Abstract: Substrates are charged with a material by introducing the substrates into an evacuated vacuum container and exposing the surface of the substrates to a reactive gas which is adsorbed on the surface. The exposure is then terminated and the reactive gas adsorbed on the surface is allowed to react. The surface with the adsorbed reactive gas is exposed to a low-energy plasma discharge with ion energy E10 on the surface of the substrate of 0<E10?20 eV and an electron energy Eeo of 0 eV<Eeo?100 eV. The adsorbed reactive gas is allowed to react at least with the cooperation of plasma-generated ions and electrons and wherein the density of the resulting material charging on the substrate surface is controlled to have a predetermined density ranging from isolated atoms, to forming a continuous monolayer.

Abstract: A surface acoustic wave device includes a transducer electrode formed on a substrate. In one aspect, the electrode has a plurality of layers. At least one of the layers is metal and another of the layers is a material for providing a hardening effect to the metal layer by reinforcement with Al2O3 precipitates. In another aspect, the electrode is electrically connected to a metal component that permits electrical connection of the surface acoustic wave device to an electrical device external to the surface acoustic wave device. The electrode has a metal portion of a first metallization. The component is of a second, different metallization. In other aspects, the surface acoustic wave device is made via a method to have such structural aspects.

Abstract: In order to produce substrate surfaces with a given two-dimensional surface distribution arising from a treatment using a vacuum treatment process, an inhomogeneous plasma (5) with a density distribution is generated and moved relative to the substrate (9) with a given movement.

Abstract: Method for manufacturing a workpiece by a vacuum treatment process includes providing a vacuum treatment system with first second parts in a vacuum chamber. Either a sensor or an adjusting element with first signal connection is mounted on the second part. An electronic unit in the chamber has a reference potential and a second electric signal connection. The first part is connected to a system reference potential. A workpiece goes into the chamber and the method includes operating the second part at a further electric potential different from the system reference potential by at least 12 V. The method includes connecting the first electric signal connection to the second electric signal connection and maintaining the reference connection during operation on the further electric potential by metallically connecting the reference connection to the second part.