Patents Assigned to Resonac Corporation
  • Publication number: 20230386851
    Abstract: There are provided an etching gas and an etching method capable of selectively etching an etching object containing silicon as compared with a non-etching object. The etching gas contains fluorobutene represented by a general formula C4HxFy, in which x is 1 or more and 7 or less, y is 1 or more and 7 or less, and x+y is 8. The etching gas contains or does not contain at least one of alkali metals and alkaline earth metals as metal impurities, and the sum of the concentrations of alkali metals and alkaline earth metals when contained is 5000 ppb by mass or less. The etching method includes an etching step of bringing the etching gas into contact with a member to be etched (12) having an etching object and a non-etching object, and selectively etching the etching object as compared with the non-etching object. The etching object contains silicon.
    Type: Application
    Filed: October 8, 2021
    Publication date: November 30, 2023
    Applicant: Resonac Corporation
    Inventor: Atsushi SUZUKI
  • Patent number: 11827789
    Abstract: The present invention relates to a thermosetting resin composition containing an inorganic filler (A1) containing a nanofiller (a), a thermosetting resin (B), and an elastomer (C); and a thermosetting resin composition containing an inorganic filler (A2), a thermosetting resin (B), and an elastomer (C), wherein the inorganic filler (A2) has at least two peaks of a first peak and a second peak in a particle size distribution measured according to the laser diffraction scattering method, and a peak position of the first peak appears at 0.3 to 0.7 ?m, while a peak position of the second peak appears at 0.7 to 1.2 ?m.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: November 28, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Aya Kasahara, Tetsurou Iwakura
  • Publication number: 20230374334
    Abstract: Provided is a composition capable of forming an easy-drying coating on an application surface in a paint, an ink, and an adhesive which mainly contain polymers, or a coating liquid for a positive electrode, a negative electrode, a separator, and the like of a lithium-ion secondary battery. The coating composition containing a filler, a binder, a thickener, and a solvent, wherein the binder is at least one selected from a diene rubber and a (meth)acrylate polymer; a viscosity of the coating composition is 1.0×106 Pa·s or less as measured at a shear rate of 0.01/s; and the following thixotropy index (TI) is 1.1×106 or more: [thixotropy index (TI)]=[viscosity of the coating composition as measured at a shear rate of 0.01/s]/[viscosity of the coating composition as measured at a shear rate of 10000/s].
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventors: Atsushi SUGAWARA, Jun KONISHI
  • Publication number: 20230373888
    Abstract: Provided is a method for storing a fluoro-2-butene by which isomerization reaction is unlikely to proceed during storage. A fluoro-2-butene represented by general formula C4HxFy where x is 0 or more and 7 or less, y is 1 or more and 8 or less, and x+y is 8 contains or does not contain hydrogen chloride as an impurity. The fluoro-2-butene is stored in a container in which the concentration of hydrogen chloride is 100 ppm by volume or less in a gas phase portion when the fluoro-2-butene contains hydrogen chloride.
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventor: Atsushi SUZUKI
  • Publication number: 20230374631
    Abstract: An aluminum alloy for sliding components contains 8.0-11.5% by mass of Si, 0.7-1.2% by mass of Cu, 0.2-0.6% by mass of Mg, 0.30-0.60% by mass of Mn, 0.10-0.30% by mass of Fe, 0.01-0.03% by mass of Cr, and balance Al with inevitable impurities, in which a tensile strength at 25° C. is within a range of 330 MPa or more and 380 MPa or less, the aluminum alloy does not contain, per 1182 ?m2, two or more crystallized products containing 1% by mass or more of Cu and having a circle equivalent diameter exceeding 5 ?m, and the aluminum alloy does not contain, per 1182 ?m2, two or more Cr-containing intermetallic compounds having a length of 8 ?m or more, and does not contain, per 4726 ?m2, two or more primary crystal Si particles having a circle equivalent diameter exceeding 10 ?m.
    Type: Application
    Filed: October 21, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventor: Takumi MARUYAMA
  • Publication number: 20230374333
    Abstract: A coating composition can be applied with excellent high-speed coating properties and surface smoothness in a paint, an ink, and an adhesive which mainly contain polymers, or is a coating liquid for a positive electrode, a negative electrode, a separator, and the like of a lithium-ion secondary battery. The coating composition contains a filler, a binder, a thickener, and a solvent, wherein an aspect ratio of the filler is 2 or more, the binder is at least one selected from a diene rubber and a (meth)acrylate polymer, a viscosity of the coating composition is 1.0×106 Pa·s or less as measured at a shear rate of 0.01/s, and the following thixotropy index (TI) is 1.1×106 or more: [thixotropy index (TI)]=[viscosity of the coating composition as measured at a shear rate of 0.01/s]/[viscosity of the coating composition as measured at a shear rate of 10000/s].
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventors: Atsushi SUGAWARA, Jun KONISHI
  • Publication number: 20230374381
    Abstract: An etching gas and an etching method capable of selectively etching an etching object containing silicon as compared with a non-etching object. The etching gas contains fluorobutene represented by a general formula C4HxFy, in which x is 1 or more and 7 or less, y is 1 or more and 7 or less, and x+y is 8. The etching gas contains carbonyl fluoride as an impurity and the concentration of carbonyl fluoride is 100 ppm by mass or less. The etching method includes an etching step of bringing the etching gas into contact with a member to be etched (12) having an etching object which is an object to be etched by the etching gas and a non-etching object which is not an object to be etched by the etching gas, and selectively etching the etching object as compared with the non-etching object. The etching object contains silicon.
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventor: Atsushi SUZUKI
  • Publication number: 20230373887
    Abstract: Provided is a method for storing a fluorobutene by which decomposition is unlikely to proceed during storage. A fluorobutene represented by general formula C4HxFy where x is 0 or more and 7 or less, y is 1 or more and 8 or less, and x+y is 8 contains or does not contain at least one of manganese, cobalt, nickel, and silicon as a metal impurity. The fluorobutene is stored in a container in which the total concentration of manganese, cobalt, nickel, and silicon is 1,000 ppb by mass or less when containing at least one of manganese, cobalt, nickel, and silicon.
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventor: Atsushi SUZUKI
  • Publication number: 20230374439
    Abstract: Provided are a cell culture apparatus capable of culturing cells with a high yield and time efficiency by efficiently advancing bead to bead transfer of the cells in a case where culture carriers are introduced into a suspension and cells are cultured on the culture carriers, and a method for manufacturing a cell group. A cell culture apparatus includes a culture container that accommodates a suspension containing at least cell complexes that are complexes of cells and culture carriers; a drive device that agitates the suspension; a measurement device that measures at least one of a cell distribution information value related to the cells and a carrier distribution information value related to the culture carriers in at least one partial region in the suspension; and a control device that controls driving of the drive device on the basis of at least one of the cell distribution information value and the carrier distribution information value measured by the measurement device.
    Type: Application
    Filed: September 24, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventors: Yuma Suzuki, Shangwu Chen, Masahiro Okanojo, Ryosuke Takahashi
  • Publication number: 20230373889
    Abstract: Provided is a method for storing a fluoro-2-butene by which isomerization reaction is unlikely to proceed during storage. A fluoro-2-butene represented by general formula C4HxFy where x is 0 or more and 7 or less, y is 1 or more and 8 or less, and x+y is 8 contains or does not contain hydrogen fluoride as an impurity. The fluoro-2-butene is stored in a container in which the concentration of hydrogen fluoride is 100 ppm by volume or less in a gas phase portion when the fluoro-2-butene contains hydrogen fluoride.
    Type: Application
    Filed: October 8, 2021
    Publication date: November 23, 2023
    Applicant: Resonac Corporation
    Inventor: Atsushi SUZUKI
  • Patent number: 11820742
    Abstract: There is provided a fluorine-containing ether compound represented by the following formula. R1—R2—CH2—R3—CH2—OCH2CH(OH)CH2O—CH2—R3—CH2—R4—R5 (in the formula. R3 represents a perfluoropolyether chain; R2 and R4 represent a divalent linking group having a polar group; R1 and R5 represent a terminal group bonded to an oxygen atom of R2 or R4; and at least one of R1 and R5 is any one selected from the group consisting of an alkenyl group having 2 to 8 carbon atoms, an alkynyl group having 3 to 8 carbon atoms, an aromatic hydrocarbon-containing group, and an aromatic heterocycle-containing group).
    Type: Grant
    Filed: December 17, 2020
    Date of Patent: November 21, 2023
    Assignee: Resonac Corporation
    Inventors: Naoya Fukumoto, Tsuyoshi Kato, Katsumi Murofushi, Daisuke Yagyu, Shunya Suzuki, Ayano Asano
  • Patent number: 11820862
    Abstract: According to one aspect of the present invention, an organic fluorine compound is represented by a general formula (R-?-E-CH2)2-A??(1A) (where A is a divalent perfluoropolyether group, ? is an arylene group or a single bond, R is an alkenyl group or an alkynyl group, and E is an ether bond or an ester bond or a group that is represented by a chemical formula —O—CH2CH(OH)CH2O— two groups each of which is represented by a general formula R-?-E-CH2— may be the same or different, and at least one n among two ? is an arylene group).
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: November 21, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Kentaro Watanabe, Yasuyuki Ueda, Kenzo Hanawa
  • Patent number: 11821963
    Abstract: A magnetic sensor 1 includes: a non-magnetic substrate 10; and a sensitive element 30 disposed on the substrate 10. The sensitive element 30 has a longitudinal direction and a transverse direction and has a uniaxial magnetic anisotropy in a direction intersecting the longitudinal direction. The sensitive element 30 is configured to sense a magnetic field by a magnetic impedance effect. The sensitive element 30 includes a soft magnetic material layer 101 made of an amorphous alloy based on Co and having a saturation magnetization of greater than or equal to 300 emu/cc and less than or equal to 650 emu/cc.
    Type: Grant
    Filed: March 23, 2022
    Date of Patent: November 21, 2023
    Assignee: Resonac Corporation
    Inventors: Daizo Endo, Akira Sakawaki
  • Patent number: 11820953
    Abstract: This fluorine-containing ether compound is a fluorine-containing ether compound represented by formula (1). R1—X—R2—CH2—R3—CH2—R4??(1) (In formula (1), R1 is an alkenyloxy group of 2 to 8 carbon atoms or an alkynyloxy group of 3 to 8 carbon atoms. R2 is represented by formula (2) shown below. In formula (2), a represents an integer of 1 to 3. X is represented by formula (3) shown below. In formula (3), b represents an integer of 1 to 5, Y is a divalent linking group that is bonded to a carbon atom in formula (2), and R represents an alkyl group of 1 to 6 carbon atoms or H. R3 represents a perfluoropolyether chain. R4 represents a terminal group containing two or three polar groups, wherein each polar group is bonded to a different carbon atom, and the carbon atoms to which the polar groups are bonded are bonded to each other via a linking group containing a carbon atom to which a polar group is not bonded.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: November 21, 2023
    Assignee: Resonac Corporation
    Inventors: Natsumi Shibata, Tsuyoshi Kato, Daisuke Yagyu, Shunya Suzuki, Masaki Nanko, Naoya Fukumoto
  • Patent number: 11823721
    Abstract: A magnetic recording medium including: a non-magnetic substrate; an underlayer; a perpendicular magnetic layer; a diffusion preventing layer; and a protective layer, wherein the underlayer, the perpendicular magnetic layer, the diffusion preventing layer, and the protective layer are layered on the non-magnetic substrate in this order, the perpendicular magnetic layer has a multi-layer structure, the perpendicular magnetic layer includes an uppermost layer and at least one layer other than the uppermost layer, the uppermost layer including Co or Fe in magnetic particles, and the at least one layer other than the uppermost layer including an oxide, the diffusion preventing layer is provided between the perpendicular magnetic layer and the protective layer, and the diffusion preventing layer includes at least one component selected from a group consisting of Si, Ti, Cr, B, and Ru, or either a carbide, an oxide, or both, of the at least one component.
    Type: Grant
    Filed: February 1, 2022
    Date of Patent: November 21, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Yoshitaka Aono, Takahiro Ukai, Takanao Ebisawa, Kazuya Niwa, Takayuki Konno
  • Publication number: 20230364119
    Abstract: There are provided an autophagy activator comprising, as an active ingredient, an inositol derivative in which a saccharide is bound to inositol, and a composition for activating autophagy comprising the autophagy activator and a pharmaceutically acceptable carrier.
    Type: Application
    Filed: September 17, 2021
    Publication date: November 16, 2023
    Applicant: Resonac Corporation
    Inventor: Yuko NAKAGAMI
  • Patent number: 11815437
    Abstract: A method of acquiring a sample for evaluation of a SiC single crystal, comprising: a step of cutting a SiC ingot in a radial direction at a thickness position, which is located in a range from a curved surface which forms a distal end surface in a crystal growth direction to a seed crystal, to obtain a head member which includes the curved surface, wherein the SiC ingot used in the step is a SiC ingot in which SiC thereof is crystal-grown from a seed crystal along a c axis direction; and a step of polishing a silicon surface of the head member to obtain a sample for evaluation.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: November 14, 2023
    Assignee: Resonac Corporation
    Inventor: Shunsuke Noguchi
  • Patent number: 11814749
    Abstract: The present invention provides a single crystal growth crucible and a single crystal growth method which can suppress the recrystallization of the raw material gas which has been sublimated on the surface of the raw material and can suppress the generation of different polytypes in single crystal growth. The single crystal growth crucible includes an inner bottom, a crystal mounting part, and a deposition preventing member, wherein a raw material is provided in the inner bottom, the crystal mounting part faces the inner bottom, the deposition preventing member has a first surface comprising metal carbide, a first surface is disposed to face the crystal mounting part, the deposition preventing member is disposed in a central area of the inner bottom in a plan view from the crystal mounting part, and the first surface is disposed in accordance with the position of the surface of the raw material.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: November 14, 2023
    Assignee: Resonac Corporation
    Inventor: Yohei Fujikawa
  • Patent number: 11814568
    Abstract: An aspect of the present invention is an anisotropic thermal conductive resin member including a plurality of bundled thermoplastic resin stretch fibers.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: November 14, 2023
    Assignees: RESONAC CORPORATION, THE UNIVERSITY OF TOKYO
    Inventors: Yoshitaka Takezawa, Masahiro Nomura
  • Patent number: 11814548
    Abstract: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, a cationic compound, and a liquid medium, in which a zeta potential of the abrasive grains is positive and a weight average molecular weight of the cationic compound is less than 1000.
    Type: Grant
    Filed: September 30, 2021
    Date of Patent: November 14, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Tomohiro Iwano, Takaaki Matsumoto, Tomoyasu Hasegawa