Abstract: Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Type:
Grant
Filed:
June 10, 2010
Date of Patent:
November 11, 2014
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
John P. Amara, James F. Cameron, Jin Wuk Sung, Gregory P. Prokopowicz
Abstract: The present invention relates to a soluble shell polymer composition comprising an alkali soluble emulsion polymer shell and an alkali insoluble emulsion polymer core, which composition is stabilized by a surfactant of the formula R—(OCH2CH2)2-6OSO3?M+, where R is a linear, branched, or cyclic C8-C24 alkyl or C12-C18 aralkyl group and M+ is a counterion. The invention further relates to a method of preparing the composition and its use as a binder in coatings formulations. Formulations prepared with the soluble shell polymer composition have excellent freeze-thaw profiles and hiding.
Type:
Grant
Filed:
August 29, 2012
Date of Patent:
November 11, 2014
Assignee:
Rohm and Haas Company
Inventors:
Monica Luckenbach, Ozzie M. Pressley, Wei Zhang
Abstract: The present invention provides thermosetting aqueous binder compositions of (i) one or more diprimary diamine, e.g. lysine, or poly(primary amine), e.g. polyethylenimine and tris(2-aminoethyl)amine, and (ii) one or more 5-carbon reducing sugar, such as xylose. The binders are at least substantially formaldehyde free and cure rapidly at temperatures sufficiently low and with sufficiently little swelling to enable one to provide wood or woody material containing articles, such as particle board, oriented strand board and bamboo boards or articles.
Type:
Grant
Filed:
April 21, 2011
Date of Patent:
November 11, 2014
Assignee:
Rohm and Haas Company
Inventors:
Charles J. Rand, Barry Weinstein, Drew E. Williams
Abstract: The present invention is a process for preparing a multistage polymer by contacting under emulsion polymerization conditions an acrylic monomer, a sulfur acid monomer, and a phosphorous acid monomer as described herein. The present invention is also a composition comprising a nonionic surfactant and a stable aqueous dispersion of polymer particles comprising structural units of butyl acrylate, methyl methacrylate, a sodium vinylbenzenesulfonate, and phosphoethyl methacrylate; wherein the polymer particles have a Tg of less than 10° C. The composition of the present invention is useful as a binder for coatings compositions.
Type:
Application
Filed:
December 17, 2012
Publication date:
November 6, 2014
Applicant:
Rohm and Haas Company
Inventors:
James C. Bohling, Arnold S. Brownell, Catherine A. Finegan
Abstract: The present invention is a drying composition comprising spherical beads and a stable aqueous dispersion of polymer particles and also a dried composition of the spherical beads and a polymer film. The composition is useful as a wall repair formulation.
Abstract: An organic polymer including internal pendant phosphorous acid groups at a level of >0.25% phosphorus by weight based on the weight of said organic polymer, the phosphorus acid groups being separated from the backbone of the organic polymer by no more than 2 alkylene glycol units, the organic polymer having an acid number of from 100 to 1,000, and a Mw of from 1,000 to 75,000, wherein the organic polymer has been formed by emulsion polymerization from at least one ethylenically unsaturated monomer is provided. Compositions further including an emulsion polymer including from 0.05% to 2% phosphorous, present as pendant phosphorous acid groups, by weight based on the weight of the emulsion polymer, and, optionally, an inorganic particle are also provided as are processes related to the compositions.
Type:
Grant
Filed:
December 3, 2007
Date of Patent:
November 4, 2014
Assignee:
Rohm and Haas Company
Inventors:
James Charles Bohling, Matthew Stewart Gebhard, Thomas Glenn Madle, Alvin Michael Maurice, Robert Joseph Pafford, IV, William Douglas Rohrbach
Abstract: A synergistic microbicidal composition containing: (a) at least one microbicide selected from the group consisting of isopropyl methyl phenols and monosubstituted phenols and (b) at least one microbicide selected from the group consisting of p-menthene alcohols, menthadiene alcohols and other antimicrobial alcohols of a specified structure.
Type:
Application
Filed:
December 5, 2012
Publication date:
October 30, 2014
Applicant:
ROHM AND HAAS COMPANY
Inventors:
Robert J. Cornmell, Megan A. Diehl, Stephen Golding, John R. Harp, Ian P. Stott, Katherine M. Thompson, Carol L. Truslow
Abstract: A synergistic microbicidal composition containing a selected from the class consisting of chlorinated phenols, fused bicyclic phenols, monosubstituted phenols and monosubstituted catechols and an antimicrobial alcohol selected from the class consisting of acyclic terpene alcohols.
Type:
Application
Filed:
December 5, 2012
Publication date:
October 30, 2014
Applicant:
ROHM AND HAAS COMPANY
Inventors:
Robert J. Cornmell, Megan A. Diehl, Stephen Golding, John R. Harp, Ian P. Stott, Katherine M. Thompson, Carol L. Truslow
Abstract: The present invention relates to an antimicrobial composition and a method for disinfection involving the antimicrobial composition. It particularly relates to an antimicrobial composition for personal cleaning, oral care or hard surface cleaning applications. It was found that compositions comprising thymol, selected antimicrobial alcohols and a carrier provide synergistic antimicrobial action. In a preferred aspect the composition also comprises 1 to 80%-wt of one or more surfactants.
Type:
Application
Filed:
December 5, 2012
Publication date:
October 30, 2014
Applicant:
ROHM AND HAAS COMPANY
Inventors:
Robert J. Cornmell, Megan A. Diehl, Stephen Golding, John R. Harp, Ian P. Stott, Katherine M. Thompson, Carol L. Truslow
Abstract: The present invention relates to an antimicrobial composition and a method for disinfection involving the antimicrobial composition. It particularly relates to an antimicrobial composition for personal cleaning, oral care or hard surface cleaning applications. It was found that compositions comprising one or more isopropyl-methylphenols, terpineol and a carrier provide synergistic antimicrobial action. In a preferred aspect the composition also comprises 1 to 80%-wt of one or more surfactants.
Type:
Application
Filed:
December 5, 2012
Publication date:
October 30, 2014
Applicant:
ROHM AND HAAS COMPANY
Inventors:
Robert J. Cornmell, Megan A. Diehl, Stephen Golding, John R. Harp, Ian P. Stott, Katherine M. Thompson, Carol L. Truslow
Abstract: The present invention provides a new process of preparation for PUA with superior mechanical performance, such as elongation, and tensile strength. The process is solvent free, smooth, and robust. PU prepolymer prepared according to the present invention has low viscosity, and contains no particulate DMPA.
Type:
Application
Filed:
December 22, 2011
Publication date:
October 30, 2014
Applicants:
DOW GLOBAL TECHNOLOGIES LLC, ROHM AND HAAS COMPANY
Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Abstract: The present disclosure provides a composition and method for the preparation of N-oxyl hindered amine esters by contacting a compound of Formula (I), wherein R1 and R2 are independently an alkyl, with a compound of Formula (II), wherein R3 and R4 are independently an alkyl, and n is an integer from 3 to 10, in the presence of a catalyst and a solvent, wherein the catalyst comprises at least one of tin, lithium, zirconium, and hafnium.
Type:
Application
Filed:
December 4, 2012
Publication date:
October 30, 2014
Applicant:
Rohm and Haas Company
Inventors:
Robert Wilczynski, Muhunthan Sathiosatham, Jamie J. Juliette, Lan T.P. Hoang Nguyen
Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Type:
Grant
Filed:
September 3, 2012
Date of Patent:
October 28, 2014
Assignee:
Rohm and Haas Electronics Materials LLC
Inventors:
Deyan Wang, Cheng-Bai Xu, George G. Barclay
Abstract: A method for chemical mechanical polishing of a substrate comprising tungsten using a nonselective chemical mechanical polishing composition.
Type:
Grant
Filed:
August 15, 2011
Date of Patent:
October 21, 2014
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Inventors:
Yi Guo, Jerry Lee, Raymond L. Lavoie, Jr., Guangyun Zhang
Abstract: A method for the recovery of uranium from pregnant liquor solutions that comprise levels of chloride of 5 to 80 g/L by using an amino phosphonic functionalized resin. The method includes providing an amino phosphonic functionalized resin; providing a pregnant liquor solution comprising and uranium; passining the pregnant liquor solution over the amino phosphonic functionalized resin to separate the uranium from the pregnant liquor solution; and eluting the uranium.
Abstract: The present invention relates to a composition comprising a water-soluble dispersant comprising structural units of a sulfonic acid monomer or a salt thereof and a co-monomer. The dispersant of the present invention addresses a need in the art by providing a way to improve the hiding efficiency of coatings compositions.
Type:
Grant
Filed:
July 26, 2013
Date of Patent:
October 21, 2014
Assignees:
Dow Global Technologies, LLC, Rohm and Haas Company
Inventors:
Kevin J. Henderson, Thomas H. Kalantar, Lidaris San Miguel Rivera, Anurima Singh, Antony K. Van Dyk
Abstract: An aqueous antibacterial polymer emulsion and coating compositions are provided. The aqueous antibacterial polymer emulsion comprising a polymer A, an oxidant and a metal complexed with a copolymer B comprising heterocyclic containing monomers; wherein the metal is selected from copper, silver, gold, tin, zinc and combinations thereof; and wherein the emulsion is heat stable. The coating compositions made therefrom provide persistent, broad spectrum antibacterial activity without discoloration problem upon exposure to heat and/or sun light.
Type:
Grant
Filed:
March 31, 2011
Date of Patent:
October 14, 2014
Assignee:
Rohm and Haas Company
Inventors:
Xiangting Dong, Shuang Liang, Tao Wang, Qingwei Zhang
Abstract: The present disclosure is directed to a polymeric composition containing a vinyl chloride resin and an epoxidized fatty acid ester. The polymeric composition also includes a heat stabilizing composition. The heat stabilizing composition includes a first metal salt, a second metal salt, and a ?-diketone. The epoxidized fatty acid ester is the primary, or the sole, plasticizer in the polymeric composition. The present polymeric composition finds advantageous application as a coating for wire and cable.
Type:
Grant
Filed:
September 29, 2010
Date of Patent:
October 14, 2014
Assignees:
Dow Global Technologies LLC, Rohm and Haas Company
Inventors:
Bharat I. Chaudhary, Scott Wills, Manish Mundra