Patents Assigned to Rohm and Haas
  • Patent number: 9000057
    Abstract: The present invention addresses a need in the art by providing a composition comprising an aqueous dispersion of a binder and porous ion exchange resin particles that are functionalized with primary amine groups or secondary amine groups or both. The composition of the present invention provides an efficient way of removing aldehydes from or in the vicinity of a coating prepared from the composition.
    Type: Grant
    Filed: October 23, 2013
    Date of Patent: April 7, 2015
    Assignees: Rohm and Haas Company, Dow Global Technologies LLC
    Inventors: Sudhakar Balijepalli, Paul Doll, Alvin M. Maurice
  • Patent number: 8999451
    Abstract: The present invention relates to aqueous coating compositions having low gloss for floor polishes, finishes and sealer, as well as wall and floor paints and sealers. These aqueous coating compositions contain one or more water soluble poly(ethylene oxide) resins having the general formula [—CH2CH2O—]n and one or more polymer binders.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: April 7, 2015
    Assignee: Rohm and Haas Company
    Inventor: Theodore Tysak
  • Patent number: 8997775
    Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: April 7, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
  • Patent number: 9000078
    Abstract: The present invention is a composition comprising an aqueous dispersion of a binder and a salt of the following fluoroalkyl phosphonic acid: wherein n, q, and p are as described herein. The composition of the present invention is useful as a block additive in coating compositions.
    Type: Grant
    Filed: October 14, 2013
    Date of Patent: April 7, 2015
    Assignees: Dow Global Technologies LLC, Rohm and Haas Company
    Inventors: Andrew Hejl, Arkady L. Krasovskiy, Partha S. Majumdar, Mark R. Winkle
  • Patent number: 8993667
    Abstract: The present invention provides elastomeric roof coatings and aqueous coating compositions of (i) an acrylic emulsion copolymer that comprises (ii) a reductant and has a high molecular weight, (iii) a combination of a hydrophilic polymeric dispersant and a pigment, extender or filler, and (iv) a multivalent transition metal ion or multivalent transition metal ion compound or salt. The composition and coating provide excellent swelling resistance and a balance of tensile and elongation in an acrylic roof coating composition.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: March 31, 2015
    Assignee: Rohm and Haas Company
    Inventors: Joseph M. Rokowski, Mark D. Westmeyer
  • Patent number: 8993111
    Abstract: The present invention provides surface treated articles comprising a recoatable surface treatment of an acrylic or vinyl polymer that does not change the appearance of the treated surface, and which imparts blocking resistance and/or stain and dirt pickup resistance to the treated surface. The one or more acrylic or vinyl polymer has a number average molecular weight of from 1,000 to 100,000, a glass transition temperature of ?10° C. or higher, preferably, 30° C. or higher, and comprises the polymerization product of one or more non-ionic monomer, such as methyl methacrylate, with up to 47 wt. % of an ethylenically unsaturated acid monomer and, preferably, is non-migrating under use conditions. When dry, the surface treatments may form a layer of domains of polymer distributed all over the treated surface, rather than a film. Treated articles include coating or painted articles and elastomer films.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: March 31, 2015
    Assignee: Rohm and Haas Company
    Inventors: Bonnie E. Baker, Arnold S. Brownell, Nancy P. Buford, Willie Lau, Joseph J. Spanier
  • Publication number: 20150087723
    Abstract: A synergistic microbicidal composition containing: (a) at least one microbicide selected from the group consisting of isopropyl methyl phenols and monosubstituted phenols and (b) at least antimicrobial alcohol is selected from the class consisting of acyclic terpene alcohols.
    Type: Application
    Filed: December 5, 2012
    Publication date: March 26, 2015
    Applicant: ROHM AND HAAS COMPANY
    Inventors: Robert J. Cornmell, Megan A. Diehl, Stephen Golding, John R. Harp, Ian P. Stott, Katherine M. Thompson, Carol L. Truslow
  • Patent number: 8987350
    Abstract: The present invention relates to a coating composition, especially, relates to an aqueous coating composition with improved liquid stain repellency, it has a fraction of critical pigment volume concentration of from 35% to 110%, and comprises (i) pigment composition, including 15 wt. %-100 wt. %, in percentage by weight based on the dry weight of the pigment composition, polymer-encapsulated pigment; and 0-85 wt. %, in percentage by weight based on the dry weight of the pigment composition, un-encapsulated pigment; and (ii) 0.01 wt. %-5 wt. %, in percentage by dry weight based on the wet weight of the aqueous coating composition, at least one paraffin wax emulsion.
    Type: Grant
    Filed: August 2, 2012
    Date of Patent: March 24, 2015
    Assignee: Rohm and Haas Company
    Inventors: Juan Li, Tao Wang, Tao Wang, David G. Speece, Jr.
  • Patent number: 8986585
    Abstract: A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: March 24, 2015
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Brian T. Cantrell, Kathleen McHugh, James T. Murnane, George H. McClain, Durron A. Hutt, Robert A. Brady, Christopher A. Young, Jeffrey Borcherdt Miller
  • Patent number: 8986723
    Abstract: A composition comprising (a) a non-aqueous pourable fluid, (b) droplets dispersed in said pourable fluid (a), wherein said droplets comprise (i) a non-aqueous continuous phase that is a solid or that is a liquid of high viscosity and (ii) solid particles dispersed in said continuous phase (i), wherein said solid particles (ii) have median size as measured by the largest dimension of 100 micrometers or less, and wherein said solid particles (ii) comprise one or more cyclopropene compound and one or more molecular encapsulating agent. Also, a method of treating plants or plant parts involving bringing such a composition into contact with plants or plant parts.
    Type: Grant
    Filed: February 9, 2011
    Date of Patent: March 24, 2015
    Assignee: Rohm and Haas Company
    Inventors: Richard M. Jacobson, Yueqian Zhen
  • Patent number: 8986791
    Abstract: The present invention relates to aqueous coating compositions having low gloss for treating natural or synthetic leather. These aqueous coating compositions contain one or more water soluble poly(ethylene oxide) resins having the general formula [—CH2CH2O—]n and one or more polymer binders.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: March 24, 2015
    Assignee: Rohm and Haas Company
    Inventor: Theodore Tysak
  • Patent number: 8986663
    Abstract: Described are skin care compositions comprising an aqueous dispersion comprising a metallocene catalyzed polyolefin, an ethylene acrylic acid copolymer, or a combination thereof.
    Type: Grant
    Filed: October 27, 2011
    Date of Patent: March 24, 2015
    Assignees: Rohm and Haas Company, Union Carbide Chemicals & Plastics Technology LLC
    Inventors: Susan L. Jordan, Ying O'Connor
  • Publication number: 20150076061
    Abstract: A process for treating coking wastewater contains the steps of passing the coking wastewater in such an order through coagulation, particles removal, and ion-exchange resin.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 19, 2015
    Applicants: DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS COMPANY
    Inventors: Chad J. Cai, Jenny Z. Zhang, Zhaohui Yan, Xianrui Wang
  • Publication number: 20150080219
    Abstract: There is provided a powder composition comprising a collection of particles (I) having median particle diameter of 10 micrometers to 200 micrometers, wherein each of said particles (I) comprises (a) a covering of a fatty compound having melting point of 50° C. to 110° C. and (b) one or more inner particles (II) comprising one or more complex that contains a cyclopropene compound molecule or a portion of a cyclopropene compound molecule encapsulated in a molecule of a molecular encapsulating agent. Also provided is a slurry comprising water and such a powder. Also provided is a method of contacting plants or plant parts with such a slurry.
    Type: Application
    Filed: June 5, 2014
    Publication date: March 19, 2015
    Applicant: ROHM AND HAAS COMPANY
    Inventors: Yueqian Zhen, Jeffrey A. Coles
  • Patent number: 8980749
    Abstract: A method for polishing a silicon wafer is provided, comprising: providing a silicon wafer; providing a polishing pad having a polishing layer which is the reaction product of raw material ingredients, including: a polyfunctional isocyanate; and, a curative package; wherein the curative package contains an amine initiated polyol curative and a high molecular weight polyol curative; wherein the polishing layer exhibits a density of greater than 0.4 g/cm3; a Shore D hardness of 5 to 40; an elongation to break of 100 to 450%; and, a cut rate of 25 to 150 ?m/hr; and, wherein the polishing layer has a polishing surface adapted for polishing the silicon wafer; and, creating dynamic contact between the polishing surface and the silicon wafer.
    Type: Grant
    Filed: October 24, 2013
    Date of Patent: March 17, 2015
    Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., Nitta Haas Incorporated
    Inventors: Yasuyuki Itai, Bainian Qian, Hiroyuki Nakano, David B. James, Naoko Kawai, Katsumasa Kawabata, Koichi Yoshida, Kazutaka Miyamoto, James Murnane, Fengji Yeh, Marty W. DeGroot
  • Patent number: 8980077
    Abstract: Silver electroplating baths having certain sulfide compounds and methods of electrodepositing a silver-containing layer using these baths are disclosed. Such electroplating baths are useful to provide silver-containing solder deposits having reduced void formation and improved within-die uniformity.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: March 17, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Duane R. Romer, Elissei Iagodkine, Inho Lee
  • Patent number: 8980536
    Abstract: Provided are photoresist developer compositions that include a mixture of organic solvents. Also provided are methods of forming photolithographic patterns using negative tone development, coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: March 17, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Seung-Hyun Lee
  • Publication number: 20150072291
    Abstract: Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.
    Type: Application
    Filed: September 6, 2013
    Publication date: March 12, 2015
    Applicants: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE TEXAS A&M UNIVERSITY SYSTEM
    Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
  • Publication number: 20150073134
    Abstract: The present invention is a multilayered composite comprising porous metal oxide particles that are covalently bonded by way of inorganic ether groups to one or more sites of a first polyhydroxyl-functionalized polymer. This first polymer is in turn covalently bonded by way of inorganic ether groups to one or more sites of a second polyhydroxyl-functionalized polymer. The multilayered composites can be prepared by contacting porous inorganic-oxide particles with a sufficient amount of OH-reactive crosslinking agent to form metal oxide particles imbibed with the crosslinking agent, and then contacting the inorganic-oxide particles with a solution of polyhydroxyl-functionalized polymer under reactive conditions.
    Type: Application
    Filed: September 5, 2014
    Publication date: March 12, 2015
    Applicants: The Regents of the University of California, Rohm and Haas Company, Dow Global Technologies LLC
    Inventors: Joseph Jankolovits, Alexander S. Katz, Oz M. Gazit, James C. Bohling, John A. Roper, III
  • Patent number: 8975008
    Abstract: Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 10, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Paul J. Ciccolo, Brian D. Amos, Stephen McCammon