodies for promoting cellular uptake by a target cell, and pro-drugs for altering cellular metabolism, for example, a pro-drug that alters expression of protein kinase CK2.
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: December 16, 2014
    Assignees: Cedars-Sinai Medical Center, Arrogene Nanotechnology, Inc.
    Inventors: Julia Y. Ljubimova, Keith L. Black, Eggehard Holler
  • Contaminate detection and substrate cleaning
    Patent number: 8891080
    Abstract: Detection of periodically repeating nanovoids is indicative of levels of substrate contamination and may aid in reduction of contaminants on substrates. Systems and methods for detecting nanovoids, in addition to, systems and methods for cleaning and/or maintaining cleanliness of substrates are described.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: November 18, 2014
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Dwayne L. LaBrake