Abstract: This undercoat foil for an energy storage device electrode comprises a collector base plate, and an undercoat layer formed on at least one surface of the collector base plate, the undercoat layer containing carbon nanotubes, and the coating amount per collector base plate surface being 0.1 g/m2 or less. Since this undercoat foil can be effectively welded by ultrasound, the use thereof allows a low-resistance energy storage device and a simple and effective production method therefor to be provided.

Abstract: A resist underlayer film composition for lithography, including: a silane: at least one among a hydrolyzable organosilane, a hydrolysis product thereof, and a hydrolysis-condensation product thereof, wherein the silane includes a silane having a cyclic organic group containing as atoms making up the ring, a carbon atom, a nitrogen atom, and a hetero atom other than a carbon and nitrogen atoms. The hydrolyzable organosilane may be a hydrolyzable organosilane of Formula (1), wherein, at least one group among R1, R2, and R3 is a group wherein a —Si(X)3 group bonds to C1-10 alkylene group, and other group(s) among R1, R2, and R3 is(are) a hydrogen atom, C1-10 alkyl group, or C6-40 aryl group; a cyclic organic group of 5-10 membered ring containing atoms making up the ring, a carbon atom, at least one of nitrogen, sulfur or oxygen atoms; and X is an alkoxy group, acyloxy group, or halogen atom.

Abstract: A thickened composition that does not lose viscosity even in the presence of an organic acid. A thickened composition, including a polyhydric alcohol, water, an organic acid, and a lipid peptide-type compound containing at least one of a compound of Formula (1) to Formula (3) below and a pharmaceutically usable salt of compound of Formula (1) to Formula (3), where R1 is a C9-23 aliphatic group, R2 is a hydrogen atom or a C1-4 alkyl group that optionally has a C1-2 branched chain, R3 is a —(CH2)n—X group, n is a number of 1 to 4, X is an amino group, guanidino group, —CONH2 group, a 5-membered ring group optionally containing 1 to 3 nitrogen atom(s), a 6-membered ring group optionally containing 1 to 3 nitrogen atom(s), or a condensed heterocycle group that contains a 5-membered ring and a 6-membered ring optionally containing 1 to 3 nitrogen atom(s).

Abstract: The present invention addresses the problem of providing a new microorganism that is useful for efficiently decomposing oils and fats, and a use for said microorganism. According to screening results, a new Yarrowia lipolytica having a high capacity to assimilate free fatty acids was successfully obtained. Efficient decomposition of oils and fats is achieved by causing the Yarrowia lipolytica to act under conditions in which fatty acids that are hydrolysis products of oils or fats are present, or under conditions in which oils or fats are decomposed into fatty acids and glycerol.

Abstract: An additive for a resist underlayer film-forming composition containing a copolymer having structural units of Formulae (1) to (4), and a resist underlayer film-forming composition containing the additive: (where each R1 is independently a hydrogen atom or methyl group, Ar is arylene group, Pr is a protecting group or a hydrogen atom, X is a direct bond or a —C(?O)O—R2— group, R2 constituting the —C(?O)O—R2— group is a C1-3 alkylene group, the alkylene group is bonded to a sulfur atom, R3 is a hydrogen atom, methyl group, methoxy group, or halogeno group, R4 is a C1-3 alkyl group in which at least one hydrogen atom is substituted with a fluoro group, and Z is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, or norbornane skeleton).

Abstract: A sealing material composition for LED has excellent heat-resistant transparency, adhesion, and crack resistance, and low sulfur gas permeability. A sealing material composition for LED has the following (A), (B), (C), and (D): (A): polysiloxane containing units (1-1), (1-2), and (1-3): wherein R1 is C1-12 alkyl or C6-20 aryl, R2 is hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (A); (B): polysiloxane containing units (2-1), (2-2), and (2-3): wherein R3 and R4 are each hydrogen, C1-12 alkyl, or Si constituting main chain of polysiloxane as (B); (C): adhesive; and (D): condensation catalyst for silanol group.

Abstract: A charge-transporting varnish including charge-transporting material comprising N,N?-diaryl benzidine derivatives represented by formula (1), a charge-accepting dopant comprising heteropoly acid, and an organic solvent. [In the formula, R1 to R8 independently represent hydrogen, a halogen, an alkyl having 1 to 20 carbon atoms, an alkenyl having 2 to 20 carbon atoms or an alkynyl having 2 to 20 carbon atoms; and Ar1 and Ar2 independently represent groups represented by formulas (2) or (3). (In the formula, R9 to R18 independently represent hydrogen, a halogen, an alkyl having 1 to 20 carbon atoms, an alkenyl having 2 to 20 carbon atoms or an alkynyl having 2 to 20 carbon atoms; and X1 and X2 independently represent hydrogen, a halogen, an alkyl having 1 to 20 carbon atoms, an alkenyl having 2 to 20 carbon atoms, an alkynyl having 2 to 20 carbon atoms, diphenylamino, 1-naphthylphenylamino, 2-naphthylphenylamino, di(1-naphthyl)-amino, and di(2-naphthyl)-amino or 1-naphthyl-2-naphtylamino.

Abstract: A method for producing forsterite microparticles having a primary particle size of 1, to 50 nm, as determined through electron microscopy. The method includes spray-drying, in an atmosphere of 50° C. or higher and lower than 300° C., a solution containing a water-soluble magnesium salt and colloidal silica at a mole ratio of magnesium atoms to silicon atoms (Mg/Si) of 2; and subsequently, firing the spray-dried product in air at 800 to 1,000° C.

Abstract: There is provided a polymerizable composition suitable to produce a molded product in which high refractive index is maintained, and dimensional change and a transmittance change further caused by a high-temperature heat history can be suppressed. A polymerizable composition comprising (a) 100 parts by mass of a specific reactive silsesquioxane compound and (b) 10 to 2,000 parts by mass of a specific fluorene compound, and a cured product obtained by curing the polymerizable composition, and a resin lens manufactured from the polymerizable composition.

Abstract: The present invention relates to a polymer composition which contains (A) a photosensitive side-chain polymer that exhibits liquid crystallinity in a predetermined temperature range and has a repeating unit comprising a vertically aligning group, and (B) an organic solvent. The present invention provides: a liquid crystal alignment film which has excellent tilt angle characteristics, while being provided with alignment controllability with high efficiency; a polymer composition which enables the achievement of this liquid crystal alignment film; a twisted nematic liquid crystal display element; and a vertical field switching mode liquid crystal display element.

Abstract: Method for producing a gel having a desired strength, by performing a step of removing a part or all of a solvent. Method for producing a gel containing a water-soluble organic polymer (A), a silicate salt (B), and a dispersant (C) for the silicate salt, including a desolvation step of removing a part or all of one or more solvents selected from the group consisting of water and a water-soluble organic solvent in the gel, or gelling a gel-forming composition containing the water-soluble organic polymer (A), the silicate salt (B), the dispersant (C) for the silicate salt, and one or more solvents selected from the group consisting of water and a water-soluble organic solvent and removing a part or all of the solvent in the composition.

Abstract: A resist underlayer film forming composition for lithography for forming a resist underlayer film that can be used as a hard mask, including: a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane includes at least one hydrolyzable silane selected from the group made of hydrolyzable silanes of Formula (1), Formula (2), and Formula (3): A method for producing a semiconductor device including: forming an organic underlayer film on a semiconductor substrate; applying the resist underlayer film forming composition onto the organic underlayer film and baking the composition to form a resist underlayer film; applying a resist film forming composition onto the resist underlayer film to form a resist film; exposing the resist film to light; developing the resist film after exposure to obtain a resist pattern; and etching in this order.

Abstract: Aniline derivatives such as those represented by the formulas shown, for example, have good solubility in organic solvents, and are able to provide organic electroluminescent elements having excellent longevity when thin films containing said aniline derivatives as charge transporting substances are used for hole injection layers.

Abstract: A resin composition for forming an insulating film including a polymer having a structural unit of the following formula (1a) and a structural unit of the following formula (1b); and an organic solvent; wherein T0 is a divalent organic group containing at least one arylene group in which at least one hydrogen atom is substituted with an amino group; and T1 is a divalent organic group containing at least one arylene group having at least one substituent, wherein the substituent is a substituent of the following formula (2); and wherein Z is a divalent, aliphatic, aromatic, or alicyclic group optionally having a substituent.

Abstract: To provide a novel pesticidal composition, particularly a composition for a fungicide. A fungicidal or bactericidal composition comprising one or more compounds selected from oxime-substituted amide compounds represented by the formula (I), or their N-oxides or salts, and one or more compounds selected from known fungicidal or bactericidal compounds: wherein G1 represents a structure of G1-1, G1-27, etc., G2 represents a structure of G2-2, etc., W represents an oxygen atom, etc., X1 represents difluoromethyl, trifluoromethyl, etc., X2, X3, X4 and X5 each independently represents a hydrogen atom, etc., Y1 represents a halogen atom, etc., Y2 represents a hydrogen atom, a halogen atom, etc., Y3 represents a halogen atom, trifluoromethyl, C2-C6 alkynyl, etc., Y4 represents a hydrogen atom, etc., R1 represents C1-C6 alkyl, C1-C4 haloalkyl, etc., R2 and R3 each independently represents a hydrogen atom, methyl, etc., R4 represents a hydrogen atom, etc., and R5 represents methyl, etc.

Abstract: There is provided a mask blank including on a substrate: a thin film for forming a transfer pattern; a resist underlayer formed on the thin film and made of a resist underlayer composition containing a polymer having a unit structure having a lactone ring and a unit structure having a hydroxyl group; a resist film formed on the resist underlayer film and made of a resist composition; and a mixed film formed so as to be interposed between the resist underlayer film and the resist film and made of a mixed component containing the resist underlayer composition and the resist composition.

Abstract: This composition for forming an extreme-ultraviolet (EUV) or electron-beam upper-layer resist film including (a) a polymer (P) and (b) a solvent, the solvent containing 1 to 13 mass % of a C4-12 ketone compound with respect to the entire solvent, is used in the lithography process of a procedure for manufacturing a semiconductor device. Without needing to be intermixed with a resist, and particularly on the occasion of EUV exposure, the composition for forming an EUV or electron-beam upper-layer resist film blocks undesirable exposure light, e.g., ultraviolet (UV) or deep ultraviolet (DUV) rays, and selectively transmits only the EUV rays, and can be developed using a developing solution after exposure.

Abstract: It is possible to obtain a thin film that can form a minute pattern and that has a high index of refraction by using a polymer containing a triazine ring and containing a repeating unit structure represented for example by formula (22) or (26).

Abstract: A novel gelator including a sugar derivative; a gelator including a compound of Formula (1) or Formula (2): wherein R1 is a linear or branched alkyl group having a carbon atom number of 9 to 20, a cyclic alkyl group having a carbon atom number of 13 to 20, or a linear or branched alkenyl group having a carbon atom number of 9 to 20, R2 is a hydrogen atom, a linear or branched alkyl group having a carbon atom number of 1 to 10, or an aryl group optionally having a substituent, and R3 and R4 are hydroxy groups.

Abstract: A radiation dosimetry gel is excellent in heat resistance, and a radiation dosimeter includes the radiation dosimetry gel as a material for measuring a radiation dose. A radiation dosimetry gel includes a water-soluble organic polymer (A) having an organic acid salt structure or an organic acid anion structure, a silicate (B), and a dispersant (C) for the silicate, and a radiation dosimeter includes the radiation dosimetry gel as a material for measuring a radiation dose.