Patents Assigned to SKY TECH INC.
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Patent number: 11597999Abstract: The present disclosure relates to a method and device for decreasing generation of surface oxide of aluminum nitride. In a physical vapor deposition process, the aluminum nitride is deposited on a substrate in a deposition chamber to form an aluminum nitride coated substrate. A cooling chamber and a cooling load lock module respectively perform a first stage cooling and a second stage cooling on the aluminum nitride coated substrate in vacuum environments, so as to prevent the aluminum nitride coated substrate with the high temperature from being exposed in an atmosphere environment to generate the surface oxide. The method and device for decreasing the generation of the surface oxide of the aluminum nitride can further eliminate crystal defects caused by that gallium nitride is deposited on the surface oxide of the aluminum nitride in the next process.Type: GrantFiled: February 24, 2020Date of Patent: March 7, 2023Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Yao-Syuan Cheng
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Patent number: 11535938Abstract: A shower head assembly of an atomic layer deposition device has a first trapezoidal column component, a second trapezoidal column component and a column component, wherein a first bottom edge of the first trapezoidal column component is connected to a second top edge of the second trapezoidal column component, and a second bottom edge of the second trapezoidal column component is connected to a top edge of the column component. The first trapezoidal column component has a first bottom dimension distance, the second trapezoidal column component has a second vertical distance, and the column component has a column vertical distance, wherein a ratio of the column vertical distance to the second vertical distance is greater than or equal to 1.2, and a total distance of the second vertical distance and the column vertical distance is less than the first bottom dimension distance.Type: GrantFiled: March 3, 2021Date of Patent: December 27, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Ching-Liang Yi, Yun-Chi Hsu
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Manufacturing method and manufacturing machine for reducing non-radiative recombination of micro LED
Patent number: 11532665Abstract: The present disclosure is a manufacturing method for reducing non-radiative recombination of micro LED. At least one etched LED epitaxial wafer includes a plurality of etching grooves and mesas, an etched sidewall of the mesa includes a stack of a first type semiconductor layer, an active layer and a second type semiconductor layer. Two stages of ALD are performed on the etched LED epitaxial wafer with different temperature ranges. The first ALD can be used to repair dangling bonds and defects on the etched side walls of the mesa, and the second ALD can be used to form a passivation layer on the etched side walls of the mesa. By the manufacturing method of the present disclosure, non-radiative recombination of the micro LED can be reduced, and the luminous brightness and luminous efficiency of the micro LED can be improved.Type: GrantFiled: December 21, 2020Date of Patent: December 20, 2022Assignee: SKY TECH INC.Inventor: Jing-Cheng Lin -
Patent number: 11532469Abstract: The present disclosure provides a thin-film-deposition equipment with shielding device, which includes a reaction chamber, a carrier and a shielding device. The shielding device includes a first-carry arm, a second-carry arm, a first-shield member, a second-shield member and a driver. The driver interconnects the first-carry arm and the second first-carry arm, for driving and swinging the first-shield member and the second-shield member to move in opposite directions via the first-carry arm and the second first-carry arm. During a cleaning process, the driver swings the shield members toward each other into a shielding state for covering the carrier, such that to prevent polluting the carrier during the process of cleaning the thin-film-deposition equipment.Type: GrantFiled: September 24, 2021Date of Patent: December 20, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Yu-Te Shen
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Patent number: 11527391Abstract: The present disclosure provides a position-detectable shielding device, which includes a first-shield member, a second-shield member, a driver and two position sensors. The driver includes a motor, an outer tube and a main shaft within the outer tube. The motor is connected to the first-shield member and the second-shield member, respectively via the outer tube and the main shaft. Such that, the motor drives and swings the two shield members between a shielding state and an open state. The two position sensors are respectively disposed for detecting that the outer tube has rotated to a first position where the first-shield member is in the open state, and for detecting that the outer tube has rotated to a second position where the first-shield member is in the shielding state, thereby to confirm that the two shield members are exactly at the preset shielding state or the open state.Type: GrantFiled: October 20, 2021Date of Patent: December 13, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Yu-Te Shen
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Patent number: 11482403Abstract: The present disclosure provides a thin-film-deposition equipment for detecting shielding mechanism, which includes a reaction chamber, a carrier, a shielding mechanism and two distance sensors. The carrier and the shielding mechanism is partially disposed within the reaction chamber. The shielding mechanism includes two shield unit and a driver. The driver interconnects and drives the two shield units to sway in opposite directions and into an open state and a shielding state. Each of the two shield unit is disposed with a reflective surface for each of the two distance sensors to respectively project optical beams onto and detect a distances therebetween when the two shield units are operated in the shielding state, such that to confirm that the shielding mechanism is in the shielding state.Type: GrantFiled: October 21, 2021Date of Patent: October 25, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Yu-Te Shen
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Patent number: 11476101Abstract: The present disclosure provides a thin-film-deposition equipment with double-layer shielding device, which includes a reaction chamber, a carrier and a double-layer shielding device. The double-layer shielding device includes a first-shield member, a second-shield member, a first-guard plate, a second-guard plate and a driver. The first-guard plate is disposed on the first-shield member, the second-guard plate is disposed on the second-shield member. The driver interconnects the two shield members for driving and swinging the two shield members to move in opposite directions. During a cleaning process, the driver swings the two shield members toward each other into a shielding state for covering the carrier, the two guard plates thereon also approach each other to cover the shield members, such that to effectively prevent polluting the carrier during the process of cleaning the thin-film-deposition equipment.Type: GrantFiled: October 8, 2021Date of Patent: October 18, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Yu-Te Shen
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Patent number: 11476100Abstract: The present disclosure is a substrate-processing chamber with a shielding mechanism, which includes a reaction chamber, a substrate carrier, a storage chamber and a shielding mechanism. The reaction chamber is connected to the storage chamber, the substrate carrier is within the reaction chamber. The shielding mechanism includes at least one guide unit, at least one connecting seat, a shield and at least one drive arm. The drive arm is connected to the shield for driving the shield to move between the storage chamber and the reaction chamber. During a deposition process, the drive arm drives the shield to move into the storage space. During a cleaning process, the drive arm moves the shield to move into the reaction chamber for prevent pollution to the substrate carrier.Type: GrantFiled: August 23, 2021Date of Patent: October 18, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Ta-Hao Kuo, Yu-Te Shen, Chi-Hung Cheng
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Patent number: 11427910Abstract: An atomic layer deposition equipment capable of reducing precursor deposition and an atomic layer deposition process method using the same are disclosed. The atomic layer deposition equipment includes a chamber, a stage, a precursor inlet, a shielding component, at least one gas inlet, and at least one pumping port, wherein the stage and the shielding component are disposed in a containing space of the chamber. The shielding component shields part of the inner surface of the chamber, and the gas inlet is fluidly connected to the containing space for introducing an inactive gas to the space between the chamber and the shielding component to prevent the precursor from entering. The pumping port pumps out the precursors that have not reacted with a substrate, thereby reducing the precursors remaining on the inner surface of the chamber, prolonging the cleaning cycle of the chamber and improving the product yield.Type: GrantFiled: October 20, 2020Date of Patent: August 30, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Ta-Hao Kuo
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Patent number: 11401608Abstract: An atomic layer deposition equipment and an atomic layer deposition process method are disclosed. The atomic layer deposition equipment includes a chamber, a substrate stage, at least one bottom pumping port, at least one hollow component, a baffle and a shower head assembly, wherein the hollow component has an exhaust hole. The baffle is below the hollow component and forms an upper exhaust path with the hollow component, so that the flow field of the precursor in the atomic layer deposition process can be adjusted to a slow flow field to make a uniform deposition on the substrate.Type: GrantFiled: October 20, 2020Date of Patent: August 2, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Ching-Liang Yi, Yun-Chi Hsu, Hsin-Yu Yao
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Patent number: 11332826Abstract: An atomic layer deposition equipment and an atomic layer deposition process method are disclosed. The atomic layer deposition equipment includes a chamber, a heater, a support unit, a hollow component, a bottom pumping port, and a shower head component, wherein the support unit is disposed on the top surface of the heater for supporting a substrate. There is an upper exhaust path formed between the hollow component and the support unit for exhausting process fluid such as precursors, so that the flow field of the process fluid in the atomic layer deposition process can be adjusted stably to make a uniform deposition on the substrate.Type: GrantFiled: December 3, 2020Date of Patent: May 17, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Ta-Hao Kuo
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Patent number: 11322380Abstract: The present disclosure relates to a substrate transfer system, which includes a main body, a tray cassette base, a tray aligner, a tray robot, a substrate cassette base, a substrate aligner, a substrate robot and a Bernoulli robot. The tray can be transferred to the tray aligner by the tray robot. The substrate can be transferred to the substrate aligner by the substrate robot. By the Bernoulli robot, the substrate can be transferred from the substrate aligner to the tray on the tray aligner.Type: GrantFiled: March 11, 2021Date of Patent: May 3, 2022Assignee: SKY TECH INC.Inventors: Jing-Cheng Lin, Jung-Hua Chang