Abstract: A composition and method for electroplating a metal on a substrate. The composition has a chloride to brightener concentration ratio of from 20:1 to 125:1. The method of electroplating, which employs the composition, employs pulse patterns that improve physical properties of metal surfaces.
Type:
Application
Filed:
November 30, 2005
Publication date:
April 20, 2006
Applicant:
Shipley Company, L.L.C.
Inventors:
Leon Barstad, Thomas Buckley, Raymond Cruz, Trevor Goodrich, Gary Hamm, Mark Kapeckas, Katie Price, Erik Reddington, Wade Sonnenberg
Abstract: Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are preferably crosslinking compositions and may contain a resin component in addition to the basic additive. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
Type:
Grant
Filed:
July 30, 2001
Date of Patent:
April 11, 2006
Assignee:
Shipley Company, LLC
Inventors:
Peter Trefonas, III, Manuel doCanto, Edward K. Pavelchek
Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.
Type:
Grant
Filed:
June 9, 2003
Date of Patent:
April 11, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
James W. Thackeray, James F. Cameron, Roger F. Sinta
Abstract: Provided are methods of forming optical waveguides. The methods involve: (a) forming over a substrate a layer of a photodefinable composition; (b) exposing a portion of the layer to actinic radiation; (c) developing the exposed layer to form a waveguide core structure; and (d) heating the waveguide core structure to a temperature and for a time effective to reflow the structure such that it becomes at least partially rounded in cross-section. Also provided are optical waveguides formed from the described methods and electronic devices including one or more of the optical waveguides.
Type:
Grant
Filed:
December 2, 2003
Date of Patent:
April 4, 2006
Assignee:
Shipley Company, LLC
Inventors:
James G. Shelnut, Matthew L. Moynihan, Omari Patterson
Abstract: The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an ester oxygen. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
Abstract: The present invention provides novel alicyclic-esterified norbornene carboxylates monomers, polymers and photoresist compositions that comprise the polymers as a resin binder component. Methods for synthesis of the monomers and polymers of the invention are also provided. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including sub-300 and sub-200 nm wavelengths such as 193 nm and 157 nm.
Type:
Grant
Filed:
February 26, 2001
Date of Patent:
April 4, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
George G. Barclay, Wang Yueh, Joseph Mattia
Abstract: A fiber optic array (90) is provided having fibers (24) positioned at a selected angle relative to the output face of the array. The array includes first (20) and second (30) substrates each of which has a plurality of fiber passageways extending therethrough. The substrates are positioned relative to one another such that each passageway (22) of the first substrate is registered to a respective passageway (32) of the second substrate. An optical fiber is disposed in each pair of registered passageways. The passageways are dimensioned to permit the optical fiber disposed therein to be positioned at a range of angles relative to the output face of the array. The first and second substrates are moved relative to one another to select an angle from the range of angles at which the fibers are oriented relative to the output face of the array. A method for fabricating such a fiber optic array is also provided.
Abstract: Disclosed are electrolyte compositions for depositing tin-copper alloys that are substantially free of lead. Also disclosed are methods of plating tin-copper alloys that are substantially free of lead on substrates and uses for such plated substrates.
Type:
Application
Filed:
November 2, 2005
Publication date:
March 30, 2006
Applicant:
Shipley Company, L.L.C.
Inventors:
Robert Schetty, Michael Toben, James Martin, Neil Brown, Jeffrey Crosby, Keith Whitlaw
Abstract: Methods for depositing uniform, pinhole-defect free organic polysilica coatings are provided. These methods allow for the use of these materials as spin-on cap layers in the manufacture of integrated circuits.
Type:
Grant
Filed:
June 3, 2003
Date of Patent:
March 28, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
Dana A. Gronbeck, Michael K. Gallagher, Jeffrey M. Calvert, Gregory P. Prokopowicz, Timothy G. Adams
Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
Abstract: Free standing articles of chemical vapor deposited silicon carbide with electrical resistivities of less than 0.9 ohm-cm are provided without substantially degrading its thermal conductivity or other properties.
Type:
Grant
Filed:
February 21, 2001
Date of Patent:
March 28, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
Jitendra S. Goela, Michael A. Pickering
Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
Abstract: A functionalized copolymer containing a main chain derived from polymerizable monomers and pendent functional groups terminated with one or more ? or ? ethylenically or acetylenically unsaturated groups. The functionalized copolymers are self cross-linking and are suitable for use as binders.
Type:
Application
Filed:
October 28, 2005
Publication date:
March 16, 2006
Applicant:
Shipley Company, L.L.C.
Inventors:
Edgardo Anzures, Robert Barr, Yueping Fu
Abstract: New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
Type:
Grant
Filed:
March 3, 2003
Date of Patent:
March 7, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
George G. Barclay, Subbareddy Kanagasabapathy, Matthew A. King
Abstract: Porous thermoset dielectric materials having low dielectric constants useful in electronic component manufacture are provided along with methods of preparing the porous thermoset dielectric materials. Also provided are methods of forming integrated circuits containing such porous thermoset dielectric material.
Type:
Grant
Filed:
March 26, 2002
Date of Patent:
February 14, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
Yujian You, Nikoi Annan, Michael K. Gallagher, Robert H. Gore
Abstract: Electrically resistive material including platinum and from about 5 and about 70 molar percent of iridium, ruthenium or mixtures thereof, calculated based on platinum as 100%, are disclosed.
Type:
Grant
Filed:
June 21, 2004
Date of Patent:
February 7, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
Craig S. Allen, John Schemenaur, David D. Senk, Marc Langlois, Xiaodong Hu, Jan Tzyy-Jiuan Hwang, Jud Ready, Trifon Tomov
Abstract: An object of the present invention is to provide an electroless displacement gold plating solution, an additive for use in preparing the plating solution, and a metal composite material obtained by treatment with the plating solution. The electroless displacement gold plating solution contains a water-soluble gold compound, a complexing agent, and a water-soluble silver compound, and optionally a water-soluble thallium compound, a water-soluble lead compound, a water-soluble copper compound or a water-soluble nickel compound, or any combination thereof. The plating solution has good stability and, even not only immediately after the preparation but also after a lapse of a certain time period from the preparation, can be used for production of a metal composite material exhibiting an even plated appearance and also having a thick gold coating film.
Abstract: The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.
Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has been found that linewidth variation is substantially reduced when using the halogenated sulfonic acid generator in a process involving a high temperature post exposure bake.
Type:
Grant
Filed:
March 14, 2002
Date of Patent:
February 14, 2006
Assignee:
Shipley Company, L.L.C.
Inventors:
James W. Thackeray, James F. Cameron, Roger F. Sinta