Abstract: The invention provides a composition for the production of a fiber having organic solvent resistance, a fiber obtained by spinning the composition, and a biocompatible material containing the fiber. The composition contains (A) a polymer compound containing a unit structure represented by the formula (1) wherein each symbol is as described herein, (B) a crosslinking agent, (C) an acid compound, and (D) a solvent.

Abstract: A photosensor element that is capable of achieving a good balance between high photoelectric conversion efficiency and low dark current is able to be obtained by using a composition for forming a hole collecting layer of a photosensor element, which contains an organic solvent and a charge-transporting material that is composed, for example, of an aniline derivative or thiophene derivative represented by one of formulae (AA)-(DD) and having a molecular weight of 200-2,000.

Abstract: The present invention provides a method capable of easily mixing any liquid containing a linking substance such as a divalent metal cation and the like with a liquid containing a particular compound at a high concentration, and capable of producing a liquid medium composition comprising fine structures dispersed therein, and a production device therefor and a kit therefor. The first liquid containing a particular compound is passed through a through-hole having a given cross-sectional area formed in a nozzle part at a given flow rate and injected into the second liquid at a given flow rate. By this simple operation, a structure in which the particular compound is bonded via the linking substance is formed, and the structure is preferably dispersed in a mixture of the both liquids.

Abstract: A cured-film formation composition that forms a cured film exhibiting excellent liquid-crystal orientation properties and excellent light transmission properties when the cured-film formation composition is used as an orientation material and a layer of a polymerizable liquid crystal is arranged thereon.

Abstract: A coating solution has a polymer having a formula (1) structural unit, a formula (2) primary, secondary, or tertiary amine, and a formula (3) ester capable of dissolving the polymer and amine: R1 is a hydrogen atom or methyl group. L is a divalent aromatic group optionally having at least one substituent, —C(?O)—O— group, or —C(?O)—NH— group. The —C(?O)—O— or —C(?O)—NH— group carbon atom is attached to a polymer main chain. X is a hydrogen atom or linear or branched alkyl or alkoxy group having a 1-10 carbon atom number. At least one alkyl group hydrogen atom is optionally substituted with a halogen atom or hydroxy group. R2, R3, and R4 are independently a hydrogen atom, hydroxy group, or linear, branched, or cyclic organic group having a 1-16 carbon atom number. R5 and R6 are each independently a linear or branched organic group having a 1-16 carbon atom number.

Abstract: Disclosed herein is a composition for forming a resist underlayer film used as an underlayer of a resist for nanoimprint in nanoimprint lithography of a pattern forming process by heat-baking, light-irradiation, or a combination thereof to form the resist underlayer film. The composition includes a silicon atom-containing polymerizable compound (A), a polymerization initiator (B), and a solvent (C). The polymerizable compound (A) may contain silicon atoms in a content of 5 to 45% by mass. The polymerizable compound (A) may be a polymerizable compound having at least one cation polymerizable reactive group, a polymerizable compound having at least one radical polymerizable reactive group, or a combination thereof, and the polymerization initiator (B) may be a photopolymerization initiator.

Abstract: A hydrogel-forming material, a premix, and a method for forming a hydrogel through a simple process at room temperature. The material including: a disperse phase (A) including a lipid peptide-based gelator including at least one of a compound of Formula (1) or pharmaceutically usable salt thereof, water, and a fatty acid salt; and a phase (B) that includes a water-soluble acidic polymer: (where R1 is a C9-23 aliphatic group, R2 is a hydrogen atom or a C1-4 alkyl group that optionally has a C1-2 branched chain, R3 is a —(CH2)n-X group, n is a number of 1 to 4, X is an amino group, a guanidino group, a —CONH2 group, a 5-membered ring optionally containing 1 to 3 nitrogen atom(s), a 6-membered ring optionally containing 1 to 3 nitrogen atom(s), or a condensed heterocycle that contains a 5-membered ring and a 6-membered ring optionally containing 1 to 3 nitrogen atom(s)).

Abstract: Novel tricyclic compounds which have JAK inhibitory activities are useful for prevention, treatment or improvement of autoimmune diseases, inflammatory diseases and allergic diseases are provided. Novel tricyclic compound represented by the formula (I), the formula (II) or the formula (III) (wherein: each of A1, A2 and A3 is a cyclohexane-1,4-diyl group or the like; each of L1, L2 and L3 is a methylene group or the like; each of X1 and X3 is 0 or NH; each of R1 and R3 is a cyano C1-6 haloalkyl group or the like; and R2 is an aromatic heterocyclic group), a tautomer or pharmaceutically acceptable salt of the compound or a solvate thereof.

Abstract: To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 ?m and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 ?m of 50% or more.

Abstract: There are provided a hydrogel having a highly strengthened self-supporting property, which can be prepared by simply mixing at room temperature, and a method for producing the hydrogel. A hydrogel-formable composition capable of forming a hydrogel having a self-supporting property characterized by comprising: a water-soluble organic polymer having an organic acid structure, an organic acid salt structure, or an organic acid anion structure; a silicate; a compound having a diphosphonic acid structure of Formula (I): wherein R1 and R2 each are independently specific substituents, X1 and X2 each are independently a single bond or a linking group, and n is an integer of 1 to 5; or a salt thereof; and a compound having or generating a positive charge of divalent or more, a hydrogel which is formed from the composition, and a method for producing the hydrogel.

Abstract: There is provided a composition for coating a stepped substrate that has high filling properties of a pattern, and is capable of forming a coating film that does not cause degassing and heat shrinkage, and is used to form a coating film having flattening properties on the substrate. The composition for coating a stepped substrate includes a compound (C) having in the molecule a partial structure of Formula (1) (where R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group, or a C6-40 aryl group; five R3s are each independently a hydrogen atom, a hydroxy group, a C1-10 alkoxy group, a C1-10 alkyl group, a nitro group, or a halogen atom; and * is a bond site to the compound); and a solvent.

Abstract: An additive for a resist underlayer film-forming composition that modifies a surface state of a resist underlayer film into a hydrophobic state to enhance adhesion between the resist underlayer film and a resist pattern formed on the resist underlayer film, and a resist underlayer film-forming composition containing the additive. An additive for a resist underlayer film-forming composition including a polymer having a structural unit of Formula (1): (wherein R1 is a hydrogen atom or methyl group, L is a single bond or a divalent linking group, and X is an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or a heterocyclic group having an oxygen atom as a heteroatom that does not have a hydroxy group). A resist underlayer film-forming composition for lithography including a resin binder, an organic solvent, and the additive.

Abstract: A polymerizable composition suitable for use in producing molded articles that can maintain a high refractive index, and can be prevented from cracking, peeling from a support, and dimensional changes due to a high-temperature thermal history. A polymerizable composition including (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound, and (c) 0.1 to 50 parts by mass of a polymer having a weight average molecular weight of 5,000 to 100,000; a cured product obtained by polymerizing the polymerizable composition; and a high-refractive-index resin lens material including the polymerizable composition.

Abstract: A resin composition for forming an insulating film including a polymer having a structural unit of the following formula (1a) and a structural unit of the following formula (1b); and an organic solvent; wherein T0 is a divalent organic group containing at least one arylene group in which at least one hydrogen atom is substituted with an amino group; and T1 is a divalent organic group containing at least one arylene group having at least one substituent, wherein the substituent is a substituent of the following formula (2); and wherein Z is a divalent, aliphatic, aromatic, or alicyclic group optionally having a substituent.

Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.

Abstract: A fluorine-containing highly branched polymer obtained by polymerizing a polyfunctional monomer A that has two or more radically polymerizable double bonds and all or a portion of which has a bisphenol structure, a monomer B having a fluoroalkyl group and at least one radically polymerizable double bond, within a molecule, and a monomer C having at least one ring-opening polymerizable group selected from the group including an epoxy group and an oxetanyl group, and having at least one radically polymerizable double bond, within a molecule, under the presence of a polymerization initiator D with an amount of 5% by mole to 200% by mole to the number of moles of the polyfunctional monomer A; an epoxy resin composition including the polymer; and an epoxy resin cured product obtained from the resin composition.

Abstract: To provide a novel pesticide, especially a fungicide and a nematocide.

Abstract: A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): The water content is adjusted to a level of from 5 to 15%, and the crystal form is controlled to be crystal form A, thereby to obtain a drug substance excellent in stability.

Abstract: [Problem] To provide a novel nucleic acid aptamer for a vascular endothelial growth factor receptor, said nucleic acid aptamer being useful for the diagnosis and treatment of various diseases associated with VEGFs that can regulate angiogenesis and receptors for the VEGFs, e.g., tumor angiogenesis, diabetic retina and chronic rheumatoid arthritis. [Solution] A nucleic acid aptamer characterized by comprising a nucleotide sequence represented by any one of SEQ ID NOs: 1 to 5, and also characterized by being capable of bonding to a human VEGF receptor specifically. In a preferred embodiment of the nucleic acid aptamer, a primer recognition sequence, a fluorescent label, or a biotin molecule, an avidin molecule, a streptavidin molecule or other specific binding tag peptide may be linked to the 5?- or 3?-terminal of the nucleic acid aptamer for the purpose of making it possible to detect the nucleic acid aptamer easily.

Abstract: There is provided an aqueous suspension agrochemical composition including (Z)-4-[5-(3,5-dichlorophenyl)-5-trifluoromethyl-4,5-dihydroisoxazol-3-yl]-N-(methoxyiminomethyl)-2-methylbenzamide, a thickener, a surfactant, and water, which is excellent in homogeneity stability during storage, and simultaneously excellent in ease of discharge from a storage container. An aqueous suspension agrochemical composition comprising (a) (Z)-4-[5-(3,5-dichlorophenyl)-5-trifluoromethyl-4,5-dihydroisoxazol-3-yl]-N-(methoxyiminomethyl)-2-methylbenzamide, (b) xanthan gum, (c) a surfactant, and (d) water, wherein the xanthan gum is contained in an amount of 0.15 to 0.65% by mass in the aqueous suspension agrochemical composition. The surfactant is preferably one selected from the group consisting of polyoxyethylene styryl phenyl ethers, polyoxyethylene polyoxypropylene block polymers, and mixtures thereof.