Abstract: Provided is a novel pesticide, particularly a fungicide and a nematicide. An alkynyl pyridine-substituted amide compound represented by formula (I), its N-oxide or a salt thereof, and a pesticide containing it. [In the formula, G1 is a structure represented by G1-1a, G1-3a, G1-27a, etc.; X1 is a halogen atom, difluoromethyl, trifluoromethyl, etc.; Y1 is a halogen atom, etc.; Y2, Y3, R4 and R5 independently represent a hydrogen atom, etc.; R1 is a hydrogen atom, a halogen atom, methyl, methoxy, etc.; R2 is a hydrogen atom, a halogen atom, etc., or R1 and R2 together form an alkylene chain thereby to form a cyclopropyl group together with the carbon atom to which R1 and R2 are bonded, or R1 and R2 together form C1-C2 alkylidene or C1-C2 haloalkylidene; R3 is a hydrogen atom, methyl, etc.; and R6 is C1-C4 alkyl, C3-C6 cycloalkyl, C1-C4 alkoxy(C1-C4)alkyl, etc.

Abstract: A solid base material for external use on skin that has a breaking strength sufficiently high to be usable as a stick-shaped base material or the like. A solid base material for external use on skin containing a lipid peptide compound including at least one of compound of Formula (1), the similar compound thereof and the pharmacologically usable salts thereof; water; and a 1,3-alkanediol; wherein R1 is a C9-23 aliphatic group; R2 is a hydrogen atom or a C1-4 alkyl group optionally having a C1 or C2 branched chain; and R3 is a —(CH2)n—X group, wherein n is a number from 1 to 4, and X is amino group, guanidino group, -CONH2 group, or a 5-membered ring group or 6-membered ring group optionally having one to three nitrogen atoms or a fused heterocyclic group composed of the 5-membered ring and the 6-membered ring.

Abstract: To provide a novel diamine, and a polyimide precursor and a polyimide using it. A diamine represented by the formula (1): wherein each of X1 and X5 which are independent of each other, is a single bond or the like; each of X2 and X4 which are independent of each other, is —CH2— or the like; X3 is a C1-6 alkylene or the like; each of Y1 and Y2 which are independent of each other, is a single bond or the like; R is a C1-20 linear, branched or cyclic hydrocarbon group; and a is 0 or 1).

Abstract: There is provided a polymer-containing coating liquid which is applied to a resist pattern and which is used in place of a conventional rinsing liquid. A coating liquid that is applied to a resist pattern comprising a polymer having a structural unit of Formula (1): (wherein R1 is a C1-12 organic group, and X is an organic group of Formula (2): (wherein R2 and R3 are each independently a linear or branched alkylene group having a carbon atom number of 1 to 3, R2 is bonded to an oxygen atom in Formula (1), R4 is a C1-4 alkoxy group, an allyloxy group, or a hydroxy group, and p is 0, 1, or 2)), and a solvent containing water and/or alcohols.

Abstract: A composition to be applied onto a resist pattern comprising a polysiloxane obtained by hydrolytically condensing a hydrolyzable silane and a carboxylic ester solvent or an ether solvent, wherein the hydrolyzable silane includes a vinyl group- or (meth)acryloxy group-containing hydrolyzable silane. A hydrolyzable silane includes the vinyl group- or (meth)acryloxy group-containing hydrolyzable silane at a content of 20 to 100 mol % in the total hydrolyzable silane. A method for producing a semiconductor device, the method includes: a step (1) of applying a resist onto a substrate; a step (2) of exposing a resist film to light and subsequently developing the resist film to form a resist pattern; a step (3) of applying the composition as described above onto the resist pattern during the development or after the development; and a step (4) of removing the resist pattern by etching to reverse the pattern.

Abstract: Provided is a composition comprising: a charge-transporting substance that comprises N,N?-diphenylbenzidine; an electron-accepting dopant substance; and an organic solvent. This composition is suitable, for example, as a composition for the anode buffer layer of an organic thin film solar cell, said composition being used to produce a thin film that is suitable for use as an anode buffer layer that makes it possible to achieve an organic thin film solar cell having a high photoelectric conversion efficiency.

Abstract: Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent.

Abstract: There is provided a novel slurry composition for forming a lithium secondary battery electrode which can improve homogeneity of an electrode active material and a conductive assistant even without using an organic solvent and can improve the binding of an electrode active material and a conductive assistant with an electrode collector, and a lithium secondary battery with improved charge/discharge cycle characteristics and battery capacity. A slurry composition for forming a lithium secondary battery electrode, characterized by comprising an electrode active material (A), a conductive assistant (B), and a pulverized cellulose fiber (C) as an aqueous binder, and a lithium secondary battery electrode and a lithium secondary battery which are obtained using the composition, and an aqueous binder used for the composition.

Abstract: The present invention relates to a protein production accelerating agent that has enabled to largely increase the produced amount of a desired protein by adding polysaccharides to a medium for animal cells containing a serum or serum alternative, and a production method of a protein using a medium containing the protein production accelerating agent.

Abstract: The objective of the present invention is to provide a calcium salt composition with improved dispersity and preservation stability of calcium salt in an aqueous medium as well as with increased filaggrin production promoting action of calcium salt in addition. The present invention relates to a calcium salt composition comprising a calcium salt insoluble or poorly soluble to an aqueous medium and an anionic dispersant.

Abstract: There is provided a cosmetic additive in which the cosmetic obtained by mixing has excellent transparency, and good spread and feeling of use during application, and stickiness when dried can be suppressed, and a cosmetic containing the additive. A cosmetic additive containing cellulose fibers having an average fiber diameter (D) of 0.001 to 0.05 ?m, and a ratio (L/D) of average fiber length (L) to average fiber diameter (D) of 5 to 500; and a cosmetic containing the cosmetic additive.

Abstract: To provide a liquid crystal aligning agent to obtain a liquid crystal alignment film which is excellent in the adhesion to a sealing agent and in the liquid crystal alignment property. A liquid crystal aligning agent containing at least one polymer selected from the group consisting of a polyimide precursor having structural units represented by the formula (1) and structural units represented by the formula (3) and an imidized polymer of the polyimide precursor: wherein X1 and X4 are a tetravalent organic group, Y1 is a bivalent organic group having a thermally-leaving group, Y2 is a bivalent organic group, R1 and R2 are a hydrogen atom or a C1-5 alkyl group, and Z1 and Z2 are a hydrogen atom, or a C1-10 alkyl group, C2-10 alkenyl group or C2-10 alkynyl group which may have a substituent.

Abstract: A resist underlayer film-forming composition in which a coating film having high flattening properties is formed on a substrate. A resist underlayer film-forming composition including an epoxy adduct (C) obtained by reacting an epoxy group-containing compound (A) with an epoxy adduct-forming compound (B), wherein one or both of the epoxy group-containing compound (A) and the epoxy adduct-forming compound (B) contain an optionally branched alkyl group having a carbon atom number of three or more. The epoxy adduct-forming compound (B) is at least one compound selected from the group consisting of carboxylic acid (B1), carboxylic anhydride (B2), a phenol compound (B3), a hydroxyl group-containing compound (B4), a thiol compound (B5), an amino compound (B6), and an imide compound (B7). The optionally branched alkyl group having a carbon atom number of three or more is contained in the epoxy adduct-forming compound (B). The optionally branched alkyl group has a C3-19 alkyl group.

Abstract: A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1) R1 aR2bSi(R3)4-(a+b) ??Formula (1) wherein R1 is an organic group of Formula (1-2) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R3 is a hydrolyzable group; and Formula (2) R7cR8dSi(R9)4-(c+d) ??Formula (2) wherein R7 is an organic group of Formula (2-1) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R9 is a hydrolyzable group.

Abstract: A novel imprint material including a component (A); a component (B); a component (C); and a component (D) below. (A): a compound of Formula (1) below, (B): a compound of Formula (2) below, (C): a compound of Formula (3) below, and (D): a photopolymerization initiator, wherein, each R1 is independently a hydrogen atom or a methyl group, R2 is a C1-5 hydrocarbon group that optionally has a hydroxy group as a substituent, m is 2 or 3, X is a divalent linking group having an ethylene oxide unit and/or a propylene oxide unit, R3 is a hydrogen atom or a C1-3 alkyl group, n is 1 or 2, and when n is 1, R4 is a C1-12 alkyl group that is optionally substituted with at least one substituent, and when n is 2, R4 is a C1-12 alkylene group that is optionally substituted with at least one substituent.

Abstract: The present invention provides a method for producing an epoxy compound by a reaction of an olefin compound with hydrogen peroxide, wherein the epoxy compound is stably and safely produced using a hydrogen peroxide stabilizer for reducing an oxygen gas generated from hydrogen peroxide. A method for producing an epoxy compound by a reaction of an olefin compound with hydrogen peroxide, wherein the reaction is carried out in the presence of an organophosphorus compound in such a reaction medium that the pH is maintained within a range of more than 7.5 and less than 12.0. The olefin compound may be 1,3,5-tris-(alkenyl)-isocyanurate. The alkenyl group in the olefin compound may be 3-butenyl group, 4-pentenyl group, 5-hexenyl group, 6-heptenyl group, or 7-octenyl group. The epoxy compound may be 1,3,5-tris-(epoxyalkyl)-isocyanurate. The reaction medium may be such a reaction medium that the pH is maintained within a range of 8.0 to 10.5.

Abstract: A solid base material for external use on skin usable as a stick-shaped base material or similar, and has excellent thermal stability and a breaking strength sufficiently high, including a lipid peptide compound including at least one of compounds of formula (1) wherein R1 is a C9-23 aliphatic group, R2 is a hydrogen atom or a C1-4 alkyl group optionally having a C1 or C2 branched chain, and R3 is a —(CH2)n—X group, wherein n is a number from 1 to 4, and X is amino group, guanidino group, -CONH2 group, or a 5-membered ring or 6-membered ring optionally having one to three nitrogen atoms or a fused heterocyclic ring composed of the 5- and 6-membered ring, and analogue compound thereof, or pharmacologically usable salts thereof, and a surfactant, water, and at least one saturated or unsaturated monohydric alcohol having a carbon atom number of 8 to 30.

Abstract: An underlayer film-forming composition used for an underlayer for a self-assembled film, including a polysiloxane and a solvent. The polysiloxane may be a hydrolysis-condensation product of a silane containing a phenyl group-containing silane, or a hydrolysis-condensation product of a silane containing a silane of Formula (1) in a ratio of 10 to 100% by mol relative to the total silane, or a hydrolysis-condensation product of silanes containing the silane of Formula (1), silane of Formula (2) [R4Si(R3)3 (2)], and silane of Formula (3) [Si(R5)4 (3)] in a ratio of silane of Formula (1): silane of Formula (2): silane of Formula (3) of 10 to 100:0 to 90:0 to 50 in terms of % by mol relative to the total silane.

Abstract: There is provided a cured-film formation composition for providing an orientation material that has high photoreaction efficiency and excellent solvent resistance with adhesion durability, and that enables a polymerizable liquid crystal to be aligned even on a resin film in a highly sensitive manner. A cured-film formation composition including: (A) an acrylic polymer having a photo-aligning group; (B) a polymer having any one of a hydroxy group, a carboxy group, and an amino group on at least two terminals of a group bonded to a main chain; and (C) a cross-linking agent. An orientation material and a retardation material are obtained with the cured-film formation composition.

Abstract: A solvent-free light-curable adhesive composition includes: for example, a triazine ring-containing polymer including a repeating unit structure represented by formula [3] and having a weight-average molecular weight of 500-5000; and a reactive diluent such as N-vinylformamide, the composition not including a solvent. The solvent-free light-curable adhesive composition has good compatibility with acrylic materials and the like, which are adhesive components, even without including a solvent.