Patents Assigned to Sumitomo Chemical Company, Limited
  • Thermoplastic elastomer composition
    Patent number: 11634570
    Abstract: A thermoplastic elastomer composition that can form a molded article having both high low-temperature impact resistance and high high-temperature impact resistance is provided. A specimen of the thermoplastic elastomer composition 30 mm wide×30 mm long×2.0 mm thick punched out from a central portion of a molded article formed by injection-molding the thermoplastic elastomer composition into a mold cavity 90 mm wide×150 mm long×2.0 mm thick at a cylinder temperature of 220° C., a mold temperature of 50° C., and an injection rate of 25 cm3/sec satisfies the following requirements: (1) an area increase rate S of the specimen after impregnation with petroleum benzine at 23° C. for 24 hours is 20% or less; and (2): a volume increase rate V of the specimen after impregnation with petroleum benzine at 23° C. for 24 hours is 20% or more and 125% or less.
    Type: Grant
    Filed: March 17, 2021
    Date of Patent: April 25, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Tomoki Kanemori
  • HYDROGEN SENSOR ELEMENT
    Publication number: 20230122523
    Abstract: A hydrogen sensor element comprising a pair of electrodes and a hydrogen detection film disposed in contact with the pair of electrodes, wherein the hydrogen detection film contains a conjugated polymer and a dopant, and wherein the absolute value |?G| of energy difference between the lowest unoccupied orbital of the dopant and the highest occupied orbital of the conjugated polymer in the ground state is 4.5 eV or more, is provided.
    Type: Application
    Filed: February 3, 2021
    Publication date: April 20, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Megumi HAYASAKA, Yuichiro KUNAI
  • HYDROGEN SENSOR ELEMENT
    Publication number: 20230124639
    Abstract: A hydrogen sensor element comprising a pair of electrodes and a hydrogen detection film disposed in contact with the pair of electrodes, wherein the hydrogen detection film contains a conjugated polymer and an organic dopant, and wherein the organic dopant includes a dopant having an acid group, and containing an atom having an absolute value of negative charge of 0.55 or more in the molecular structure other than the acid group, is provided.
    Type: Application
    Filed: February 3, 2021
    Publication date: April 20, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Megumi HAYASAKA, Yuichiro KUNAI
  • Group-III nitride laminated substrate and semiconductor light-emitting element
    Patent number: 11631785
    Abstract: A group III-nitride laminated substrate includes a sapphire substrate, a first layer that is formed on the sapphire substrate and is made of aluminum nitride, a second layer that is formed on the first layer and serves as an n-type layer made of gallium nitride and doped with an n-type dopant, a third layer that is formed on the second layer and serves as a light-emitting layer made of a group III-nitride, and a fourth layer that is formed on the third layer and serves as a p-type layer made of a group III-nitride and doped with a p-type dopant. The second layer has a thickness of 7 ?m or less. A half-value width of (0002) diffraction determined through X-ray rocking curve analysis is 100 seconds or less, and a half-value width of (10-12) diffraction determined through X-ray rocking curve analysis is 200 seconds or less.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: April 18, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hajime Fujikura, Taichiro Konno, Takeshi Kimura
  • RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230113512
    Abstract: A resist composition includes (A1) a resin including a structural unit represented by formula (1) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R1 and R2 each represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, X1 and X2 each represent a single bond or *—CO—O—, L1 represents a single bond or a hydrocarbon group which may have a substituent, and —CH2— included in the group may be replaced by —O—, —S—, —SO2— or —CO—, ring W represents a hydrocarbon ring which may have a substituent, mi and mk represent an integer of 1 to 4, and L2 represents a single bond or a hydrocarbon group which may have a substituent, and —CH2— included in the group may be replaced by —O—, —S—, —SO2— or —CO—.
    Type: Application
    Filed: August 3, 2022
    Publication date: April 13, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiromu NAKAMURA, Koji ICHIKAWA
  • HETEROCYCLIC COMPOUND AND HARMFUL ARTHROPOD-CONTROLLING COMPOSITION INCLUDING SAME
    Publication number: 20230115523
    Abstract: A compound of Formula (I) where Q represents a group represented by Q2, . represents a site of binding with the rest of molecules, T1 represents a group represented by T1-1, Z represents an oxygen atom, A2 represents CR4a, B1 represents CR38a, B2 represents CR1, B3 represents a nitrogen atom, G1 represents a nitrogen atom or CR3a, G2 represents a nitrogen atom or CR3b, G3 represents a nitrogen atom or CR3c, G4 represents a nitrogen atom or CR3d, R1 represents a C1-C6 chain hydrocarbon group that is substituted with one or more substituents selected from the group consisting of a cyano group and a halogen atom, R2 represents a C1-C6 alkyl group, and R3a, R3b, R3c, R3d, R4a, and R6 are the same or different and represent a C1-C6 chain hydrocarbon group, R38a represents a C1-C3 chain hydrocarbon group or the like, and n represents 0, 1, or 2.
    Type: Application
    Filed: January 8, 2021
    Publication date: April 13, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ryota MAEHATA, Takeshi TSURUDA, Takayuki SHIODA, Yasumasa SAITO
  • CATALYST FOR HALOGEN PRODUCTION, PACKAGE, AND METHOD FOR PRODUCING PACKAGE
    Publication number: 20230115399
    Abstract: A catalyst for halogen production for oxidizing a hydrogen halide with oxygen to produce a halogen, the catalyst for halogen production including 4% or less by volume of water with respect to a pore volume of the catalyst for halogen production while the catalyst is encapsulated in a package, and the package encapsulating therein the catalyst for halogen production for oxidizing a hydrogen halide with oxygen to produce a halogen, wherein the catalyst for halogen production includes 4% or less by volume of water with respect to a pore volume of the catalyst for halogen production.
    Type: Application
    Filed: January 28, 2021
    Publication date: April 13, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yusuke MIKAMI, Kohei SEKI
  • METHOD FOR PRODUCING OLEFINS
    Publication number: 20230113926
    Abstract: To provide a method for producing olefins having the carbon atom number of 2 to 3 with a high yield. A method for producing olefins including following steps (1) and (2): step (1): heating a polyolefin plastic to obtain a decomposed product (pyrolysis step); and step (2): causing the decomposed product obtained at the step (1) to contact with an MFI zeolite containing sodium atoms in the range of 0.10% by mass to 0.30% by mass to obtain catalytically cracked products containing olefins (catalytic cracking step).
    Type: Application
    Filed: February 15, 2021
    Publication date: April 13, 2023
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, MURORAN INSTITUTE OF TECHNOLOGY
    Inventors: Yoshio UEMICHI, Yasuharu KANDA, Yuki OKAMOTO
  • LAMINATED SUBSTRATE HAVING PIEZOELECTRIC FILM, ELEMENT HAVING PIEZOELECTRIC FILM AND METHOD FOR MANUFACTURING THIS LAMINATED SUBSTRATE
    Publication number: 20230115136
    Abstract: There is provided a laminated substrate having a piezoelectric film, including: a substrate; and a piezoelectric film provided on the substrate interposing a base film, wherein the piezoelectric film has an alkali niobium oxide based perovskite structure represented by a composition formula of (K1-xNax)NbO3 (0<x<1) and preferentially oriented in (001) plane direction, and a sound speed of the piezoelectric film is 5100 m/s or more.
    Type: Application
    Filed: December 15, 2022
    Publication date: April 13, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kenji SHIBATA, Kazutoshi WATANABE, Fumimasa HORIKIRI
  • COLORED RESIN COMPOSITION
    Publication number: 20230106988
    Abstract: An object of the present invention is to provide a colored resin composition, which is useful in production of a color filter suitable for an organic EL display device, excellent in low temperature curability, and also excellent in red color reproducibility. The present invention relates to the colored resin composition containing a colorant, a resin, a polymerizable compound, and a polymerization initiator, wherein the colorant is composed of only pigments, and the pigments include C.I. Pigment Violet 29, a red pigment and a yellow pigment.
    Type: Application
    Filed: December 14, 2020
    Publication date: April 6, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hirotsugu KANO, Takakiyo TERAKAWA
  • Sputtering-target material, sputtering target, sputtering-target aluminum plate, and method of manufacturing the same
    Patent number: 11618942
    Abstract: A sputtering-target material (2) is composed of aluminum having a purity of 99.999 mass % or higher and unavoidable impurities. When an average crystal-grain diameter at the plate surface (21) is given as Ds [?m], an average crystal-grain diameter at a depth of ¼th of the plate thickness (22) is given as Dq [?m], and an average crystal-grain diameter at a depth of ½ of the plate thickness (23) is given as Dc [?m], the formulas below are satisfied, and the average crystal-grain diameter changes continuously in a plate-thickness direction. Ds?230 Dq?280 Dc?300 1.2?Dq/Ds 1.
    Type: Grant
    Filed: June 21, 2018
    Date of Patent: April 4, 2023
    Assignees: UACJ CORPORATION, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiroki Takeda, Masahiro Fujita
  • Composition and method for producing composition
    Patent number: 11621299
    Abstract: The present disclosure relates to a composition including a light-emitting perovskite compound (1) which includes constituent components A, B, and X, and a silazane or modified product thereof (2).
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: April 4, 2023
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Shota Naito, Takashi Arimura, Yoshiaki Sakatani
  • INK COMPOSITION AND METHOD FOR PRODUCING SAME
    Publication number: 20230101034
    Abstract: The present invention further improves the measurement accuracy of the viscosity of an ink composition. An ink composition for forming a functional layer of an organic photoelectric conversion element, wherein an electron spin concentration per 1 L of volume of the ink composition is 250×1016 or less. The ink composition may be an ink composition containing a solvent and a p-type semiconductor material. The ink composition may be an ink composition in which the p-type semiconductor material contains a polymer compound having an electron spin concentration per 1 g of weight of 70×1016 or less. The ink composition may be an ink composition in which the solvent contains one or more types of organic solvents and the p-type semiconductor material contains a ?-conjugated polymer compound containing a donor constitutional unit and an acceptor constitutional unit.
    Type: Application
    Filed: February 8, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Daisuke INOKUCHI, Yuta ISHINO
  • PLANT DISEASE CONTROL COMPOSITION, AND PLANT DISEASE CONTROL METHOD
    Publication number: 20230102128
    Abstract: The present invention provides a composition having an excellent control efficacy against plant diseases, and a method for controlling plant diseases using the same composition, and the composition comprises a compound represented by formula (I) [wherein each symbol represents the definition described in the specification], and one or more compounds selected from a mitochondrial electron transport chain complex III inhibitor, a mitochondrial electron transport chain complex II inhibitor, and a sterol biosynthesis inhibitor.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hidekatsu TOBITA, Yoshihiko NOKURA, Takaaki NAKANO
  • PROCESS OF PREPARING NUCLEIC ACID OLIGOMER
    Publication number: 20230095584
    Abstract: The present invention provides an efficient process for preparing a nucleic acid oligomer, that is, a process for preparing a nucleic acid having a phosphate triester bond effectively by oxidizing a nucleic acid precursor having a phosphite triester bond. Specifically, the present invention provides a process for preparing a nucleic acid compound having at its 5?-terminus a nucleotide represented by formula (I) by a phosphoramidite method, which comprises a step of reacting a precursor having a phosphite triester bond represented by a formula (II) (the definitions of substituents of formulae (I) and (II) are described in the Description) with an oxidation solution subjected to a heat-treatment that contains iodine, pyridine and water.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takuya MIYAGAWA
  • METHOD FOR CONTROLLING QOI FUNGICIDE-RESISTANT SOYBEAN RUST FUNGI
    Publication number: 20230102860
    Abstract: The present invention provides a method for controlling a soybean rust fungus having an amino acid substitution of F129L on mitochondrial cytochrome b protein. According to the present invention, a compound represented by formula (I) [wherein: Q represents a group represented by Q1, a group represented by Q2, a group represented by Q3, or a group represented by Q4 (wherein “•” represents a binding site to a benzene ring); R1 represents a C1-C4 alkyl group which may be optionally substituted with one or more halogen atoms, etc.; E represents R2—CH?CH—, etc.; R2 represents a cyclopropyl group, etc.] can be used to control a soybean rust fungus having an amino acid substitution of F129L on mitochondrial cytochrome b protein.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takaaki NAKANO, Hidekatsu TOBITA, Yuichi MATSUZAKI, Yoshihiko NOKURA
  • METHOD FOR PRODUCING GLYCOLIC ACID SALT AND METHOD FOR PRODUCING GLYCOLIC ACID
    Publication number: 20230095083
    Abstract: A glycolic acid salt that can be a raw material (intermediate product) for producing glycolic acid is more efficiently produced by a simple process. A method for producing a glycolic acid salt includes step (1) of reacting at least one compound selected from the group consisting of glycolonitrile and glycolamide with water in the presence of a metal oxide containing 50% by mass or more of at least one element selected from the group consisting of a rare earth element, a group 4 element of the periodic table, and a group 12 element of the periodic table, and a base to obtain a glycolic acid salt.
    Type: Application
    Filed: January 19, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayuki IKEGUCHI, Takahiro ISHIHARA
  • CURABLE RESIN COMPOSITION AND DISPLAY DEVICE
    Publication number: 20230099979
    Abstract: There is provided a curable resin composition containing quantum dots (A), a resin (B), a photopolymerizable compound (C), and a photopolymerization initiator (D), in which the photopolymerization initiator (D) contains an oxime compound having a first molecular structure represented by the formula (1).
    Type: Application
    Filed: March 19, 2021
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshihiro HARADA, Masayoshi TOKUDA, Yoshifumi KOMATSU
  • PRODUCTION APPARATUS FOR PRODUCING STRUCTURAL BODY AND PRODUCTION METHOD FOR PRODUCING STRUCTURAL BODY
    Publication number: 20230099777
    Abstract: A production apparatus for producing a structural body includes: a holding mechanism that holds a processing target in contact with an etching solution, the processing target including an etch region that is made of a Group III nitride, and on which photoelectrochemical etching is to be performed; a light emitting device that irradiates the processing target with first light for performing the photoelectrochemical etching; a light emitting device that irradiates the processing target with second light that has a wavelength longer than that of the first light; and a measurement device that measures reflected light resulting from the second light being reflected off a surface of the etch region.
    Type: Application
    Filed: September 9, 2022
    Publication date: March 30, 2023
    Applicants: SCIOCS COMPANY LIMITED, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Fumimasa HORIKIRI, Noboru FUKUHARA
  • POLYMER COMPOSITION, MOLDED ARTICLE, AND OPTICAL MEMBER
    Publication number: 20230098037
    Abstract: Provided are a polymer composition capable of achieving both thermal stability and thermal deterioration-resistant characteristics in a well-balanced manner, and a molded article and an optical member each containing the polymer composition. A polymer composition contains: a polymer including a structural unit derived from a (meth)acrylate and a structural unit derived from (meth)acrylic acid; and at least one compound (A) selected from the group consisting of 4-tert-butylcatechol, 6-tert-butyl-2,4-xylenol, paramethoxyphenol, hydroquinone, 2,2,6,6-tetramethylpiperidinyl-1-oxile, 4-hydroxy-2,2,6,6-tetramethylpiperidinyl-1-oxile, and triphenyl verdazyl. The content of compound (A) is 1 ppm by mass to 10 ppm by mass.
    Type: Application
    Filed: November 25, 2020
    Publication date: March 30, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ryosuke OKAZAKI, Makoto MANABE