Patents Assigned to Nanotronics Imaging, Inc.
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Patent number: 12657686Abstract: A computing system generates a training data set for training a machine learning model to detect line defects on a surface of a specimen. The computing system trains the machine learning model to detect line defects based on the training data set. The machine learning model is trained to detect line defects by detecting the individual defects represented by the plurality of annotations extending between the starting point and the end point. The computing system determines that the machine learning model has exceeded a threshold level of accuracy. Based on the determining, the computing system deploys the machine learning model to detect line defects on future specimens.Type: GrantFiled: February 23, 2024Date of Patent: June 16, 2026Assignee: Nanotronics Imaging, Inc.Inventors: Joanna Lee, Jacob Keith, Anuj Doshi
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Patent number: 12585839Abstract: A computing system receives one or more process parameters to be optimized during a multi-step manufacturing process. The computing system initiates a process prediction model in accordance with the one or more process parameters. The computing system simulates the multi-step manufacturing process using a plurality of sets of different setpoints until the one or more process parameters are optimized. The computing system identifies a first set of setpoints from the plurality of sets of different setpoints that optimized the one or more process parameters. The computing system causes the station controller to apply the first set of setpoints to the one or more stations.Type: GrantFiled: February 16, 2024Date of Patent: March 24, 2026Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman, Jonathan Lee, Sarah Constantin, Damas Limoge
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Publication number: 20260050247Abstract: Various embodiments relate to a method for analyzing manufacturing process data. The method includes: receiving, by a processor, a sequence of sensor outputs from a plurality of sensors monitoring a manufacturing process; predicting, using a transformer model executed by the processor, future manufacturing process parameters based on the sensor outputs; generating one or more key influencers on a current system state based on an attention matrix of the transformer model; analyzing the predicted parameters to identify an out-of-specification parameter; and identifying one or more key contributors to the out-of-specification parameter based on the attention matrix of a transformer head associated therewith.Type: ApplicationFiled: August 15, 2025Publication date: February 19, 2026Applicant: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman, Joanna Lee, Damas Limoge, Jonathan Bobrow
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Publication number: 20260042261Abstract: Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.Type: ApplicationFiled: October 20, 2025Publication date: February 12, 2026Applicant: Nanotronics Imaging, Inc.Inventors: Vadim Pinskiy, Matthew C. Putman, Damas Limoge, Aswin Raghav Nirmaleswaran
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Publication number: 20260017775Abstract: A computer-implemented method for detecting defects on specimens in an inspection system is disclosed herein. A first set of images of a plurality of specimens having defects formed thereon is received. A second set of images of the plurality of specimens is received, the second set of images includes the plurality of specimens after undergoing a destructive etch process and labels corresponding to each defect. Labels from the second set of images are transferred to the first set of images. A machine learning model is trained to classify defects on unetched specimens based on the first set of images and the labeled first set of images. Once the machine learning model has achieved a threshold of accuracy, the machine learning model may be deployed in the inspection system.Type: ApplicationFiled: July 10, 2024Publication date: January 15, 2026Applicant: Nanotronics Imaging, Inc.Inventors: Jacob Keith, Joanna Lee
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Publication number: 20260017810Abstract: Systems and methods of analyzing aligning a golden template with a scanned image of specimen under manufacture are disclosed herein. A computing system generates a golden template for a patterned specimen design by forming a single coherent image from a first plurality of scanned images of a plurality of specimens manufactured according to the patterned specimen design. The computing system identifies a plurality of regions of interest in the patterned specimen design that is present across a second plurality of scanned images of the plurality of specimens manufactured according to the patterned specimen design. The computing system receives a new scanned image of a new specimen manufactured in accordance with the patterned specimen design. The computing system aligns the golden template with the new scanned image of the new specimen by performing a pixel-by-pixel analysis in the plurality of regions of interest only.Type: ApplicationFiled: July 11, 2024Publication date: January 15, 2026Applicant: Nanotronics Imaging, Inc.Inventors: Anuj Doshi, Joanna Lee, John B. Putnam
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Publication number: 20250385635Abstract: A roofing system for renewable energy applications and a method for installing the same are disclosed herein. The roofing system includes a roofing sub-structure, a plurality of openings, a channel, and a plurality of filler panels. The plurality of openings is formed in the roofing sub-structure. The channel is formed in the roofing sub-structure. The channel is configured to receive wiring. The plurality of filler is panels attached to the roofing sub-structure via the plurality of openings. The plurality of filler panels provides standard places for the addition of solar panels to the roofing system.Type: ApplicationFiled: June 17, 2024Publication date: December 18, 2025Applicant: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman
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Publication number: 20250348998Abstract: A manufacturing system is disclosed herein. The manufacturing system includes a monitoring platform and an analytics platform. The monitoring platform is configured to capture data of an operator during assembly of an article of manufacture. The monitoring platform includes one or more cameras and one or more microphones. The analytics platform is in communication with the monitoring platform. The analytics platform is configured to analyze the data captured by the monitoring platform.Type: ApplicationFiled: July 16, 2025Publication date: November 13, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Joanna Lee, Anuj Doshi
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Patent number: 12462412Abstract: An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.Type: GrantFiled: February 6, 2023Date of Patent: November 4, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Tanaporn Na Narong, Denis Sharoukhov, Tonislav Ivanov
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Publication number: 20250328122Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: ApplicationFiled: June 30, 2025Publication date: October 23, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Damas Limoge, Sadegh Nouri Gooshki, Aswin Raghav Nirmaleswaran, Fabian Hough
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Patent number: 12449792Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.Type: GrantFiled: April 8, 2024Date of Patent: October 21, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12447687Abstract: Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.Type: GrantFiled: August 21, 2023Date of Patent: October 21, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Vadim Pinskiy, Matthew C. Putman, Damas Limoge, Aswin Raghav Nirmaleswaran
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Publication number: 20250315017Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.Type: ApplicationFiled: June 20, 2025Publication date: October 9, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Joanna Lee, Damas Limoge
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Publication number: 20250272822Abstract: A computing system generates a training data set for training a machine learning model to detect line defects on a surface of a specimen. The computing system trains the machine learning model to detect line defects based on the training data set. The machine learning model is trained to detect line defects by detecting the individual defects represented by the plurality of annotations extending between the starting point and the end point. The computing system determines that the machine learning model has exceeded a threshold level of accuracy. Based on the determining, the computing system deploys the machine learning model to detect line defects on future specimens.Type: ApplicationFiled: February 23, 2024Publication date: August 28, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Joanna Lee, Jacob Keith, Anuj Doshi
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Patent number: 12387317Abstract: A manufacturing system is disclosed herein. The manufacturing system includes a monitoring platform and an analytics platform. The monitoring platform is configured to capture data of an operator during assembly of an article of manufacture. The monitoring platform includes one or more cameras and one or more microphones. The analytics platform is in communication with the monitoring platform. The analytics platform is configured to analyze the data captured by the monitoring platform.Type: GrantFiled: July 18, 2023Date of Patent: August 12, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Jonathan Lee, Anuj Doshi
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Patent number: 12368223Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.Type: GrantFiled: April 8, 2024Date of Patent: July 22, 2025Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Joanna Lee
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Patent number: 12339631Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.Type: GrantFiled: April 8, 2024Date of Patent: June 24, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Joanna Lee, Damas Limoge
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Patent number: 12298489Abstract: A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.Type: GrantFiled: May 26, 2023Date of Patent: May 13, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Denis Sharoukhov
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Patent number: 12301990Abstract: A computing system receives, from an image sensor, at least two images of a specimen positioned on a specimen stage of a microscope system. The computing system provides the at least two images to an autofocus model for detecting at least one distances to a focal plane of the specimen. The computing system identifies, via the autofocus model, the at least one distance to the focal plane of the specimen. Based on the identifying, the computing system automatically adjusts a position of the specimen stage with respect to an objective lens of the microscope system.Type: GrantFiled: August 6, 2021Date of Patent: May 13, 2025Assignee: Nanotronics Imaging, Inc.Inventors: Denis Sharoukhov, Tonislav Ivanov, Jonathan Lee
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Publication number: 20250147499Abstract: A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.Type: ApplicationFiled: November 25, 2024Publication date: May 8, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Andrew Sundstrom, Damas Limoge, Vadim Pinskiy, Aswin Raghav Nirmaleswaran, Eun-Sol Kim