Patents Assigned to Technion Research and Development Foundation
  • Publication number: 20200284652
    Abstract: A sensing device that may include a substrate; a single-ended SPAD; first electrical components; second electrical components; and capacitors. The SPAD, the first electrical components and the second electrical components are formed on the substrate. The SPAD and the first electrical components belong to a high voltage domain of the sensing device. The high voltage domain is configured to receive a high supply voltage that exceeds a breakdown voltage of the SPAD. The second electrical components belong to a low voltage domain of the sensing device. The capacitors are coupled between the low voltage domain and the high voltage domain. The first electrical components and the second electrical components belong to an electrical circuit that is configured to perform quenching of the SPAD.
    Type: Application
    Filed: February 11, 2020
    Publication date: September 10, 2020
    Applicant: Technion research and development foundation
    Inventors: Alexander KATZ, Yael Nemirovsky
  • Patent number: 7905836
    Abstract: A method of using ultrasound waves that are focused at a specific location in a medium is provided to cause localized production of bubbles at that location and to control the production, and the cavitational and heating effects that take place there. Production and control are accomplished by interference-specific waveforms at the focal point, which are not produced at other locations. Preferably, the region within the focal zone of all the transducers in which the specific waveform develops at significant intensities are very small. The method, and a system that performs the method, can be used to perform a variety of therapeutic procedures. Typical of such procedures is occlusion of varicose veins.
    Type: Grant
    Filed: February 3, 2005
    Date of Patent: March 15, 2011
    Assignee: Technion Research and Development Foundation
    Inventor: Adam Dan
  • Publication number: 20100143826
    Abstract: A fuel cell anode with high surface-to-volume ratio made of fibrous mat is disclosed. The fuel cell anode can be a fibrous mat produced by electrospinning method. The disclosed anode enables to fuel with saccharides fuel cells. In a preferred embodiment the fuel cell anode is provided wherein the anode is an electrospun fibrous mat, wherein the fibers are made of a polymer coated by a conductive material, preferably silver. This anode can also be made of fibrous mat, wherein the fibers are made of polymer fibers that contain metallic particles. A fuel cell that contains the disclosed anode and a fuel, such as glucose, is also disclosed in the present invention.
    Type: Application
    Filed: January 11, 2008
    Publication date: June 10, 2010
    Applicants: OFEK ESHKOLOT RESEARCH AND DEVELOPMENT LTD, TECHNION RESEARCH AND DEVELOPMENT FOUNDATION
    Inventors: Pinchas Schechner, Evgenia Bubis, Ehud Kroll, Eyal Zussman, Shmuel Chervinski
  • Patent number: 7138554
    Abstract: A method for the synthesis of cyclobuta aromatic compounds by cyclizing two ortho dibromoalkyl substituents is described. Using a mediator, such as nickel metal, and continuous removal of product from contact with the mediator, high product yields are achieved. A method for bromination of ortho alkyl substituents of aromatic compounds is also described.
    Type: Grant
    Filed: June 12, 2002
    Date of Patent: November 21, 2006
    Assignee: Technion Research and Development Foundation
    Inventor: Amnon Stanger
  • Patent number: 6521118
    Abstract: There is provided a process for etching a semiconductor material, comprising the steps of: providing an electrochemical cell containing an etching electrolyte, the etching electrolyte being selected from the group of acidic electrolyte solutions, alkaline solutions, neutral solutions, and molten electrolytes; immersing the semiconductor material in the etching electrolyte, whereby at least one surface of the semiconductor material contacts the etching electrolyte; thereafter negatively biasing the semiconductor material; and while continuing to negatively bias the semiconductor material, illuminating at least part of the at least one surface of the semiconductor material which contacts the etching electrolyte with light selected from the group of ultraviolet, visible, and infrared light. There is also provided an apparatus for effecting the process of the invention, as well as semiconductor materials so etched.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: February 18, 2003
    Assignee: Technion Research and Development Foundation
    Inventors: David Starosvetsky, Mark Kovler, Joseph Yahalom, Yael Nemirovsky
  • Patent number: 5667336
    Abstract: An automated furrow irrigation control method and system involves the initiation of an irrigation flow into an upstream end of a furrow at an initial water discharge rate; continuously or periodically sensing the progress of water flow along the furrow; continuously or periodically increasing the water discharge rate in response to the sensed progress of the water flow so as to ensure a substantially continuous flow in the furrow at a flow rate which lies substantially between .+-.30% of a constant value; sensing the arrival of the water flow at a downstream end of the furrow; reducing the water discharge rate in response to the sensed arrival of the water flow at the downstream end of the furrow; sensing the percolation of the water flow at the downstream end down to a predetermined depth; and terminating the irrigation flow in response to the sensed percolation.
    Type: Grant
    Filed: June 19, 1995
    Date of Patent: September 16, 1997
    Assignee: Technion Research and Development Foundation
    Inventor: Benjamin Zur