Abstract: A substrate cleaning apparatus may include a steam injector configured to clean a substrate, a steam supplier configured to supply a steam, and a gas supplier configured to supply a gas. The steam injector may include a drive unit configured to move horizontally, a plate on the drive unit, and a plurality of nozzles on the plate. The plate may include a temperature sensor, a first pressure sensor, and a second pressure sensor. Each of the plurality of nozzles may be connected to the steam supplier and the gas supplier. The plurality of nozzles may be arranged in one direction from a planar viewpoint.

Abstract: The inventive concept provides a transfer robot system. Embodiments of the inventive concept provide a transfer robot system and a transfer robot system driving method in which a bottleneck phenomenon of mobile robots may be prevented, as a new obstacle which does not exist within a map for a mobile robot is recognized in advance during an autonomous driving of the mobile robot and the new obstacle is not passed through. The transfer robot system includes an OHT for transferring an article by autonomously driving along a rail and having a bottom side distance detection sensor installed for generating a distance information of below; and a mobile robot for transferring the article by autonomously driving on the ground and autonomously driving while avoiding an obstacle information generated through the distance information.

Abstract: A substrate processing equipment and a method of driving the substrate processing equipment, which automatically cut off power supplied to a main circuit breaker and a branch circuit breaker when an operator inspects a process chamber or a power supply system. The substrate processing equipment for processing a substrate includes: a process processing module including loads utilized in a process for processing a substrate; a branch circuit breaker installed on a periphery to the process processing module and electrically connected to the loads; a main circuit breaker electrically connected to the branch circuit breaker and supplying power to the branch circuit breaker; and a power distribution board in which the branch circuit breaker is mounted, and including a power distribution board door, in which the main circuit breaker cuts off power when the power distribution board door is opened.

Abstract: The present invention provides an apparatus for treating a substrate. The apparatus for treating a substrate comprises: a first module; and a treating module configured to treat the substrate, and the first module includes: a load port on which a container having the substrate accommodated therein is placed; a transfer unit having a hand that transfers the substrate between the load port and the treating module; and an observation unit mounted in the transfer unit and configured to observe a state of the substrate accommodated in the container.

Abstract: A gripper gripping a plurality of types of probe cards includes a frame, a driving unit connected to the frame, and a plurality of gripper portions connected to the driving unit and including an inner gripper portion and an outer gripper portion. The gripper portions include a moving block moving in a radial direction as the driving unit is driven, and the inner gripper portion and the outer gripper portion connected to the moving block. The outer gripper portion is rotatably connected to the moving block, and is configured such that the outer gripper portion rotates downward with respect to the moving block as the moving block moves in a radial outward direction.

Abstract: Provided are a nozzle inspection unit configured to generate a large amount of defect data to improve detection accuracy of a defective nozzle, and a substrate treatment apparatus including the same. The nozzle inspection unit includes: a data collection module configured to collect a plurality of image data related to nozzles; a data classification module configured to classify the plurality of image data according to predefined classes; a data merging module configured to merge good image data related to a normal nozzle and defect image data related to a defective nozzle from among the plurality of image data; a data training module configured to train a plurality of merged image data obtained through the data merging module; and a defect data generation module configured to generate a plurality of final image data from the plurality of merged image data based on the training result.

Abstract: The present invention provides an apparatus for treating a substrate, the apparatus including: a processing tank having an accommodation space in which a processing liquid is accommodated; a support member for supporting at least one substrate in the receiving space in a vertical posture; and a posture changing robot for changing a posture of the substrate in a state of being immersed in the liquid state from the vertical posture to a horizontal posture, in which wherein the posture changing robot includes: a hand configured to grip the substrate; and an arm for moving the hand.

Abstract: A substrate processing apparatus includes a nozzle unit including a nozzle tip discharging liquid to a substrate; and a liquid supply line supplying the liquid to the nozzle unit, wherein the liquid supply line includes a liquid supply pipe connected to the nozzle tip; a supply valve installed in the liquid supply pipe; and a heater disposed between the nozzle tip and the supply valve in the liquid supply pipe.

Abstract: An apparatus for processing a substrate includes a mixing nozzle having a mixing space that is shaped as an inverted cone, the mixing nozzle including a first inlet, a second inlet and an outlet installed at the mixing space; a first chemical supply unit connected to the first inlet; a second chemical supply unit connected to the second inlet; and a supply tank connected to the outlet, wherein the first chemical supply unit is configured to supply a first chemical solution to the mixing space through the first inlet, the second chemical supply unit is configured to supply a second chemical solution to the mixing space through the second inlet, and the supply tank is supplied with, through the outlet, a solution mixture that is formed of the first chemical solution and the second chemical solution after being mixed in the mixing space.

Abstract: A substrate processing device is provided. The substrate processing device includes: a substrate supporter configured to support a substrate; a heating ring horizontally surrounding the substrate supporter; and an edge ring horizontally surrounding the heating ring and configured to cover a top surface of the heating ring.

Abstract: An apparatus for processing a substrate may include a process chamber in which a desired process is performed, a supporting unit disposed in the process chamber, and a heater array disposed in the supporting unit. The heater array may include a plurality of heaters providing a plurality of heating areas, a plurality of diodes electrically connected to the plurality of heaters, respectively, and a controller operating the plurality of heaters. Here, adjacent diodes in the plurality of heating areas are arranged in opposed directions.

Abstract: Provided is an article transfer apparatus and article transfer method capable of autonomously loading or unloading an article by accurately checking a correct position in an article storage without a teaching process, the article transfer apparatus including a carriage body travelling along travel rails to transfer an article, and a position detection device mounted in the carriage body to detect position information related to a correct position from a detection target mounted in an article storage capable of storing the article in order to place the article at the correct position in the article storage where the article is to be stored.

Abstract: Provided is a device for visualizing a temperature and an amount of static electricity, wherein the device is arranged adjacent to a substrate processing liquid providing unit including a pipe to provide a passage through which a substrate processing liquid is transferred and a processing liquid storage module for storing the substrate processing liquid, the device including a photographing unit configured to generate a plurality of partially captured images by photographing a plurality of areas of a measurement target, a static electricity sensor configured to measure static electricity levels of the plurality of areas of the measurement target, a thermal imaging camera configured to measure temperatures of the plurality of areas of the measurement target, a processor configured to generate an entire image by combining the plurality of partially captured images with each other, and an output unit configured to output a visualization image.

Abstract: The disclosure provides a shutter open-closing apparatus capable of improving producibility, assemblability, and maintainability and reducing an operating cost, a shutter open-closing system including the same, and a shutter open-closing method. The shutter open-closing apparatus includes a main body connected to a main door, which is opened and closed, to move along with movement of the main door, a main guide unit coupled to the main body, a shutter pushing unit movable on the main guide unit, a link unit rotatably connected to the shutter pushing unit to move along with movement of the shutter pushing unit, and a shutter connected to the link unit to move along with movement of the link unit, and opened and closed using a driving force for moving the main door.

Abstract: A stocking device includes a case including a central portion therein, extending a first direction, a longitudinal direction, and provided with a first storage portion and a second storage portion on both sides of the central portion in a second direction, a width direction, a shelf portion provided in the first storage portion and the second storage portion and having a plurality of shelves with an electronic component loaded thereon, a first port located in the first storage portion, and having a first open surface in which at least a portion of a side of the case is open in the second direction to communicate externally.

Abstract: An inspecting apparatus capable of performing an inspection of equipment without destroying the equipment and semiconductor manufacturing equipment including the inspecting apparatus are provided. The inspecting apparatus includes: a measurement module measuring a first impedance at a first port, and a second impedance at a second port; a comparison module comparing the first and second impedances; and a determination module determining whether the equipment part is operating properly based on a result of the comparison of the first and second impedances, wherein the first impedance includes a first resistance and a first reactance, the second impedance includes a second resistance and a second reactance, and the determination module determines whether the equipment part is operating properly based on at least one of a result of the comparison of the first and second resistances and a result of the comparison of the first and second reactances.

Abstract: An impedance matching circuit, which is provided for quick impedance matching, a power supply apparatus, and a plasma processing equipment including the same are provided. The impedance matching circuit includes a parallel capacitor array connected to a radio frequency (RF) power supply to generate a RF signal, and a series capacitor array connected to the RF power supply in series, wherein the parallel capacitor array or the series capacitor array includes a mechanical vacuum variable capacitor and an electrical switch capacitor module connected to the mechanical vacuum variable capacitor in parallel.

Abstract: Provided are a substrate treatment apparatus and method for treating a substrate while preventing the surface of the substrate from drying out. The substrate treatment method includes: moving a first nozzle to above a first point on a substrate; ejecting a first substrate treatment liquid onto the substrate from the first nozzle; moving a second nozzle to above the first point; and ejecting a second substrate treatment liquid onto the substrate from the second nozzle, wherein the second nozzle is positioned above a second point on the substrate before moving to above the first point.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having an entrance for taking in and taking out a substrate at a side wall; a support unit provided inside of the chamber and supporting the substrate; an imaging unit for imaging a substrate being taken in by a transfer robot through the entrance; and a controller is configured to control a position of the transfer robot based on an image data from the imaging unit.

Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a body including an irradiation end, from which laser light is irradiated, a shaft coupled to the body, and a driver that supplies power to the shaft, the heating unit is swung about an axis of the shaft, and the controller moves the irradiation end of the heating unit to a target location on a substrate by adjusting a rotation angle of the heating unit and a rotation angle of the support unit.