Abstract: The present invention is a composition for forming a metal oxide film, including: (A) a metal oxide nanoparticle; (B) a flowability accelerator containing a resin having a structural unit represented by the following general formula (1); (C) a dispersion stabilizer having two or more benzene rings or having one benzene ring and a structure represented by the following general formula (C-1), and the dispersion stabilizer being composed of an aromatic group-containing compound having a molecular weight of 500 or less; and (D) an organic solvent, wherein the flowability accelerator (B) has a content of 9 mass % or more in an entirety of the composition, a ratio Mw/Mn of 2.50?Mw/Mn?9.00, and the flowability accelerator (B) having no cardo structure.

Abstract: Provided is a condensation-reaction-curable silicone coating agent composition which contains, as a main component, a hydrolysable-group-containing organosiloxane mixture and also contains a curing catalyst, in which the hydrolysable-group-containing organosiloxane mixture contains an organotrisiloxane compound having a specified molecular structure in which there is at least one non-substituted, halogen-substituted or alkyl-substituted phenyl group in the molecule thereof and at least four hydrolysable groups are contained at molecule chain both ends thereof and an organodisiloxane compound having a specified structure in which there are at least two non-substituted, halogen-substituted or alkyl-substituted phenyl groups on one silicon atom in the molecule thereof and at least two hydrolysable groups are contained on the other silicon atom in the molecule thereof, and the organotrisiloxane compound and the organodisiloxane compound are contained in the hydrolysable-group-containing organosiloxane mixture at

Abstract: A polysilicon rod has a diameter of 120 mm or more, the polysilicon rod having a lowest resistivity of 3300 ?cm or more and an RRG of 100% or less. A polysilicon rod has a diameter of 140 mm or more, the polysilicon rod having a lowest resistivity of 3300 ?cm or more and an RRG of 150% or less.

Abstract: Provided is a water-repellent member in which a silica layer having a specific thickness and mainly composed of silica nanoparticles is provided on the outer surfaces of various substrates, and then a water- and oil-repellent layer having a specific thickness and containing a cured product of a fluorine-containing organosilicon compound as a main component is provided on the outer surface of the silica layer. The water-repellent member is obtained by a method comprising: a step for wet coating a dispersion containing silica nanoparticles and a solvent onto the outer surface of a substrate; a step for drying and removing the solvent from the dispersion; a step for wet coating a solution containing a fluorine-containing organosilicon compound and a solvent onto the outer surface of a silica layer formed by drying and removing the solvent; and a step for drying and removing the solvent from the solution to cure the fluorine-containing organosilicon compound.

Abstract: A siloxane-modified polyurethane resin coating agent composition which includes: (A) a siloxane-modified polyurethane resin; and (B) a solvent, wherein component (A) is a cured product of a composition including: (a) a hydroxyl group-containing organosilicon compound having the formula (1): (R13SiO1/2)k(R12SiO2/2)p(R1SiO3/2)q(SiO4/2)r ??(1) wherein R1 is a group selected from the following formulas (2) and (3) or the like, k, p, q, and r are predetermined integers, wherein R2 to R4 are each hydrogen or the like, and x, y, z, s, t, and u are predetermined numbers; (b) a diisocyanate compound; and (c) an organic compound such as polyols, wherein (c) is m moles, (b) is (l+m)×(0.9 to 1.2) moles each per 1 mole of (a), and m is 0.2 moles or more and less than 1.6 moles, and wherein a content of component (B) is 50 to 98% by weight.

Abstract: A manufacturing method of glass base material for optical fiber in which occurrence of opaque glass portion and elongation can be suppressed is provided. A preparation step of porous base material for optical fiber in which a porous glass layer is formed around the periphery of a core rod; a sintering preparation step, in which the porous base material for optical fiber is hung in a furnace core tube of a sintering apparatus; and a sintering step in which a mixture of halogen-containing gas and inert gas is flowing into the furnace core tube and the porous base material for optical fiber is made into transparent glass by heating the porous base material for optical fiber while moving the heater relative to the porous base material for optical fiber from one end of the core rod to the other end, to obtain glass base material for optical fiber, are performed.

Abstract: In a glass cloth made of glass filaments having a composition which is at least 50 wt % SiO2, the filaments have a diameter that is 0.5 ?m or more and less than 3.0 ?m. The glass cloth has a thickness of 15 ?m or less and a weight of from 0.3 to 10 g/m2.

Abstract: A seed substrate for epitaxial growth has a support substrate, a planarizing layer of 0.5 to 3 ?m provided on the top surface of the support substrate, and a seed crystal layer provided on the top surface of the planarizing layer. The support substrate includes a core of group III nitride polycrystalline ceramics and a 0.05 to 1.5 ?m encapsulating layer that encapsulates the core. The seed crystal layer is provided by thin-film transfer of 0.1 to 1.5 ?m of the surface layer of Si<111> single crystal with oxidation-induced stacking faults (OSF) of 10 defects/cm2 or less. High-quality, inexpensive seed substrates with few crystal defects for epitaxial growth of epitaxial substrates and solid substrates of group III nitrides such as AlN, AlxGa1-xN (0<X<1) and GaN are obtained.

Abstract: The present invention is to provide a pellicle frame in a frame shape, having an upper end face to arrange a pellicle film thereon and a lower end face to face a photomask, and which is characterized by being provided with a notched part from an outer side face toward an inner side face of the upper end face, and to provide a pellicle characterized by including the pellicle frame as a component.

Abstract: The present invention provides a process for preparing 2-methyl-N-(2?-methylbutyl)butanamide of the following formula (1): the process comprising: subjecting an ?-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-?-arylethyl-2-methyl-N-(2?-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the ?-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2?-methylbutyl)butanamide (1).

Abstract: A low dielectric substrate for high-speed millimeter-wave communication includes a quartz glass cloth with a dielectric loss tangent of 0.0001 to 0.0015 and a dielectric constant of 3.0 to 3.8 at 10 GHz, and an organic resin with a dielectric loss tangent within 80% to 150% of the dielectric loss tangent of the quartz glass cloth at 10 GHz and a dielectric constant within 50% to 110% of the dielectric constant of the quartz glass cloth at 10 GHz. This provides a low dielectric substrate for high-speed millimeter-wave communication where the low dielectric substrate makes it possible to send signals that are stable and have excellent quality with no difference in propagation time between wirings even if the substrate has an uneven resin distribution and the quartz glass cloth above and below the wirings, and the difference in dielectric loss tangent between members has been reduced to lower transmission loss.

Abstract: The present invention provides: a temporary adhesive for wafer processing, said temporary adhesive being used for the purpose of provisionally bonding a wafer to a support, while being composed of a photocurable silicone resin composition that contains a non-functional organopolysiloxane; a wafer processed body; and a method for producing a thin wafer, said method using a temporary adhesive for wafer processing.

Abstract: A room-temperature-curable organopolysiloxane composition for an oil seal, wherein an organosilane compound containing a specific organo-oxymethyl group and represented by formula (1) below and/or a partial hydrolysis condensate of said compound is used as a curing agent (crosslinking agent), and an organic compound having a guanidine skeleton is added in combination as a curing catalyst. In the formula, each R1 is independently a C1-12 unsubstituted or substituted monovalent hydrocarbon group, R2 is a C1-12 unsubstituted or substituted monovalent hydrocarbon group, Y is a hydrolyzable group, and n is 0, 1 or 2.

Abstract: The present invention provides a photomask blank which exhibits high adhesion of a resist film to a film containing chromium, and which is capable of achieving good resolution limit and good CD linearity during the formation of an assist pattern of a line pattern, said assist pattern supplementing the resolution of the main pattern of a photomask.

Abstract: An amino-modified silicone emulsion including: (A) an amino-modified silicone represented by formula (1), having a viscosity at 25° C. of 200 to 100,000 mPa·s, and an amine equivalent of 1,000 to 20,000 g/mol; (B) 5 to 100 mass % of a nonionic surfactant relative to the mass of component (A); (C) 50 to 100 mol % of lactic or acetic acid relative to a number of moles of amino groups of component (A); and (D) 85 to 10,000 mass % of water relative to the mass of component (A), where an increased amount of each of (D4), (D5), and (D6) is less than 3,000 ppm relative to the mass of component (A) when the emulsion has been stored at 25° C. for 6 months. Thus, the emulsion is provided wherein octamethyl cyclotetrasiloxane etc. hardly increase over time, and provides excellent smoothness and softness when blended in a hair cosmetic or a fiber treatment agent.

Abstract: A surface treatment agent which contains a fluorooxyalkylene group-containing polymer and/or a partial hydrolysis-condensation product of the polymer, said polymer having at least one group represented by formula (1) (wherein Y represents a single bond or a divalent hydrocarbon group which may have F, Si and a siloxane bond; R represents a C1-C4 alkyl group or a phenyl group; X represents a hydrolyzable group; and a represents 2 or 3) at least at one end of each molecule, wherein the molecular weight distribution of the fluorooxyalkylene group-containing polymer or a fluorooxyalkylene group-containing polymer mixture containing the fluorooxyalkylene group-containing polymer contained in the surface treatment agent is within the range of from 1.2 to 1.8. This surface treatment agent is able to form a cured coating film that has excellent surface sliding properties, excellent water falling properties, low haze and excellent wear resistance.

Abstract: A polymer containing a structural unit including an aromatic hydroxy group bonded to a main chain, where the aromatic hydroxy group is protected by an acid-labile group represented by the following formula (ALU-1) and is deprotected by action of an acid to become alkali-soluble. This provides: a polymer that makes it possible to form a resist film with which it is possible to form a pattern having extremely high isolated space resolution, small LER, and excellent rectangularity, effects of development loading and residue defects being suppressed, and the pattern having etching resistance and suppressed pattern collapse in the produced resist pattern; a chemically amplified positive resist composition containing the polymer; a resist patterning process using the chemically amplified positive resist composition; and a mask blank including the chemically amplified positive resist composition.

Abstract: Provided are a low-viscosity ultraviolet curable silicone composition capable of being used even in a surface exposure method and a lift-up method etc.; and a cured product superior in tensile strength and elongation at break.

Abstract: A film formation device which forms a film on a substrate through the heat treatment of a starting material solution in the form of a mist, the film formation device including a mist conversion unit that generates a mist by converting the starting material solution into mist, a carrier gas supply unit that supplies a carrier gas for transporting the mist generated by the mist conversion unit, a film formation unit that includes therein a placement part for placing the substrate and that is where the mist transported by the carrier gas is supplied onto the substrate, and an exhaust unit that exhausts exhaust gas from the film formation unit, and further including, above the placement part in the film formation unit, a nozzle for supplying the mist onto the substrate and a top plate for adjusting the flow of the mist supplied from the nozzle.

Abstract: A solar cell includes a light-receiving surface electrode formed on a light-receiving surface, a back surface electrode formed on a backside, and a CZ silicon single crystal substrate doped with gallium. The CZ silicon single crystal substrate contains 12 ppm or more oxygen atoms. A spiral oxygen-induced defect is not observed in an EL (electroluminescence) image of the solar cell.