Abstract: An interconnection element of an interconnection structure of an integrated circuit is manufactures by a method where a cavity is etched in an insulating layer. A silicon nitride layer is then deposited on walls and a bottom of the cavity. The nitrogen atom concentration in the silicon nitride layer increasing as a distance from an exposed surface of the silicon nitride layer increases. A copper layer is deposited on the silicon nitride layer. The cavity is further filled with copper. A heating process is performed after the deposition of the copper layer, to convert the copper layer and the silicon nitride layer to form a copper silicide layer which has a nitrogen atom concentration gradient corresponding to the gradient of the silicon nitride layer.

Abstract: The disclosure concerns an electronic component manufacturing method including a first step of etching at least one first layer followed, with no exposure to oxygen, by a second step of passivating the first layer.

Abstract: The disclosure relates to integrated circuits and methods including one or more rows of transistors. In an embodiment, an integrated circuit includes a row of bipolar transistors including a plurality of first conduction regions, a second conduction region, and a common base between the first conduction regions and the second conduction region. An insulating trench is in contact with each bipolar transistor of the row of bipolar transistors. A conductive layer is on the insulating trench and the common base between the first conduction regions. A spacer layer is between the conductive layer and the first conduction regions.

Abstract: A row decoder includes decoder logic generating an initial word line signal, and two inverters. The first inverter is formed by a first p-channel transistor having a source coupled to a supply voltage and a gate receiving the initial word line signal. The second inverter is formed by a first n-channel transistor having a drain coupled to a drain of the first p-channel transistor, a source coupled to a shared ground line, and a gate receiving the initial word line signal. An inverse word line signal is generated at the drain of the first n-channel transistor. A second inverter inverts the inverse word line signal to produce a word line signal. Negative bias generation circuitry generates a negative bias voltage on the shared ground line when the initial word line signal is logic high, and otherwise couples the shared ground line to ground.

Abstract: A phase-change memory cell is formed by a heater, a crystalline layer disposed above the heater, and an insulating region surrounding sidewalls of the crystalline layer. The phase-change memory cell supports programming with a least three distinct data levels based on a selective amorphization of the crystalline layer.

Abstract: An AC capacitor is coupled to a totem-pole type PFC circuit. In response to detection of a power input disconnection, the PFC circuit is controlled to discharge the AC capacitor. The PFC circuit includes a resistor and a first MOSFET and a second MOSFET coupled in series between DC output nodes with a common node coupled to the AC capacitor. When the disconnection event is detected, one of the first and second MOSFETs is turned on to discharge the AC capacitor with a current flowing through the resistor and the turned on MOSFET. Furthermore, a thyristor may be simultaneously turned on, with the discharge current flowing through a series coupling of the MOSFET, resistor and thyristor. Disconnection is detected by detecting a zero-crossing failure of an AC power input voltage or lack of input voltage decrease or input current increase in response to MOSFET turn on for a DC input.

Abstract: An electronic device includes an analog to digital converter receiving an analog mirror sense signal from an oscillating mirror and generating a digital mirror sense signal therefrom, and a digital signal processing block. The digital signal processing block cooperates with the analog to digital converter to take a first sample of the digital mirror sense signal at a first time where a derivative of capacitance of the digital mirror sense signal crosses zero, take a second sample of the digital mirror sense signal at a second time between a peak of the digital mirror sense signal and the first time, and take a third sample of the digital mirror sense signal at a third time after the digital mirror sense signal has reached a minimum. Control circuitry determines an opening angle of the oscillating mirror as a function of the first, second, and third samples.

Abstract: Disclosed herein is a method of performing a password challenge in an embedded system. The method includes receiving a password, scrambling the sub-words of the password pursuant to scramble control codes, retrieving a verification word, scrambling the sub-words of the verification word pursuant to the scramble control codes, and comparing the scrambled sub-words of the password to the scrambled sub-words of the verification word. Access to a secure resource is granted if the scrambled sub-words of the password match the scrambled sub-words of the verification word. The scramble control codes cause random reordering of the sub-words of the password and sub-words of the verification word in a same fashion, and insertion of random delays between the comparison of different sub-words of the password to corresponding sub-words of the verification word.

Abstract: An HV MOSFET device has a body integrating source conductive regions. Projecting gate structures are disposed above the body, laterally offset with respect to the source conductive regions. Source contact regions, of a first metal, are arranged on the body in electric contact with the source conductive regions, and source connection regions, of a second metal, are arranged above the source contact regions and have a height protruding with respect to the projecting gate structures. A package includes a metal support bonded to a second surface of the body, and a dissipating region, above the first surface of the semiconductor die. The dissipating region includes a conductive plate having a planar face bonded to the source connection regions and spaced from the projecting gate structures. A package mass of dielectric material is disposed between the support and the dissipating region and incorporates the semiconductor die. The dissipating region is a DBC-type insulation multilayer.

Abstract: A bipolar transistor includes a collector. The collector is produced by a process wherein a first substantially homogeneously doped layer is formed at the bottom of a cavity. A second gradually doped layer is then formed by diffusion of dopants of the first substantially homogeneously doped layer.

Abstract: An electronic device is couplable to a plurality of laser diodes and includes a control switch having a drain coupled to a drain metallization and having a source coupled to a first source metallization that is electrically couplable to cathodes of the laser diodes. Each of a plurality of first switches has a drain coupled to the drain metallization and a source coupled to a respective second source metallization that is couplable to an anode of the laser diodes. The second source metallizations are aligned with one another in a direction of alignment, overlie, in a direction orthogonal to the direction of alignment, the respective sources of the first switches, and can be aligned, in a direction orthogonal to the direction of alignment, to the respective laser diodes. At least one of the sources of the first switches can be aligned, in a direction orthogonal to the direction of alignment, to the respective laser diode.

Abstract: Methods of manufacture of an optical diffuser. In one embodiment, an optical diffuser is formed by providing a wafer including a silicon slice of which an upper face is covered with a first layer made of a first material itself covered with a second layer made of a second selectively etchable material with respect to the first material. The method further includes forming openings in the second layer extending up to the first layer and filling the openings in the second layer with a third material. The method yet further includes bonding a glass substrate to the wafer on the side of its upper face and removing the silicon slice.

Abstract: A photodiode includes an active area formed by intrinsic germanium. The active area is located within a cavity formed in a silicon layer. The cavity is defined by opposed side walls which are angled relative to a direction perpendicular to a bottom surface of the silicon layer. The angled side walls support epitaxial growth of the intrinsic germanium with minimal lattice defects.

Abstract: A MEMS micromirror device is formed in a package including a containment body and a lid transparent to a light radiation. The package forms a cavity housing a tiltable platform having a reflecting surface. A metastructure is formed on the lid and/or on the reflecting surface and includes a plurality of diffractive optical elements.

Abstract: A sensor has plurality of pixels arranged in a plurality of rows and columns with row control circuitry for controlling which one of said rows is activated and column control circuitry for controlling which of said pixels in said activated row is to be activated. The column circuitry has memory configured to store information indication as to which of the pixels are defective, wherein each of the pixels has a photodiode and a plurality of transistors which control the activation of the photodiode. A first transistor is configured to be controlled by a column enable signal while a second transistor is configured to be controlled by a row select signal.

Abstract: A NiPt layer with a Pt atom concentration equal to 15% plus or minus 1% is deposited on a semiconductor region (which may, for example, be a source/drain region of a MOS transistor). An anneal is then performed at a temperature of 260° C. plus or minus 20° C., for a duration in the range from 20 to 60 seconds, in order to produce, from the Nickle-Platinum (NiPt) layer and the semiconductor material of said semiconductor region, an intermetallic layer. Advantageously, the intermetallic layer possesses a structure of heteroepitaxy with the semiconductor material, and includes free Pt atoms.

Abstract: Low-voltage differential signaling (LVDS) receiver circuits, electronic devices, and methods are provided. A LVDS receiver includes an input differential pair of transistors that receive a differential input signal. The input differential pair includes a first NMOS transistor that receives a first input signal and a second NMOS transistor that receives a second input signal. A third NMOS transistor has source and drain terminals respectively coupled to source and drain terminals of the first NMOS transistor, and a fourth NMOS transistor has source and drain terminals respectively coupled to source and drain terminals of the second NMOS transistor. A first level shifter is coupled to a gate of the third NMOS transistor, and a second level shifter is coupled to a gate of the fourth NMOS transistor.

Abstract: A normally-off electronic device, comprising: a semiconductor body including a heterostructure that extends over a buffer layer; a recessed-gate electrode, extending in a direction orthogonal to the plane; a first working electrode and a second working electrode at respective sides of the gate electrode; and an active area housing, in the on state, a conductive path for a flow of electric current between the first and second working electrodes. A resistive region extends at least in part in the active area that is in the buffer layer and is designed to inhibit the flow of current between the first and second working electrodes when the device is in the off state. The gate electrode extends in the semiconductor body to a depth at least equal to the maximum depth reached by the resistive region.

Abstract: Binary data is processed through a differential pre-encoder, which includes a simple modulo-2 addition. This step is used to cancel the propagation error that can be introduced by duo-binary modulation and to simplify demodulation. Next the duo-binary encoder introduces controlled Inter Symbol Interference between a previously sent bit and a present bit to compress the spectral density closer to the DC. Next a 60-GHz carrier is modulated and transmitted over differential transmission lines.

Abstract: An input signal having a logic low level at a first voltage and a logic high level at a second voltage is received by a Schmitt trigger. A voltage generator outputs a reference voltage generated from a third voltage that is higher than the second voltage. A first transistor coupled between the third voltage and a power supply node of the Schmitt trigger is biased by the reference voltage to apply a fourth voltage to the power supply node of the Schmitt trigger that is dependent on the reference voltage. The reference voltage has a value which causes the fourth voltage to be less than or equal to the second voltage. A second transistor coupled between the input signal and the input of the Schmitt trigger circuit is also biased by the reference voltage to control the logic high level voltage of the input signal at the Schmitt trigger.