Abstract: The present disclosure relates to a semiconductor device and a method of manufacturing a semiconductor device. The semiconductor device including first and second semiconductor dies arranged on respective and first and second carriers, the first and second semiconductor dies each comprising a first contact and a second contact arranged on a top major surface of the respective semiconductor dies and a third contact arranged on a bottom major surface the respective semiconductor dies; first and second die connection portions, arranged on the respective first and second carriers, connected to the third contacts of the respective first and second semiconductor dies; and a first contact connection member, extending from the first contact of the first semiconductor die to the die connection portion of second carrier, electrical connection of the first contact of the first semiconductor die to the third contact of the second semiconductor die.

Abstract: A field effect transistor semiconductor device having a compact device footprint for use in automotive and hot swap applications. The device includes a plurality of field effect transistor cells with the plurality of transistor cells having at least one low threshold voltage transistor cell and at least one high threshold voltage transistor cell arranged on a substrate. The field effect transistor semiconductor device is configured and arranged to operate the at least one high threshold voltage transistor cell during linear mode operation, and operate both the low threshold voltage transistor cell and the high threshold voltage transistor cell during resistive mode operation. Further provided is a method of operating field effect transistor semiconductor device including a plurality of field effect transistor cells that includes at least one low threshold voltage transistor cell and at least one high threshold voltage transistor cell.

Abstract: A leadless package semiconductor device has a top surface, a bottom surface opposite to the top surface, and multiple sidewalls between the top and bottom surfaces. At least one connection pad is disposed on the bottom surface. The connection pad includes a connection portion and at least one protrusion portion that extends from the connection portion and away from the bottom surface such that the protrusion portion and the connection portion surround a space on the bottom surface.

Abstract: An electrostatic discharge protection device and a method of making the same. The device includes a device area located on a semiconductor substrate. The device also includes an array of coextensive, laterally spaced fingers located within the device area. Each finger includes an elongate source and an elongate drain separated by an elongate gate. The fingers are electrically connected in parallel for conducting an electrostatic discharge current during an electrostatic discharge event. The device further includes a plurality of body contact regions. A layout of the body contact regions is graded such that a greater number of the body contact regions, larger body contact regions, or both are located towards a periphery of the device area than towards a central part of the device area. The layout of the body contact regions may encourage triggering of the electrostatic discharge protection device within the central part of the device area.

Abstract: A semiconductor die has internal circuitry formed on two more internal layers, and die bonding pads arranged on a top surface of the die. The bonding pads are connected to the internal circuitry for providing input and output signals to the internal circuitry. One or more connecting lines electrically connect one or more pairs of the die bonding pads, thereby defining a bonding pad layout. The die bonding pads are arranged and connected with the connecting lines such that the bonding pad layout is reversible, which allows the die to be used in different package types (e.g., TSSOP or DFN) yet maintain a standardized pin arrangement without the necessity for long or crossed bond wires.

Abstract: A semiconductor device includes a semiconductor die having a first side having a first terminal and an opposite second side having at least two second terminals. A lead frame has a first part and a second part. The second part of the lead frame is both electrically and mechanically spaced from the first part. The second side of the die is attached to the lead frame such that the first and second lead frame parts are respectively connected to the at least two second terminals. The first and second lead frame parts include respective first and second extensions that project past a side of the die and provide first and second terminal surfaces that are co-planar with the first terminal on the first side of the die. The device makes use of the terminals on the both sides of the die. The device second side is exposed for thermal performance.

Abstract: A semiconductor arrangement comprising; a normally-on transistor having first and second main terminals and a control terminal, a normally-off transistor having first and second main terminals and a control terminal, the transistors connected in a cascode arrangement by a connection between one of the main terminals of the normally-on transistor and one of the main terminals of the normally-off transistor, a current-source arrangement connected to a node on the connection and configured to provide for control of the voltage at said node between the normally-on and normally-off transistors by providing for a predetermined current flow, wherein the semiconductor arrangement comprises a first semiconductor die of III-V semiconductor type having the normally-on transistor formed therein and a second semiconductor die having the normally-off transistor formed therein, the current-source arrangement formed in the first and/or second semiconductor dies.

Abstract: Embodiments of methods and system for transferring semiconductor devices from a wafer to a carrier structure are described. In one embodiment, a method for transferring semiconductor devices from a wafer to a carrier structure involves positioning a carrier structure with a bond surface extending in a first plane and transferring a semiconductor device from a wafer onto the bond surface of the carrier structure using a plurality of rotatable transfer assemblies. Centers of the rotatable transfer assemblies are positioned in parallel with the first plane.

Abstract: A positioning system and method for positioning a semiconductor device are disclosed. In an embodiment, a positioning system for positioning a semiconductor device includes a long-stroke stage configured to be movable with respect to a supporting structure within a plane and a short-stroke stage attached to the long-stroke stage and configured to carry a semiconductor device and to be rotatable within the plane. The long-stroke stage acts as a balance mass between the short-stroke stage and the supporting structure.

Abstract: A semiconductor device and a method of making a semiconductor device. The device includes a semiconductor substrate having a first conductivity type, a layer of doped silicon located on the substrate, a trench extending into the layer of silicon, and a gate electrode and gate dielectric located in the trench. The device also includes a drain region, a body region having a second conductivity type located adjacent the trench and above the drain region, and a source region having the first conductivity type located adjacent the trench and above the body region. The layer of doped silicon in a region located beneath the body region includes donor ions and acceptor ions forming a net doping concentration within said region by compensation. The net doping concentration of the layer of doped silicon as a function of depth has a minimum in a region located immediately beneath the body region.

Abstract: A common mode choke comprising a first planar coil for receiving a first signal, a second planar coil for receiving a second signal, the first and second coils comprising substantially mirror images of one another and arranged side by side in a common plane, the first planar coil and second planar coil electromagnetically coupled by a closed coupling loop.

Abstract: Embodiments of a packaged semiconductor device with interior polygon pads are disclosed. One embodiment includes a semiconductor chip and a package structure defining a rectangular boundary and having a bottom surface that includes interior polygonal pads exposed at the bottom surface of the package structure and located on a centerline of the bottom surface of the package structure and edge polygonal pads exposed at the bottom surface of the package structure, located at an edge of the rectangular boundary, and including one edge polygonal pad in the vicinity of each corner of the rectangular boundary. The interior polygonal pads are configured such that a line running between at least one vertex of each of the interior polygonal pads is parallel to an edge of the rectangular boundary of the package structure.

Abstract: A semiconductor arrangement comprising a substrate having a first trench formed therein, a field plate layer arranged to extend within the first trench and coat the first trench, the field plate layer having a thickness such that it defines a second trench within the first trench, a barrier layer arranged to coat an internal surface of the second trench; and a trench fill material configured to substantially planarize the first and second trenches.

Abstract: The disclosure relates to chips scale packages and methods of forming such packages or an array of such packages. The semiconductor chip scale package comprises: a semiconductor die, comprising: a first major surface opposing a second major surface; a plurality side walls extending between the first major surface and the second major surface; a plurality of electrical contacts arranged on the second major surface of the semiconductor die; and an inorganic insulating material arranged on the plurality of side walls and on the first major surface.

Abstract: A semiconductor arrangement comprising; a die of III-V semiconductor material; a resistor element integrated in the die, the resistor element comprising a track defined by a first implant material in the III-V semiconductor material of the die, said track electrically isolated from substantially the remainder of the die by an isolation region that surrounds the track.

Abstract: A semiconductor device comprising: a die-source-terminal, a die-drain-terminal and a die-gate-terminal; a semiconductor-die; an insulated-gate-depletion-mode-transistor provided on the semiconductor-die, the insulated-gate-depletion-mode-transistor comprising a depletion-source-terminal, a depletion-drain-terminal and a depletion-gate-terminal, wherein the depletion-drain-terminal is coupled to the die-drain-terminal and the depletion-gate-terminal is coupled to the die-source-terminal; an enhancement-mode-transistor comprising an enhancement-source-terminal, an enhancement-drain-terminal and an enhancement-gate-terminal, wherein the enhancement-source-terminal is coupled to the die-source-terminal, the enhancement-gate-terminal is coupled to the die-gate-terminal and the enhancement-drain-terminal is coupled to the depletion-source-terminal; and a clamp-circuit coupled between the depletion-source-terminal and the depletion-gate-terminal.

Abstract: A device is disclosed. The device comprises a substrate having an epitaxial layer of a first conductivity type, a deep trench of a first depth, a pillar region of a second conductivity type of a second depth and a blocking layer of a third conductivity type immediately below a bottom surface of the deep trench. The second depth is larger than the first depth.

Abstract: A die expansion tool and method for expanding foil of a foil carrier connected to a frame is disclosed. In the embodiment, the die expansion tool has an inner body within a cavity formed by an outer body. The frame of the foil carrier can be positioned within the outer body and a wafer attached to the foil of the foil carrier can be positioned over the inner body. A pressurized fluid system, also within the cavity of the outer body, is positioned such that the pressurized fluid system can move the frame axially around the inner body and expand the foil.

Abstract: A process of manufacturing a device is disclosed. The process includes forming an epitaxial layer of a first conductivity type on in a substrate, forming a first vertical section of a second conductivity type in the expitaxial layer, creating a first vertical trench through etching vertically next to the first vertical section, filling the first vertical trench with a first type oxide, forming a second vertical trench in the first vertical trench. The second vertical trench is bounded by the first type oxide in the first vertical trench. The process further includes forming a second type oxide on inner walls of the second vertical trench, filling the second vertical trench with polysilicon. In a second vertical section of the epitaxial layer vertically next to the first vertical trench, a body region is created by implanting ions of the first conductivity type and a source region is created by implanting ions in a top layer of the body region.

Abstract: A semiconductor device and a method of making the same is provided. The device includes a semiconductor substrate having a major surface and a back surface. The device also includes a bipolar transistor. The bipolar transistor has comprises a collector region located in the semiconductor substrate; a base region located within the collector region and positioned adjacent the major surface; an emitter region located within the base region and positioned adjacent the major surface; and a collector terminal located on the major surface of the semiconductor substrate. The collector terminal includes: a first electrically conductive part electrically connected to the collector region; an electrically resistive part electrically connected to the first electrically conductive part, and a second electrically conductive part for allowing an external electrical connection to be made the collector terminal. The second conductive part is electrically connected to the first conductive part via the resistive part.