Patents Assigned to Sumitomo Chemical Company, Limited
  • Publication number: 20230142065
    Abstract: There is provided a piezoelectric stack, including: a substrate; an output-side bottom electrode film on the substrate; an output-side piezoelectric film, being an oxide film, on the output-side bottom electrode film; an output-side top electrode film on the output-side piezoelectric film; an input-side bottom electrode film on the substrate; an input-side piezoelectric film, being a nitride film, on the input-side bottom electrode film; an input-side top electrode film on the input-side piezoelectric film; and an ultrasonic output part and ultrasonic input part placed in such a manner as not overlapping each other when viewed from a top surface of the substrate, the ultrasonic output part comprising a stacked part of the output-side bottom electrode film, the output-side piezoelectric film, and the output-side top electrode film, the ultrasonic input part comprising a stacked part of the input-side bottom electrode film, the input-side piezoelectric film, and the input-side top electrode film.
    Type: Application
    Filed: February 24, 2021
    Publication date: May 11, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshiaki KURODA, Kenji SHIBATA, Kazutoshi WATANABE, Takeshi KIMURA
  • Publication number: 20230146890
    Abstract: A salt represented by formula (I), a resin comprising a structural unit derived from the salt represented by formula (I), a resit composition comprising the salt represented by formula (I) or a resin comprising a structural unit derived from the salt represented by formula (I).
    Type: Application
    Filed: October 31, 2022
    Publication date: May 11, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Publication number: 20230146232
    Abstract: Provided is a protein derived from Tumebacillus sp. NITE BP-02779 and having peptidoglycan-degrading activity. Provided is a protein comprising the amino acid sequence at positions 1 to 164 of SEQ ID NO: 2 or the amino acid sequence at positions 1 to 493 of SEQ ID NO: 4, or the amino acid sequences with a substitution, deletion, insertion, or addition of 1 to 10 amino acid residues, or an amino acid sequence having 90% or more identity to the amino acid sequences, and having peptidoglycan-degrading activity.
    Type: Application
    Filed: March 24, 2021
    Publication date: May 11, 2023
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, KATAOKA BIO LABORATORY CO., LTD.
    Inventors: Tomokazu MITSUI, Akiho HARIMA, Yusuke ONISHI
  • Publication number: 20230144404
    Abstract: Disclosed is a sulfanyl sulfonic acid compound represented by the following formula (1) or a metal salt thereof. In the formula, m represents an integer of 2 to 7, n represents an integer of 3 to 10, and R1 and R2 each independently represent a hydrogen atom or an alkyl group.
    Type: Application
    Filed: February 26, 2021
    Publication date: May 11, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Natsuyo KAMIMOTO, Takeshi HARA
  • Patent number: 11643533
    Abstract: Provided are a film having an excellent balance between heat seal strength and opening strength, a method of producing the film, and a bag obtained by heat-sealing the film. According to the present invention, there is provided a film containing a resin, wherein a resin density of the film is 860 kg/m3 or more and less than 900 kg/m3, and on at least one surface of the film, an arithmetic mean height Sa satisfies the following Expression [1]: 0.10 ?m?Sa?0.50 ?m??[1], and a minimum autocorrelation length Sal satisfies the following Expression [2]: 0.2 ?m?Sal?10.4 ?m??[2].
    Type: Grant
    Filed: March 10, 2021
    Date of Patent: May 9, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Naoko Ochi, Hiroshi Toyoda
  • Patent number: 11642621
    Abstract: An acidic gas separation membrane sheet causes an acidic gas to selectively permeate therethrough. The acidic gas separation membrane sheet includes a first porous layer, a hydrophilic resin composition layer, and a second porous layer in this order. A second peel strength between the second porous layer and the hydrophilic resin composition layer is less than a first peel strength between the first porous layer and the hydrophilic resin composition layer. An average value of the second peel strength is within a range of greater than or equal to 5 N/m and less than or equal to 500 N/m.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: May 9, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hironori Takemoto, Kohei Yamamoto, Shohei Kasahara, Osamu Hirose
  • Publication number: 20230139896
    Abstract: Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition including the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc., A1 and A2 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, —SO2—, etc., X3 and X4 each represent —O— or —S—, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1?m1+m7?5, 0?m2+m8?5, and AI? represents an organic anion.
    Type: Application
    Filed: August 26, 2022
    Publication date: May 4, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Saki KATO, Koji ICHIKAWA
  • Publication number: 20230135208
    Abstract: A piezoelectric stack, including: a substrate; an electrode film; and a piezoelectric film comprising an alkali niobium oxide of a perovskite structure represented by a composition formula of (K1-xNax)NbO3 (0<x<1), wherein an average light transmittance through the piezoelectric film in a wavelength region of visible light and near-infrared ray is 65% or more.
    Type: Application
    Filed: November 14, 2019
    Publication date: May 4, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kenji SHIBATA, Kazutoshi WATANABE, Fumimasa HORIKIRI
  • Publication number: 20230135345
    Abstract: Provided is an ink composition capable of improving external quantum efficiency of a photoelectric conversion element. A method for producing an ink composition containing a p-type semiconductor material, an n-type semiconductor material, and a solvent, the method comprising: a step of preparing one or more compositions in which one or both of the p-type semiconductor material and the n-type semiconductor material are dissolved in the solvent; and a step of storing the composition for 4 days or longer to prepare the ink composition. The p-type semiconductor material contains a polymer compound having a donor-acceptor structure.
    Type: Application
    Filed: March 14, 2022
    Publication date: May 4, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Shiro KATAKURA, Yuki YOKOI
  • Patent number: 11640114
    Abstract: A compound represented by the formula (I): wherein R1, R2, R3, R4, X1, X2, Xa, Xb, L1, L2, L3 and L4 are defined in the specification.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: May 2, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko Shimada, Koji Ichikawa
  • Patent number: 11640906
    Abstract: Provided is a crystal laminate including: a crystal substrate formed from a monocrystal of group III nitride expressed by a compositional formula InxAlyGa1-x-yN (where 0?x?1, 0?y?1, 0?x+y?1), the crystal substrate containing at least any one of n-type impurity selected from the group consisting of Si, Ge, and O; and a crystal layer formed by a group III nitride crystal epitaxially grown on a main surface of the crystal substrate, at least any one of p-type impurity selected from the group consisting of C, Mg, Fe, Be, Zn, V, and Sb being ion-implanted in the crystal layer. The crystal laminate is configured in a manner such that an absorption coefficient of the crystal substrate for light with a wavelength of 2000 nm when the crystal substrate is irradiated with the light falls within a range of 1.8 cm?1 or more and 4.6 cm?1 or less under a temperature condition of normal temperature.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: May 2, 2023
    Assignees: SUMITOMO CHEMICAL COMPANY, LIMITED, HOSEI UNIVERSITY
    Inventors: Fumimasa Horikiri, Takehiro Yoshida, Tomoyoshi Mishima
  • Publication number: 20230130507
    Abstract: It is an object of the present invention to provide a negative resist composition that is useful for producing a color filter with a high transmittance of light at a wavelength of 440 nm. A negative resist composition of the present invention comprises a colorant and a resin, wherein the colorant contains a xanthene dye, and a cured film formed from the negative resist composition exhibits a spectrum that satisfies the following condition 1: [condition 1] a maximum absorption wavelength is present in a wavelength range of 500 to 580 nm, and based on a transmittance at the maximum absorption wavelength being 5%, a transmittance at a wavelength of 440 nm is 80% or more and a transmittance at a wavelength of 620 nm is 80% or more.
    Type: Application
    Filed: March 11, 2021
    Publication date: April 27, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomohiro NAKAYAMA, Tetsuo AKASAKA, Takuma AOKI, Taku MIYAZAWA
  • Publication number: 20230130221
    Abstract: A conjugated diene-based polymer including at least conjugated diene monomer units, and having a shrinkage factor of high molecular weight molecules of 0.4 to 0.8, a degree of adsorption of high molecular weight molecules onto silica of 75% or less, and a degree of adsorption of medium molecular weight molecules of 40 to 100%.
    Type: Application
    Filed: March 29, 2021
    Publication date: April 27, 2023
    Applicants: ZS ELASTOMERS CO., LTD., SUMITOMO CHEMICAL COMPANY, LIMITED, ZEON CORPORATION
    Inventors: Jesus RODRIGUEZ CASTANON, Hisakatsu HAMA, Sho KANESAKA, Yukari ICHIMIYA
  • Publication number: 20230127143
    Abstract: The present invention provides a method for controlling a soybean rust fungus having an amino acid substitution of F129L on mitochondrial cytochrome b protein. According to the present invention, a compound represented by formula (I) [wherein R1 represents a C1-C3 chain hydrocarbon group and so on, n is 0, 1, 2 or 3, and when is 2 or 3, a plural of R2 may be identical to or different from each other, and R2 represents a C1-C3 chain hydrocarbon group and so on, Q represents a group represented by Q1 (where • represents a binding site to a benzene ring) and so on, L1 represents CH2 or an oxygen atom, and E represents a C1-C6 alkyl group and so on.] can use to control a soybean rust fungus having an amino acid substitution of F129L on mitochondrial cytochrome b protein.
    Type: Application
    Filed: January 29, 2021
    Publication date: April 27, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuichi MATSUZAKI, Takaaki NAKANO, Hidekatsu TOBITA, Hiroto TAMASHIMA, Keisuke ARAI
  • Publication number: 20230130546
    Abstract: The present invention provides a composition having excellent control efficacy against plant diseases and a method for controlling plant diseases.
    Type: Application
    Filed: January 29, 2021
    Publication date: April 27, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hidekatsu TOBITA, Hiroto TAMASHIMA, Takaaki NAKANO
  • Patent number: 11634639
    Abstract: A polarizing film including a polarizer that is a cured product of a polymerizable liquid crystal composition is provided. The polymerizable liquid crystal composition contains both a polymerizable liquid crystal compound having at least one polymerizable group and a dichroic coloring matter. The polarizer is laminated on a surface, having a pore size of 0.45 nm to 0.57 nm, of a base material. The pore size is obtained by converting, into a diameter, an average free volume radius calculated by a positron lifetime measurement method in which the positron lifetime is measured by irradiating the surface with positrons with an injection energy of 3 kV.
    Type: Grant
    Filed: May 27, 2019
    Date of Patent: April 25, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yosuke Ota, Nobuyuki Hatanaka
  • Patent number: 11634420
    Abstract: A compound of formula (I): (Formula (I)) wherein Ar1, Ar2 and Ar3 independently in each occurrence is a C6-20 aryl group or a 5-20 membered heteroaryl group which is unsubstituted or substituted with one or more substituents; X1, X2 and X3 in each occurrence is independently a direct bond or a group of formula —C(R1)2— wherein R1 in each occurrence is independently H or a substituent. The compound of formula (I) may be used to form an n-dopant for doping an organic semiconductor. A film formed by such n-doping may be used in an organic electronic device, for example an electron injection layer of an organic light-emitting device.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: April 25, 2023
    Assignee: Sumitomo Chemical Company Limited
    Inventors: William Tarran, James Lee, Nazrul Islam
  • Patent number: 11632955
    Abstract: A compound which has a superior control effect on arthropod pests is provided. In particular, a compound represented by formula (I) is provided, wherein the variable groups are as defined in the specification. Also provided is a composition containing the compound represented by formula (I), and uses thereof for controlling harmful arthropods.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: April 25, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takeshi Tsuruda, Takamasa Tanabe, Masaru Shimomura
  • Patent number: 11634570
    Abstract: A thermoplastic elastomer composition that can form a molded article having both high low-temperature impact resistance and high high-temperature impact resistance is provided. A specimen of the thermoplastic elastomer composition 30 mm wide×30 mm long×2.0 mm thick punched out from a central portion of a molded article formed by injection-molding the thermoplastic elastomer composition into a mold cavity 90 mm wide×150 mm long×2.0 mm thick at a cylinder temperature of 220° C., a mold temperature of 50° C., and an injection rate of 25 cm3/sec satisfies the following requirements: (1) an area increase rate S of the specimen after impregnation with petroleum benzine at 23° C. for 24 hours is 20% or less; and (2): a volume increase rate V of the specimen after impregnation with petroleum benzine at 23° C. for 24 hours is 20% or more and 125% or less.
    Type: Grant
    Filed: March 17, 2021
    Date of Patent: April 25, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Tomoki Kanemori
  • Publication number: 20230122523
    Abstract: A hydrogen sensor element comprising a pair of electrodes and a hydrogen detection film disposed in contact with the pair of electrodes, wherein the hydrogen detection film contains a conjugated polymer and a dopant, and wherein the absolute value |?G| of energy difference between the lowest unoccupied orbital of the dopant and the highest occupied orbital of the conjugated polymer in the ground state is 4.5 eV or more, is provided.
    Type: Application
    Filed: February 3, 2021
    Publication date: April 20, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Megumi HAYASAKA, Yuichiro KUNAI