Patents Assigned to Nanotronics Imaging, Inc.
  • Patent number: 11815673
    Abstract: A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and ? coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.
    Type: Grant
    Filed: May 16, 2022
    Date of Patent: November 14, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Cruickshank, Julie Orlando, Adele Frankel, Brandon Scott
  • Publication number: 20230359730
    Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.
    Type: Application
    Filed: June 28, 2023
    Publication date: November 9, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
  • Publication number: 20230359163
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Application
    Filed: July 17, 2023
    Publication date: November 9, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Publication number: 20230344105
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Application
    Filed: June 28, 2023
    Publication date: October 26, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Patent number: 11796785
    Abstract: An automatic focus system for an optical microscope that facilitates faster focusing by using at least two offset focusing cameras. Each offset focusing camera can be positioned on a different side of an image forming conjugate plane so that their sharpness curves intersect at the image forming conjugate plane. Focus of a specimen can be adjusted by using sharpness values determined from images taken by the offset focusing cameras.
    Type: Grant
    Filed: December 5, 2022
    Date of Patent: October 24, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Vadim Pinskiy, Denis Y. Sharoukhov
  • Publication number: 20230324874
    Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.
    Type: Application
    Filed: June 12, 2023
    Publication date: October 12, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Patent number: 11784386
    Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.
    Type: Grant
    Filed: August 5, 2022
    Date of Patent: October 10, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
  • Publication number: 20230315854
    Abstract: A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 5, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Jonathan Lee, Matthew C. Putman
  • Publication number: 20230315071
    Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 5, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Publication number: 20230316465
    Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.
    Type: Application
    Filed: May 26, 2023
    Publication date: October 5, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
  • Publication number: 20230297668
    Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.
    Type: Application
    Filed: May 26, 2023
    Publication date: September 21, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
  • Publication number: 20230296872
    Abstract: A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.
    Type: Application
    Filed: May 26, 2023
    Publication date: September 21, 2023
    Applicant: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Denis Sharoukhov
  • Patent number: 11747911
    Abstract: An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.
    Type: Grant
    Filed: August 4, 2022
    Date of Patent: September 5, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Paul Roossin
  • Patent number: 11747772
    Abstract: A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.
    Type: Grant
    Filed: September 12, 2022
    Date of Patent: September 5, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: John B. Putman, Sarah Constantin, Valerie Bordelanne, Damas Limoge, Jonathan Lee
  • Patent number: 11748846
    Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: September 5, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
  • Patent number: 11731368
    Abstract: Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: August 22, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Vadim Pinskiy, Matthew C. Putman, Damas Limoge, Aswin Raghav Nirmaleswaran
  • Patent number: 11727672
    Abstract: A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.
    Type: Grant
    Filed: October 7, 2022
    Date of Patent: August 15, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Anuj Doshi, Jonathan Lee, John B. Putman
  • Patent number: 11709483
    Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: July 25, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
  • Patent number: 11703824
    Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.
    Type: Grant
    Filed: December 27, 2021
    Date of Patent: July 18, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
  • Patent number: 11693956
    Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.
    Type: Grant
    Filed: August 23, 2021
    Date of Patent: July 4, 2023
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III