Abstract: A bus driver circuit divides an internal data bus for an integrated circuit memory into at least two groups, designated by speed. A faster group of data lines and a slower group of data lines are placed in an interleaved fashion in order to provide a two group shielding solution. At the earliest opportunity following the reception of a read command, the data from memory banks in the memory is sorted into these two groups. For a DDR3 memory, the sorting method is based on the A2 column address, known as C2. All of the data is brought out of the banks in parallel and sorted as it enters the main amplifiers. These main amplifiers are also divided into two groups, faster and slower. Each amplifier then connects to a data line (G-line) of the same group. The clock assigned to the fast group fires right away, thereby connecting the data associated with the fast amplifiers to the fast data group. This data group then proceeds to the output buffers through the entire data path as fast as possible.

Abstract: A dual bit line precharge architecture and method for low power DRAM which provides the low operating voltage of a non-half supply voltage (VCC/2) precharge with the low memory array current consumption and low memory array noise spike of VCC/2 precharge techniques. The architecture and technique of the present invention provides both reference voltage (VSS) precharged sub arrays and VCC precharged sub arrays on the same DRAM memory either with or without the novel charge sharing or charge recycling circuitry between these two different sub arrays as disclosed herein.

Abstract: A method for establishing a scattering bar rule for a mask pattern for fabricating a device is provided. The method is described as follows. First, at least one image simulation model is established according to the mask pattern and a process reference set used for fabricating the device based on the mask pattern. Next, a plurality of scattering bar reference sets is applied to the image simulation model so as to generate a plurality of simulation images, respectively. Further, a portion of the simulation images are selected to be a plurality of candidate layouts according to a screening criterion. Next, one of the candidate layouts is determined to be a pattern layout according to a selection rule, and the scattering bar reference set corresponding to the pattern layout is determined to be a scattering bar rule of the mask pattern.

Abstract: A dual bit line precharge architecture and method for low power DRAM which provides the low operating voltage of a non-half supply voltage (VCC/2) precharge with the low memory array current consumption and low memory array noise spike of VCC/2 precharge techniques. The architecture and technique of the present invention provides both reference voltage (VSS) precharged sub arrays and VCC precharged sub arrays on the same DRAM memory either with or without the novel charge sharing or charge recycling circuitry between these two different sub arrays as disclosed herein.

Abstract: A dual bit line precharge architecture and method for low power DRAM which provides the low operating voltage of a non-half supply voltage (VCC/2) precharge with the low memory array current consumption and low memory array noise spike of VCC/2 precharge techniques. The architecture and technique of the present invention provides both reference voltage (VSS) precharged sub arrays and VCC precharged sub arrays on the same DRAM memory either with or without the novel charge sharing or charge recycling circuitry between these two different sub arrays as disclosed herein.

Abstract: A phase change memory device comprising an electrode, a phase change layer crossing and contacting the electrode at a cross region thereof, and a transistor comprising a source and a drain, wherein the drain of the transistor electrically connects the electrode or the phase change layer is disclosed.

Abstract: A phase change memory device is provided. The phase change memory device comprises a substrate. An electrode layer is on the substrate. A phase change memory structure is on the electrode layer and electrically connected to the electrode layer, wherein the phase change memory structure comprises a cup-shaped heating electrode on the electrode layer. An insulating layer is on the cup-shaped heating electrode along a first direction covering a portion of the cup-shaped heating electrode. An electrode structure is on the cup-shaped heating electrode along a second direction covering a portion of the insulating layer and the cup-shaped heating electrode. A pair of double spacers is on a pair of sidewalls of the electrode structure covering a portion of the cup-shaped heating electrode, wherein the double spacer comprises a phase change material spacer and an insulating material spacer on a sidewall of the phase change material spacer.

Abstract: A method of making planar-type bottom electrode for semiconductor device is disclosed. A sacrificial layer structure is formed on a substrate. Multiple first trenches are defined in the sacrificial layer structure, wherein those first trenches are arranged in a first direction. The first trenches are filled with insulating material to form an insulating layer in each first trench. Multiple second trenches are defined in the sacrificial layer structure between the insulating layers, and are arranged in a second direction such that the second trenches intersect the first trenches. The second trenches are filled with bottom electrode material to form a bottom electrode layer in each second trench. The insulating layers separate respectively the bottom electrode layers apart from each other. Lastly, removing the sacrificial layer structure defines a receiving space by two adjacent insulating layers and two adjacent bottom electrode layers.

Abstract: A twin cell architecture for dynamic random access memory (DRAM) devices and those devices incorporating embedded DRAM utilizing an open bitline configuration is disclosed. The twin cell architecture disclosed has significant advantages over conventional designs in terms of power, radiation hardness and speed and does not require intermediate supply voltage bitline precharge while allowing for 6F2 memory cell layouts.

Abstract: Conventional fabrication of sidewall oxide around an ONO-type memory cell stack usually produces Bird's Beak because prior to the fabrication, there is an exposed sidewall of the ONO-type memory cell stack that exposes side parts of a plurality of material layers respectively composed of different materials. Certain materials in the stack such as silicon nitrides are more difficult to oxidize than other materials in the stack such polysilicon. As a result oxidation does not proceed uniformly along the multi-layered height of the sidewall. The present disclosure shows how radical-based fabrication of sidewall dielectric can help to reduce the Bird's Beak formation. More specifically, it is indicated that short-lived oxidizing agents (e.g.

Abstract: A column repair circuit uses a system of circuits that automatically stops the shifting of register contents independently of the number of bits to be shifted. The circuit is only dependent on the number of bits in a column address repair block. By adding shift register positions to one end of each shift register chain, a dedicated block of bits is used to detect the end of the shift chain without explicitly knowing the length of the chain. The shift register positions provide a hard-programmed code that can be used to stop the shifting of data automatically. The shift register positions also provide a space for hard-programmed code bits that can be examined to determine when the shift process ends. A shift chain can be controlled with a controller so long as the information is organized into groups of ‘k’ bits. The controller only requires information regarding the value of the number ‘k’ and the pre-programmed stop code in order to control any number of bits in a shift chain.

Abstract: A data capture circuit includes strobes that track input data even when conditions arise that cause the differences in skew from interpreting data state ones and zeros. This is accomplished whether these skews arise from reference voltage variation, data pattern loading, power supply droop, process variations within the chip itself, or other causes. The differential input strobes of the data capture circuit are input into individual input buffers, each compared against a reference voltage individually, as well as a data input pin. The outputs from these buffers are maintained separate from each other all the way to the point where the input data is latched. In latching the input data, data ones are latched entirely based on input signals derived from a rising edge (both strobes and data), and zeros are latched entirely based on input signals derived from a falling edge (both strobes and data).

Abstract: A configurable architecture, hybrid analog/digital delay locked loop and technique with fast open loop digital locking for integrated circuit dynamic random access memory (DRAM) devices and devices incorporating embedded DRAM. The DLL design and technique disclosed employs a hybrid analog/digital delay line, but does not use conventional closed loop architecture during the digital phase of the locking process.

Abstract: A method for manufacturing the DRAM includes first providing a substrate where patterned first mask layer and deep trenches exposed by the patterned first mask layer are formed. Deep trench capacitors are formed in the deep trenches and each of the deep trench capacitors includes a lower electrode, an upper electrode, and a capacitor dielectric layer. A device isolation layer is formed in the first mask layer and the substrate for defining an active region. The first mask layer is removed for exposing the substrate, and a semiconductor layer is formed on the exposed substrate. The semiconductor layer and the substrate are patterned for forming trenches, and the bottom of the trench is adjacent to the upper electrodes of the trench capacitor. Gate structures filling into the trenches are formed on the substrate. A doped region is formed in the substrate adjacent to a side of the gate structure.

Abstract: A power metal-oxide-semiconductor field-effect transistor (MOSFET) array structure is provided. The power MOSFET array is disposed under a gate pad, and space under the gate pad can be well used to increase device integration. When the array and the conventional power MOSFET array disposed under the source pad are connected to an array pair by using circuit connection region, the same gate pad and source pad can be shared, so as to achieve an objective of increasing device integration.

Abstract: An asymmetric data path position and delays technique enabling high speed access in integrated circuit memory devices which is asymmetric in terms of the delay from the array to the I/O buffers based on the position relative within a known starting address of a pre-fetch field. In accordance with the technique of the present invention, the delay is not only asymmetric in terms of its physical length, but also in the number of pipeline stages and the clocks that control them and can also be asymmetric in terms of the column address required to access each section of the array and its designated pre-fetch field.

Abstract: A batch of wafers is temporarily stalled during a Double Pattern Technology (DPT) process before a temporary representation of a second of to-be-overlaid patterns is permanently combined with a first of the patterns. Sampled ones of the stalled wafers are inspected to determine if sufficiently close alignment is present between the two patterns. If excessive misalignment is detected (e.g., by SEM microscopy), the second but still temporary pattern representation is erased from all wafers of the batch and the batch is routed for rework and corrected reestablishment of the temporary representation of the second of to-be-overlaid patterns.

Abstract: Charge-trapping dielectric (160) in a nonvolatile memory cell is recessed from under the control gate's edge and/or from an edge of a substrate isolation region. The recessed geometry serves to reduce or eliminate charge trapping in regions from which the charge may be difficult to erase.

Abstract: A gate structure includes a substrate, a gate dielectric layer, a first conductive layer, a second conductive layer, a cap layer and a first insulating spacer. The gate dielectric layer is disposed on the substrate. The first conductive layer is disposed on the gate dielectric layer and has an opening. A part of the second conductive layer is disposed in the opening. The second conductive layer has an extrusion that protrudes above the opening of the first conductive layer. The extrusion has a cross-sectional width less than the width of the second conductive layer inside the opening. The cap layer is disposed on the extrusion. The first insulating spacer is disposed on a part of the first conductive layer and covers the sidewalls of the extrusion. The inclusion of the extrusion in the second conductive layer decreases the resistance of the gate structure and promotes the efficiency of the device.

Abstract: A floating gate memory cell's channel region (104) is at least partially located in a fin-like protrusion (110P) of a semiconductor substrate. The floating gate's top surface may come down along at least two sides of the protrusion to a level below the top (110P-T) of the protrusion. The control gate's bottom surface may also comes down to a level below the top of the protrusion. The floating gate's bottom surface may comes down to a level below the top of the protrusion by at least 50% of the protrusion's height. The dielectric (120) separating the floating gate from the protrusion can be at least as thick at the top of the protrusion as at a level (L2) which is below the top of the protrusion by at least 50% of the protrusion's height. A very narrow fin or other narrow feature in memory and non-memory integrated circuits can be formed by providing a first layer (320) and then forming spacers (330) from a second layer without photolithography on sidewalls of features made from the first layer.