Patents Assigned to Sumitomo Chemical Company, Limited
  • Resist composition and method for producing resist pattern
    Patent number: 11675267
    Abstract: Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
    Type: Grant
    Filed: February 26, 2021
    Date of Patent: June 13, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuji Kita, Nobuhiko Nishitani, Koji Ichikawa
  • PRODUCTION OF JASMONATES IN FILAMENTOUS FUNGI
    Publication number: 20230175033
    Abstract: The present invention relates to improved methods for producing jasmonates such as jasmonic acid and methyl jasmonate in filamentous fungi under shaking conditions, hence enabling scale-up manufacturing processes using conventional fermenters. Specifically, one or more fungal quorum sensing molecules and/or jasmonate production elicitors can be added in the nutrient medium during cultivation of the filamentous fungi to induce formation of favorable morphologies and jasmonate production.
    Type: Application
    Filed: May 4, 2021
    Publication date: June 8, 2023
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Hui Chen, Oliver Yu
  • DISPLAY DEVICE
    Publication number: 20230176421
    Abstract: A display device including a light source (A), a color conversion layer (B), and a color filter (C), wherein the color conversion layer (B) contains quantum dots (B-r) that emit red light, the color filter (C) has a blue color filter (C-b), a green color filter (C-g), and a red color filter (C-r), and the display device satisfies ??1.80 and (II) ??63.0.
    Type: Application
    Filed: July 13, 2021
    Publication date: June 8, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshihiro HARADA, Yoshifumi KOMATSU, Tomohiro FUKUURA
  • Light-emitting composition
    Patent number: 11667835
    Abstract: A composition comprising a light-emitting material having a photoluminescent spectrum with a peak wavelength of more than 600 nm and material comprising a group of formula (I): wherein 1 2 3 4 Ar1, Ar2, Ar3 and Ar4 are each independently a C6-20 aryl group which is unsubstituted or substituted with one or more substituents, Ar5 independently in each occurrence is a heteroarylene group or a C6-20 arylene group which is unsubstituted or substituted with one or more substituents, and m is 0, 1, 2 or 3. The composition may be used in an organic light-emitting device.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: June 6, 2023
    Assignee: Sumitomo Chemical Company Limited
    Inventor: Kiran Kamtekar
  • Inorganic oxide
    Patent number: 11666889
    Abstract: Provided is a powder inorganic oxide containing Al, Ce and Zr as constituent elements, that affords a molded product with a density of 1.0 to 1.3 g/ml by placing 4.0 g of the inorganic oxide in a cylindrical container having diameter 20 mm and performing uniaxial molding under conditions of room temperature and pressure of 29.4 MPa for 30 sec., and achieves an average shrinkage percentage of not more than 14.0% as calculated by the following formula: average shrinkage percentage (%)=100×{(1?(c)/(a))+(1?(d)/(b))}/2 wherein each symbol is as defined in the DESCRIPTION.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: June 6, 2023
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshitaka Kawakami, Hiroyuki Ando
  • PHOTODETECTOR ELEMENT
    Publication number: 20230171973
    Abstract: To improve specific detectivity. A photodetector element 10 includes: an anode 12; a cathode 16; and an active layer 14 provided between the anode and the cathode and containing a p-type semiconductor material and an n-type semiconductor material, wherein a value (?EA+?EB) of a sum of a value (?EA) obtained by subtracting an absolute value of an energy level of HOMO of the p-type semiconductor material from an absolute value of an energy level of HOMO of the n-type semiconductor material and a value (?EB) obtained by subtracting an absolute value of an energy level of LUMO of the p-type semiconductor material from an absolute value of an energy level of LUMO of the n-type semiconductor material is in a range of more than 0 and less than 0.88.
    Type: Application
    Filed: March 22, 2021
    Publication date: June 1, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Giovanni FERRARA, Takafumi ARAKI, Miho OZEKI
  • METHOD FOR PRODUCING NUCLEIC ACID OLIGOMER
    Publication number: 20230167152
    Abstract: The present invention provides a method for efficiently producing a nucleic acid oligomer. Specifically, the present invention provides a method for producing a nucleic acid oligomer represented by Formula (2), the method including a step of reacting a nucleic acid oligomer represented by Formula (1) with a dichloroacetic acid solution having a molar ratio of formaldehyde to dichloroacetic acid (formaldehyde mol/dichloroacetic acid mol) of 90×10?6 or less: wherein symbols have the meanings given in the description; wherein symbols have the meanings given in the description.
    Type: Application
    Filed: March 26, 2021
    Publication date: June 1, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuki TANAKA, Toshifumi KANO
  • GROUP III NITRIDE STACK
    Publication number: 20230167585
    Abstract: There is provided a Group III nitride stack in which the concentration of an impurity in the buffer/channel layer of an HEMT is suppressed to a predetermined range. The Group III nitride stack includes a first layer comprising gallium nitride, and a second layer on the first layer, the second layer comprising a Group III nitride having a lower electron affinity than gallium nitride. The first layer includes a lower layer and an upper layer on the lower layer. The carbon concentration in the upper layer is lower than a carbon concentration in the lower layer, the hydrogen concentration in the upper layer is lower than a hydrogen concentration in the lower layer, the carbon concentration in the upper layer is 5×1016 cm?3 or less, and the hydrogen concentration in the upper layer is 1×1017 cm?3 or less.
    Type: Application
    Filed: November 22, 2022
    Publication date: June 1, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ryota ISONO, Takeshi TANAKA
  • SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230161256
    Abstract: A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resist composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I).
    Type: Application
    Filed: October 31, 2022
    Publication date: May 25, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230161244
    Abstract: A carboxylate represented by formula (I), a resin comprising a structural unit derived from the carboxylate represented by formula (I), a resit composition comprising the carboxylate represented by formula (I) or a resin comprising a structural unit derived from the carboxylate represented by formula (I).
    Type: Application
    Filed: October 31, 2022
    Publication date: May 25, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230161250
    Abstract: A carboxylate represented by formula (I), a resin comprising a structural unit derived from the carboxylate represented by formula (I), a resist composition comprising the carboxylate represented by formula (I) or a resin comprising a structural unit derived from the carboxylate represented by formula (I).
    Type: Application
    Filed: October 31, 2022
    Publication date: May 25, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230161243
    Abstract: A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resit composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I).
    Type: Application
    Filed: October 31, 2022
    Publication date: May 25, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Coating fluid
    Patent number: 11655390
    Abstract: The present invention provides a coating fluid including: a hydroxy group-containing resin; an inorganic layered compound; and a liquid medium, in which a ratio (outflow time (B)/outflow time (A)) of outflow time (B) of a coating fluid at 5° C. measured by a Zahn cup to outflow time (A) of a coating fluid at 24° C. measured by a Zahn cup is 1.40 or less.
    Type: Grant
    Filed: November 5, 2018
    Date of Patent: May 23, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Nobuhiro Oosaki, Mizuki Sato, Daisuke Shibata
  • Fungicide composition and method for controlling disease of crop
    Patent number: 11653650
    Abstract: The present invention relates to a fungicide composition having excellent fungicidal activity, particularly a fungicide composition comprising isofetamid and mandestrobin as active ingredients, and a method for controlling a disease of a crop, which comprises applying isofetamid and mandestrobin to the crop.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: May 23, 2023
    Assignees: ISHIHARA SANGYO KAISHA, LTD., SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuzuka Abe, Shuko Nishimi
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230152691
    Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5, and AI? represents an organic anion.
    Type: Application
    Filed: August 24, 2022
    Publication date: May 18, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Saki KATO, Koji ICHIKAWA
  • PHENYLACETIC ACID DERIVATIVE, USE THEREFOR, AND PRODUCTION INTERMEDIATE THEREOF
    Publication number: 20230150909
    Abstract: The present invention provides a compound having an excellent efficacy for controlling pests. According to the present invention, a compound represented by formula (I) [wherein Q represents a group represented by Q1, or a group represented by Q2 (where • represents a binding site to a benzene ring), E represents a C5-C6 cycloalkenyl group and so on, L represents an oxygen atom or NH, a combination of R1 and n represents a combination where R1 represents a hydrogen atom, and n is 1, and so on, and R2 represents a methyl group and so on] or its N-oxide, or agriculturally acceptable salts thereof has an excellent efficacy for controlling pests.
    Type: Application
    Filed: January 29, 2021
    Publication date: May 18, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Nao MAEHATA, Keisuke ARAI, Hiroto TAMASHIMA, Toshiyuki HARADA
  • CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20230152693
    Abstract: A carboxylate represented by formula (I), a resin comprising a structural unit derived from the carboxylate represented by formula (I), a resit composition comprising the carboxylate represented by formula (I) or a resin comprising a structural unit derived from the carboxylate represented by formula (I).
    Type: Application
    Filed: October 31, 2022
    Publication date: May 18, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • ELECTROCHEMICAL SENSOR AND METHOD FOR MANUFACTURING ELECTROCHEMICAL SENSOR
    Publication number: 20230152268
    Abstract: There is provided an electrochemical sensor, comprising: a working electrode; a counter electrode; and a base material supporting the working electrode and the counter electrode, wherein the working electrode is a chip-shaped electrode including a diamond film that causes a redox reaction on its surface when a predetermined voltage is applied in a state where a test sample exists between the working electrode and the counter electrode, and a support that comprises a material other than diamond and supports the diamond film, and the working electrode is mounted on the base material, with the support positioned on the base material side and at least a part of a side surface of the support exposed.
    Type: Application
    Filed: April 15, 2021
    Publication date: May 18, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kaori KURIHARA, Yohei OTOKI, Koji NAKAMURA, Yuichi KOIBUCHI, Atsushi SATO
  • Charge trap evaluation method and semiconductor element
    Patent number: 11652150
    Abstract: Provided are a charge trap evaluation method and semiconductor device including, in an embodiment, a step for applying an initialization voltage that has the same sign as a threshold voltage and is greater than or equal to the threshold voltage between the source electrode 15 and drain electrode 16 of a semiconductor device 1 having an HEMT structure and the substrate 10 of the semiconductor device 1 and initializing a trap state by forcing out trapped charge from a trap level and a step for monitoring the current flowing between the source electrode 15 and drain electrode 16 after the trap state initialization and evaluating at least one from among charge trapping, current collapse, and charge release.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: May 16, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kuniyuki Kakushima, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Hiroshi Iwai, Taiki Yamamoto
  • Semiconductor gas sensor and gas sensing method
    Patent number: 11650176
    Abstract: A method of sensing a target gas in an environment in which a response of a semiconducting gas sensor device upon exposure to the environment is measured. The semiconducting gas sensor device includes first and second electrodes in electrical contact with a doped organic semiconductor layer and is, e.g., an organic thin film transistor or organic chemiresistor. The measured response may be indicative of a cumulative amount of a target gas that the semiconducting gas sensor device has been exposed to. A gas sensor module containing the semiconducting gas sensor device may be connectable to a reader configured to read the semiconducting gas sensor device after exposure to the environment. The connection may be wired or wireless. The target gas may be 1-methylcyclopropene.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: May 16, 2023
    Assignee: Sumitomo Chemical Company Limited
    Inventor: Daniel Tobjork