Abstract: A resist composition comprising a sulfonium salt of carboxylic acid having a chromone structure as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: This organopolysiloxane composition, when cured at room temperature by moisture in the atmosphere, provides a silicone rubber cured product having good self-adhesiveness to a magnesium alloy. The organopolysiloxane composition contains (A) an organopolysiloxane having a hydroxy group and/or a hydrolysable silyl group at both ends of the molecular chain, (B) an organic silicon compound other than (A) and (C), having at least three hydrolysable groups bonded to a silicon atom per molecule, and/or a partial hydrolysis-condensation product thereof, and (C) a silane coupling agent having a specific molecular structure having a carboxylic acid silyl ester bond. Furthermore, a novel compound, having an alkoxysilyl group and a carboxylic acid silyl ester group per molecule, can have improved adhesiveness/bonding properties with respect to a base material due to the effect of carboxylic acid after hydrolysis thereof.

Abstract: A substrate with a multilayer reflection film for an EUV mask blank including a substrate, and a multilayer reflection film formed on the substrate is provided. The multilayer reflection film includes a Si/Mo laminated portion in which Si layers and Mo layers are alternately laminated, and a layer containing Si and N intervenes at one or more portions between the Si layer and the Mo layer of the Si/Mo laminated portion, and is contact with both of the Si layer and the Mo layer.

Abstract: A resist composition comprising an ammonium salt and fluorine-containing polymer comprising repeat units AU having an ammonium salt structure of an iodized or brominated phenol compound and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone.

Abstract: A quantum dot including fluorescent crystalline nanoparticle, wherein surface of the quantum dot is modified with a ligand containing fluorine. The quantum dots include fluorescent crystalline nanoparticles which have high stability and are less likely to agglomerate when added to a fluororesin.

Abstract: Functional agent-containing fibers according to an embodiment of the present invention, wherein a functional agent is supported by silicone fixed to the fibers. The silicone includes an acrylic-modified organopolysiloxane having two or more acrylic groups per molecule. A rate of decrease in the functional agent after the functional agent-containing fibers are washed 10 times is less than 40%. In the present invention, the functional agent-containing fibers may be produced, e.g., by irradiating fibers impregnated with a fiber treatment agent A containing silicone with an electron beam so that the silicone is fixed to the fibers, and impregnating the fibers to which the silicone has been fixed with a fiber treatment agent B containing a functional agent. The functional agent-containing fibers may be produced, e.g.

Abstract: A resist composition is provided comprising a base polymer and a quencher comprising a salt compound obtained from a nitrogen-containing compound having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbon group and a compound having a 1,1,1,3,3,3-hexafluoro-2-propanol group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.

Abstract: This bile acid adsorbing agent composed of silica particles, to which an organosilicon compound represented by general formula (1) is bonded, has the advantage that water-absorption swelling does not occur. (In formula (1), R1, R2, and R3 each independently represent a hydrogen atom, a C1-C20 alkyl group, a vinyl group, a phenyl group, or a benzyl group, and R4 represents a group represented by general formula (2), provided that R1 and R3 may be bonded to each other to form a benzene ring.) (In formula (2), A represents a linear or branched divalent linking group which may contain a heteroatom, a urethane bond, a urea bond, a thiourethane bond, and/or a thiourea bond, R5,s each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, R6,s each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, and n represents an integer of 1-3.

Abstract: A carbon black dispersion composition for batteries contains carbon black, a dispersant, N-methyl-2-pyrrolidone, and from 0.0001 to 5 parts by weight of a hindered phenolic compound per 100 parts by weight of carbon black. The composition uses as the dispersing medium N-methyl-2-pyrrolidone, which increases the dispersibility of the carbon black, continues to maintain the dispersibility immediately after dispersion and provides an excellent shelf stability without expenditure of time and effort.

Abstract: An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided. A resist composition comprising a polymer comprising repeat units derived from the onium salt has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A method for producing a light emitting diode supply substrate for transferring a plurality of light emitting diodes to a supply destination, including: a first mounting step of mounting a plurality of light emitting diodes on a supply substrate; a selective removal step of selectively removing defective light emitting diodes on the supply substrate, and a second mounting step of transferring a normal light emitting diode to a position where the defective light emitting diode has been arranged on the supply substrate. Thus, a method produces a light emitting diode supply substrate capable of producing a light emitting diode supply substrate capable of transferring a plurality of normal light emitting diodes to a supply destination.

Abstract: A resist composition comprising a quencher containing a nitroxyl radical having an iodized aromatic ring is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: Provided is an ultraviolet curable silicone composition capable of being ejected via inkjet ejection. The composition of the invention is an ultraviolet curable silicone composition comprising: (A) an organopolysiloxane represented by the following general formula (1) wherein each R1 independently represents a group selected from a monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms, an acryloyl group, a methacryloyl group, an alkyl acrylate group and an alkyl methacrylate group, while the component (A) has per molecule at least two groups selected from an acryloyl group, a methacryloyl group, an alkyl acrylate group and an alkyl methacrylate group; n represents a number satisfying 10?n?1,000; (B) a monofunctional (meth)acrylate compound having no siloxane structure; and/or (C) a multifunctional (meth)acrylate compound having no siloxane structure; and (D) a photopolymerization initiator.

Abstract: The present invention is a sulfonium-salt-type polymerizable monomer represented by the following formula (1), wherein “p” represents an integer of 1 to 3; R11 represents a C1-20 hydrocarbyl group; Rf represents a fluorine atom or a fluorine-atom-containing C1-6 group selected from alkyl, alkoxy, and sulfide; “q” represents an integer of 1 to 4; RALU represents an acid-labile group; “r” represents an integer of 1 to 4; R12 represents a C1-20 hydrocarbyl group; “s” represents an integer of 0 to 4; “t” represents an integer of 0 to 2; Rf and —O—RALU are bonded to adjacent carbon atoms; and A-X? represents a non-nucleophilic counterion having a polymerizable group A. This provides: a monomer to yield a polymer; the polymer contained in a resist composition; the composition having excellent solvent-solubility, sensitivity, contrast, and lithographic performance, and hardly causing pattern collapse even with fine patterning; and a patterning process using the composition.

Abstract: This perfluoropolyether-based adhesive composition contains: (A) a linear perfluoropolyether compound containing two or more alkenyl groups in one molecule and having a number average molecular weight of 2,000 or more and a weight loss ratio of 1% or less when heated at 150° C. for 1 hour; (B) a fluorine-containing organohydrogenpolysiloxane compound which contains at least one fluorine-containing organic group, and does not contain an epoxy group and a trialkoxysilyl group, and which has a number average molecular weight of 1,000-4,000 and a weight loss ratio of 20% or less when heated at 150° C.

Abstract: This surface treatment agent using a compound represented by formula (1) or (2) can, even without having a hydrolyzable group, form a water repellent and oil repellent layer having excellent abrasion resistance under mild conditions such as at room temperature. [Rf represents a monovalent or divalent fluorooxyalkylene group-containing polymer residue, Y1 and Y2 each represent a single bond or a divalent hydrocarbon group, Q represents a group that has a Si-containing structure having a valence of 2-4, Si, or C, X represents an epoxy-containing group, k represents 0-2, m represents 1-5, n represents 1-3, Z represents H, —SiR3 (R represents an alkyl group or a phenyl group), or —W1-Q?-W2—X? (X? represents X or —SiR3, W1 and W2 each represent a single bond or a divalent hydrocarbon group, Q? represents a divalent group having a Si-containing structure), and ? represents 1 or 2].

Abstract: A resist composition comprising a base polymer and a quencher containing a compound having the formula (A) is provided.

Abstract: A voice coil motor yoke having a magnet bonding surface includes an annular groove inside a bonding region on the magnet bonding surface, the bonding region having substantially the same shape as a contour of a magnet to be bonded on the magnet bonding surface of the yoke. A region surrounded by the annular groove on the magnet bonding surface is an adhesive application region. A voice coil motor includes: a pair of the voice coil motor yokes; an adhesive applied to the adhesive application region of each of the pair of yokes; and a pair of rare earth magnets bonded via the adhesive to the bonding region of each of the pair of yokes.

Abstract: The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10, and R1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point.