Patents Assigned to SILTECTRA GMBH
  • Patent number: 10079171
    Abstract: The present invention relates to a method for the production of at least one three-dimensional layer of solid material, in particular for usage as wafer, and/or at least one tree-dimensional solid body.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: September 18, 2018
    Assignee: Siltectra, GmbH
    Inventor: Jan Richter
  • Publication number: 20180233347
    Abstract: The present invention relates to a method for producing solid body layers. The claimed method comprises at least the following steps: providing a solid body (2) for separating at least one solid body layer (4), arranging a receiving layer (10) on the solid body for holding the solid body layer (4), said receiving layer being made of at least one polymer and an additional material, said receiving layer, in terms of volume, be made mainly of polymer, the additional material having a greater conductivity than the polymer, and the receiving layer (10) is subjected to thermal stress, in particular, mechanical stress, for generating voltages in the solid body (2), wherein a crack in the solid body (2) along a separation plane (8) expands due to the voltages, the solid layer (4) being separated from the solid body (2) due to the crack.
    Type: Application
    Filed: September 24, 2015
    Publication date: August 16, 2018
    Applicant: Siltectra GMBH
    Inventors: Richter Jan, Christian Beyer, Anas Ajaj
  • Publication number: 20180233373
    Abstract: The overall yield of a splitting method for division of a solid-state starting material into at least two solid-state pieces is increased by use of a polymer hybrid material comprising one or more fillers in a polymer matrix. A corresponding splitting method comprises the steps of providing the solid-state starting material with at least one exposed surface, applying a polymer hybrid material comprising fillers in a polymer matrix to at least one exposed surface of the solid-state starting material, so as to result in a composite structure, and subjecting the composite structure to a stress field such that the solid-state starting material is split along a plane within the solid-state starting material into at least two solid-state pieces.
    Type: Application
    Filed: October 6, 2015
    Publication date: August 16, 2018
    Applicant: SILTECTRA GMBH
    Inventors: Wolfram DRESCHER, Jan RICHTER, Christian BEYER
  • Patent number: 10029277
    Abstract: The invention relates to a method of producing at least one layer of solid material.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: July 24, 2018
    Assignee: Siltectra, GmbH
    Inventors: Lukas Lichtensteiger, Jan Richter, Wolfram Drescher
  • Publication number: 20180009130
    Abstract: The present invention relates to a device (1) for separating at least one wafer from a donor substrate (2). The device (1) according to the invention comprises at least a housing (4) with a receiving space (6) for receiving at least one multi-layer arrangement (8) which consists of at least one donor substrate (2) and a receiving layer (10) arranged or generated thereon, and an application device (12) for the contactless application of the multi-layer arrangement (8) for generating crack-conducting stresses in the multi-layer arrangement (8).
    Type: Application
    Filed: January 13, 2016
    Publication date: January 11, 2018
    Applicant: SILTECTRA GmbH
    Inventor: Jan Richter
  • Publication number: 20180001416
    Abstract: The invention relates to a method for cutting off at least one portion (4), in particular a wafer, from a solid body (2). The method comprises at least the following steps: modifying the crystal lattice of the solid body (2) by means of a modifier (18), wherein a number of modifications (19) are produced to form a nonplanar, in particular convex, detachment region (8) in the interior of the solid body, wherein the modifications (19) are produced in accordance with predetermined parameters, wherein the predetermined parameters describe a relationship between a deformation of the portion (4) and a defined further treatment of the portion (4), detaching the portion (4) from the solid body (2).
    Type: Application
    Filed: January 13, 2016
    Publication date: January 4, 2018
    Applicant: SILTECTRA GmbH
    Inventor: Jan Richter
  • Patent number: 9754810
    Abstract: The invention relates to a method for the production of layers of solid material, in particular for use as wafers, comprising the following steps: providing a workpiece for the separation of layers of solid material, the workpiece having at least one exposed surface, producing and/or providing a carrier unit for receiving at least one layer of solid material, the carrier unit being made in a number of layers, the carrier unit having a stabilisation layer and the stabilisation layer being overlapped at least partially by a receiving layer, the receiving layer being made to hold the layer of solid material, and the stabilisation layer being formed, at least partially, such that it has an E modulus that is greater than the E modulus of the receiving layer, connecting the receiving layer to the exposed surface of the workpiece, thus forming a composite structure, exposing the composite structure to an inner and/or outer stress field such that the layer of solid material is separated along a plane of the workpiece
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: September 5, 2017
    Assignee: Siltectra GmbH
    Inventor: Lukas Lichtensteiger
  • Patent number: 8877077
    Abstract: A method of printing comprises the steps of: providing a solid state material having an exposed surface; applying an auxiliary layer to the exposed surface to form a composite structure, the auxiliary layer having a stress pattern; subjecting the composite structure to conditions facilitating fracture of the solid state material along a plane at a depth therein; and removing the auxiliary layer and, therewith, a layer of the solid state material terminating at the fracture depth, wherein an exposed surface of the removed layer of solid state material has a surface topology corresponding to the stress pattern.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: November 4, 2014
    Assignee: Siltectra GmbH
    Inventor: Lukas Lichtensteiger
  • Publication number: 20110259936
    Abstract: A method of printing comprises the steps of: providing a solid state material having an exposed surface; applying an auxiliary layer to the exposed surface to form a composite structure, the auxiliary layer having a stress pattern; subjecting the composite structure to conditions facilitating fracture of the solid state material along a plane at a depth therein; and removing the auxiliary layer and, therewith, a layer of the solid state material terminating at the fracture depth, wherein an exposed surface of the removed layer of solid state material has a surface topology corresponding to the stress pattern.
    Type: Application
    Filed: December 18, 2009
    Publication date: October 27, 2011
    Applicant: SILTECTRA GMBH
    Inventor: Lukas Lichtensteiger