Abstract: Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: A photoacid generator compound has formula (1) wherein n is zero or 1; and R1-R6 are each independently hydrogen, halogen, or unsubstituted or substituted C1-20 linear or branched alkyl, C1-20 cycloalkyl, C6-20 aryl, C3-20 heteroaryl, or an acid-generating group having the structure *?L-Z?M+] wherein L is an unsubstituted or substituted C1-50 divalent group; Z? is a monovalent anionic group; and M+ is an iodonium or sulfonium cation. Geminal R groups can combine to form a ring with the carbon to which they are attached, as long as no more than two such rings are formed. At least one of R1-R6 includes the acid-generating group or two germinal R groups combine to form the acid-generating group. Also described are a photoresist composition incorporating the photoacid generator compound, a coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using a layer of the photoresist composition.

Abstract: Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a dopant-containing polymer and a non-polar solvent on a substrate; and annealing the substrate at a temperature of 750 to 1300° C. for 1 second to 24 hours to diffuse the dopant into the substrate; wherein the dopant-containing polymer is a polymer having a covalently bound dopant atom; wherein the dopant-containing polymer is free of nitrogen and silicon; and wherein the method is free of a step of forming an oxide capping layer over the coating prior to the annealing step.

Abstract: An organic solderability preservative solution includes pyrazine derivatives which inhibit corrosion of metal. The solution is applied to metal surfaces of components for electronic apparatus to improve solderability of electrical connections between the components in the electronic apparatus.

Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.

Abstract: Stable zero-valent metal compositions and methods of making and using these compositions are provided. Such compositions are useful as catalysts for subsequent metallization of non-conductive substrates, and are particularly useful in the manufacture of electronic devices.

Abstract: Methods of purifying crude cyclopentadienyl magnesium compounds using a scavenging agent are provided. The purified cyclopentadienyl magnesium compounds have very low levels of metallic impurities.

Abstract: The present invention relates to a composition comprising an aqueous dispersion of xanthan gum and opacifying pigment particles such as TiO2 encapsulated with a vinyl ester polymer or a vinyl ester-acrylate copolymer, as well as a method for its preparation. The composition is useful in coatings formulations, especially paint formulations.

Abstract: The present invention relates to a method for disinfection involving an antimicrobial composition. It particularly relates to an antimicrobial method for personal cleaning, oral care or hard surface cleaning applications. It was found that compositions comprising thymol, acyclic terpene alcohols and a carrier provide synergistic antimicrobial action in a method for disinfection. In a preferred aspect the composition also comprises 1 to 80%-wt of one or more surfactants.

Abstract: Disclosed are metal plating compositions and methods. The metal plating compositions provide good leveling performance and throwing power.

Abstract: Oil-water dispersions and emulsions derived from petroleum industry operations are demulsified and clarified using anionic polymers. Formation of such oil-water dispersion and emulsions is inhibited and mitigated using the anionic polymers. The anionic polymers comprise: A) 2-80% by weight of at least one C3-C8 ?,?-ethylenically unsaturated carboxylic acid monomer; B) 15-80% by weight of at least one nonionic, copolymerizable ?,?-ethylenically unsaturated monomer; C) 1-50% by weight of one or more of the following monomers: C1) at least one nonionic vinyl surfactant ester; or C2) at least one nonionic, copolymerizable ?,?-ethylenically unsaturated monomer having longer polymer chains than monomer B), or C3) at least one nonionic urethane monomer; and, optionally, D) 0-5% by weight of at least one crosslinker.

Abstract: A photoacid generator includes those of formula (I): wherein each Ra in formula 1 is independently H, F, a C1-10 nonfluorinated organic group, C1-10 fluorinated organic group, or a combination comprising at least one of the foregoing, provided at least one Ra is F or a C1-10 fluorinated organic group, the C1-10 fluorinated and nonfluorinated organic groups each optionally comprising O, S, N, or a combination comprising at least one of the foregoing heteroatoms; L1 is a linking group comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing; G+ is an onium salt of the formula (II): wherein in formula (II), X is S or I, each R0 is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination comprising at least one of the foregoing, provided at least one R0 is substituted where each R0 is a C6 monocyclic aryl group, and wherein when X is I, a is 2, and where X is S, a is 3,

Abstract: A transesterification process produces a (meth)acrylate ester product from a mixture comprising an alkyl(meth)acrylate reactant, an alcohol reactant, a catalyst, and a polymerization inhibitor. The mixture is subjected to reaction conditions sufficient to produce a product (meth)acrylate and a product alcohol, which are different than the reactants.

Abstract: A transesterification process produces a (meth)acrylate ester product from a mixture comprising an alkyl(meth)acrylate reactant, an alcohol reactant, a catalyst, and a polymerization inhibitor, wherein the water content in the reaction zone at the start of the transesterification step is from 0.2 to 1.1 weight percent, based on the weight of the materials in the reaction zone. The mixture is subjected to reaction conditions sufficient to produce a product (meth)acrylate and a product alcohol, which are different than the reactants.

Abstract: A method for forming a dispersible nonwoven substrate in an aqueous medium including: a) forming an aqueous nonwoven binder including a selected emulsion polymer wherein the polymer has been modified with a compound comprising a tri-substituted N-atom, the compound having a pKb of from 4 to 7; b) contacting a nonwoven substrate with the aqueous nonwoven binder; c) heating the contacted nonwoven to a temperature of from 120° C. to 220° C.; and d) immersing the contacted heated nonwoven in an aqueous medium having a final pH<5 is provided. A dispersible nonwoven substrate in an aqueous medium formed by the preceding method and a method for providing a dispersed nonwoven in an aqueous medium are also provided.

Abstract: A method for dispersing an alkali or alkaline earth metal borohydride having median particle size less than 30 microns in an organic solvent. The method comprises combining the alkali or alkaline earth metal borohydride, the organic solvent and a surfactant.

Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

Abstract: Methods for depositing a metal or metal alloy on a substrate and articles made with the methods are described. The metal or metal alloy is deposited on the substrate electrolytically. The current is periodically interrupted during deposition to improve throwing power and reduce nodule formation on the metal or metal alloy deposit.

Abstract: A two-component curable adhesive or sealant composition is provided. The first component may comprise a mixture of at least one polyol selected from the group comprising a polyester polyol, a polyester-polycarbonate copolymer polyol, and combinations thereof, a resin, and optionally a solvent. The second component may comprise a prepolymer obtained by reacting a polyester-polycarbonate copolymer polyol which is the reaction product of a polyester polyol which is the reaction product of one or more organic acids, and one or more glycols having a functionality of two or more and one or more polycarbonate polyols, at least one organic polyisocyanate component, and at least one chain extending agent and optionally a solvent. Alternatively, the first component may comprise a polyester-polycarbonate copolymer polyol, a resin, and optionally a solvent. The second component may comprise a polyisocyanate curative and optionally a solvent.

Abstract: The present invention provides novel polymers having chelating functionality and comprising units derived from a vinyl aminocarboxylate monomer which comprises units derived from iminodiecetic acid, iminodisuccinic acid, or a salt thereof, and a vinyl epoxy benzene monomer.