Patents Assigned to Rohm and Haas Electronic Materials, LLC
  • Environmentally friendly nickel electroplating compositions and methods
    Patent number: 10458032
    Abstract: Environmentally friendly nickel electroplating compositions enable the electroplating of nickel deposits which are bright and uniform and inhibit corrosion of gold layers deposited on the bright and uniform nickel deposits. The environmentally friendly nickel electroplating compositions can be used to electroplate bright and uniform nickel deposits on various substrates over a wide current density range.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: October 29, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Michael Lipschutz
  • Polymeric charge transfer layer and organic electronic device containing the same
    Patent number: 10454036
    Abstract: The present invention relates to a polymeric charge transfer layer comprising a polymer and a p-dopant. The polymer comprises as polymerized units, Monomer A, Monomer B, and Monomer C crosslinking agent. The present invention further relates to an organic electronic device, especially an organic light emitting device containing the polymeric charge transfer layer.
    Type: Grant
    Filed: January 8, 2015
    Date of Patent: October 22, 2019
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials Korea Ltd., Rohm and Haas Electronic Materials LLC
    Inventors: Liam P. Spencer, Hong-Yeop Na, Yoo-Jin Doh, Chun Liu, Minrong Zhu, Jichang Feng, Zhengming Tang, Shaoguang Feng, Kenneth L. Kearns, Jr., Timothy De Vries, Sukrit Mukhopadhyay, John W. Kramer, Peter Trefonas, III, David D. Devore, William H. H. Woodward
  • Metal plating compositions
    Patent number: 10435380
    Abstract: Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: October 8, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Lingli Duan, Chen Chen, Shaoguang Feng, Zukhra I. Niazimbetova, Maria Anna Rzeznik
  • Indium electroplating compositions containing amine compounds and methods of electroplating indium
    Patent number: 10428436
    Abstract: Indium electroplating compositions containing amine compounds in trace amounts to electroplate substantially defect-free uniform indium which has a smooth surface morphology. The indium electroplating compositions can be used to electroplate indium metal on metal layers of various substrates such as semiconductor wafers and as thermal interface materials.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: October 1, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Yi Qin, Kristen Flajslik, Mark Lefebvre
  • Photo-elastic compensation of thin glass sheets
    Patent number: 10399893
    Abstract: A coated glass substrate. The coated glass substrate comprises a glass sheet having a thickness from 0.1 to 0.7 mm and coated on a first side with a first optical layer having a positive photo-elastic constant and coated on a second side with a second optical layer having a negative photo-elastic constant.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: September 3, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Company, Dow Global Technologies LLC
    Inventors: Shih-Wei Chang, Lanfang Li, Kathleen M. O'Connell, Weijun Zhou
  • Aromatic resins for underlayers
    Patent number: 10377848
    Abstract: Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
    Type: Grant
    Filed: April 7, 2016
    Date of Patent: August 13, 2019
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Seon-Hwa Han, Sung Wook Cho, Hae-Kwang Pyun, Jung-June Lee, Shintaro Yamada
  • Purification methods
    Patent number: 10370320
    Abstract: Provided are purification methods, comprising: (a) providing an organic solvent and a phenolic peroxide formation inhibitor, wherein the organic solvent has a first boiling point at standard atmospheric pressure (bp1) and the phenolic peroxide formation inhibitor has a second boiling point at standard atmospheric pressure (bp2) that satisfy the following inequality (I): bp2?(1.10)(bp1)??(I); and (b) heating the organic solvent and the phenolic peroxide formation inhibitor to a temperature causing the organic solvent and phenolic peroxide formation inhibitor to vaporize, and (ii) condensing the vaporized organic solvent and peroxide formation inhibitor to provide a purified mixture of the organic solvent and peroxide formation inhibitor. The methods find particular use in the purification of solvents that are useful in process chemicals for the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: August 6, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Andrey Rudenko, Gerhard Pohlers
  • Coating compositions for use with an overcoated photoresist
    Patent number: 10365562
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: July 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, Vipul Jain, Suzanne Coley, Anthony Zampini
  • Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
    Patent number: 10359698
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: July 23, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Doping of a substrate via a dopant containing polymer film
    Patent number: 10340144
    Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a copolymer, a dopant precursor and a solvent on a substrate; where the copolymer is capable of phase segregating and embedding the dopant precursor while in solution; and annealing the substrate at a temperature of 750 to 1300° C. for 0.1 second to 24 hours to diffuse the dopant into the substrate. Disclosed herein too is a semiconductor substrate comprising embedded dopant domains of diameter 3 to 30 nanometers; where the domains comprise Group 13 or Group 15 atoms, wherein the embedded spherical domains are located within 30 nanometers of the substrate surface.
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: July 2, 2019
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, DOW GLOBAL TECHNOLOGIES, LLC, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Rachel A. Segalman, Peter Trefonas, III, Bhooshan C. Popere, Andrew T. Heitsch
  • Photoacid generator
    Patent number: 10317795
    Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: June 11, 2019
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: William Williams, III, Emad Aqad, James F. Cameron
  • SALTS AND PHOTORESISTS COMPRISING SAME
    Publication number: 20190163055
    Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
    Type: Application
    Filed: November 29, 2018
    Publication date: May 30, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, James F. Cameron, James W. Thackeray
  • Oxygen substituted benzoclobutenes derived compositions for electronic devices
    Patent number: 10297755
    Abstract: The invention provides compositions comprising BCB-functionalized materials for use in OLEDs applications. The inventive compositions can be used to form hole-transporting materials for use in electroluminescent devices. In particular, the invention provides for compositions, charge transport film layers, and light emitting devices, comprising, or formed from, a polymer, which comprises one or more polymerized units derived from Structure (A).
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: May 21, 2019
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Liam P. Spencer, Nolan T. McDougal, Peter Trefonas, III, David D. Devore
  • Photoresists and methods of use thereof
    Patent number: 10295910
    Abstract: New photoresist are provided that comprises a low-Tg component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride and other inorganic surfaces.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: May 21, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Gerhard Pohlers
  • Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
    Patent number: 10294359
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer comprising a polymer wherein the surface tension of the polymer with the first polymer and the surface tension of the polymer with the second polymer are both lower than the surface tension between the first polymer and second polymer; where the additive polymer comprises a reactive functional moiety that forms a bond or a complex or a coordinate with the substrate upon being disposed on the substrate; where the reactive functional moiety is unreacted when it is a part of the composition; and a solvent.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: May 21, 2019
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Phillip D. Hustad, Jieqian Zhang, Peter Trefonas, III
  • Stable electroless copper plating compositions and methods for electroless plating copper on substrates
    Patent number: 10294569
    Abstract: A specific cysteine derivative is added to electroless copper plating compositions to improve the stability of the electroless copper plating compositions such that the plating activity of the electroless plating copper compositions is not compromised even when electroless plating at low plating temperatures and high stabilizer and high leached catalyst concentrations.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: May 21, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Alejo M. Lifschitz Arribio, Donald E. Cleary
  • Methods for manufacturing block copolymers and articles manufactured therefrom
    Patent number: 10287455
    Abstract: Disclosed herein is an article comprising a substrate; upon which is disposed a composition comprising: a first block copolymer that comprises a first block and a second block; where the first block has a higher surface energy than the second block; a second block copolymer that comprises a first block and a second block; where the first block of the first block copolymer is chemically the same as or similar to the first block of the second block copolymer and the second block of the first block copolymer is chemically the same as or similar to the second block of the second block copolymer; where the first and the second block copolymer have a chi parameter greater than 0.04 at a temperature of 200° C.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: May 14, 2019
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold
  • SILSESQUINOXANE MODIFIED TiO2 SOL
    Publication number: 20190136086
    Abstract: A silsesquinoxane modified TiO2 sol, a method of forming the TiO2 sol, a radiation curable composition comprising the TiO2 sol and cured material formed from the radiation curable composition are disclosed. The TiO2 sol is at least partially covered by silsesquinoxane and has high RI useful for an insulating layer on indium tin oxide (ITO) electrodes that provides transparency of the ITO electrodes.
    Type: Application
    Filed: May 27, 2016
    Publication date: May 9, 2019
    Applicants: DOW GLOBAL TECHNOLOGY LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Linfei WANG, Nan HU, Hongyu CHEN, Wanfu MA, Yu CAI, Mitsuru HAGA
  • Flux method for tin and tin alloys
    Patent number: 10273591
    Abstract: A flux composition which includes one or more organic compounds including one or more sulfonic acid groups, salts or anhydrides thereof is applied to tin or tin alloy deposits. The flux composition is then homogenized on the tin or tin alloy to inhibit tin or tin alloy oxidation and improve brightness of the tin or tin alloy.
    Type: Grant
    Filed: January 20, 2013
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Peter R. Levey
  • Acid generator compounds and photoresists comprising same
    Patent number: 10274825
    Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and photoresist compositions that comprise such compounds are provided. In another preferred aspect, acid generator compounds are provided that comprise one or more covalently linked acid-labile moieties, particularly ester-containing acid-labile moieties.
    Type: Grant
    Filed: September 16, 2013
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Paul J. LaBeaume