Patents Assigned to National Yunlin University of Science and Technology
  • Patent number: 7403414
    Abstract: A method for measuring hysteresis curves and anisotropic energy of magnetic memory units is disclosed. It comprises gradually applying different magnetic fields to a single-layer or a multilayer magnetic structure (such as a MRAM memory unit) by extra ordinary Hall effect, and recording the variation of the Hall voltage to obtain the hysteresis curve and anisotropic energy with specific instruments, and calculating the individual anisotropic energy value of the magnetic material of the single-layer or the multilayer magnetic structure.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: July 22, 2008
    Assignee: National Yunlin University of Science and Technology
    Inventors: Te-Ho Wu, Lin-Hsiu Ye, Jia-Mou Lee, Ming-Chi Weng
  • Patent number: 7387923
    Abstract: A PbTiO3/SiO2-gated ISFET device comprising a PbTiO3 thin film as H+-sensing film, and a method of forming the same. The PbTiO3 thin film is formed through a sol-gel process which offers many advantages, such as, low processing temperature, easy control of the composition of the film and easy coating over a large substrate. The PbTiO3/SiO2 gated ISFET device of the present invention is highly sensitive in aqueous solution, and particularly in acidic aqueous solution. The sensitivity of the present ISFET ranges from 50 to 58 mV/pH. In addition, the disclosed ISFET has high linearity. Accordingly, the disclosed ISFET can be used to detect effluent.
    Type: Grant
    Filed: October 21, 2005
    Date of Patent: June 17, 2008
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Wen Yuan Liu, Wen Bin Hong
  • Patent number: 7067343
    Abstract: Methods for fabricating ion sensitive field effect transistors (ISFETs) with SnO2 extended gates. A SnO2 detection film is formed on a substrate by sol-gel technology to serve as an extended gate. The SnO2 detection film is electrically connected to a conductive wire, and an insulating layer is formed on the surface of the ISFET but part of the SnO2 detection film and the conductive wire are left exposed. The exposed conductive wire is electrically connected to a gate terminal of a MOS transistor.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: June 27, 2006
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Zhi Jie Chen, Shih I Liu
  • Patent number: 7019343
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: March 28, 2006
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Patent number: 7009376
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Grant
    Filed: March 1, 2004
    Date of Patent: March 7, 2006
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Publication number: 20060029994
    Abstract: A penicillin G biosensor, systems comprising the same, and measurement using the systems. The penicillin G biosensor has an extended gate field effect transistor (EGFET) structure and comprises a metal oxide semiconductor field effect transistor (MOSFET) on a semiconductor substrate, a sensing unit comprising a substrate, a tin oxide film on the substrate, and a penicillin G acylase film immobilized on the tin oxide film, and a conductive wire connecting the MOSFET and the sensing unit.
    Type: Application
    Filed: December 30, 2004
    Publication date: February 9, 2006
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Chin-Hsien Yen, Yi-Ting Lai
  • Patent number: 6963193
    Abstract: An a-C:H ISFET device and manufacturing method thereof. The present invention prepares a-C:H as the detection membrane of an ISFET by plasma enhanced low pressure chemical vapor deposition (PE-LPCVD) to obtain an a-C:H ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the a-C:H ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rates of the a-C:H ISFET for different pH and hysteresis width of the a-C:H ISFET for different pH loops are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the a-C:H ISFET.
    Type: Grant
    Filed: September 28, 2004
    Date of Patent: November 8, 2005
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Hsuan-Ming Tsai
  • Patent number: 6905896
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Grant
    Filed: April 22, 2003
    Date of Patent: June 14, 2005
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Patent number: 6867059
    Abstract: An a-C:H ISFET device and manufacturing method thereof. The present invention prepares a-C:H as the detection membrane of an ISFET by plasma enhanced low pressure chemical vapor deposition (PE-LPCVD) to obtain an a-C:H ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the a-C:H ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rates of the a-C:H ISFET for different pH and hysteresis width of the a-C:H ISFET for different pH loops are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the a-C:H ISFET.
    Type: Grant
    Filed: March 29, 2004
    Date of Patent: March 15, 2005
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Hsuan-Ming Tsai
  • Patent number: 6847067
    Abstract: An a-C:H ISFET device and manufacturing method thereof. The present invention prepares a-C:H as the detection membrane of an ISFET by plasma enhanced low pressure chemical vapor deposition (PE-LPCVD) to obtain an a-C:H ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the a-C:H ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rates of the a-C:H ISFET for different pH and hysteresis width of the a-C:H ISFET for different pH loops are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the a-C:H ISFET.
    Type: Grant
    Filed: April 22, 2003
    Date of Patent: January 25, 2005
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Hsuan-Ming Tsai
  • Patent number: 6806116
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: October 19, 2004
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Publication number: 20040180463
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Application
    Filed: March 30, 2004
    Publication date: September 16, 2004
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Publication number: 20040164330
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Application
    Filed: March 1, 2004
    Publication date: August 26, 2004
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Publication number: 20040129984
    Abstract: A SnO2 ISFET device and manufacturing method thereof. The present invention prepares SnO2 as the detection membrane of an ISFET by sol-gel technology to obtain a SnO2 ISFET. The present invention also measures the current-voltage curve for different pH and temperatures by a current measuring system. The temperature parameter of the SnO2 ISFET is calculated according to the relationship between the current-voltage curve and temperature. In addition, the drift rate of the SnO2 ISFET for different pH and hysteresis width of the SnO2 ISFET for different pH loop are calculated by a constant voltage/current circuit and a voltage-time recorder to measure the gate voltage of the SnO2 ISFET.
    Type: Application
    Filed: December 18, 2003
    Publication date: July 8, 2004
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Yii Fang Wang
  • Patent number: 6740911
    Abstract: Disclosed is an ISFET comprising a H+-sensing membrane consisting of RF-sputtering a-WO3. The a-WO3/SiO2-gate ISFET of the present invention is very sensitive in aqueous solution, and particularly in acidic aqueous solution. The sensitivity of the present ISFET ranges from 50 to 58 mV/pH. In addition, the disclosed ISFET has high linearity. Accordingly, the disclosed ISFET can be used to detect effluent.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: May 25, 2004
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung Chuan Chou, Jung Lung Chiang
  • Patent number: 6617190
    Abstract: Disclosed is an ISFET comprising a H+-sensing membrane consisting of RF-sputtering a-WO3. The a-WO3/SiO2-gate ISFET of the present invention is very sensitive in aqueous solution, and particularly in acidic aqueous solution. The sensitivity of the present ISFET ranges from 50 to 58 mV/pH. In addition, the disclosed ISFET has high linearity. Accordingly, the disclosed ISFET can be used to detect effluent.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: September 9, 2003
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung Chuan Chou, Jung Lung Chiang
  • Patent number: 6531858
    Abstract: A method of measuring the the drift value of an a-Si:H ISFET) has the steps of: (1) using a constant voltage/current circuit to fix the drain/source current and the drain/source voltage of the a-Si:H ISFET; (2) dipping the sensing film into a buffer solution; (3) recording the gate/source output voltage of the a-Si:H ISFET by using a voltage-time recorder; and (4) exchanging the pH value of the buffer solution and then repeating the steps of (1)˜(3).
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: March 11, 2003
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung Chuan Chou, Hsuan Ming Tsai
  • Patent number: 6525554
    Abstract: A method and an apparatus for measuring the temperature parameters of an ISFET that uses hydrogenated amorphous silicon as a sensing film, which uses the measurements of the temperature parameters and the source/drain current and gate voltage in an unknown solution to sense the ion concentration and the pH value of the unknown solution.
    Type: Grant
    Filed: January 24, 2001
    Date of Patent: February 25, 2003
    Assignee: National Yunlin University of Science and Technology
    Inventors: Jung Chuan Chou, Yii Fang Wang
  • Publication number: 20020158645
    Abstract: A method and an apparatus for measuring the temperature parameters of an ISFET that uses hydrogenated amorphous silicon as a sensing film, which uses the measurements of the temperature parameters and the source/drain current and gate voltage in an unknown solution to sense the ion concentration and the pH value of the unknown solution.
    Type: Application
    Filed: April 23, 2002
    Publication date: October 31, 2002
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung Chuan Chou, Yii Fang Wang
  • Publication number: 20020109161
    Abstract: Disclosed is an ISFET comprising a H+-sensing membrane consisting of RF-sputtering a-WO3. The a-WO3/SiO2-gate ISFET of the present invention is very sensitive in aqueous solution, and particularly in acidic aqueous solution. The sensitivity of the present ISFET ranges from 50 to 58 mV/pH. In addition, the disclosed ISFET has high linearity. Accordingly, the disclosed ISFET can be used to detect effluent.
    Type: Application
    Filed: November 21, 2001
    Publication date: August 15, 2002
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung Chuan Chou, Jung Lung Chiang