Patents Assigned to Nippon Steel Chemical Co., Ltd.
  • Patent number: 6770421
    Abstract: This invention relates to a photo- or heat-curable resin composition which yields a cured product with minimal cracking and high reliability. The resin composition of this invention comprises 100 parts by weight of (A) photo- or heat-polymerizable unsaturated compound composed of a polycarboxylic acid adduct of bisphenol-epoxy (meth)acrylate, 10-100 parts by weight of (B) alkylene oxide-modified product of (meth)acrylate or oligomers thereof, 0-50 parts by weight of (C) compound containing epoxy group and 0-50 parts by weight of (D) photopolymerization initiator or sensitizer. The composition exhibits high heat resistance and good microfabrication quality and is useful as a peripheral material of electronic parts such as semiconductor devices by the build-up process, for example, as a material for forming insulation layers in multilayer printed wiring boards.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: August 3, 2004
    Assignee: Nippon Steel Chemical, Co., Ltd
    Inventors: Masahiko Takeuchi, Kazuhiko Mizuuchi, Hironobu Kawasato
  • Patent number: 6767983
    Abstract: This invention relates to photosensitive silicone resins and resin compositions containing the same. Silicone resins of this invention are characterized by that a triorganosilyl group represented by the following general formula (1) wherein R is a divalent organic group and R′ is a divalent group or a direct bond is linked to all or a part of the ends of the backbone of polyorganosilsesquioxanes. Photosensitive resin compositions of this invention are formulated from the aforementioned silicone resins and a photogenerator of acid. The aforementioned silicone resins and photosensitive resin compositions show excellent performance as resist materials for multi-level resist processes and for forming barriers of PDP and, on account of their excellent plasma resistance (resistance to O2-RIE), yield patterns of a high aspect ratio.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: July 27, 2004
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Takeshi Fujiyama, Takero Teramoto
  • Patent number: 6765071
    Abstract: This invention relates to a resin composition containing an aromatic episulfide which exhibits excellent moldability, heat resistance and optical properties. The composition comprises an aromatic episulfide compound (A) having two or more reactive groups represented by the following formula (1) (wherein X is O or S with S accounting for 50 mol % or more of X on the average and R1-R4 are independently hydrogen, halogen or an alkyl group with 1-4 carbon atoms) in its molecule, a glycidyl compound (B) composed of an aromatic glycidyl ether compound having two or more glycidyl groups in its molecule or a glycidyl ester compound having two or more glycidyl groups in its molecule, an acid anhydride (C) and a curing catalyst (D) as essential components and shows the following molar ratios of &bgr;-epithiopropyl group (a), glycidyl group (b) and acid anhdyride group (c); [(b)+(a)]/(c)=1.35-3.5, (a)/(c)=0.5-2.2 and (b)/(c)=0.5-1.9.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: July 20, 2004
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Koichi Fujishiro, Hiroshi Ogata, Fumihiro Ohmori
  • Patent number: 6750308
    Abstract: This invention relates to a silicone resin composition comprising a silicone resin and an unsaturated compound. This resin composition is formulated from a silicone resin which has in its structural unit cage type polyorganosilsesquioxane whose siloxy groups are linked to a triorganosilyl group represented by —Si(CH3)2—X (wherein X is —R1—OCO—CR2═CH2, —R1—CR2═CH2 or —CH═CH2, R1 is an alkyl group, an alkylidene group or phenylene group and R2 is a hydrogen atom or an alkyl group) and an unsaturated compound which contains an unsaturated group represented by —R3—CR4═CH2 or —CR4═CH2 (wherein R3 is an alkylene group, an alkylidene group or —OCO— group and R4 is a hydrogen atom or an alkyl group) at the weight ratio of the silicone resin to the unsaturated compound in the range of 1:99 to 99:1.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: June 15, 2004
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hideki Andoh, Masayoshi Isozaki, Takero Teramoto
  • Patent number: 6734011
    Abstract: This invention relates to a denitrifying composition which is a material to be used for decomposing nitrates nitrogen in effluent by sulfur-oxidizing bacteria that consume sulfur and carbonate as nutrients and is characterized by containing particles of calcium carbonate dispersed in sulfur. Preferably, the composition contains 10 parts by weight of sulfur coexisting with 10-15 parts by weight of calcium carbonate and 1-3 parts by weight of a microporous substance. This denitrifying composition can be prepared by heating powder of calcium carbonate and sulfur thereby melting the sulfur, dispersing the powder of calcium carbonate in liquid sulfur and solidifying the dispersion by rapid cooling. The composition simultaneously contains nutrients and alkali source and hence enables denitrification to proceed stably without addition of other components.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: May 11, 2004
    Assignees: Nitchitsu Co., Ltd, Nippon Steel Chemical Co., Ltd.
    Inventors: Atsushi Yatagai, Tomomichi Gunji, Hiroshi Masujima, Takuma Yabe, Toru Oishi
  • Patent number: 6713591
    Abstract: This invention relates to an aromatic oligomer represented by the following formula (1): (A—F)n—A   (1) wherein A is a unit comprising (a) 30-90 wt % of a bicyclic or tricyclic aromatic compound and (b) 10-70 wt % of a phenol, F is methylene or a mixture of methylene and —CH2OCH2— and n is a number of 1-100. The aromatic oligomer is obtained by and reaction of a polycyclic aromatic compound such as naphthalene and benzothiophene, a phenol and formaldehyde compound in the presence of an acid catalyst. The aromatic oligomer is odorless and useful for various applications. In particular, when incorporated in rubber or resin, the aromatic oligomer can perform execellently as a tackifier in a wide temperature range or perform excellently as a vibration damping agent.
    Type: Grant
    Filed: March 5, 2002
    Date of Patent: March 30, 2004
    Assignee: Nippon Steel Chemicals Co., Ltd.
    Inventors: Toshihide Senzaki, Takahiro Imamura
  • Patent number: 6664433
    Abstract: This invention provides a process for purifying to a high degree of purity aromatic hydrocarbons containing impurities which are difficult to separate by distillation such as sulfur compounds and nitrogen compounds. The process of this invention for purifying aromatic hydrocarbons comprises treating crude aromatic hydrocarbons with a formaldehyde or with a formaldehyde and a phenol in the presence of an acid catalyst to form oligomers, distilling or evaporating the reaction mixture thereby separating the unreacted aromatic hydrocarbons from the oligomers, and crystallizing or washing with an organic solvent the separated aromatic hydrocarbons. In case the target hydrocarbon is naphthalene, it is possible to prepare naphthalene which has a purity of 99.9999 wt % or more, emits little odor, and can be readily flavored by perfumes. Naphthalene of this quality is used to prepare an insecticide of excellent fragrance.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: December 16, 2003
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Toshihide Senzaki, Takahiro Imamura, Takeshi Takayama, Katsuhide Noguchi
  • Patent number: 6583583
    Abstract: This invention relates to an organic aluminum complex manifesting excellent performance when used in an organic EL device and to a process for preparing said complex. The organic EL material of this invention comprises an organoaluminum complex which generates heat of 2 J/g or less In the range of 350-400° C. and absorbs heat of 70-120 j/g, in the range of 400-450° C., with the maximum of an endothermic peak being located near 420° C. on analysis by differential scanning calorimetry. The organic EL material can be obtained by refining the raw material (8-quinolinolato)aluminum by sublimation under reduced pressure of 20 Torr or less while maintaining the temperature in the sublimation zone above 300° C. and below 420° C. and the temperature in the product recovery zone above 100° C. and below 250° C.
    Type: Grant
    Filed: February 21, 2002
    Date of Patent: June 24, 2003
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Mahito Soeda, Hiroshi Miyazaki, Tohru Saito
  • Patent number: 6495298
    Abstract: This invention relates to a photopolymerizable resin composition containing resin component (A) composed of a resin and/or a resin-forming ingredient and a photopolymerization initiator (B) wherein the component (A) comprises an addition-polymerizable compound (A1) having at least two ethylenically unsaturated groups and the photopolymerization initiator (B) comprises a diaminobenzophenone compound (B1), an N-phenylglycine compound (B2), and at least one kind of compound selected from a group of a 3,3′,4,4′-tetra(alkylperoxycarbonyl)benzophenone (B3), 2-methyl-1-[4-(thiomethyl)phenyl]- 2-morpholinopropan-1-one (B4), and a 1,3,5-triazine derivative (B5) containing at least one trihalomethyl group as substituent.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: December 17, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Koichi Fujishiro, Manabu Higashi
  • Patent number: 6491795
    Abstract: High-purity benzyl benzoate is recovered by distilling the residue remaining after removal of unreacted toluene and benzoic acid from a reaction mixture produced by the oxidation of toluene by molecular oxygen in the presence of a metal catalyst thereby separating a fraction of benzyl benzoate containing 80 wt % or more benzyl benzoate, 10 wt % or less benzoic acid and 10 wt % or less fluorenone, and purifying the fraction of benzyl benzoate by crystallization such as recrystallization. According to this process, it is possible to recover high-purity benzyl benzoate by a simple operation at low cost from the by-product formed in the manufacture of benzoic acid.
    Type: Grant
    Filed: February 8, 2001
    Date of Patent: December 10, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Noboru Daitou, Shingo Ueda, Ryouji Akamine, Kazuyoshi Horibe, Katsuhiko Sakura
  • Patent number: 6492616
    Abstract: This invention relates to a process for machining resin film for a wiring board or double-sided carrier tape which comprises forming openings in the resin film by applying a continuous-wave carbon dioxide gas laser beam which is scanned in one or two ways to the resin film or a laminate containing a layer of the resin film placed on a worktable (5) moving in the direction nearly at a right angle to the scanning direction of the laser beam (7). As a continuous-wave carbon dioxide gas laser beam is used for drilling holes, the operation is highly efficient and accurate and gives rigid-flex wiring boards or double-sided carrier tapes of good quality in high yield.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: December 10, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Takashi Tanaka, Mitsuru Kohno, Masakazu Ii, Keiji Yoshizawa
  • Patent number: 6444403
    Abstract: A method of making a multilayer buildup printed circuit board and mounting substrate wherein a resin laminated wiring sheet, which has a copper foil, an epoxy-acrylate photosensitive resin composition having a fluorene structure, and a conductive pattern, are overlaid on the conductive pattern side of a supporting substrate at 100° C. and 3 kg/cm2, and adhered thereto at 200 to 300° C. and 10 kg/cm2. The copper foil is entirely etched by wet-etching or is etched into a predetermined pattern so as to form a wiring structure. Since the epoxy-acrylate photosensitive resin composition is not treated at 100° C. or more, and hence is in a semi-cured state, the epoxy-acrylate photosensitive resin composition can be heat-bonded onto the supporting substrate.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: September 3, 2002
    Assignees: NEC Corporation, Nippon Steel Chemical Co., Ltd.
    Inventors: Tadanori Shimoto, Koji Matsui, Takero Teramoto, Hironobu Kawasato
  • Patent number: 6407783
    Abstract: A liquid crystal display device has a light shielding layer 21 at a portion excluding a display pattern on a transparent substrate 12 wherein material for the light shielding layer has an electrical insulation property of not less than 1012 &OHgr;/□ in terms of insulation resistance and an optical density (OD value) of not less than 2.0 per a film thickness of 1 &mgr;m.
    Type: Grant
    Filed: April 6, 1999
    Date of Patent: June 18, 2002
    Assignees: Optrex Corporation, Hiroshima Opt Corporation, Nippon Steel Chemical Co., Ltd.
    Inventors: Masao Ohgawara, Shinsuke Iguchi, Masanori Kohno, Takero Teramoto, Naoki Yokoyama, Kizo Hattori
  • Patent number: 6403828
    Abstract: This invention relates to a process for purifying crystalline substances by charging the feed crystals containing impurities in a solid state to the top of a tower-type continuous crystallizer equipped with an agitating device, bringing said solid feed crystals into countercurrent contact with the melt formed by melting the descending crystals by a heating device provided in the lower section, taking out the purified crystals as melt from the lower section, and taking out the mother liquor containing the concentrated impurities from the upper section and comprises maintaining the temperature of the mother liquor existing in the upper section in a specified range by either heating the feed crystals or the upper section of the continuous crystallizer or making the average particle diameter of the feed crystals 2.5 mm or more.
    Type: Grant
    Filed: January 18, 2000
    Date of Patent: June 11, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hiroyuki Kuwahara, Kazuyoshi Horibe, Nobumasa Noma, Masakazu Takeuchi, Yukio Akimaru
  • Patent number: 6369240
    Abstract: This invention relates to the vapor-phase oxidation of hydrocarbons by passing a gaseous mixture comprising of a molecular oxygen-containing gas and hydrocarbons which may contain substituents to a fixed bed of catalyst and provides a process for vapor-phase oxidation to be effected by passing a gaseous mixture of raw materials to a fixed bed of catalyst in which the void ratio of the catalyst layers increases by stages in one step or more from upstream downward in the flow of the gaseous mixture of raw materials. For example, the process can oxidize in vapor phase such hydrocarbons as naphthalene, xylene, benzene, toluene, durene, butene, acenaphthene, anthracene, indene and their derivatives in high yields with high productivity. Moreover, the process can prepare phthalic anhydride in high yields with high productivity by the vapor-phase oxidation of naphthalene or ortho-xylene.
    Type: Grant
    Filed: April 23, 1999
    Date of Patent: April 9, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Tadanori Hara, Nobuyoshi Nakamura
  • Patent number: 6353088
    Abstract: This invention relates to a method for removing unreacted monomers and other volatile matters from a polymer solution composition produced from a mixture containing an aromatic vinyl monomer, utilizes two or more flash devolatilizing vessels, and effects the removal by adjusting the solid content of the polymer solution composition at the outlet of the devolitilizer before the last-stage devolitilizer to a level in excess of 97%, adding 0.5-4 parts by weight of a foaming agent to the total polymer solution composition, passing the polymer solution composition through the last-stage devolitilizer while maintaining the pressure of the polymer solution at 10 kg/cm2 or more by means of a pressure controller and the temperature in the range 190-260° C., introducing the polymer solution composition to a vapor-liquid separation vessel maintained at a vacuum of 20 Torr or less, and allowing the composition to foam.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: March 5, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Toshihisa Fujitaka, Koji Hirashima, Hideki Ono, Keiichi Hayashi
  • Patent number: 6329556
    Abstract: This invention relates to a process for preparing bisphenol A by the condensation of phenol with acetone in the presence of cation exchange resin obtained by sulfonating copolymers of monovinyl monomers mainly consisting of styrenes and divinyl monomers as crosslinking agent while using divinylbiphenyl and divinylbenzene mainly as said divinyl monomers and controlling the molar ratio of divinylbiphenyl to divinylbenzene at 10/0-2/8. The cation exchange resin to be used as catalyst in the condensation reaction shows a long life, maintains the production of bisphenol A over a long period of time, possesses high strength and is useful for economical and advantageous production of bisphenol A.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: December 11, 2001
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Katsuhiko Sakura, Shingo Ueda, Genki Takeuchi, Shyouta Shirasaka, Toshikazu Maruyama, Yasuharu Hukuda, Taketoshi Kitoh, Morio Kimura
  • Patent number: 6303230
    Abstract: This invention relates to laminates in which a layer of polyimide precursors and a layer of photosensitive resins are formed one on top of another on an electric conductor such as a stainless steel foil and also to laminates consisting of a stainless steel foil and successive layers of polyimide precursors and photosensitive resins useful for the manufacture of HDD suspensions. In particular, the use of resins containing a repeating unit derivable from specific aromatic diamines and aromatic carboxylic acid dianhydrides as polyimide precursors makes it possible to fabricate an insulator of high fabrication accuracy and reliability on an electric conductor and, in addition, the laminates are useful as materials for the manufacture of HDD suspensions of an integrated circuit/wiring structure with high accuracy.
    Type: Grant
    Filed: October 22, 1997
    Date of Patent: October 16, 2001
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hisashi Watanabe, Takashi Tanaka, Hiroyuki Chinju, Seigo Oka, Soichiro Kawamura, Taeko Hayama
  • Patent number: 6300412
    Abstract: This invention relates to a process for preparing rubber-modified aromatic vinyl resin compositions by polymerizing a raw material solution containing 3 to 20% by weight of rubbery polymer, 50 to 97% by weight of an aromatic vinyl monomer, and 0 to 30% by weight of a solvent until the conversion of said aromatic vinyl monomer falls in the range from 30 to 70%, adding a (meth)acrylate monomer or its mixture with other monomers to the reaction mixture so that the ratio by weight of the aromatic vinyl monomer in the reaction mixture to the (meth)acrylate monomer becomes 85/15 to 50/50, continuing the polymerization, and devolatilizing to remove the unreacted monomers, solvent, and the like. It is possible by this process to prepare easily and economically rubber-modified aromatic vinyl resin compositions of easy processability, good surface properties in respect to appearance and scratch resistance, and good balance between impact resistance and rigidity.
    Type: Grant
    Filed: January 7, 2000
    Date of Patent: October 9, 2001
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Yasuji Shichijo, Masanari Fujita
  • Patent number: 6284858
    Abstract: This invention relates to silicone compounds in which terminal SiO of cage-type and/or ladder-type polyphenylsilsesquioxanes is wholly or partly linked to a triorganosilyl group containing reactive functional group X and also relates to a process for preparing said silicone compounds by subjecting cage-terminated and silanol-free cage-type and/or ladder-type polyphenylsilsesquioxanes to an equilibrium reaction under heat with disiloxanes containing reactive functional group X of the following structural formula in an organic solvent in the presence of an alkaline rearrangement and condensation catalyst. This invention provides silicone compounds containing terminal reactive functional groups of excellent storage stability and properties of good reproducibility such as heat resistance.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: September 4, 2001
    Assignees: Nippon Steel Chemical Co., Ltd., Nippon Steel Corporation
    Inventors: Takeshi Fujiyama, Nobuyuki Furukawa, Takero Teramoto