Patents Assigned to Rigaku Corporation
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Publication number: 20240133829Abstract: A processing apparatus, a system, a method and a program for applying non-negative matrix factorization to one or more measured profiles of X-ray powder diffraction based on known information are provided. A processing apparatus for applying non-negative matrix factorization to a measured profile of X-ray powder diffraction comprises a measured profile acquiring section for acquiring one or more measured profiles, a known information acquiring section for acquiring known information including a shape of a predetermined profile corresponding to a background or a predetermined substance included in the measured profile, or a restriction of a coefficient matrix of the predetermined profile, and a decomposition section for applying non-negative matrix factorization to the measured profile based on the known information.Type: ApplicationFiled: October 12, 2023Publication date: April 25, 2024Applicant: Rigaku CorporationInventors: Takumi OTA, Norihiro MUROYAMA, Akihiro HIMEDA
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Publication number: 20240120036Abstract: A processing apparatus for processing a structure factor including total scattering data and data of a structural model are provided comprises a structure factor acquiring section for acquiring a first structure factor based on measured total scattering data; a data converting section for separating the first structure factor into a short-range correlation and a long-range correlation; and a scattering intensity calculating section for acquiring a structural model indicating an atomic arrangement in a finite region, calculating a short-range scattering intensity of the structural model and calculating a second structure factor from the short-range scattering intensity and the long-range correlation.Type: ApplicationFiled: September 28, 2023Publication date: April 11, 2024Applicant: Rigaku CorporationInventors: Masatsugu YOSHIMOTO, Kazuhiko OMOTE, Kazuki ITO
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Patent number: 11942231Abstract: An airtight apparatus in which an airtight box (30) for measurement is combined with a glove box (20) is provided. The airtight box (30) for measurement includes a hollow housing (31), and a sample stage (34) having a sample loading portion. The sample stage (34) is transported by a transport stage (35) installed in the housing (31). The housing (31) is provided with a measurement window (40) for measuring a sample loaded on the sample stage (34) from the outside by a measurement apparatus (10).Type: GrantFiled: November 17, 2020Date of Patent: March 26, 2024Assignee: RIGAKU CORPORATIONInventors: Koichiro Ito, Tetsuya Ozawa, Takeshi Ozawa
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Publication number: 20240077396Abstract: A configuration is provided in which outside air is taken as a carrier gas into a carrier gas flow path (A, B). A CO2 sensor (specific gas detection sensor) (71) for detecting a CO2 gas desorbed from a sample is installed in a component gas detector (70). A CO2 sensor (air-containing specific gas detection sensor) (54) for detecting a CO2 gas contained in air taken into the carrier gas flow path by a blower fan (51) is installed separately. A CO2 gas detection amount detected by the air-containing specific gas detection sensor (54) is subtracted from a CO2 gas detection amount detected by the specific gas detection sensor (71) to calculate a detection amount of the CO2 gas desorbed from the sample.Type: ApplicationFiled: September 1, 2023Publication date: March 7, 2024Applicant: RIGAKU CORPORATIONInventor: Koichiro Noritake
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Patent number: 11921065Abstract: An exclusion module (21) is configured to calculate a coating amount of each component whose measurement element is not contained in the base layers, for each of corresponding measurement lines, on an assumption that that component solely makes up the thin film and to adopt a maximum coating amount as an initial value of the coating amount of that component; and to calculate a coating amount of each component whose measurement element is contained in the base layers, for each of corresponding measurement lines, on the basis of initial values of coating amounts of individual components whose measurement elements are not contained in the base layers, if calculation results for all the corresponding measurement lines give errors, to exclude that component from analysis targets as an unquantifiable component, and in other cases, to adopt a maximum coating amount as an initial value of the coating amount of that component.Type: GrantFiled: September 10, 2021Date of Patent: March 5, 2024Assignee: Rigaku CorporationInventors: Shinya Hara, Yasujiro Yamada, Kenji Kodama, Makoto Doi
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Patent number: 11921060Abstract: A sample holder unit for a single-crystal X-ray structure analysis apparatus that quickly, surely and easily performs structure analysis with a crystalline sponge, the structure analysis inclusive of an operation of attaching a sample soaked in the crystalline sponge thereto, even if having no specialized knowledge, is provided. There are provided a sample holder, and an applicator comprising an opening 302 and a storing space in which the sample holder is stored, and a pull-out prevention part that selectively prevents and releases the sample holder stored in the storing space from being pulled out from the opening 302, wherein the pull-out prevention part comprises an operation part that releases pull-out prevention thereof in a state where the sample holder stored in the applicator is attached to the goniometer.Type: GrantFiled: November 21, 2019Date of Patent: March 5, 2024Assignee: Rigaku CorporationInventor: Takashi Sato
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Publication number: 20240068876Abstract: A thermal analysis apparatus includes circuitry for displaying a graph of the thermal analysis data relating to temperature or time on a display displaying a sample image on the display, generating color information data of range and type selected from the sample image, displaying a graph of the color information data relating to temperature or time side by side with the graph of the thermal analysis data relating to temperature or time without superimposing both graphs on the display, and displaying a marker at an arbitrary point on one of the graphs and displaying a marker on others of the graphs at a point whose measurement time is synchronized with the point where the marker is displayed.Type: ApplicationFiled: August 17, 2023Publication date: February 29, 2024Applicant: Rigaku CorporationInventors: Koichiro NORITAKE, Yoshinobu HOSOI
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Patent number: 11913891Abstract: A structure for pressurization analysis includes a sample accommodating unit (10) for accommodating an all-solid-state battery (S) therein, and a pressurizing unit (30) having a pressurizing mechanism for causing pressure to act on the all-solid-state battery (S). The all-solid-state battery (S) is pressurized inside the sample accommodating unit (10) while being sandwiched between a pressure receiving member (21) and a pressing member (22). Further, an X-ray window (14) is provided in an outer radial direction orthogonal to an acting direction of the pressure from the pressurizing unit (30), and reflection type X-ray diffraction measurement can be performed through the X-ray window (14).Type: GrantFiled: September 23, 2021Date of Patent: February 27, 2024Assignee: RIGAKU CORPORATIONInventor: Koichiro Ito
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Patent number: 11885754Abstract: A tolerance error estimating apparatus, method, program, reconstruction apparatus and control apparatus capable of estimating a deviation of a drive axis from a reference position with respect to driving time are provided. A tolerance error estimating apparatus (processing apparatus 300) X-ray analysis apparatus comprises a specific position calculating section 320 for obtaining a specific position of a reference sample at each rotation driving time from X-ray detection images and a deviation amount calculating section 330 for calculating the deviation amount ?x in the x direction and ?y in the y direction of the center position of a rotation drive shaft as the rotation drive axis at each rotation driving time from the reference position based on the specific position, when the z direction of the orthogonal coordinate system fixed to the sample is set the direction parallel to the rotation drive axis.Type: GrantFiled: March 24, 2022Date of Patent: January 30, 2024Assignee: Rigaku CorporationInventor: Takumi Ota
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Patent number: 11885753Abstract: An imaging type X-ray microscope capable of enlarging a numerical aperture even with high energy X-rays and acquiring a magnified image with sufficient intensity even in a laboratory. The imaging type X-ray microscope comprises an X-ray irradiation unit having a microfocal and high-power X-ray source and a condenser mirror for focusing and irradiating the emitted X-rays toward a sample, a sample holding unit for holding the sample, a reflecting mirror type X-ray lens unit for imaging X-rays transmitted through the sample, and an imaging unit for acquiring the imaged X-ray image, wherein each mirror constituting the condenser mirror and the reflecting mirror type X-ray lens unit has a reflecting surface formed with a multilayer film having a high reflectivity in X-rays of a specific wavelength.Type: GrantFiled: October 14, 2021Date of Patent: January 30, 2024Assignee: Rigaku CorporationInventors: Kazuhiko Omote, Raita Hirose, Shuichi Kato, Yuriy Platonov
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Publication number: 20240027373Abstract: A sample holder unit used for a single-crystal X-ray structure analysis apparatus, the sample holder unit comprising a sample holder for being attached to a goniometer in the single-crystal X-ray structure analysis apparatus, and an applicator that stores the sample holder, wherein the sample holder comprises a holding part that holds a porous complex crystal capable of soaking a sample in a plurality of fine pores formed therein, and the applicator comprises a space for soaking the sample in the porous complex crystal of the sample holder, wherein the applicator comprises a space for soaking the sample in the porous complex crystal of the sample holder, wherein the porous complex crystal is soaked only in a preserving solvent in the space.Type: ApplicationFiled: August 4, 2023Publication date: January 25, 2024Applicant: Rigaku CorporationInventor: Takashi SATO
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Patent number: 11879857Abstract: A single-crystal X-ray structure analysis system capable of surely and easily performing a precise step of soaking a very small amount of a sample in a framework of a fine crystalline sponge, is provided. There are provided a soaking apparatus 500 and a single-crystal X-ray structure analysis apparatus, the single-crystal X-ray structure analysis apparatus comprising a sample holder that holds a sample, the sample holder comprising a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein; a goniometer that rotationally moves, the goniometer to which the sample holder is attached; an X-ray irradiation section that irradiates the X-rays from the X-ray source to the sample held by the sample holder attached to the goniometer; wherein the soaking apparatus 500 soaks the sample in the porous complex crystal of the sample holder.Type: GrantFiled: November 21, 2019Date of Patent: January 23, 2024Assignee: Rigaku CorporationInventor: Takashi Sato
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Publication number: 20240019385Abstract: A user-friendly single-crystal X-ray structure analysis apparatus for quickly performing a single-crystal X-ray structure analysis using a crystalline sponge and easily making it possible by including managing related information and a method therefor, are provided. There are provided a sample holder comprising a porous complex crystal capable of soaking a sample in a plurality of fine pores formed therein; a goniometer that rotationally moves, the sample holder being attached to the goniometer; an information acquisition section 600 that acquires invariable information about the porous complex crystal or variable information provided after the sample is soaked therein; and an information storage section 111 that stores the invariable information or the variable information acquired by the information acquisition section 600.Type: ApplicationFiled: August 13, 2023Publication date: January 18, 2024Applicant: Rigaku CorporationInventor: Takashi SATO
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Patent number: 11874204Abstract: A user-friendly single-crystal X-ray structure analysis apparatus for quickly performing a single-crystal X-ray structure analysis using a crystalline sponge and easily making it possible by including managing related information and a method therefor, are provided. There are provided a sample holder comprising a porous complex crystal capable of soaking a sample in a plurality of fine pores formed therein; a goniometer that rotationally moves, the sample holder being attached to the goniometer; an information acquisition section 600 that acquires invariable information about the porous complex crystal or variable information provided after the sample is soaked therein; and an information storage section 111 that stores the invariable information or the variable information acquired by the information acquisition section 600.Type: GrantFiled: November 21, 2019Date of Patent: January 16, 2024Assignee: Rigaku CorporationInventor: Takashi Sato
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Patent number: 11874238Abstract: User-friendly single-crystal X-ray structure analysis apparatus and method for quickly performing a single-crystal X-ray structure analysis using a crystalline sponge and enabling the analysis including management of related information, and a sample holder and an applicator therefor are provided. There are provided a single-crystal X-ray structure analysis apparatus that performs a structure analysis of a material is provided, the apparatus comprising a sample holder that comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein and that holds the sample; a goniometer that rotationally moves with the sample holder 250 being attached; and an information acquisition section 600 that acquires information about the porous complex crystal.Type: GrantFiled: November 21, 2019Date of Patent: January 16, 2024Assignee: Rigaku CorporationInventor: Takashi Sato
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Patent number: 11867646Abstract: Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.Type: GrantFiled: November 1, 2021Date of Patent: January 9, 2024Assignee: RIGAKU CORPORATIONInventors: Makoto Kambe, Kazuhiko Omote, Toshifumi Higuchi, Tsutomu Tada, Hajime Fujimura, Masahiro Nonoguchi, Licai Jiang, Boris Verman, Yuriy Platonov
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Publication number: 20240005569Abstract: A system that can reduce the cost for correcting artifacts due to motion in the reconstruction of CT images includes acquiring the temporarily corrected projection image and determining the reference center position correction function and the parameter of the temporary reference center position correction function by calculating a degree of coincidence between the temporarily corrected projection image and the projection image at the imaging angle opposing thereto, and correcting the main imaging data or the projection image based on the main imaging data using the reference center position correction function and the relative motion correction function.Type: ApplicationFiled: June 30, 2023Publication date: January 4, 2024Applicant: Rigaku CorporationInventors: Shota TAGUCHI, Takumi OTA
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Patent number: 11852597Abstract: A measured pattern acquisition unit acquires a measured X-ray scattering pattern of a sample containing a target substance and another known mixed substance. A known pattern acquisition unit acquires a known X-ray scattering pattern of the other known mixed substance. A crystalline pattern acquisition unit at least partially acquires an X-ray diffraction pattern of a crystalline portion included in the target substance. A crystalline integrated intensity calculation unit calculates an integrated intensity for the acquired X-ray diffraction pattern of the crystalline portion. A target substance integrated intensity calculation unit calculates an integrated intensity for an X-ray scattering pattern of the target substance. A degree-of-crystallinity calculation unit calculates a degree of crystallinity of the target substance based on the integrated intensity for the X-ray diffraction pattern of the crystalline portion and the integrated intensity for the X-ray scattering pattern of the target substance.Type: GrantFiled: June 6, 2022Date of Patent: December 26, 2023Assignee: RIGAKU CORPORATIONInventor: Hideo Toraya
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Patent number: 11846594Abstract: It is enabled to surely attach a sample holder to a goniometer head with good reproducibility in a relatively easy manner, the sample holder holding a porous complex crystal where a single-crystal is soaked. There is provided a single-crystal X-ray structure analysis apparatus that performs a structure analysis of a material, the apparatus comprising a goniometer having a goniometer head 514 to which a sample holder 310 is attached, the sample holder holding a porous complex crystal where a sample is soaked; an X-ray irradiation section that irradiates the X-rays to the porous complex crystal whose position is adjusted with the goniometer head 514, wherein a positioning portion for positioning the sample holder 310 to be attached is formed on a surface of the goniometer head 514, the sample holder 310 being attached onto the surface.Type: GrantFiled: November 21, 2019Date of Patent: December 19, 2023Assignee: Rigaku CorporationInventor: Takashi Sato
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Patent number: 11841334Abstract: A quantitative phase analysis device includes: a unit for acquiring a powder diffraction pattern of the sample; a unit for acquiring information on a plurality of crystalline phases; a unit for acquiring a fitting function for each of the plurality of crystalline phases; a unit for executing whole-powder pattern fitting for the powder diffraction pattern by using the acquired fitting functions, to thereby acquire a fitting result; and a unit for calculating a weight ratio of the plurality of crystalline phases based on the fitting result. Each fitting function is selected from the group consisting of a first fitting function using an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function using an integrated intensity obtained by observation or calculation, and a third fitting function using a profile intensity obtained by observation or calculation.Type: GrantFiled: February 10, 2020Date of Patent: December 12, 2023Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Norihiro Muroyama