Patents Assigned to QUALCOMM MEMS Technologies
  • Publication number: 20090204349
    Abstract: Methods and devices to measure threshold voltages of MEMS devices are disclosed. The threshold voltages are based on test voltages which cause the devices to change states. State changes of the device are detected by monitoring integrated current or charge used to drive the test voltages.
    Type: Application
    Filed: February 11, 2009
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Alok Govil, Kostadin Djordjev, Alan Lewis, Wilhelmus Johannes Robertus Van Lier
  • Publication number: 20090201034
    Abstract: Various methods are described to characterize interferometric modulators or similar devices. Measured voltages across interferometric modulators may be used to characterize transition voltages of the interferometric modulators. Measured currents may be analyzed by integration of measured current to provide an indication of a dynamic response of the interferometric modulator. Frequency analysis may be used to provide an indication of a hysteresis window of the interferometric modulator or mechanical properties of the interferometric modulator. Capacitance may be determined through signal correlation, and spread-spectrum analysis may be used to minimize the effect of noise or interference on measurements of various interferometric modulator parameters.
    Type: Application
    Filed: September 30, 2008
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventor: Alok Govil
  • Publication number: 20090201242
    Abstract: Devices and methods for determining an operational state of a selected display device in an array of display devices. One method includes determining the operational state of a particular display device in the array by measuring an electrical characteristic of a plurality of the display devices, and determining the operational state based at least in part on the three measurements. In some embodiments, the electrical characteristic is capacitance, in other embodiments impedance can be the measured electrical characteristic. Such methods can be applied to IMOD displays and other displays, including LCD displays.
    Type: Application
    Filed: February 3, 2009
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventor: Alok Govil
  • Publication number: 20090199900
    Abstract: In various embodiments described herein, a device comprising one or more light guides that is optically coupled to one or more photocells is described. The device further comprises one or more light turning films or layers comprising volume or surface diffractive features or holograms. Light incident on the light guides is turned by volume or surface diffractive features or holograms that are reflective or transmissive and guided through the light guides by multiple total internal reflections. The guided light is directed towards the photocells. In certain embodiments, solar energy is also used to power or heat a thermal generator to heat water or produce electricity from steam. Various embodiments may comprise an air gap or an optical isolation layer disposed between the multiple light guides.
    Type: Application
    Filed: February 11, 2009
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Ion Bita, Russell Wayne Gruhlke, Gang Xu, Marc Maurice Mignard
  • Publication number: 20090201571
    Abstract: A reflective electronic display includes a front light assembly with a diffuser for enlarging the viewing cone of the display. The front light may include a substrate, a plurality of optical turning features, and a diffuser formed therebetween. The haze of the diffuser may be spatially non-uniform and switchable between two or more levels.
    Type: Application
    Filed: February 11, 2009
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Brian J. Gally, Gang Xu, Ion Bita, Marek Mienko, Russell Gruhlke
  • Publication number: 20090201009
    Abstract: Various methods are described to characterize interferometric modulators or similar devices. Measured voltages across interferometric modulators may be used to characterize transition voltages of the interferometric modulators. Measured currents may be analyzed by integration of measured current to provide an indication of a dynamic response of the interferometric modulator. Frequency analysis may be used to provide an indication of a hysteresis window of the interferometric modulator or mechanical properties of the interferometric modulator. Capacitance may be determined through signal correlation, and spread-spectrum analysis may be used to minimize the effect of noise or interference on measurements of various interferometric modulator parameters.
    Type: Application
    Filed: September 30, 2008
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventor: Alok Govil
  • Publication number: 20090201008
    Abstract: Various methods are described to characterize interferometric modulators or similar devices. Measured voltages across interferometric modulators may be used to characterize transition voltages of the interferometric modulators. Measured currents may be analyzed by integration of measured current to provide an indication of a dynamic response of the interferometric modulator. Frequency analysis may be used to provide an indication of a hysteresis window of the interferometric modulator or mechanical properties of the interferometric modulator. Capacitance may be determined through signal correlation, and spread-spectrum analysis may be used to minimize the effect of noise or interference on measurements of various interferometric modulator parameters.
    Type: Application
    Filed: September 30, 2008
    Publication date: August 13, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Chen-Jean Chou, Alok Govil
  • Publication number: 20090195856
    Abstract: Methods of fabricating an electromechanical systems device that minimize critical dimension (CD) loss in the device are described. The methods provide electromechanical systems devices with improved properties, including high reflectivity.
    Type: Application
    Filed: February 5, 2008
    Publication date: August 6, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Manish Kothari, Clarence Chui, Sauri Gudlavalleti
  • Patent number: 7569488
    Abstract: Embodiments of the present invention relate to methods and systems for making a microelectromechanical system MEMS device comprising supplying an etchant to etch one or more sacrificial structures of the system in a chamber. A process parameter relating to the pressure within the chamber is monitored as a function of time to provide an indication of the extent of the etching of the one or more sacrificial structures.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: August 4, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventor: Marjorio Rafanan
  • Patent number: 7570415
    Abstract: A microelectromechanical systems device having an electrical interconnect between circuitry outside the device and at least one of an electrode and a movable layer within the device. A layer of the electrical interconnect is formed directly under, over, or between a partially reflective layer and a transparent layer of the device. The layer of the electrical interconnect preferably comprises nickel.
    Type: Grant
    Filed: August 7, 2007
    Date of Patent: August 4, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventor: Teruo Sasagawa
  • Publication number: 20090190373
    Abstract: The invention comprises devices and methods for coupling a light source to a display illumination device. In one embodiment, an illumination device includes a light guide comprising a front surface, a back surface, a light coupling section configured to receive optical energy from a light source in to the light guide through said front surface or said back surface at an angle about normal to the optical energy receiving surface, and further configured to direct light through said light guide, and a light turning section configured to redirect out of the light guide at least a portion of the light received from said light coupling section, said redirected light at an angle about normal to the optical energy receiving surface.
    Type: Application
    Filed: April 1, 2009
    Publication date: July 30, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Ion Bita, Marek Mienko, Gang Xu, Russell Wayne Gruhlke
  • Patent number: 7566940
    Abstract: Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
    Type: Grant
    Filed: July 21, 2006
    Date of Patent: July 28, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventors: Teruo Sasagawa, SuryaPrakash Ganti, Mark W. Miles, Clarence Chui, Manish Kothari, Ming-Hau Tung
  • Patent number: 7566664
    Abstract: A method for etching a target material in the presence of a structural material with improved selectivity uses a vapor phase etchant and a co-etchant. Embodiments of the method exhibit improved selectivities of from at least about 2-times to at least about 100-times compared with a similar etching process not using a co-etchant. In some embodiments, the target material comprises a metal etchable by the vapor phase etchant. Embodiments of the method are particularly useful in the manufacture of MEMS devices, for example, interferometric modulators. In some embodiments, the target material comprises a metal etchable by the vapor phase etchant, for example, molybdenum and the structural material comprises a dielectric, for example silicon dioxide.
    Type: Grant
    Filed: August 2, 2006
    Date of Patent: July 28, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventors: Xiaoming Yan, Brian Arbuckle, Evgeni Gousev, Ming-Hau Tung
  • Patent number: 7564613
    Abstract: A microelectromechanical device (MEMS) utilizing a porous electrode surface for reducing stiction is disclosed. In one embodiment, a microelectromechanical device is an interferometric modulator that includes a transparent electrode having a first surface; and a movable reflective electrode with a second surface facing the first surface. The movable reflective electrode is movable between a relaxed and actuated (collapsed) position. An aluminum layer is provided on either the first or second surface. The aluminum layer is then anodized to provide an aluminum oxide layer which has a porous surface. The porous surface, in the actuated position, decreases contact area between the electrodes, thus reducing stiction.
    Type: Grant
    Filed: October 9, 2007
    Date of Patent: July 21, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventors: Teruo Sasagawa, Lior Kogut
  • Patent number: 7561334
    Abstract: Methods and apparatus for reducing back-glass deflection in an interferometric modulator display device are provided. In one embodiment, an interferometric modulator display is provided that includes a including a substrate, an optical stack formed on the substrate, a moveable reflective layer formed over the optical stack, and a backplate attached to the substrate. The moveable reflective layer includes one or more first posts extending therefrom, in which one or more of the first posts are operable to protect the moveable reflective layer by contacting at least a portion of the backplate if the backplate is deflected.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: July 14, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventor: Qi Luo
  • Patent number: 7561321
    Abstract: A method of fabricating an array of MEMS devices includes the formation of support structures located at the edge of upper strip electrodes. A support structure is etched to form a pair of individual support structures located at the edges of a pair of adjacent electrodes. The electrodes themselves may be used as a hard mask during the etching of these support structures. A resultant array of MEMS devices includes support structures having a face located at the edge of an overlying electrode and coincident with the edge of the overlying electrode.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: July 14, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventor: David Heald
  • Patent number: 7556981
    Abstract: A MEMS (Microelectromechanical system) device is described. The device includes a first layer on a substrate, and a sacrificial layer on or over the first layer, the first sacrificial layer being configured to be removed in a removal procedure. The device also includes a second layer on or over the first sacrificial layer, where the second layer is spaced apart from the first layer, and a shorting element electrically connecting the first and second layers, where at least a portion of the shorting element is removable in the removal procedure.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: July 7, 2009
    Assignee: Qualcomm MEMS Technologies, Inc.
    Inventor: William J. Cummings
  • Publication number: 20090159123
    Abstract: A plurality of dichroic filters are included in multifunction photovoltaic cells to increase efficiency. For example, in a multi-junction photovoltaic cell comprising blue, green, and red active layers, blue, green, and red dichroic filters that reflect blue, green, and red light, respectively, may be disposed proximal to the blue, green, and red active layers to reflect back light not absorbed on the first past. The dichroic filters may be used to demultiplex white light incident on the PV cell and deliver suitable wavelengths to the appropriate active layer, e.g., blue wavelengths to the blue active layer, green wavelengths to the green active layer, red wavelengths to the red active layer. The PV cell may additionally be interferometrically tuned to increase absorption efficiency. Accordingly, optical resonant layers and cavities may be employed in certain embodiments.
    Type: Application
    Filed: December 15, 2008
    Publication date: June 25, 2009
    Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.
    Inventors: Manish Kothari, Yeh-Jiun Tung
  • Patent number: 7550810
    Abstract: A microelectromechanical (MEMS) device includes a substrate and a movable layer mechanically coupled to the substrate. The movable layer moves from a first position to a second position at a first rate and from the second position to the first position at a second rate faster than the first rate. The MEMS device further includes an adjustable cavity defined between the substrate and the movable layer and containing a fluid. The MEMS device further includes a fluid conductive element through which the fluid flows at a first flowrate from inside the cavity to outside the cavity upon movement of the movable layer from the second position to the first position and through which the fluid flows at a second flowrate slower than the first flowrate from outside the cavity to inside the cavity upon movement of the movable layer from the first position to the second position.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: June 23, 2009
    Assignee: QUALCOMM MEMS Technologies, Inc.
    Inventors: Marc Mignard, Lior Kogut
  • Publication number: 20090151771
    Abstract: An interferometric mask covering a reflective conductive ribbon that electrically interconnects a plurality of photovoltaic cells is disclosed. Such an interferometric mask may reduce reflections of incident light from the conductors. In various embodiments, the mask reduces reflections, so that a front and back electrode pattern appears black or similar in color to surrounding features of the device. In other embodiments, the mask may modulate reflections of light such that the electrode pattern matches a color in the visible spectrum.
    Type: Application
    Filed: December 17, 2008
    Publication date: June 18, 2009
    Applicant: QUALCOMM MEMS Technologies, Inc.
    Inventors: Manish Kothari, Kasra Khazeni