Abstract: Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device can further include a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating and forming a wall of a cavity, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an orifice formed in the cavity to provide for the passage of air between the inside and outside of the cavity.

Abstract: A lens-less system for analyzing an optical spectrum includes a sophisticated volume hologram for separating an incident diffuse optical signal into wavelength channels without aid of an external collector lens and a detector for receiving and detecting light dispersed by the sophisticated volume hologram. Other systems and methods are also provided.

Abstract: Disclosed are capacitive micromechanical resonators optimized for high Q, low motional impedance, and large tuning range. Exemplary resonators were fabricated using a HARPSS-on-SOI process, and demonstrated quality factors up to 119000 in vacuum. For resonators operating between 3 MHz and 30 MHz, the lowest extracted impedance is 218 k? and the largest electrostatic tuning coefficient is ?240 ppm/V2. The disclosed designs are applicable up to at least 200 MHz operation. An oscillator interface circuit comprising of a trans-impedance amplifier and an automatic bias generator providing a temperature-compensating bias voltage is also disclosed. Experiments show temperature drift reduction from 2800 ppm to 39 ppm over a 100° C. range. Process compensation (DFM) of micromechanical resonators, resonators having mass loading elements that allow generation of closely spaced frequencies, and coupled systems comprising of the resonators are also described.

Abstract: In general, in one aspect, the invention features an article that includes a layer including a plurality of spaced-apart portions of a first material extending along a first direction. The layer transmits about 20% or more of light of wavelength ? having a first polarization state incident on the layer along a path. The layer transmits about 2% or less of light of wavelength ? having a second polarization state incident on the layer along the path, the first and second polarization states being orthogonal. For wavelength ?, the first material has a refractive index of 1.8 or more and an extinction coefficient of 1.8 or more, and ? is 300 nm or less.

Abstract: Disclosed is a gain boosting technique for use with millimeter-wave cascode amplifiers. The exemplary technique may be implemented using a 0.18 ?m SiGe process (FT=140 GHz). It has also been shown that the technique is effective for CMOS processes with comparable FT. An exemplary gain-enhanced cascode stage was measured to have higher than 9 dB gain with a 1-dB bandwidth above 6 GHz with a DC power consumption of 13 mW. In addition, one cascode stage without gain boosting may be cascaded with two gain-boosted cascode amplifier stages to implement a three-stage LNA. The measured stable gain is higher than 24 dB at 60 GHz with a 3-dB bandwidth of 3.1 GHz for 25 mW of DC power consumption. It is believed that this is the first 60 GHz LNA with a higher than 20 dB gain using a 0.18 ?m SiGe process.

Abstract: Embodiments of the invention may provide for digital wavelet generators utilized in providing flexible spectrum-sensing resolutions for a Multi-Resolution Spectrum Sensing (MRSS) technique. Embodiments of the invention may provide for either multi-point or multi-rate digital wavelet generators. These digital wavelet generators may utilizing the same hardware resource optimally, and the various wavelet bases may be generated by changing the memory addressing schemes or clock speeds.

Abstract: A microvalve which utilizes a low temperature (<300° C.) fabrication process on a single substrate. The valve uses buckling and an electromagnetic actuator to provide a relatively large closing force and lower power consumption. A buckling technique of the membrane is used to provide two stable positions for the membrane, and to reduce the power consumption and the overall size of the microvalve. The use of a permanent magnet is an alternative to the buckled membrane, or it can be used in combination with the buckled membrane, or two sets of micro-coils can be used in order to open and close the valve, providing the capability for the valve to operate under normally opened or normally closed conditions. Magnetic analysis using ANSYS 5.7 shows that the addition of Orthonol between the coils increases the electromagnetic force by more than 1.5 times. At a flow rate of 1 mL/m, the pressure drop is <100 Pa.

Abstract: In general, in a first aspect, the invention features an article that includes a plurality of spaced apart ridges extending along a first direction, adjacent ridges being spaced with a period of ? or less, each ridge comprising a plurality of layers where adjacent layers have different refractive indexes at a first wavelength ?1 and a second wavelength ?2, where ?1 and ?2 are different, ?<??1, and ?<?2. The ridges are configured so that for radiation at ?1 and ?2 incident on the grating, the grating substantially blocks the radiation at ?1 having a first polarization state, substantially transmits the radiation at ?2 having the first polarization state, and substantially transmits the radiation at ?1 and ?2 having a second polarization state, where the first and second polarization states are orthogonal.

Abstract: Apparatus and processes are disclosed that provide a microfabricated microtool having a mechanically actuated manipulating mechanism. The microtool comprises a tweezer having flexible arms, and an actuating mechanism. A biological, electrical, or mechanical component is grasped, cut, sensed, or measured by the flexible arms. The actuating mechanism requires no electric power and is achieved by the reciprocating motion of a smooth, rigid microstructure applied against the flexible arms of the microtool. In certain implementations, actuator motion is controlled distally by a tethered cable. A process is also disclosed for producing a microtool, and in particular, by micropatterning. Photolithography may be used to form micro-molds that pattern the microtool or components of the microtool. In certain implementations, the tweezer and actuating mechanism are produced fully assembled. In other implementations, the tweezer and actuating mechanism are produced separately and assembled together.

Abstract: An electroplating apparatus for electroplating a surface of a wafer is provided. The wafer is capable of being electrically charged as a cathode. The electroplating apparatus includes a plating head capable of being positioned either over or under the surface of a wafer and capable of being electrically charged as an anode. The plating head is capable of enabling metallic plating between the surface of the wafer and the plating head when the wafer and plating head are charged. The plating head further comprises a voltage sensor pair capable of sensing a voltage present between the plating head and the surface of the wafer, and a controller capable of receiving data from the voltage sensor pair. The data received from the voltage sensor pair is used by the controller to maintain a substantially constant voltage to be applied by the anode when the plating head is placed in positions over the surface of the wafer. A method of electroplating a wafer is also provided.

Abstract: Briefly described, embodiments of this disclosure, among others, include scanning ion probe systems, methods of use thereof, scanning ion source systems, methods of use thereof, scanning ion probe mass spectrometry systems, methods of use thereof, methods of simultaneous ion analysis and imaging, and methods of simultaneous mass spectrometry and imaging.

Abstract: Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device further includes a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an electrode extending toward, but spaced a distance away from, the second region of the mechanical structure.

Abstract: Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface.

Abstract: Ionization systems, methods of using ionization systems, ion source systems, methods of using ion source systems, and methods of ionization, are described herein.

Abstract: A system for purification of high value metals comprises an electrolytic cell in which an anode formed of a composite of a metal oxide of the metal of interest with carbon is electrochemically reduced in a molten salt electrolyte.

Abstract: A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.

Abstract: Methods, apparatus, and systems are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention provide an in-situ reclaim approach that utilizes condensing mechanisms to reclaim evaporated solvent components. In these embodiments, the condensing can occur within a proximity head itself and/or along a vacuum line running from the proximity head to a vacuum tank. Other embodiments of the present invention provide an in-situ reclaim approach that prevents the evaporation of solvents at the onset by maintaining appropriate equilibrium gas phase concentrations between the liquid chemistries and gases used to process wafer surfaces.

Abstract: Methods and apparatus are provided for using various megasonic apparatus including megasonic tanks, scanning megasonic plates, megasonic jets, and megasonic sweeping beams etc., in combination with selective chemistries to remove sub-micron particulate contaminants from the surfaces of the processing equipment used in semiconductor, medical, or any other processing environments.

Abstract: Methods and compositions for synthesizing biopolymers using an intercalator are provided. Aspects provide compositions and methods for synthesizing biopolymers with non-natural backbones or non-natural biopolymer subunits using natural biopolymer templates. Other aspects provide compositions and methods for synthesizing biopolymers using a template with a non-natural backbone on non-natural biopolymer subunits.

Abstract: Disclosed are resonant vibratory gyroscopes and fabrication methods relating thereto. The angular motion sensor comprises a resonating star gyroscope which comprises a vibratory solid or shell-type structure for rate sensing or measuring angle of rotation. The structure formed as a merged superposition of two square entities, yields in-plane degenerate flexural modes that are used to sense rotation around the axis perpendicular to the substrate. The resonating star gyroscope may be implemented using the primary flexural degenerate modes. Such an implementation has been successfully demonstrated by the authors using trench-refilled polysilicon and epitaxial polysilicon as the structural material. It is also possible to use a solid star-shaped resonator (with or without perforations) for the gyroscope. The authors also suggest the operation of the resonating star gyroscope employing the higher-order flexural modes.