Abstract: A method of producing a cell culture chip, in which a first adhesive is film-formed on a first substrate having transparency such that a first adhesive layer and a recessed portion on which one or more cell culture flow paths are formed face each other, and a second adhesive is film-formed on the first substrate such that a second adhesive layer and a flat portion around the recessed portion face each other, thereby obtaining a cell culture flow path substrate, the first adhesive containing a polyester-based resin having a glass transition temperature of 5° C. or higher, and the second adhesive containing a polyester-based resin having a glass transition temperature of lower than 5° C.

Abstract: [Problems] To easily and efficiently manufacture a catalyst layer having high catalytic activity and to easily manufacture a fuel cell having high power generation efficiency. [Solution] An apparatus for forming a catalyst layer 3 for a fuel cell on an electrolyte film (application object) 2, the apparatus including: a holding portion 6 that holds a sheet-shaped electrolyte film 2, an application portion 7 that applies a catalyst ink 5 for forming the catalyst layer 3 on at least one side of the electrolyte film 2 held by the holding portion 6, a chamber portion 8 that is capable of forming a space 55 including the holding portion 6, and a suction portion 9 that depressurizes the inside of the space 55 formed by the chamber portion 8 so as to dry the catalyst ink 5.

Abstract: A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, M1m+ represents a sulfonium cation having a sulfonyl group, R001 to R003 each independently represent a monovalent organic group; provided that at least one of R001 to R003 is an organic group having an acid dissociable group; and M3m+ represents an m-valent organic cation having an electron-withdrawing group.

Abstract: A method includes contacting an organic cured film with an acidic cleaning liquid including sulfuric acid and a water-soluble organic solvent and does not include a compound capable of generating nitronium ions. An amount of the sulfuric acid in the acidic cleaning liquid is 40% by mass or more, and an amount of water in the acidic cleaning liquid is 5% by mass or less.

Abstract: A nanostructure array including a base body and a nanostructure formed on the base body, in which a plurality of the nanostructures are arranged on the nanostructure array, the nanostructure is made of a metal having a surface plasmon and a property of absorbing and releasing hydrogen, the base body is made of a hydrogen-responsive material that reacts with hydrogen to reversibly change from a conductor to a dielectric substance, and a surface plasmon resonance occurs by light incident on the nanostructure.

Abstract: Provided are: a surface treatment liquid with which it is possible to conduct a surface treatment of an object to be treated, so that water, upon contact with the treated surface, rapidly spreads on and wets the surface; a surface treatment method for treating an object using the surface treatment liquid; and a method for producing a roll-shaped sheet which has been surface-treated by the surface treatment method. The surface treatment liquid comprises a polymer (A) and a solvent (S), wherein the polymer (A) comprises a constituent unit (a1) which is derived from a monomer having a log P value of 0.5 or less and which has a hydrophilic group and a constituent unit (a2) derived from a monomer that gives a homopolymer having a glass transition temperature (Tg) of 120° C. or higher, and the polymer (A) has a weight-average molecular weight of 500-20,000.

Abstract: A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Va1 is a divalent hydrocarbon group, na1 represents an integer of 0 to 2, Ya0 is a carbon atom, Xa0 is a group forming a monocyclic aliphatic hydrocarbon group together with Ya0, and Ra00 is an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rb1 represents a cyclic hydrocarbon group, Yb1 represents a divalent linking group containing an ester bond, Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond, and Mm+ is an m-valent organic cation.

Abstract: To provide a surface treatment liquid capable of making a base material including polyorganosiloxane on at least a part of a surface thereof hydrophilic stably over a long period of time, and provide a surface treatment method using the surface treatment liquid. In a surface treatment liquid including (A) resin and a (B) solvent, as the (A) resin, resin having a functional group I that is a hydroxyl group and/or a cyano group is used, and a functional group II that is a hydrophilic group other than the functional group I, and a ratio of a structural unit having an anionic group to total structural units of the (A) resin is 5 mol % or less, or resin including a cationic group including an anion moiety and a cation moiety that can be bonded to the (A) resin is used.

Abstract: A resist composition including a resin component whose solubility in a developing solution is changed due to an action of an acid, in which the resin composition has a constitutional unit derived from a compound containing a chain-like aliphatic acid dissociable group or a monocyclic aliphatic acid dissociable group and a constitutional unit derived from a compound containing an aromatic hydrocarbon group-containing acid dissociable group.

Abstract: The present invention provides: a gas separation method which is capable of desirably separating a slight amount of a component from a mixed gas under mild conditions such that the pressure difference between both sides of a gas separation membrane is 1 atmosphere or less; and a gas separation membrane which is suitable for use in this gas separation method. According to the present invention, in a gas separation method wherein a specific gas (A) in a mixed gas, which contains the specific gas (A) at a concentration of 1,000 ppm by mass or less, is selectively permeated with use of a gas separation membrane, an extremely thin gas separation membrane that has a film thickness of 1 ?m or less is used, so that the gas (A) is desirably separated under mild conditions such that the pressure difference between both sides of the gas separation membrane is 1 atmosphere or less.

Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

Abstract: An aromatic amine compound capable of satisfactorily forming a cured product having exceptional alkali resistance by reaction with an epoxy compound; a curing agent for an epoxy compound, the curing agent including the aromatic amine compound; a curable composition including the curing agent for an epoxy compound; a cured product of the curable composition; a method for producing the cured product; and a method for producing the abovementioned aromatic amine compound. The aromatic amine compound has a structure such that a specific position in a central skeleton comprising a fused ring such as a fluorene ring is substituted with a side-chain group including two aromatic groups linked by a flexible bond such as an amide bond, at least one amino group is bonded to the end of the side-chain group, and the structure has no hydroxyl groups.

Abstract: A method for manufacturing a flow path device internally provided with a flow path for allowing a liquid to flow by compression bonding two or more members to each other, in which the hydrophilic property of a surface of the flow path can be maintained for a long period of time. A flow path device is manufactured by forming a hydrophilic coating film using a treatment liquid including a hydrophilizing agent in at least one member, the coating film covering a surface of the member at a side to be joined to another member, then irradiating only a joining surface of the coating film with ultraviolet rays or plasma derived from an oxygen-containing gas in the member having the coating film, and irradiating at least the joining surface with ultraviolet rays or plasma derived from an oxygen-containing gas in a member having no coating film, and compression bonding the two or more members.

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).

Abstract: A hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the composition; and an electronic element provided with the hydrogen barrier film. A salt compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. The composition is prepared by blending the hydrogen barrier agent into the base material component. The hydrogen barrier film is formed using the hydrogen barrier film forming composition.

Abstract: A method of analyzing a metal component contained as an impurity in a polymer composition that contains a polymer and an organic solvent including a step (i) of preparing a dispersion by mixing the polymer composition with an acid aqueous solution, a step (ii) of separating the dispersion prepared in the step (i) into a dispersoid layer containing the polymer and a dispersion medium layer containing the metal component, and a step (iii) of quantifying the metal component contained in the dispersion medium layer separated in the step (ii).

Abstract: A method for producing a polyimide film includes: obtaining a polyamic acid solution having a viscosity of 5 to 150 cps by preparing a raw material mixture liquid containing a solvent, a tetracarboxylic dianhydride represented by a specific general formula, and an aromatic diamine represented by a specific general formula, and has a total content of the tetracarboxylic dianhydride and aromatic diamine of 15% by mass or less, and reacting the tetracarboxylic dianhydride and aromatic diamine with each other in the raw material mixture liquid forming a polyamic acid having a repeating unit represented by a specific general formula; obtaining a polyimide-forming mixture liquid by adding a compound represented by a specific general formula to the polyamic acid solution; and obtaining a polyimide film represented by a specific general formula by forming a film made of the polyimide-forming mixture liquid, followed by imidization of the polyamic acid in the film.

Abstract: A chemically amplified positive-type photosensitive resin composition which is highly sensitive and in which it is easy to form a resist pattern whose cross-sectional shape is rectangular, a photosensitive dry film which includes a photosensitive resin layer formed from the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition and a method of manufacturing a plated article using the substrate with the template. A Lewis acid compound is included in the composition that also includes an acid generator which generates an acid by application of an active ray or radiation, and a resin whose solubility in alkali is increased by action of an acid.

Abstract: A metal resist cleaning liquid including a solvent and formic acid.

Abstract: A cleaning liquid usable for cleaning a substrate provided with a metal resist, the cleaning liquid including a solvent, an organic acid, and a compound (A) represented by general formula (a-1) shown below (in the formula, Ra1 and Ra2 each independently represents an alkyl group having 1 to 3 carbon atoms).