Abstract: A microballoon according to the present invention contains, in a surface layer of the microballoon, a polymerizable functional group having reactivity with an iso(thio)cyanate group, and the microballoon has a particle diameter of 10 ?m to 200 ?m. When the microballoon according to the present invention is used in a CMP polishing pad, excellent polishing characteristics and excellent durability of the polishing pad can be exhibited.
Abstract: The present invention relates to a curable composition containing (A) a side chain-containing cyclic molecule in which three or more side chains each having a polymerizable functional group introduced at a terminal are introduced ((A) cyclic polyfunctional monomer), and (B) a polymerizable monomer having a polymerizable functional group polymerizable with the side chain-containing cyclic molecule ((B) another polymerizable monomer). The present invention provides a curable composition from which a cured article having high abrasion resistance and enabling exhibition of excellent mechanical properties and photochromic properties is obtained. In particular, the present invention can provide a curable composition from which a cured article suitable for use as a polishing pad or a photochromic spectacle lens can be obtained.
Abstract: The present invention provides a silicon nitride sintered substrate capable of reducing contamination caused by a boron nitride powder or the like used as a releasing agent and problems in bonding strength and dielectric strength at the time of laminating metal layers or the like, where the contamination is caused by a network structure provided by a silicon nitride crystal formed on the surface of the substrate in an unpolished state after sintering a silicon nitride powder. The silicon nitride substrate in an unpolished state after sintering is a silicon nitride sintered substrate where a cumulative volume of pores having a diameter in a range of 1 to 10 ?m is not more than 7.0'10?5 mL/cm2 in a measurement by a mercury porosimetry. Preferably, Ra of the surface is not more than 0.6 ?m and arithmetic mean peak curvature (Spc) of a peak is not more than 4.5 [l/mm].
June 29, 2021
November 9, 2023
Norihira MITSUMURA, Dai KUSANO, Hideaki KAWAI
Abstract: Provided is a method for continuously producing a silicon nitride sintered compact for enabling a continuous production of silicon nitride sintered compacts by sintering using a silicon nitride powder having a high ?-phase rate. A fired compact 1 housed in a firing jig 2 contains a silicon nitride powder having at least 80% of ?-transition rate and 7 to 20 m2/g of specific surface area together with a sintering additive, where the total content of aluminum element is adjusted not to exceed 800 ppm.
Abstract: A primer composition for optical articles includes (A) a urethane prepolymer which is a reaction product of an aromatic polyisocyanate compound and a polyol compound, and which has a reactive group at an end, the reactive group being selected from among an isocyanate group and a hydroxyl group, (B) a light absorbing compound which has a maximum absorption wavelength within the range of from 320 nm to 650 nm (inclusive) and (C) an organic solvent which has a solubility parameter of 8 (cal/cm3)1/2 or more, while containing no active hydrogen.
Abstract: Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis. Also provided is a method for manufacturing said high-purity isopropyl alcohol.
Abstract: Provided are a method of cleaning a group III nitride single crystal substrate which enables the roughness of a nitrogen-polar face of the group III nitride single crystal substrate to be suppressed to remove foreign substances, and a method of producing a group III nitride single crystal substrate. The method of cleaning a group III nitride single crystal substrate having a group III element-polar face, and the nitrogen-polar face opposite the group III element-polar face includes: cleaning the nitrogen-polar face with a detergent including a fluoroorganic compound.
Abstract: A group III nitride single crystal substrate including a main surface, the main surface including: a center; a periphery; an outer region whose distance from the center is greater than 30% of a first distance, the first distance being a distance from the center to the periphery; and an inner region whose distance from the center is no more than 30% of the first distance, wherein a ratio (?A??B)/?B is within the range of ±0.1%, wherein ?A is a minimum value of peak wave numbers of micro-Raman spectra in the inner region; and ?B is an average value of peak wave numbers of micro-Raman spectra in the outer region.
Abstract: The present invention relates to a photochromic compound including a polyvalent residue on which at least one group having a photochromic moiety is substituted, and at least one long-chain group not containing a photochromic moiety and having a molecular weight of 300 or more is further substituted; and a curable composition containing the same. In accordance with the present invention, it is possible to provide a photochromic compound which has high solubility in a polymerizable compound serving as a matrix while retaining high photochromic characteristics and is hardly affected by the matrix; and a curable composition containing the same.
Abstract: A polycrystalline silicon crushed lump has a surface metal concentration of 15.0 pptw or less, in which a copper concentration is 0.30 pptw or less in the surface metal concentration, and a total concentration of iron and zinc is 2.00 pptw or less in the surface metal concentration, and preferably an iron concentration is 1.25 pptw or less, and a zinc concentration is 0.75 pptw or less.
Abstract: A silicon etching liquid which is characterized by containing a quaternary ammonium hydroxide represented by formula (1), a quaternary ammonium salt represented by formula (2) and water, and which is also characterized in that the concentration of the quaternary ammonium salt represented by formula (2) is more than 1% by mass but not more than 50% by mass. (1): R1R2R3R4N+·OH? (In formula (1), R1, R2, R3 and R4 may be the same groups or different groups, and each represents an optionally substituted alkyl group, aryl group or a benzyl group.) (2): R5R6R7R8N+·X? (In formula (2), R5, R6, R7 and R8 may be the same groups or different groups, and each represents an optionally substituted alkyl group having from 1 to 16 carbon atoms; and X represents BF4, a fluorine atom, a chlorine atom or a bromine atom.
Abstract: The present invention provides a novel compound for optical materials, and a curable composition, a cured body and an optical article containing the compound for optical materials. According to an embodiment, there is provided a compound for optical materials represented by Formula (Ia) below: In Formula (Ia), X1 and X2 are each NH, S, or O. R1 is a 1- to 30-valent organic residue. R3 is a group composed of a polymer having a repeating unit selected from the group consisting of —(CH2)mO—, —(CH2CH2O)—, —(CH(CH3)CH2O)—, —(CH2CH(CH3)O)—, — (C(?O)—CH2CH2CH2CH2CH2O)—, —(C(?O)—O—CH2CH2CH2CH2CH2O)—, and —(C(?O)—O—CH2CH2CH2CH2CH2CH2O)—, a random copolymer having at least two repeating units selected from the group, or a block copolymer having at least two repeating units selected from the group.
Abstract: The laminate for a circuit board of the present invention is a laminate including a metal nitride sintered board and a copper sheet, and the laminate has a size with a minimum length from a center of a plane to a peripheral edge of 50 mm or more, and has a void ratio X of 0.50% or less, which is a ratio of a total length LB of voids having a diameter of 1 µm or more confirmed in the vicinity of a bonding interface of the metal nitride sintered board and the copper sheet with respect to a measured length LI of the bonding interface, measured on a cut cross section obtained by cutting the laminate in a lamination direction. According to the present invention, a laminate that is excellent in heat radiation capability, has a feature that an etching solution used in patterning is difficult to remain at the bonding interface, and is excellent in reliability as a product can be provided.
Abstract: A silicon etching liquid which contains a quaternary ammonium hydroxide represented by formula (1), a quaternary ammonium iodide represented by formula (2), and water. (1): R11R12R13R14N+·OH? (In formula (1), each of R11, R12, R13 and R14 independently represents an aryl group, a benzyl group or an alkyl group having from 1 to 16 carbon atoms; and the alkyl group, the aryl group or the benzyl group may have a hydroxyl group.) (2): R21R22R23R24N+·I? (In formula (2), R21, R22, R23 and R24 may be the same groups or different groups, and each represents an optionally substituted aryl group, benzyl group or alkyl group having from 1 to 10 carbon atoms.
Abstract: The present invention aims to provide a photochromic compound capable of exhibiting photochromic properties regardless of matrix, and the compound is stably dispersed without aggregation in a process of molding (curing) an optical base material. According to the present invention, a polymer photochromic compound, which has a block polymeric group of an oligomeric chain group having relatively favorable compatibility with a solid matrix and an oligomeric chain group having poor compatibility with a solid matrix, forms a nano- to micro-phase separation structure in a solid matrix. The compound does not rely on the solid matrix, its dispersibility is improved and aggregation is prevented or reduced, whereby excellent photochromic properties can be exhibited.
Abstract: To provide an adhesive composition capable of firmly bonding polymer sheets together, comprising: (I) 100 parts by mass of an end-unreactive urethane urea resin; and (III) 4.0 to 20 parts by mass of a polyisocyanate compound having at least two isocyanate groups in the molecule, wherein the polyisocyanate compound (III) contains (IIIA) a polyisocyanate compound having an isocyanate group bonded to secondary carbon and (IIIB) a polyisocyanate compound having 4 to 30 carbon atoms in the molecule other than the component (IIIA), and the amount of the component (IIIB) is 10 to 500 parts by mass based on 100 parts by mass of the component (IIIA).
Abstract: The present invention provides industrially advantageous production method and production apparatus, with respect to production of a halogen oxyacid solution. There is solved by a method for producing a halogen oxyacid solution, comprising continuously supplying an organic alkaline solution and halogen to a static mixer and mixing them, to thereby continuously obtain a halogen oxyacid generated.
Abstract: The polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt of the present invention is a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt having at least two active hydrogen groups in a molecule, and the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt has a quaternary ammonium salt skeleton of the polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that includes an imidazole skeleton. According to the present invention, a polyfunctional active hydrogen group-containing sulfonate quaternary ammonium salt that is excellent in solubility and dispersibility in a polyurethane (urea) resin raw material, and a high effect of the hydrophilization of a polyurethane (urea) resin can be provided.
Abstract: The present invention provides: a curable composition which contains a bismuth compound, wherein a phosphoric acid ester having a (meth)acryloyl group is bonded to bismuth, and a nitrile compound having a radically polymerizable carbon-carbon double bond; a cured body which is obtained by curing this curable composition; a multilayer body which is composed of the above-described cured body and a cured body that is obtained by curing a photochromic curable composition; and a radiation protective material which is formed of the above-described cured body or the above-described multilayer body.
Abstract: Provided is a treatment liquid for a semiconductor with ruthenium, containing a hypobromite ion. Also provided is a treatment liquid for a semiconductor with ruthenium, containing at least a bromine-containing compound, an oxidizing agent, a basic compound, and water which are added and mixed, wherein the liquid has the bromine-containing compound added in an amount of 0.01 mass % or more and less than 2 mass % as a bromine element content with respect to the total mass of the liquid, has the oxidizing agent added in an amount of 0.1 mass % or more and 10 mass % or less with respect to the total mass, and has a pH of 8 or more and 14 or less. Further provided is a method of producing a treatment liquid for a semiconductor with ruthenium, including a step of mixing a bromine-containing compound with a solution containing a hypochlorous acid compound and a basic compound.