Patents Assigned to Toagosei Co., Ltd.
  • Patent number: 7776181
    Abstract: A novel retention aid is provided, which can realizes not only high retention but also excellent paper formation and is easy to use, in various papermaking processes. A composition for improving retention is provided, which comprises (A) a cationic water-soluble polymer and (B) an amphoteric water-soluble polymer. The component (A) preferably is a copolymer having a cation equivalent of 0.05 to 4.00 meq/g or one having a 0.5% salted viscosity of 30 to 200 mPa·s. The component (B) preferably is either a copolymer comprising a cationic radical-polymerizable monomer unit, an anionic radical-polymerizable monomer unit, and a nonionic radical-polymerizable monomer unit, or an amphoteric water-soluble polymer obtained by polymerizing a cationic radical-polymerizable monomer with an anionic radical-polymerizable monomer in the presence of a polysaccharide.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: August 17, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Yoshio Mori, Koichi Adachi, Ken Takeda, Tetsuya Tsuzuki
  • Patent number: 7771738
    Abstract: The present invention is to provide a silver-based inorganic antimicrobial agent that has excellent heat resistance and chemical resistance, that gives little resin coloration, and that has excellent processability. It has been found that the object can be attained by a silver ion-containing zirconium phosphate represented by Formula (1) below by limiting the production conditions to wet synthesis, and the present invention has thus been accomplished. Aga MbZrc(PO4)3.nH2O??(1) In Formula (1), M is at least one type of ion selected from an alkali metal ion, a hydrogen ion, and an ammonium ion, a, b, and c are positive numbers and satisfy 1.5?c?2 and a+b+4c=9, and n is no greater than 2.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: August 10, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Koji Sugiura, Yasuharu Ono
  • Patent number: 7754781
    Abstract: An active energy beam-curable composition is provided, which is excellent in coatability to films and safety, and particularly suitable for use in a light diffusion film since a light diffusion film made of a cured product of the composition is excellent in both haze and total light transmittance. The active energy beam-curable composition comprises an ethylenically unsaturated group-containing compound (A) that contains, as an essential component thereof, a compound having an ethylenically unsaturated group and an aromatic group, and a granular substance (B) that is insoluble in the component (A), in which the subtraction of the refractive index of the component (B) from the refractive index of a cured product of the component (A) alone is not less than 0.03 and not more than 0.18.
    Type: Grant
    Filed: February 27, 2006
    Date of Patent: July 13, 2010
    Assignees: Toagosei Co., Ltd., Kuraray Co., Ltd.
    Inventors: Yasyuki Sanai, Atsushi Nagasawa
  • Patent number: 7740822
    Abstract: The objective of the present invention is to provide a method for obtaining a high purity disilicon hexachloride by removing a silanol with good efficiency from a disilicon hexachloride material containing the silanol as an impurity. The purification method for disilicon hexachloride of the present invention comprises a process for contacting a disilicon hexachloride material containing disilicon hexachloride and a silanol as an impurity with an adsorbent material such as activated carbon to remove the silanol. The method may further comprise a distillation process. The above processes are preferably performed in an atmosphere of an inert gas.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: June 22, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Koji Ishikawa, Hiroshi Suzuki, Yoshinori Kimata
  • Publication number: 20100123101
    Abstract: The present invention is a novel hydrotalcite compound that is environmentally friendly and exhibits an excellent metal corrosion inhibiting effect by the addition of a small amount thereof, and an inorganic ion scavenger employing same; the hydrotalcite compound is represented by Formula (1), has a hydrotalcite compound peak in the powder X-ray diffraction pattern, the peak intensity at 2?=11.4° to 11.7° being at least 3,500 cps, and has a BET specific surface area of greater than 30 m2/g. MgaAlb(OH)c(CO3)d·nH2O??(1) In Formula (1), a, b, c, and d are positive numbers and satisfy 2a+3b?c?2d=0. Furthermore, n denotes hydration number and is 0 or a positive number.
    Type: Application
    Filed: April 16, 2008
    Publication date: May 20, 2010
    Applicant: TOAGOSEI CO., LTD.,
    Inventor: Yasuharu Ono
  • Patent number: 7709676
    Abstract: A method for producing a purified 2-cyanoacrylate is characterized in that distillation is conducted in the presence of a polymerization inhibitor whose boiling point is within ±12° C. of the boiling point of the 2-cyanoacrylate. With this method, polymerization of 2-cyanoacrylate can be continuously prevented in the distillate system during distillation of a crude 2-cyanoacrylate, so that a purified 2-cyanoacrylate can be obtained.
    Type: Grant
    Filed: May 27, 2004
    Date of Patent: May 4, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Muneaki Kanou, Yoshiharu Ohashi
  • Publication number: 20100089872
    Abstract: The object is to provide an etching liquid for a conductive polymer having excellent etching capability toward a conductive polymer, and a method for patterning a conductive polymer employing the etching liquid for a conductive polymer. The conductive etching liquid of the present invention is selected from the group consisting of (1) an etching liquid comprising greater than 0.5 wt % but no greater than 70 wt % of (NH4)2Ce(NO3)8 or at least 0.5 wt % but no greater than 30 wt % of Ce(SO4)2, (2) an etching liquid comprising greater than 0.5 wt % but no greater than 30 wt % of (NH4)4Ce(SO4)4, (3) an etching liquid comprising a hypochlorous acid salt aqueous solution having an effective chlorine concentration of at least 0.06 wt % and a pH of greater than 3 but less than 8, (4) an etching liquid comprising nitrosyl chloride which comprises at least 5 wt % of hydrochloric acid and at least 20 wt % of nitric acid, a (hydrochloric acid concentration+0.
    Type: Application
    Filed: September 13, 2007
    Publication date: April 15, 2010
    Applicants: Tsurumi Soda Co., Ltd., Toagosei Co., Ltd.
    Inventors: Takashi Ihara, Takahiro Fujimoto
  • Publication number: 20100068386
    Abstract: The object of the invention is to provide an aqueous coating agent which I applied onto a recording medium in the ink-jet system to form a film excellent in scratch resistance, water resistance and gloss on the surface of an image, and an aqueous coating solution containing this aqueous coating agent.
    Type: Application
    Filed: October 1, 2007
    Publication date: March 18, 2010
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Shinya Kanbe, Takayuki Maki, Yousuke Asai, Morikatsu Matsunaga, Yoshio Mori
  • Publication number: 20100069592
    Abstract: A process for producing polymer microparticles by suspension polymerization of a vinyl-based monomer in which, when polymer microparticles are produced by suspension polymerization of a vinyl-based monomer, a macromonomer having a radically polymerizable unsaturated group at a terminus of a vinyl-based monomer-derived polymer is used as a dispersion stabilizer.
    Type: Application
    Filed: July 5, 2007
    Publication date: March 18, 2010
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Hideo Matzuaki, Akihiro Gotou, Tomotoka Mizuno, Michiro Kaai
  • Publication number: 20100069516
    Abstract: A bismuth compound, useful as an inorganic anion exchanger used for an encapsulating material for, e.g., semiconductors, has a peak intensity of 900 to 2000 cps at 2?=27.9° to 28.1° and a peak intensity of 100 to 800 cps at 2?=8.45° to 8.55° in a powder X-ray diffraction pattern, and is represented by the following formula (1): Bi(OH)x(NO3)y.nH2O??(1) wherein x is a positive number not less than 2.5 and less than 3, y is a positive number not more than 0.5, x+y=3, and n is 0 or a positive number.
    Type: Application
    Filed: November 16, 2007
    Publication date: March 18, 2010
    Applicant: Toagosei Co. Ltd
    Inventor: Yasuharu Ono
  • Patent number: 7674349
    Abstract: There is provided a method for continuous production of a functional membrane whereby a functional membrane in which a functional polymer is filled into the micropores of a porous resin sheet can be obtained both continuously and efficiently. The method for continuous production of a functional membrane of the present invention comprises a step for impregnating and depositing a polymer precursor having a functional group on a continuously conveyed porous resin sheet; a polymerization step for continuously feeding and bringing into contact first and second resin films to one side and the other side, respectively, of the precursor-impregnated/deposited sheet comprising the porous resin sheet into which the polymer precursor is impregnated and deposited, and polymerizing the polymer precursor in a state in which the sheet is sandwiched between the two resin films; a film peeling step; and a polymer removal step.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: March 9, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Hideki Hiraoka, Kouzou Kubota, Takeo Yamaguchi, Shyusei Ohya, Hiroshi Harada
  • Patent number: 7674771
    Abstract: Antimicrobial peptide provided by present invention is an artificially designed antimicrobial peptide that does not occur naturally, and includes a sequence composed of at least 6 contiguous amino acid residues selected from an amino acid sequence constituting laminin binding site (LBS), or said sequence with one or a plurality of amino acid residue(s) conservatively replaced, and an amino acid sequence that can express antimicrobial activity against at least one kind of bacteria or fungi. It is desirable that the total number of amino acid residues is 100 or less.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: March 9, 2010
    Assignee: Toagosei Co., Ltd
    Inventors: Tetsuhiko Yoshida, Yoshinao Yamada, Masayoshi Kume, Hiroki Kourai
  • Patent number: 7670752
    Abstract: A photosensitive resin composition which is excellent in storage stability required for one-part type compositions and in processability required for dry-film formation and gives a cured product suitable for FPC substrates or suspension substrates for hard-disc which each retains essential properties required for solder resists, such as heat resistance, water resistance, and electrical-insulation reliability, and has flexibility and low polluting property. The composition comprises: a compound which has a carbon-carbon double bond and carboxy group and is obtained by allowing a bisphenol type epoxy compound and an unsaturated monocarboxylic acid to react and then allowing a polybasic acid anhydride to undergo addition reaction with part or all of the secondary hydroxy groups of the reaction product; a urethane (meth)acrylate compound having a structure derived from a polycarbonate polyol structure; another polymerizable compound having a carbon-carbon double bond; and a photopolymerization initiator.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: March 2, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Makoto Hirakawa, Masao Takei, Hiroshi Niizuma
  • Publication number: 20100047433
    Abstract: It is intended to provide a polymer for detecting a fingerprint, which can be easily handled in a scene of the fingerprint detection as a substitute for conventionally employed 2-cyanoacrylate (a monomer), and a composition for detecting a fingerprint. It is also intended to provide a method of detecting a fingerprint whereby a fingerprint can be detected at a high sensitivity regardless of the color or conditions of a specimen and wherein the specimen can be well restored. The present polymer and composition for detecting a fingerprint and method of detecting a fingerprint using the same make it possible to definitely detect a fingerprint by using fluorescence even from an almost white specimen such as a shopping bag or an aluminum foil from which a fingerprint can be hardly detected by the existing methods.
    Type: Application
    Filed: September 28, 2007
    Publication date: February 25, 2010
    Applicant: Toagosei Co., LTD
    Inventors: Osamu Shimoda, Masahisa Takatsu, Muneaki Kano
  • Publication number: 20100029841
    Abstract: A silicon-containing polymer which is represented by general formula (5) below and has a weight-average molecular weight in the range from 500 to 500,000: (In the formula, A2 is an organic group of 2-10 carbons, having a carbon-carbon unsaturated group; R3 is an alkylene group of 1-20 carbons, a bivalent aromatic group of 6-20 carbons, or a bivalent alicyclic group of 3-20 carbons; n is 0 or 1; R4 is a hydrogen atom or an alkyl group of 1-10 carbons (R4 in one molecule may be the same type or a combination of two or more different types.); each of x and y is a positive number; each of w and z is 0 or a positive number; 0?z/(w+x+y)?2; and 0.01?y/(w+x)?5), and the heat-resistant resin composition comprising the silicon-containing polymer.
    Type: Application
    Filed: October 2, 2009
    Publication date: February 4, 2010
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Kunikazu TAUCHI, Hiroshi Suzuki
  • Patent number: 7652118
    Abstract: An object of the present invention is to provide polycarbosilane which is excellent in solubility in general-purpose organic solvents, and heat resistance, and a method for producing the same. Polycarbosilane of the present invention comprises the following repeated unit [1]. Polycarbosilane may further comprise the following repeated unit [2] and, in that case, a content of the repeated unit [1] is preferably not less than 20 mol % relative to 100 mol % of a total of the repeated unit [1] and the repeated unit [2]. (wherein R1 represents an C1-C6 alkyl group, R2 represents an alkyl group having 2 or more carbon atoms, and R1 and R2 may be the same or different) (wherein Me represents a methyl group).
    Type: Grant
    Filed: July 15, 2005
    Date of Patent: January 26, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Katsuhiko Komuro, Hiroshi Suzuki
  • Publication number: 20090313813
    Abstract: A method is provided for producing a functional membrane having a structure in which pores of a porous substrate are filled with a functional polymer, the method having improved productivity and improving the stability of performance. The method for producing a functional membrane formed by filling pores of a porous substrate with a functional polymer involves carrying out a treatment of the porous substrate with a suspension of a surfactant before filling the pores of the porous substrate with a solution of the functional polymer or a solution of a precursor thereof, carrying out a drying step, and then filling with the solution of the functional polymer or the solution of the precursor thereof.
    Type: Application
    Filed: February 13, 2007
    Publication date: December 24, 2009
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Daigo Sato, Hideki Hiraoka
  • Patent number: 7615534
    Abstract: Artificially synthesized antimicrobial peptide that does not occur naturally is provided by the present invention. The antimicrobial peptide includes one unit, two units or more units of amino acid sequence composed of the following 8 amino acid residues: (R or Q)-(L or F or I)—I—K-(L or F or I or V)-L-Y-Q; and/or, modified sequence composed of said sequence with partial modification.
    Type: Grant
    Filed: October 11, 2005
    Date of Patent: November 10, 2009
    Assignee: Toagosei Co., Ltd
    Inventors: Tetsuhiko Yoshida, Yoshinao Yamada, Nahoko Kobayashi, Hiroki Kourai
  • Publication number: 20090272293
    Abstract: The present invention provides a crystalline layered zirconium phosphate, which is an ion exchanger particle excellent in heat resistance and chemical resistance, and utilizable as an impurity ion trapping agent for electronic materials, a raw material for antibacterials, a deodorant, a discoloration inhibitor, a rust preventive and the like, and which is also excellent in various processabilities. As a result of exhaustive studies to solve the problems, the present inventor has found a novel layered zirconium phosphate represented by the general formula (1) shown below: Zr1-xHfxHa(PO4)b.nH2O??(1) wherein a and b are positive numbers satisfying 3b?a=4; b is a number satisfying 2<b?2.3; x is a positive number satisfying 0?x<1; and n is a positive number satisfying 0?n?2, and thus has achieved the present invention.
    Type: Application
    Filed: October 15, 2007
    Publication date: November 5, 2009
    Applicant: TOAGOSEI CO., LTD.
    Inventor: Yasuharu Ono
  • Patent number: 7612123
    Abstract: An object of the present invention is to provide a cyclohexene oxide compound that gives a cured resin having a low refractive index and excellent transparency, curability, mold release properties, and mechanical properties, and that can be used as a component of an actinic radiation curing composition and/or heat curing composition. The present invention is a cyclohexene oxide compound having a cyclohexyl group or a long-chain alkyl group, represented by Formula (1) below (in Formula (1), A denotes a cyclohexyl group, Formula (2) below, or an optionally branched alkyl group having 8 to 16 carbons) (in Formula (2), R1 denotes a hydrogen atom or an optionally branched alkyl group having 1 to 4 carbons and R2 denotes a hydrogen atom or an optionally branched alkyl group having 1 to 4 carbons).
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: November 3, 2009
    Assignee: Toagosei Co., Ltd.
    Inventors: Hisao Kato, Yoji Horie, Hiroshi Sasaki