Patents Assigned to Nanotronics Imaging, Inc.
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Publication number: 20230297668Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: ApplicationFiled: May 26, 2023Publication date: September 21, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Patent number: 11747772Abstract: A deep learning process receives desired process values associated with the one or more process stations. The deep learning processor receives desired target values for one or more key performance indicators of the manufacturing process. The deep learning processor simulates the manufacturing process to generate expected process values and expected target values for the one or more key performance indicators to optimize the one or more key performance indicators. The simulating includes generating a proposed state change of at least one processing parameter of the initial set of processing parameters. The deep learning processor determines that expected process values and the expected target values are within an acceptable limit of the desired process values and the desired target values. Based on the determining, the deep learning processes causes a change to the initial set of processing parameters based on the proposed state change.Type: GrantFiled: September 12, 2022Date of Patent: September 5, 2023Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Sarah Constantin, Valerie Bordelanne, Damas Limoge, Jonathan Lee
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Patent number: 11748846Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.Type: GrantFiled: April 5, 2021Date of Patent: September 5, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph Succar
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Patent number: 11747911Abstract: An apparatus for manipulating an object includes first and second gesture controllers, each operatively connected to the object and structured and programmed such that, in a first-action active state, each can causes a first action to be carried out on the object by an appropriate first-action gesture made in the gesture controller. Only one of the first and second gesture controllers at any given time is capable of being in the first-action active state, and the first-action active state is transferable between the first and second gesture controllers upon the detecting of a first-action transfer gesture by one of said first gesture controller and said second gesture controller. Specific gesture control apparatus and methods for manipulating an object are also disclosed.Type: GrantFiled: August 4, 2022Date of Patent: September 5, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Paul Roossin
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Patent number: 11731368Abstract: Systems, methods, and media for additive manufacturing are provided. In some embodiments, an additive manufacturing system comprises: a hardware processor that is configured to: receive a captured image; apply a trained failure classifier to a low-resolution version of the captured image; determine that a non-recoverable failure is not present in the printed layer of the object; generate a cropped version of the low-resolution version of the captured image; apply a trained binary error classifier to the cropped version of the low-resolution version of the captured image; determine that an error is present in the printed layer of the object; apply a trained extrusion classifier to the captured image, wherein the trained extrusion classifier generates an extrusion quality score; and adjust a value of a parameter of the print head based on the extrusion quality score to print a subsequent layer of the printed object.Type: GrantFiled: August 6, 2021Date of Patent: August 22, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Vadim Pinskiy, Matthew C. Putman, Damas Limoge, Aswin Raghav Nirmaleswaran
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Patent number: 11727672Abstract: A system and method for generating a training data set for training a machine learning model to detect defects in specimens is described herein. A computing system cause presentation of an image on a device of a user. The image includes at least one defect on an example specimen. The computing system receives an annotated image from the user. The user annotated the image using an input via the device. The input includes a first indication of a location of the defect and a second indication of a class corresponding to the defect. The computing system adjusts the annotated image to standardize the input based on an error profile of the user and the class corresponding to the defect. The computing system uploads the annotated image for training the machine learning model.Type: GrantFiled: October 7, 2022Date of Patent: August 15, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Anuj Doshi, Jonathan Lee, John B. Putman
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Patent number: 11709483Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.Type: GrantFiled: June 23, 2021Date of Patent: July 25, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 11703824Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.Type: GrantFiled: December 27, 2021Date of Patent: July 18, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Patent number: 11693956Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: August 23, 2021Date of Patent: July 4, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Publication number: 20230206405Abstract: An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.Type: ApplicationFiled: February 27, 2023Publication date: June 29, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Jonathan Lee, Damas Limoge, Matthew C. Putman, John B. Putman, Michael Moskie
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Publication number: 20230186502Abstract: An imaging system is disclosed herein. The imaging system includes an imaging apparatus and a computing system. The imaging apparatus includes a plurality of light sources positioned at a plurality of positions and a plurality of angles relative to a stage configured to support a specimen. The imaging apparatus is configured to capture a plurality of images of a surface of the specimen. The computing system in communication with the imaging apparatus. The computing system configured to generate a 3D-reconstruction of the surface of the specimen by receiving, from the imaging apparatus, the plurality of images of the surface of the specimen, generating, by the imaging apparatus via a deep learning model, a height map of the surface of the specimen based on the plurality of images, and outputting a 3D-reconstruction of the surface of the specimen based on the height map generated by the deep learning model.Type: ApplicationFiled: February 6, 2023Publication date: June 15, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Tanaporn Na Narong, Denis Sharoukhov, Tonislav Ivanov
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Patent number: 11675330Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.Type: GrantFiled: October 25, 2021Date of Patent: June 13, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Patent number: 11669058Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.Type: GrantFiled: July 15, 2022Date of Patent: June 6, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Jonathan Lee, Damas Limoge
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Patent number: 11669617Abstract: A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.Type: GrantFiled: September 15, 2021Date of Patent: June 6, 2023Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Jonathan Lee, Matthew C. Putman
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Patent number: 11669078Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.Type: GrantFiled: June 23, 2021Date of Patent: June 6, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 11662563Abstract: A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.Type: GrantFiled: April 4, 2022Date of Patent: May 30, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Denis Sharoukhov
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Patent number: 11663327Abstract: A controller emulator, coupled to an interface that exposes the controller emulator to inputs from external sources, provides one or more control signals to a process simulator and a deep learning process. In response, the process simulator simulates response data that is provided to the deep learning processor. The deep learning processor generates expected response data and expected behavioral pattern data for the one or more control signals, as well as actual behavioral pattern data for the simulated response data. A comparison of at least one of the simulated response data to the expected response data and the actual behavioral pattern data to the expected behavioral pattern data is performed to determine whether anomalous activity is detected. As a result of detecting anomalous activity, one or more operations are performed to address the anomalous activity.Type: GrantFiled: August 6, 2021Date of Patent: May 30, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Andrew Sundstrom, James Williams, III
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Patent number: 11663703Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.Type: GrantFiled: May 23, 2022Date of Patent: May 30, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
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Publication number: 20230161144Abstract: A process is provided for imaging a surface of a specimen with an imaging system that employs a BD objective having a darkfield channel and a bright field channel, the BD objective having a circumference. The specimen is obliquely illuminated through the darkfield channel with a first arced illuminating light that obliquely illuminates the specimen through a first arc of the circumference. The first arced illuminating light reflecting off of the surface of the specimen is recorded as a first image of the specimen from the first arced illuminating light reflecting off the surface of the specimen, and a processor generates a 3D topography of the specimen by processing the first image through a topographical imaging technique. Imaging apparatus is also provided as are further process steps for other embodiments.Type: ApplicationFiled: January 23, 2023Publication date: May 25, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Julie A. Orlando, Jospeh G. Bulman
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Patent number: 11656184Abstract: The disclosed technology relates to an inspection apparatus that includes a stage configured to retain a specimen for inspection, an imaging device having a field of view encompassing at least a portion of the stage to view a specimen retained on the stage, and a plurality of lights disposed on a moveable platform. The inspection apparatus can further include a control module coupled to the imaging device, each of the lights and the moveable platform. The control module is configured to perform operations including: receiving image data from the imaging device, where the image data indicates an illumination landscape of light incident on the specimen; and automatically modifying, based on the image data, an elevation of the moveable platform or an intensity of one or more of the lights to adjust the illumination landscape. Methods and machine-readable media are also contemplated.Type: GrantFiled: August 5, 2022Date of Patent: May 23, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando