Abstract: An airtight apparatus in which an airtight box (30) for measurement is combined with a glove box (20) is provided. The airtight box (30) for measurement includes a hollow housing (31), and a sample stage (34) having a sample loading portion. The sample stage (34) is transported by a transport stage (35) installed in the housing (31). The housing (31) is provided with a measurement window (40) for measuring a sample loaded on the sample stage (34) from the outside by a measurement apparatus (10).
Abstract: Provided is a substrate contamination analysis system capable of individually analyzing impurities present in a film and impurities present on a surface of the film. The substrate contamination analysis system includes: a vapor phase decomposition device configured to expose a film formed on a surface of a first substrate to a gas that reacts with the film, to thereby dissolve the film; a recovery device configured to perform a first recovery operation of moving an object to be measured to a first measurement position before the film is dissolved and a second recovery operation of moving the object to be measured to a second measurement position after the film is dissolved; and an analyzer configured to analyze the object to be measured every time the recovery device performs the first recovery operation and the second recovery operation.
Abstract: Provided is an X-ray signal processor and an X-ray spectrometer that are configured to measure X-rays and, at the same time, accurately detect, with a simple method, the degree of performance degradation of a semiconductor detector. The X-ray signal processor includes: a semiconductor detector configured to generate a charge corresponding to energy of detected X-rays; a preamplifier configured to output a ramp voltage signal corresponding to the generated charge; a counter configured to count the X-rays for each voltage change amount due to the charge based on the ramp voltage signal; and a judgment part configured to determine whether the semiconductor detector has been degraded based on a first voltage change evaluation value corresponding to a total sum of products of the voltage change amount and an occurrence frequency thereof, and a second voltage change evaluation value corresponding to an increase amount of the ramp voltage signal.
Abstract: There are provided a storage section 220 that stores an output value read out by counting a pulse signal of incident X-rays, by a photon-counting type semiconductor detector; and a calculation section 230 that calculates a count value based on the output value that has been read out, wherein the calculation section 230 uses a model in which an apparent time constant of the pulse signal monotonously decreases against increase in pulse detection ratio with respect to exposure. According to such a model, the corresponding apparent time constant is able to be obtained even in any higher count rate. As a result of this, reduced can be the influence of count loss even on the count rate that has not been able to be covered by the conventional method.
Abstract: Provided is a fluorescent X-ray analysis apparatus, including: a collecting portion configured to drop a liquid droplet onto a substrate having an object to be measured on a surface thereof and move the dropped liquid droplet on the surface of the substrate to collect the object to be measured into the liquid droplet; a drying portion configured to dry the liquid droplet so that the object to be measured is held onto the surface of the substrate; an analysis portion configured to irradiate the object to be measured with an X-ray and perform quantitative analysis of an element contained in the object to be measured based on a fluorescent X-ray output from the object to be measured; a beam sensor configured to emit a laser having a band shape for detecting an amount of the liquid droplet separated from the collecting portion before the liquid droplet is dried after the object to be measured is collected; and a calculating portion configured to calculate a correction coefficient for correcting the amount of the
Abstract: Provided is an X-ray analysis system with which it is possible to set appropriate conditions for vapor phase decomposition with ease. The X-ray analysis system includes an X-ray spectrometer and a vapor phase decomposition apparatus. The X-ray spectrometer includes: an X-ray source configured to irradiate a measurement sample having a thin film present on its surface with primary X-rays; a detector configured to measure an intensity of reflected X-rays, or an intensity of fluorescent X-rays; and a calculation unit configured to calculate a film thickness or a coating mass of the thin film based on the intensity of the reflected X-rays or the fluorescent X-rays. The vapor phase decomposition apparatus includes: a vapor phase decomposition portion configured to perform vapor phase decomposition on the thin film; and a control portion configured to determine a vapor phase decomposition time based on the film thickness or the coating mass.
Abstract: This fluorescent X-ray analysis apparatus is provided with an X-ray irradiation unit 20 for irradiating a sample S with: X-rays, having an energy that exceeds the energy absorption edge value of Ag which is selected as a measurement target element, and that is no greater than the energy absorption edge value of Sn which is an adjacent element having a higher energy absorption edge value than Ag; and X-rays having an energy exceeding the energy absorption edge value of Sn which is selected as a measurement target element.
Abstract: A hybrid inspection system of the present invention is an inspection system including a first inspection device (1) for inspecting a sample (11) based on X-ray measurement data obtained by irradiating the sample (11) with X-rays, and a second inspection device (2) for inspecting the sample (11) by a measuring method using no X-rays. The X-ray measurement data obtained by the first inspection device or an analysis result of the X-ray measurement data is output to the second inspection device (2). In the second inspection device (2), the structure of the sample (11) is analyzed by using the X-ray measurement data input from the first inspection device (1) or the analysis result of the X-ray measurement data.
July 14, 2017
Date of Patent:
April 20, 2021
Kiyoshi Ogata, Kazuhiko Omote, Yoshiyasu Ito
Abstract: An X-ray analysis assistance device with an input and operation device 24 for arbitrarily inputting and setting the value of one from among the distance L between a sample S and a two-dimensional detector 2 and the maximum detection range Xmax for X-rays scattered or diffracted by the sample S, and a central processing unit 20 for automatically setting the other setting item on the basis of the value of the one setting item set by the input and operation device 24. Further, the maximum measurement frame Hmax for the X-rays is displayed on a display screen 22 of a display device 21 on the basis of the distance L and maximum detection range Xmax. Additionally, an X-ray detection area A indicating the range within which it is possible for the detection surface of the two-dimensional detector 2 to detect X-rays is displayed on the display screen 22 of the display device 21.
Abstract: There is provided an X-ray measurement apparatus (X-ray diffractometer 2) constituting a measurement system of X-ray analysis from a plurality of components, the X-ray measurement apparatus comprising an apparatus body directly or indirectly attaching each of target components and each of non-target components; each of the target components (selection slit 41) to be attached, the type of the attached target component being recognized by the apparatus body, and each of the non-target components to be attached, the type of the attached non-target component not being recognized by the apparatus body a measurement category; and an indicator (indicator 41a for the selection slit) that indicates whether attachment of each of the target components is appropriate for a measurement category.
Abstract: An X-ray diffraction apparatus having a solar slit, and a method for preventing the diffraction image on a detector from spreading in the in-plane direction even when an X-ray irradiation region spreads over the sample surface due to measurement by GIXD, thereby allowing for measurement with a short measurement time and a high resolution. The soller slit 100 includes a plurality of metallic thin plates 110, each being perpendicular to the bottom surface, which are arcuately arranged with a predetermined angular interval between each other so as to pass X-rays in a radiating direction from a particular focus, the soller slit being provided to be used at a position through which X-rays diffracted on a sample surface pass, the particular focus being the center of a goniometer circle, the X-rays being irradiated on a sample at an angle for GIXD.
October 24, 2018
Date of Patent:
March 30, 2021
Ladislav Pina, Adolf Inneman, Kazuhiko Omote, Shintaro Kobayashi
Abstract: Provided are an operation guide system, an operation guide method, and an operation guide program, which are capable of allowing a user to easily understand measurement of an X-ray optical system to be selected. A quantitative phase analysis device includes qualitative phase analysis result acquisition means for acquiring information on a plurality of crystalline phases contained in a sample, and weight ratio calculation means for calculating a weight ratio of the plurality of crystalline phases based on a sum of diffracted intensities corrected with respect to a Lorentz-polarization factor, a chemical formula weight, and a sum of squares of numbers of electrons belonging to each of atoms contained in a chemical formula unit, in the plurality of crystalline phases.
Abstract: An X-ray fluorescence spectrometric system includes: a job execution unit configured to execute a job; a storage unit configured to store in advance a time required for each of operations in association with the each of the operations; a calculation unit configured to calculate, when the job is generated, a time to be taken until execution of the job is completed, for each job based on the time stored in the storage unit; and a control unit configured to newly store, when the job is executed, a time taken for the operation in the storage unit in association with the operation. The calculation unit is configured to further calculate, when the job is executed, the time to be taken until the execution of the job is completed, based on the time newly stored in the storage unit.
Abstract: A wavelength dispersive X-ray fluorescence spectrometer includes a single one-dimensional detector (10) having detection elements (7) arranged linearly, and includes a detector position change mechanism (11) for setting a position of the one-dimensional detector (10) to either a parallel position at which an arrangement direction of the detection elements (7) is parallel to a spectral angle direction of a spectroscopic device (6) or an intersection position at which the arrangement direction intersects the spectral angle direction. At the parallel position, a receiving surface of the one-dimensional detector (10) is located at a focal point of focused secondary X-rays (42). At the intersection position, a receiving slit (9) is disposed at the focal point of the focused secondary X-rays (42), and the receiving surface is located at a traveling direction side of the focused secondary X-rays (42) farther from the spectroscopic device (6) than the receiving slit (9).
Abstract: An X-ray inspection device of the present invention includes a sample placement unit 11 for placing a sample as an inspection target therein, a sample placement unit positioning mechanism 30 for moving the sample placement unit 11, a goniometer 20 including first and second rotation members 22, 23 that rotate independently of each other, an X-ray irradiation unit 40 installed on the first rotation member 22, and a two-dimensional X-ray detector 50 installed on the second rotation member 23. The sample placement unit positioning mechanism 30 includes a ? rotation mechanism 35 for rotating the sample placement unit 11 and a ?-axis about a ?-axis that is orthogonal to a ?s-axis and a ?d-axis at a measurement point P and extends horizontally.
Abstract: A sample holder (10) filled with a sample is held in a base member (20), and an airtight member (30) is mounted on the base member (20) so as to cover the surroundings of the sample holder (10), thereby forming a sample holding structure in a closed space. The airtight member (30) includes a fitting portion (35) which is configured to be fitted and mounted in a mounting portion (21).
Abstract: An X-ray fluorescence analysis method according to an FP method uses a predefined theoretical intensity formula in a standard sample theoretical intensity calculation step for obtaining a sensitivity constant and in an unknown sample theoretical intensity calculation step during iterative calculation. In the formula, only in an absorption term relating to absorption of X-rays, a mass fraction of each component is normalized so that a sum of the mass fractions of all components becomes 1.
Abstract: Provided are a signal processing device for X-ray analysis and an adjustment method for a signal processing device for X-ray analysis, which are capable of performing correction of a time constant with high precision and simply and quickly performing adjustment work required for performing the correction. The signal processing device for X-ray analysis includes: a differentiating circuit configured to use a first time constant to convert a signal output from an X-ray detector into an analog differential wave; an AD converter configured to convert the analog differential wave into a digital differential wave; a waveform shaping digital filter configured to use a second time constant to shape the digital differential wave; and a histogram generation unit configured to acquire a feature value of a shaped waveform based on pulse heights in two regions of the shaped waveform, to generate a histogram representing an acquisition frequency for each feature value.
Abstract: An X-ray diffraction apparatus including an X-ray detector that is configured to detect diffracted X-rays diffracted from a sample when a surface of the sample is irradiated with X-rays, a counter arm which rotates around a rotation center axis set within the surface of the sample while the X-ray detector is installed on the counter arm, and a plate-like X-ray shielding member that is installed on the counter arm and rotated together with the X-ray detector.
Abstract: An X-ray generator comprising a target for receiving electrons and generating X-rays, a separator for dividing an internal space of the target into a coolant inflow path and a coolant outflow path, a motor for rotating the target, and a coolant inflow path and a coolant outflow path for supplying a coolant to the coolant inflow path and recovering the coolant through the coolant outflow path, wherein the separator rotates in the same rotation direction as the target when the target rotates. In the X-ray generator in which a coolant inflow path and a coolant outflow path are provided by a separator inside a rotating target, reduced torque load and reduced vibration can be realized.