Patents Assigned to Nanotronics Imaging, Inc.
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Patent number: 12153401Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: November 6, 2020Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Damas Limoge, Eun-Sol Kim, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12153414Abstract: A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.Type: GrantFiled: February 25, 2022Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Andrew Sundstrom, Damas Limoge, Vadim Pinskiy, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12153412Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.Type: GrantFiled: July 24, 2023Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12140926Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.Type: GrantFiled: July 17, 2023Date of Patent: November 12, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Patent number: 12140744Abstract: A microscopy system and method of focusing the same are disclosed herein. The microscopy system may include an objective, and imaging device, an illumination source, an epi-illumination module, and a controller. The imaging device is configured to capture a single image of a specimen positioned on a stage of the microscopy system. The illumination source is configured to illuminate the specimen positioned on the stage. The epi-illumination module includes a focusing mechanism in a first primary optical path of a light generated by the illumination source. The focusing mechanism is tilted in relation to a plane perpendicular to the first primary optical path. The controller is in communication with the illumination source. The controller is configured to focus the microscopy system based on a pattern produced by the focusing mechanism on the single image captured by the imaging device.Type: GrantFiled: October 7, 2022Date of Patent: November 12, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Patrick Schmidt, Denis Sharoukhov, Tonislav Ivanov, Jonathan Lee
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Patent number: 12125236Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: October 22, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12117799Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: November 6, 2020Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Damas Limoge, Eun-Sol Kim, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12120131Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.Type: GrantFiled: June 23, 2021Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12117812Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: June 18, 2021Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Eun-Sol Kim, Damas Limoge, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12117814Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.Type: GrantFiled: July 24, 2023Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12118081Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to detect a cyberattack to the manufacturing system. The control module is configured to perform operations. The operations include receiving control values for a first station of the one or more stations. The operations further include determining that there is a cyberattack based on the control values for the first station using one or more machine learning algorithms. The operations further include generating an alert to cease processing of the component. In some embodiments, the operations further include correcting errors caused by the cyberattack.Type: GrantFiled: November 20, 2020Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom
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Patent number: 12111923Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: October 8, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12111645Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.Type: GrantFiled: June 5, 2023Date of Patent: October 8, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12111922Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: GrantFiled: May 26, 2023Date of Patent: October 8, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Publication number: 20240329625Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.Type: ApplicationFiled: April 8, 2024Publication date: October 3, 2024Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Publication number: 20240332775Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.Type: ApplicationFiled: April 8, 2024Publication date: October 3, 2024Applicant: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Joanna Lee
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Publication number: 20240329609Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.Type: ApplicationFiled: April 8, 2024Publication date: October 3, 2024Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Joanna Lee, Damas Limoge
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Patent number: 12072691Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.Type: GrantFiled: July 24, 2023Date of Patent: August 27, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12072972Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: August 27, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12073584Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: August 27, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim