Patents Assigned to Rohm and Haas Electronic Materials, LLC
  • Zwitterionic photo-destroyable quenchers
    Patent number: 10042251
    Abstract: A photo-destroyable quencher having Formula (I): wherein in Formula (I), groups and variables are the same as described in the specification.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: August 7, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, James F. Cameron
  • Wet-strippable silicon-containing antireflectant
    Patent number: 10031420
    Abstract: Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: July 24, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, Charlotte Cutler, Mingqi Li, Shintaro Yamada, James Cameron
  • Arylcyclobutenes
    Patent number: 10030165
    Abstract: Arylclobutene-containing multi-functional monomers are useful in the preparation of arylcyclobutene-based polymer coatings. Compositions comprising one or more arylclobutene-containing multi-functional monomers and one or more oligomers comprising as polymerized units one or more arylcyclobutene monomer provide arylcyclobutene-based polymer coatings having reduced stress. Such compositions are useful in the manufacture of electronic devices.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: July 24, 2018
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Company
    Inventors: Duane R. Romer, Matthew M. Yonkey, Michael K. Gallagher, Kevin Y. Wang, Xiang Qian Liu, Raymond J. Thibault, Kim S. Ho, Gregory D. Prokopowicz, Corey O'Connor, Elissei Iagodkine, Robert K. Barr
  • Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
    Patent number: 10011713
    Abstract: Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; and an additive polymer; where the additive polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and where the additive polymer comprises a homopolymer that is the chemically and structurally the same as one of the polymers in the block copolymer or where the additive polymer comprises a random copolymer that has a preferential interaction with one of the blocks of the block copolymers.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: July 3, 2018
    Assignees: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Phillip D. Hustad, Peter Trefonas, III, Shih-Wei Chang
  • Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole compounds, bisepoxides and halobenzyl compounds
    Patent number: 10006136
    Abstract: Electroplating methods enable the plating of photoresist defined features which have substantially uniform morphology. The electroplating methods include copper electroplating baths with reaction products of imidazole compounds, bisepoxides and halobenzyl compounds to electroplate the photoresist defined features. Such features include pillars, bond pads and line space features.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: June 26, 2018
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Matthew Thorseth, Zuhra Niazimbetova, Yi Qin, Julia Woertink, Julia Kozhukh, Erik Reddington, Mark Lefebvre
  • Thermal acid generators and photoresist pattern trimming compositions and methods
    Patent number: 10007179
    Abstract: Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: June 26, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Cong Liu, Kevin Rowell, Gerhard Pohlers, Mingqi Li
  • Silicon-containing underlayers
    Patent number: 10007184
    Abstract: Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: June 26, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Li Cui, Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Shintaro Yamada, Mingqi Li, James F. Cameron
  • Photoresist pattern trimming methods
    Patent number: 9996008
    Abstract: Provided are methods of trimming photoresist patterns. The methods involve coating a photoresist trimming composition over a photoresist pattern, wherein the trimming composition includes a matrix polymer, a free acid having fluorine substitution and a solvent, the trimming composition being free of cross-linking agents. The coated semiconductor substrate is heated to cause a change in polarity of the resist polymer in a surface region of the photoresist pattern. The photoresist pattern is contacted with a developing solution to remove the surface region of the photoresist pattern. The methods find particular applicability in the formation of very fine lithographic features in the manufacture of semiconductor devices.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: June 12, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Cheng-Bai Xu
  • Polymers and photoresist compositions
    Patent number: 9983477
    Abstract: The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
    Type: Grant
    Filed: November 22, 2010
    Date of Patent: May 29, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Roger A. Nassar
  • BARREL PLATING OR HIGH-SPEED ROTARY PLATING USING A NEUTRAL TIN PLATING SOLUTION
    Publication number: 20180135195
    Abstract: A barrel plating or high-speed rotary plating method for electronic components, and a neutral tin plating solution used therein. A plating solution that includes (A) stannous ions, (B) an acid or a salt, (C) a complexing agent, and (D) a diamine that has a polyoxyalkylene chain, and that has a pH in a range between 4 and 8 is used. The use of this neutral tin plating solution prevents the electronic components from coupling together during the barrel plating, enabling an improvement in manufacturability in barrel plating.
    Type: Application
    Filed: October 11, 2017
    Publication date: May 17, 2018
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Makoto Kondo, Yoko Mizuno
  • Shielding coating for selective metallization
    Patent number: 9970114
    Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain polyamines and the top coat contains hydrophobic alky organic compounds.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: May 15, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Hung Tat Chan, Ka Ming Yip, Chit Yiu Chan, Kwok Wai Yee
  • Electron transport layer and film having improved thermal stability
    Patent number: 9972792
    Abstract: Aspects of the invention provide a composition having a blend of an electron transport material and an organo alkali-metal salt wherein the salt has a glass transition greater than 115° C. The organo-alkali metal salt may be selected from the group consisting of lithium 2-(2-pyridyl)phenolate (LiPP), lithium 2-(2?,2?-bipyridine-6?-yl)phenolate (LiBPP), 2-(isoquinoline-10-yl)phenolate (LiIQP), and lithium 2-(2-phenylquinazolin-4-yl)phenolate and lithium 2-(4-phenylquinazolin-2-yl)phenolate. In a preferred embodiment, the organo-alkali metal salt is lithium 2-(2?,2?-bipyridine-6?-yl)phenolate (LiBPP). Aspects of the invention also provide films and devices having a film layer prepared from the composition.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: May 15, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Timothy S. De Vries, Kenneth L. Kearns, Jr., Travis E. McIntire, Sukrit Mukhopadhyay, Peter Trefonas, III, William H. H. Woodward
  • Coating compositions for photoresists
    Patent number: 9958780
    Abstract: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: May 1, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Peter Trefonas, III, Michael K. Gallagher
  • Copolymer and associated layered article, and device-forming method
    Patent number: 9957339
    Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: May 1, 2018
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE UNIVERSITY OF QUEENSLAND
    Inventors: James W. Thackeray, Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker
  • Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of alpha amino acids and bisepoxides
    Patent number: 9932684
    Abstract: Electroplating methods enable the plating of photoresist defined features which have substantially uniform morphology. The electroplating methods include copper electroplating baths with reaction products of ?-amino acids and bisepoxides to electroplate the photoresist defined features. Such features include pillars, bond pads and line space features.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: April 3, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Matthew Thorseth, Zuhra Niazimbetova, Yi Qin, Julia Woertink, Joanna Dziewiszek, Erik Reddington, Mark Lefebvre
  • Nanostructure material methods and devices
    Patent number: 9927556
    Abstract: In one aspect, structures are provided that comprise (a) a one-dimensional periodic plurality of layers, wherein at least two of the layers have a refractive index differential sufficient to provide effective contrast; and (b) one or more light-emitting nanostructure materials effectively positioned with respect to the refractive index differential interface, wherein the structure provides a polarized output emission.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: March 27, 2018
    Assignees: The Board of Trustees of the University of Illinois, Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Brian Cunningham, Gloria G. See, Peter Trefonas, III, Jieqian Zhang, Jong Keun Park, Kevin Howard, Kishori Deshpande, Trevor Ewers
  • Tin or tin alloy plating liquid
    Patent number: 9926637
    Abstract: Tin or tin alloy plating liquid with a sufficient plated deposit can be formed in the opening without causing burns on the plated film surface or abnormal deposits, and which has a good via filling effect. When a specific ?, ?-unsaturated carbonyl compound is added into the tin or tin alloy plating liquid, the plating liquid with good via filling performance can be obtained, and the deposit which is substantially free of voids and burns or abnormal deposits on the deposit surface are reduced.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: March 27, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Hiroki Okada, Shenghua Li, Makoto Kondo
  • Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image
    Patent number: 9921475
    Abstract: A photoacid-generating compound has the structure where R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: March 20, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Emad Aqad, William Williams, III, Cong Liu
  • Increasing zinc sulfide hardness
    Patent number: 9914996
    Abstract: The hardness of zinc sulfide is increased by adding selective elements within a specified range to the crystal lattice of the zinc sulfide. The increased hardness over conventional zinc sulfide does not substantially compromise the optical properties of the zinc sulfide. The zinc sulfide may be used as a protective coating for windows and domes.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: March 13, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Jitendra S. Goela, Hangyao Wang, Hua Bai, Michael A. Pickering
  • Catalysts for electroless metallization containing five-membered heterocyclic nitrogen compounds
    Patent number: 9914115
    Abstract: Catalysts include five-membered nitrogen containing heterocyclic compounds as ligands for metal ions which have catalytic activity. The catalysts are used to electrolessly plate metal on metal clad and un-clad substrates.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: March 13, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kristen M. Milum, Donald E. Cleary, Maria A. Rzeznik