Patents Assigned to Shipley Company
  • Patent number: 6987919
    Abstract: An optical device is disclosed which includes a waveguide that support a first optical mode in a first region and a second optical mode in a second region. The waveguide further includes single material guiding layer having a lower portion with a first taper and an upper portion with a second taper.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: January 17, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Hui Luo, Mindaugas F. Dautartas, Dan A. Steinberg
  • Publication number: 20050285216
    Abstract: The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographic planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the orientation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop pit with an etch-stop layer.
    Type: Application
    Filed: June 14, 2005
    Publication date: December 29, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Dan Steinberg, Larry Rasnake
  • Patent number: 6977035
    Abstract: A method for electrolytic copper plating using an electrolytic copper plating solution including a compound containing a structure of ā€”Xā€”Sā€”Yā€”, wherein X and Y are independently chosen from hydrogen atom, carbon atom, sulfur atom, nitrogen atom, and oxygen atom, and X and Y may be the same only when they are a carbon atom, and by contacting the electrolytic copper plating solution with ozone is disclosed.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: December 20, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Hideki Tsuchida, Masaru Kusaka, Shinjiro Hayashi
  • Patent number: 6971429
    Abstract: An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under vacuum, heat and mechanical pressure a dry film photoresist-forming layer to printed circuit boards (200) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum applicator (12) comprising two independent vacuum lamination chambers (18,20) in end-to-end relation. The first vacuum chamber operates at ambient temperature to draw off all of the air entrapped between the dry film resist and the surface of the printed circuit board at conditions that do not result in premature tacking of the dry film to the surface of the board.
    Type: Grant
    Filed: December 11, 2002
    Date of Patent: December 6, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Charles R Keil, Osvaldo Novello, Roberto Stanich
  • Patent number: 6973253
    Abstract: A first waveguide holding member has a first transverse surface region and a first optical waveguide having an end terminating at the first transverse surface region. A second waveguide holding member has a second transverse surface region which confronts the first transverse surface region of the first waveguide holding member and a second optical waveguide having an end terminating at the second transverse surface region. A guide member is operatively coupled to the first and second waveguide holding members and guides the first waveguide holding member in a transverse direction relative to the second waveguide holding member so as to selectively optically couple and decouple the ends of the first and second optical waveguides.
    Type: Grant
    Filed: May 11, 2004
    Date of Patent: December 6, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, David W. Sherrer, Mindaugas F. Dautartas, Donald E. Leber
  • Publication number: 20050261152
    Abstract: A composition composed of a persulfate, boric acid, a fluorine containing acid and an inorganic acid. Adjuvants also may be included in the composition. The composition may be employed as a microetch solution in the fabrication of microelectronic packages.
    Type: Application
    Filed: July 28, 2005
    Publication date: November 24, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: John Carter, Jack Fellman, Jacek Knop, Martin Bayes
  • Patent number: 6967222
    Abstract: Methods of preparing porous optical materials are provided. These methods allow for the selection of the desired pore size and level of porosity in the porous optical material. Such methods utilize a preformed polymeric porogen.
    Type: Grant
    Filed: May 24, 2002
    Date of Patent: November 22, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Garo Khanarian, Yujian You, Robert H. Gore, Angelo A. Lamola
  • Publication number: 20050255710
    Abstract: Porous thermoset dielectric materials having low dielectric constants useful in electronic component manufacture are provided along with methods of preparing the porous thermoset dielectric materials. Also provided are methods of forming integrated circuits containing such porous thermoset dielectric material.
    Type: Application
    Filed: June 24, 2005
    Publication date: November 17, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Yujian You, Nikoi Annan, Michael Gallagher, Robert Gore
  • Patent number: 6964804
    Abstract: A micromachined structure, comprising: a substarte; a first wet etched pit disposed in the substrate; a second wet etched pit disposed in the substrate, the second pit extending into the substrate a greater depth than the first pit; and a dry pit disposed between, and adjacent to, the first and second pits. Also disclosed is a micromachined substrate comprising: a wet etched pit; and a dry-etched hole disposed in the wet etched pit, wherein the dry hole extends through the substrate.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: November 15, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, Jasean Rasnake, David W. Sherrer
  • Publication number: 20050250045
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Application
    Filed: July 13, 2005
    Publication date: November 10, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert Barr, Edgardo Anzures, Daniel Lundy
  • Publication number: 20050249967
    Abstract: Tin deposits having greatly reduced whisker formation are provided. Methods of depositing tin layers or films having a reduced tendency to form whiskers are also provided.
    Type: Application
    Filed: July 13, 2005
    Publication date: November 10, 2005
    Applicant: Shipley Company, L.L.C.
    Inventor: Andre Egli
  • Publication number: 20050250044
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Application
    Filed: July 13, 2005
    Publication date: November 10, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert Barr, Edgardo Anzures, Daniel Lundy
  • Patent number: 6956127
    Abstract: Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3?n, where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an integer fro 1 to 3. Such monoalkyl Group VA metal dihalide compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities. Monoalkyl Group VA metal dihydride compounds can be easily produced in high yield and high purity by reducing such monoalkyl Group VA metal dihalide compounds.
    Type: Grant
    Filed: January 17, 2003
    Date of Patent: October 18, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Deodatta Vinayak Shenai-Khatkhate, Michael Brendan Power, Artashes Amamchyan, Ronald L. DiCarlo, Jr.
  • Patent number: 6944945
    Abstract: A method for manufacture of a circuit board and the board formed by the novel method. The method comprises selective plating of metallic reinforcing members, solder mount pads, signal and interconnections sequentially. The resultant board is desirably free of glass fiber reinforcement.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: September 20, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Charles R. Shipley, Robert L. Goldberg, James G. Shelnut
  • Patent number: 6939821
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: September 6, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Jitendra S. Goela, Michael A. Pickering
  • Publication number: 20050191515
    Abstract: Disclosed are composites having very low coefficients of thermal expansion and methods of preparing the composites. Also disclosed are composites having negative coefficients of thermal expansion. Applications of the composites to a wide variety of uses, such as electronic and optoelectronic devices are also disclosed.
    Type: Application
    Filed: April 25, 2005
    Publication date: September 1, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Nathaniel Brese, Garo Khanarian, Craig Allen
  • Patent number: 6932519
    Abstract: An optical device package includes a substrate having a top portion with an a recess for receiving an optical semiconductor component and an elongated linear groove for receiving an optical fiber. The optical fiber is positioned within the groove in the substrate such that the tap surface of the optical fiber is substantially at or below the upper surface of the substrate and the optical fiber is operatively aligned with the optical semiconductor component for the transfer of optical signals therebetween. A frame is hermetically sealed to the upper surface of the substrate.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: August 23, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan. A. Steinberg, David W. Sherrer, Mindaugas F. Dautargas
  • Publication number: 20050180701
    Abstract: An optical device package includes a substrate having a top portion with an a recess for receiving an optical semiconductor component and an elongated linear groove for receiving an optical fiber. The optical fiber is positioned within the groove in said substrate such that the top surface of the optical fiber is substantially at or below the upper surface of the substrate and the optical fiber is operatively aligned with the optical semiconductor component for the transfer of optical signals therebetween. A frame is hermetically sealed to the upper surface of the substrate.
    Type: Application
    Filed: March 15, 2005
    Publication date: August 18, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Dan Steinberg, David Sherrer, Mindaugas Dautargas
  • Publication number: 20050180712
    Abstract: Provided are photodefinable compositions suitable for use in forming an optical waveguide. The compositions include a silsesquioxane polymer having polymerized units of the formula (R1SiO1.5) and (R2SiO1.5), wherein R1 and R2 are different and are substituted or unsubstituted organic side chain groups and are free of hydroxy groups, and two or more functional end groups, and a photoactive component. The solubility of the silsesquioxane polymer is altered upon exposure to actinic radiation such that the composition is developable in an aqueous developer solution. Also provided are methods of forming an optical waveguide with the inventive compositions, optical waveguides, and electronic devices including one or more optical waveguide.
    Type: Application
    Filed: January 10, 2005
    Publication date: August 18, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: James Shelnut, Matthew Moynihan, Omari Patterson
  • Patent number: 6926922
    Abstract: A process and composition for manufacturing printed wiring boards that reduces or eliminates the problem of depositing electroless nickel in through holes that are not designed to be metal plated is provided. Also provided by the present invention is a method and composition for depositing a final finish that is even and bright. The present invention is particularly suitable for the manufacture of printed circuit boards containing one or more electroless nickel-immersion gold layers.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: August 9, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Mei Kiu Leung, Willetta Lai, Pit Kai Peter Cheng, Cecilia Po Sze Wong