Patents Assigned to Semes Co., Ltd.
  • Patent number: 11380560
    Abstract: The inventive concept relates to an apparatus and method for forming a film on a substrate by spin coating. The apparatus includes liquid dispensing units that dispense processing liquids to form liquid films on the first and second substrates, respectively, air-flow supply units that form downward air flows in the first and second spaces, respectively, and a controller that controls the liquid dispensing units and the air-flow supply units. Each of the liquid dispensing units includes a pre-treatment nozzle that dispenses a pre-treatment liquid and a coating solution nozzle that dispenses a coating solution onto a corresponding one of the first and second substrates. The controller controls the liquid dispensing units to dispense the pre-treatment liquids and thereafter the coating solutions onto the first and second substrates and adjusts supply states of the downward air flows according to amounts of the pre-treatment liquids dispensed.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: July 5, 2022
    Assignee: SEMES CO., LTD.
    Inventors: Ki Seung Lee, Choongki Min, Soo Hyun Cho, Okseong Lee
  • Patent number: 11380565
    Abstract: A substrate misalignment compensation method includes obtaining first coordinates for an amount of movement of a substrate transfer apparatus and second coordinates measured by a plurality of sensors installed on the substrate transfer apparatus while moving the substrate transfer apparatus in one direction, calculating a calibration value of the substrate transfer apparatus by using an equation of a circle for the first coordinates and an equation of a line for the second coordinates, and calculating the center of a circle for a substrate based on the calibration value of the substrate transfer apparatus and compensating for misalignment of the substrate by using the center of the circle.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: July 5, 2022
    Assignee: SEMES CO., LTD.
    Inventors: Duk Sik Kim, Hyun Jun Kim
  • Publication number: 20220203408
    Abstract: An apparatus for processing a substrate may include a processing module including at least one process chamber performing a desired process on a substrate and an index module transferring the substrate from an outside into the processing module. The at least one process chamber may include a supporting unit on which the substrate is placed and a back nozzle unit disposed under a bottom face of the substrate. The back nozzle unit may include a skirt, at least one back nozzle providing a cleaning solution onto the bottom face of the substrate and a gas nozzle providing a gas onto the bottom face of the substrate. The skirt may include a body and a plurality of first flow paths and a plurality of second flow paths which are formed in the body and provide a gas toward the bottom face of the substrate.
    Type: Application
    Filed: August 3, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD
    Inventors: Junhyun Lim, Yunseok Jeon, Gilhun Song, Junkee Kang
  • Publication number: 20220205081
    Abstract: A substrate type sensor includes a substrate shape member, a pressure sensor panel provided at the substrate shape member, the pressure sensor panel including a plurality of pressure sensors, a central module including a transmission unit, the reception unit receiving data from the pressure sensor panel, and a battery proving power to the pressure sensor panel and the central module.
    Type: Application
    Filed: December 29, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: YOUNG SEOP CHOI, YONG-JUN SEO, SANG HYUN SON, JUN GWON LEE, HAK HYON KIM, SUN YONG PARK
  • Publication number: 20220203412
    Abstract: An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process is performed on a substrate and a chemical liquid supply device for supplying a chemical liquid onto the substrate dispose din the process chamber.
    Type: Application
    Filed: August 17, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Dogyeong Ha, Jaehyeok Yu, Gunmin Lee, Moonsoon Choi, Chaeyoung Lim
  • Publication number: 20220206031
    Abstract: A buffer unit for temporarily storing a substrate includes a housing having a space for storing a substrate therein, one or more slots disposed within the housing for placing a substrate thereon, and a holding unit disposed at a bottom portion of the housing, having a flat and non-inclined top surface, and comprising a built-in wireless charging module. A substrate type sensor is stored at the holding unit.
    Type: Application
    Filed: December 29, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: YOUNG SEOP CHOI, YONG-JUN SEO, SANG HYUN SON, JI YOUNG LEE, GYEONG RYUL KIM, SUN YONG PARK
  • Publication number: 20220205718
    Abstract: An apparatus for treating the substrate includes a process chamber having a first body and a second body which are combined with each other to have a treating space in which a substrate is treated, and a friction prevention member placed on a contact surface between the first body and the second body. The friction prevention member may have a groove formed at a surface corresponding to the contact surface. An adhesive for adhering the friction prevention member to the first body or adhering the friction prevention member to the second body may be provided in the groove. The groove may form an open-end pattern in which a first end of the open-end pattern is adjacent to a second end of the open-end pattern.
    Type: Application
    Filed: December 29, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: SANG MIN LEE, SEUNG HOON OH, JONG DOO LEE, MI SO PARK
  • Publication number: 20220208564
    Abstract: A substrate treating device includes a liquid treating chamber for liquid-treating a substrate therein, a drying chamber for dry-treating the liquid-treated substrate, a transfer device for transferring the substrate between the liquid treating chamber and the drying chamber, and a controller for controlling the liquid treating chamber and the transfer device. The transfer device includes a transfer robot having a hand for placing the substrate thereon, and a heating member for heating the substrate. The controller controls the transfer device such that the heating member of the transfer device heats a liquid on the substrate to a first temperature before the transfer device transfers the substrate taken out from the liquid treating chamber to the drying chamber.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: EUI SANG LIM, YONG HEE LEE
  • Publication number: 20220206391
    Abstract: An apparatus for treating the substrate includes a process chamber with a treating space therein, a support member located in the treating space to support the substrate, and a gas supply unit supplying a surface-modifying gas to the treating space. The gas supply unit includes a bubbler tank provided with an accommodating space for storing a liquid alkyne-based chemical, the bubbler tanks bubbling the liquid alkyne-based chemical by supplying an inert gas to the accommodating space to generate the surface-modifying gas, a heater heating the liquid alkyne-based chemical stored in the bubbler tank at a first temperature, and a gas supply line coupled between the process chamber and the bubbler tank to supply the surface modified gas to the treating space and provided with a first valve.
    Type: Application
    Filed: December 29, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: HYUN MIN KIM, YOUNG SEO AN
  • Publication number: 20220206467
    Abstract: A controlling apparatus for controlling operation of a substrate processing apparatus includes a first CTC, and a second CTC. When the first CTC stops operating, the second CTC is preset to control each module in the substrate processing apparatus in place of the first CTC. As the first CTC and the second CTC are dualized to provide the controlling apparatus, even when one of the CTCs stops operating, another dualized CTC is used to control the substrate processing apparatus, so that operation-stop of the substrate processing system is prevented and entire process efficiency is increased.
    Type: Application
    Filed: December 23, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventor: Sang Bo SEO
  • Publication number: 20220207925
    Abstract: A transport vehicle management method includes self-testing a transport vehicle to determine whether there is an abnormality in the transport vehicle, checking whether the transport vehicle is capable of self-correcting the abnormality when the abnormality is detected in the transport vehicle, and self-correcting the abnormality when the transport vehicle is capable of self-correcting the abnormality.
    Type: Application
    Filed: December 29, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Tae In KIM, Hyun Joon YOON, Tae Uk PARK
  • Publication number: 20220208562
    Abstract: A pressure adjustment apparatus includes a storage tank storing a gas for the chamber with an outlet, a first supply line supplying the gas from an external line to the storage tank, a second supply line supplying the gas from the storage tank to the chamber, a discharge line discharging the gas from the chamber using the outlet of the chamber, and a controller controlling valves at the first, second, and discharge lines. The discharge line includes first and second valves connected to each other in parallel at an end portion of the outlet of the chamber, and a third valve connected to the end portion of the outlet of the chamber. The controller opens the first and second valves to discharge the gas from the chamber, and opens the third valve after a predetermined amount of time after the opening of the first and second valves.
    Type: Application
    Filed: December 27, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Su Chul PARK, Eui Cheol HONG, Min Cheol KIM
  • Publication number: 20220208526
    Abstract: An apparatus for processing a substrate may include an upper electrode, a gas distributing unit disposed under the upper electrode, a shower head disposed under the gas distributing unit, a temperature measuring unit including a first temperature sensor for measuring a temperature of the shower head, and a lower electrode disposed under the shower head. The first temperature sensor may pass through the upper electrode and the lower electrode and may make directly contact with the shower head.
    Type: Application
    Filed: November 23, 2021
    Publication date: June 30, 2022
    Applicant: Semes Co., Ltd.
    Inventors: Doosoon KIM, Sangmin MUN
  • Publication number: 20220208589
    Abstract: An apparatus and a method of reducing the replacement cycle due to abrasion of chuck pins that support a lateral surface of a substrate are proposed. A substrate gripping apparatus for gripping the substrate in substrate processing equipment includes a chuck, a gear box configured to be movable with respect to the chuck, a rotation gear provided inside the gear box, chuck pins configured to be rotatable while being coupled to the rotation gear and to be brought into contact with a lateral surface of the substrate. According to the embodiment of the present disclosure, the substrate is configured such that the lateral surface thereof is supported by various positions of each of the chuck pins. Therefore, the life of the chuck pins can be improved and maintenance costs can be reduced.
    Type: Application
    Filed: December 17, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Se Min KANG, Gu Yeol AN
  • Publication number: 20220208513
    Abstract: A substrate treating apparatus includes a chamber having a treating space therein, a substrate support unit supporting a substrate in the treating space, a gas supply unit supplying a gas into the treating space, and a plasma generation unit exciting the gas within the treating space to generate plasma. The plasma generation unit includes an RF power supplying an RF signal, and a first antenna and a second antenna being supplied with the RF signal to generate the plasma from the gas supplied inside the treating space. The first antenna is disposed at an inside of the second antenna. The coils included in the second antenna are stacked on each other at a second height, and coils included in the first antenna are stacked on each other at a first height, the second height being greater than the first height.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: OGSEN GALSTYAN, HYUK JIN LEE, YOUNG-BIN KIM, YOUN GUN BONG, JONG-HWAN AN
  • Publication number: 20220208586
    Abstract: A substrate storing and aligning apparatus is proposed. The substrate storing and aligning apparatus is capable of efficiently using space in substrate bonding equipment. The substrate storing and aligning apparatus in the substrate bonding equipment for bonding substrates includes a front end buffer including a front end storing slot configured to temporarily store a substrate, and a front end opening configured such that a transfer robot is movable therethrough to transfer the substrate from the front end storing slot, and a front end aligner provided to be stacked on an upper portion of the front end buffer, and configured to rotate the substrate so as to align the substrate.
    Type: Application
    Filed: December 27, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventor: Ho Cheon BANG
  • Publication number: 20220208561
    Abstract: An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process may be performed on the substrate, and a supporting device contacting the process chamber and supporting the process chamber. The supporting device may include a supporting chamber providing a supporting space for supporting components of the process chamber and a supply member supplying a fluid into the supporting space.
    Type: Application
    Filed: July 16, 2021
    Publication date: June 30, 2022
    Applicant: Semes Co., Ltd.
    Inventors: Yonghee LEE, Sangmin LEE, Euisang LIM, Dohyeon YOON
  • Publication number: 20220208565
    Abstract: A substrate processing apparatus includes a substrate cleaning unit cleaning a substrate, a substrate drying unit drying the substrate, and a transfer robot transferring the substrate between the substrate cleaning unit and the substrate drying unit. The substrate drying unit includes a substrate processing container having a substrate processing space accommodating the substrate, and the transfer robot includes a surface temperature measurement sensor measuring a surface temperature of the substrate processing container.
    Type: Application
    Filed: November 8, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Jin Woo JUNG, Do Hyeon YOON, Yong Hee LEE
  • Publication number: 20220208569
    Abstract: The inventive concept provides a substrate treating apparatus. According to the inventive concept, the substrate treating apparatus treats the substrate by supplying a treating liquid on a rotating substrate. The exhaust unit exhausting an atmosphere of an inner space comprises: a first exhaust port introducing the atmosphere of the inner space, a first exhaust line provided to exhaust an atmosphere introduced through the first exhaust port in a first direction and a second exhaust port introducing the atmosphere of the inner space, and a second exhaust line provided to exhaust an atmosphere introduced through the second exhaust port in a second direction. The controller controls the support unit so an exhaust direction inside of the first exhaust line and the second exhaust line become a forward direction with respect to a rotation direction of the substrate.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: JU WON KIM, JUN HO SEO, DONG WOON PARK, SANG PIL YOON
  • Publication number: 20220208568
    Abstract: A liquid supply unit includes a tank having an inner space for storing the liquid, an inlet line for supplying the liquid from the liquid supply source to the inner space and having an inlet valve installed thereon, an outlet line for supplying the liquid from the tank to a nozzle or for recollecting the liquid to the tank and having an outlet valve installed thereon, a gas supply line for supplying a gas to the inner space and having a gas control valve installed thereon, an exhaust line for exhausting the inner space and having an exhaust valve installed thereon, a circulation line for circulating the liquid stored in the inner space, and a controller controlling the liquid supply unit so that the circulation line is pressurized while the liquid is supplied to the inner space.
    Type: Application
    Filed: December 27, 2021
    Publication date: June 30, 2022
    Applicant: SEMES CO., LTD.
    Inventors: DO GYEONG HA, SEUNG TAE YANG