Abstract: Composition and methods are provided for analgesic cleansing compositions, which may be either wash-off or leave-on cleansing compositions. Such compositions comprise a number of surfactants and a number of analgesic compounds, and may optionally comprise antibacterial agents and/or a cosmetically suitable carrier. A method of making an analgesic soap composition is also provided. A method of using a wash-off analgesic cleansing composition is also provided.
Abstract: Composition and methods are provided for analgesic cleansing compositions, which may be either wash-off or leave-on cleansing compositions. Such compositions comprise a number of surfactants and a number of analgesic compounds, and may optionally comprise antibacterial agents and/or a cosmetically suitable carrier. A method of making an analgesic soap composition is also provided. A method of using a wash-off analgesic cleansing composition is also provided.
Abstract: Methods and apparatus are provided for an antimicrobial hand wash composition. The antimicrobial hand wash composition includes a cationic antimicrobial active ingredient. The antimicrobial hand wash composition further includes a number of surfactants including at least two surfactants compatible with cationics with at least one of the surfactants including an alkamine oxide. Further, the antimicrobial hand wash composition includes a hydrocolloid. The antimicrobial hand wash composition further includes a zinc salt including at least one of zinc sulfate and zinc gluconate.
Type:
Application
Filed:
May 16, 2014
Publication date:
November 19, 2015
Applicant:
The Dial Corporation
Inventors:
Nancy D. Rodgers, Janice L. Fuls, Jessica Killian, Kanani Guerra
Abstract: Methods and apparatus are provided for an exfoliating anti-acne face cleansing composition. The exfoliating anti-acne face cleansing composition includes an anti-acne active ingredient and exfoliating particles. The exfoliating anti-acne face cleansing composition further includes a high molecular weight polymer having a molecular weight at least equal to ten kiloDaltons (kD) and a moisturizer. A ratio of the high molecular weight polymer to total formula solids is between 8:100 and 12:100. A ratio of the high molecular weight polymer to an amount of moisturizer is between 4:10 and 9:10. A pH of the exfoliating anti-acne face cleansing composition is less than 5.0.
Abstract: Compositions and apparatus are provided for controlling a release of a cleaning agent with silica particles. Silica particles disposed within the gel composition and are configured to at least partially dissolve in an alkaline environment. Further, an active cleaning agent sorbed by the silica particles is configured to be released from the silica particles upon partial dissolution of the silica particles.
Abstract: Processes for making an antiperspirant emulsion composition and antiperspirant emulsion compositions are provided herein. In an embodiment, a process for making an antiperspirant emulsion composition includes combining water and an antiperspirant active component to form a water phase. A hydrophobic carrier and a structurant are combined to form an oil phase. The structurant has a melting point above ambient temperature. The oil phase is heated to a first temperature of at least a melting point of the structurant that is disposed in the oil phase. The water phase and the heated oil phase are mixed to form the antiperspirant emulsion composition. The antiperspirant emulsion composition is cooled under continued mixing.
Abstract: An antibacterial composition includes at least one surfactant that is less than 6.0 weight percent of the composition and at least one antibacterial active that is less than 0.2 weight percent of the composition. The composition also has a pH between 6.0 and 6.5. The composition also exhibits an efficacy characteristic that results in a logarithmic reduction of at least 2.0 of a bacterial population based on measurements taken from of a user's hand.
Type:
Grant
Filed:
October 15, 2013
Date of Patent:
September 15, 2015
Assignee:
The Dial Corporation
Inventors:
Kanani Crider, Chris Luciow, Janice L. Fuls, Nancy D. Rodgers
Abstract: Materials and apparatus are provided that include non-ionic polymers. An antiperspirant composition with non-ionic polymers includes an active antiperspirant ingredient disposed within the antiperspirant composition. The antiperspirant composition further includes a non-ionic modified cellulose polymer disposed within the antiperspirant composition. The non-ionic modified cellulose polymer forms between 0.01 to 5.0 weight percent of the antiperspirant composition. The antiperspirant composition further includes a non-ionic calcium salt disposed within the antiperspirant composition. The non-ionic calcium salt forms between 0.01 to 5.0 weight percent of the antiperspirant composition.
Abstract: Methods and apparatus are provided for an exfoliating skin cleansing composition which is both gentle and moisturizing. The exfoliating skin cleansing composition includes a number of surfactants. The exfoliating skin cleansing composition further includes a number of suspending aides. The exfoliating skin cleansing composition also includes a number of exfoliating particles. The exfoliating skin cleansing composition also includes an aqueous medium in which the number of surfactants, the number of suspending aides and the number of exfoliating particles are distributed.
Abstract: Materials and apparatus are provided for a skin cleaning composition with a cationic deposition component. The skin cleaning composition includes a keratolytic skin peeling ingredient. The skin cleaning composition further includes at least one surfactant. The skin cleaning composition further includes a cationic deposition component to enhance deposition of the keratolytic skin peeling ingredient onto the skin.
Abstract: Materials and apparatus are provided for a skin cleansing composition with enhanced rheological properties. The skin cleansing composition includes a number of surfactants. The skin cleansing composition further includes at least one cationic antimicrobial active. The skin cleansing composition also includes a quaternary amine salt. Ratios of the components of the skin cleansing composition which provide the enhanced rheological properties are also provided. The skin cleansing composition also includes an aqueous medium in which the number of surfactants, the at least one cationic antimicrobial active and the quaternary amine salt are distributed.
Type:
Application
Filed:
December 4, 2013
Publication date:
June 4, 2015
Applicant:
The Dial Corporation
Inventors:
Kanani Guerra, Nancy D. Rodgers, Jared Schoepf
Abstract: Materials and apparatus are provided that exhibit increased efficacy. An antimicrobial composition includes a cationic active ingredient disposed within the antimicrobial composition. Further, the antimicrobial composition includes a lauramine oxide surfactant, the lauramine oxide surfactant comprising 0.9 to 1.9 weight percent of the antimicrobial composition. Further, the antimicrobial composition includes a number of co-surfactants, the co-surfactant comprising cocamidopropyl betaine, sunfloweramidopropyl ethonium sulfate, PEG-120 methyl glucose dioleate, lauryl/myristyl amidopropyl amine oxide, lauramidopropylamine oxide, or combinations thereof. Still further, the antimicrobial composition includes a thickener, the thickener comprising hydromethylcellulose, PEG-120 methyl glucose, cocamide MEA, hydroxypropyl methylcellulose or combinations thereof.
Abstract: Materials and apparatus are provided that include an enhanced evaporative mechanism. A solid antiperspirant composition includes an antiperspirant agent disposed within the solid antiperspirant composition. Further, the solid antiperspirant composition includes an enhanced evaporative component disposed within the solid antiperspirant composition. The enhanced evaporative component includes a spreading agent configured to reduce the surface tension of perspiration molecules.
Type:
Application
Filed:
November 22, 2013
Publication date:
May 28, 2015
Applicant:
The Dial Corporation
Inventors:
Travis T. Yarlagadda, Aleidatje M. Lester, Debra K. Butterworth
Abstract: Materials and apparatus are provided that include an enhanced evaporative component. A solid antiperspirant composition includes an antiperspirant agent disposed within the solid antiperspirant composition. Further, the solid antiperspirant composition includes an enhanced evaporative component disposed within the solid antiperspirant composition. The enhanced evaporative component includes a first spreading agent configured to reduce the surface tension of perspiration molecules. The enhanced evaporative component also includes a volatile to increase the volatility of perspiration molecules. Still further, the enhanced evaporative component includes an entrapment material disposed within the solid antiperspirant composition to contain the volatile.
Type:
Application
Filed:
November 22, 2013
Publication date:
May 28, 2015
Applicant:
The Dial Corporation
Inventors:
Travis T. Yarlagadda, Aleidatje M. Lester, Debra K. Butterworth
Abstract: An antibacterial composition includes at least one surfactant that is less than 6.0 weight percent of the composition and at least one antibacterial active that is less than 0.2 weight percent of the composition. The composition also has a pH between 6.0 and 6.5. The composition also exhibits an efficacy characteristic that results in a logarithmic reduction of at least 2.0 of a bacterial population based on measurements taken from of a user's hand.
Type:
Application
Filed:
October 15, 2013
Publication date:
April 16, 2015
Applicant:
The Dial Corporation
Inventors:
Kanani Crider, Chris Luciow, Janice L. Fuls, Nancy D. Rodgers
Abstract: A hair styling composition comprises: 5 wt. % to 50 wt. % of a first nonionic polymer; 2 wt. % to 20 wt. % of a second nonionic polymer; and 2 wt. % to 15 wt. % of a cationic polymer. A method of making a hair styling composition comprises: combining 5 wt. % to 50 wt. % of a first nonionic polymer, 2 wt. % to 20 wt. % of a second nonionic polymer, and 2 wt. % to 15 wt. % of a cationic polymer to form a hair styling composition.