Patents Assigned to Silicon Light Machines
  • Patent number: 5764280
    Abstract: A display device includes a plurality of modulatable light sources providing a one-dimensional array of display-elements, and a scanning unit, carried or worn by the user, which causes the user to perceive the array as a two-dimensional image. The scanning unit is movable with respect to the array while still allowing the user to view the array as a two-dimensional image.
    Type: Grant
    Filed: March 20, 1997
    Date of Patent: June 9, 1998
    Assignee: Silicon Light Machines Inc.
    Inventors: David M. Bloom, Asif A. Godil
  • Patent number: 5731802
    Abstract: A time interleaved bit addressed weighted pulse width modulation (PWM) method and apparatus reduces the bandwidth requirement necessary for providing a plurality of data entries regarding multiple points of information. As is well known, a weighted PWM scheme modulates an output by utilizing a frame time that is divided into events of varying durations; most conventional schemes have each bit in the frame being half the duration of its predecessor. The modulated signal is activated during all, some or none of the events in the frame to develop a signal representing a particular parameter. This method and apparatus can be used in a display for selecting among varying levels of gray scale or from among multiple colors on a palette. In one application for a display, a register containing the same number of data pits as pixels in a row of the display is provided. The register is loaded with one bit per frame for each pixel in the entire row.
    Type: Grant
    Filed: April 22, 1996
    Date of Patent: March 24, 1998
    Assignee: Silicon Light Machines
    Inventors: Richard John Edward Aras, Paul A. Alioshin, Bryan P. Straker
  • Patent number: 5661592
    Abstract: A deformable grating aparatus for modulating light is made by forming an insulating layer on a substrate, forming a first conductive layer on the insulating layer and then forming a sacrificial layer thereon. The sacrificial layer and the first conducting layer are then etched to define bit lines and busses to bonding pads. Then a layer of resilient material is formed onto the etched layers and a reflective conducting layer is formed on the resilient layer. A dielectric layer is deposited on the reflective conducting layer. The dielectric layer, the reflective conducting layer, the resilient layer and the sacrificial layer are all then etched to form a grating including a plurality of parallel elements. Thereafter the sacrificial layer is removed below the parallel elements, to suspend the parallel elements over the first conducting layer. The surface is treated to prevent the grating from adhering to the first conducting layer.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: August 26, 1997
    Assignee: Silicon Light Machines
    Inventors: Jonathan G. Bornstein, William C. Banyai, David M. Bloom, Ralph G. Whitten, Bryan P. Staker
  • Patent number: 5629801
    Abstract: A reflective/diffractive light valve system collects light from multiple dimensions around a single light source. From these multiple collection dimensions, the light is directed to impinge on the valve from multiple directions. When the valve is configured to be reflective, the light returns to the source. On the other hand, when the valve is configured to be diffractive, light from a first and third order diffraction are transmitted from the valve for each of the collection dimensions which greatly enhances the efficiency of the system.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: May 13, 1997
    Assignee: Silicon Light Machines
    Inventors: Bryan P. Staker, David M. Bloom, Bryan E. Loucks