Patents Assigned to Tokyo
  • Patent number: 8188468
    Abstract: An organometal material gas is supplied into a low electron temperature and high density plasma excited by microwaves to form a thin film of a compound on a substrate as a film forming object. In this case, the temperature of a supply system for the organometal material gas is controlled by taking advantage of the relationship between the vapor pressure and temperature of the organometal material gas.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: May 29, 2012
    Assignees: National University Corporation Tohoku University, Rohm Co., Ltd., Tokyo Electron Limited, Ube Industries, Ltd.
    Inventors: Tadahiro Ohmi, Hirokazu Asahara, Atsutoshi Inokuchi, Kohei Watanuki
  • Patent number: 8188202
    Abstract: A polymer comprising a unit represented by the following formula (1); and a process for producing the polymer comprising the step of polymerizing a diene compound such as 9,9-diallylfluorene in the presence of a polymerization catalyst formed by contacting a nickel compound with an organoaluminum compound and/or a boron compound:
    Type: Grant
    Filed: May 26, 2010
    Date of Patent: May 29, 2012
    Assignees: Sumitomo Chemical Company, Limited, Tokyo Institute of Technology
    Inventors: Kohtaro Osakada, Daisuke Takeuchi, Yusuke Fukuda, Osamu Ihata, Hiroshi Kuribayashi
  • Patent number: 8190281
    Abstract: A substrate processing apparatus includes a substrate processing unit for performing a process on substrates; a recipe protection unit for prohibiting processing conditions for the process from being changed while the process is being performed on a specific number of substrates; a protection cancellation unit for canceling a prohibition of a change in the process to allow the processing conditions to be changed while the process is being performed on the specific number of substrates; and a modifying unit for modifying the processing conditions. Further, a method for examining substrate processing conditions includes a protection cancellation step of canceling a prohibition of a change in the process to allow the processing conditions to be changed while the process is being performed on the specific number of substrates; and a modifying step of modifying the processing conditions.
    Type: Grant
    Filed: March 6, 2007
    Date of Patent: May 29, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Takeshi Yokouchi, Fumiko Yagi
  • Patent number: 8188260
    Abstract: An object of the present invention is to provide novel ribozyme systems capable of catalyzing tRNA acetylation using various carboxylic acids as acyl donors and uses thereof. Disclosed is a ribozyme catalyzing tRNA acetylation having a structure consisting of the RNA sequence represented by: (formula 1) P1-Z1Z2Z3Z4(N1)1(N1)2 . . . (N1)p-P2-(N2)1(N2)2 . . . (N2)q Y1Y2Y3-(N3)1(N3)2-N4GGN wherein (N1)1-(N1)p each independently represent any monoribonucleotide of U, C, A, and G; p represents 3 or 4; (N2)1-(N2)q each independently represent any monoribonucleotide of U, C, A, and G; q represents 5 or 6; (N3)1-(N3)2 each independently represent any monoribonucleotide of U, C, A, and G; N4 represents any monoribonucleotide of U, C, A, and G; Z1-Z4 each independently represent C or G; Y1-Y3 each independently represent C or G; N represents a monoribonucleotide complementary to A or G; and P1 and P2 represent a domain consisting of any RNA sequence capable of having a stem-loop structure.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: May 29, 2012
    Assignee: The University of Tokyo
    Inventors: Hiroaki Suga, Hiroshi Murakami
  • Patent number: 8186298
    Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
    Type: Grant
    Filed: April 21, 2008
    Date of Patent: May 29, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Hiroichi Inada, Taro Yamamoto, Akihiro Fujimoto
  • Patent number: 8187789
    Abstract: A positive resist composition, including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) includes a structural unit (a1) derived from a hydroxystyrene, and a structural unit (a2) containing an acid dissociable, dissolution inhibiting group; and the component (B) includes an acid generator (B1) composed of a compound represented by the general formula (b1) shown below: [Chemical Formula 1] X-Q1-Y1—SO3?A+??(b1) (in the formula, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms which may contain a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may contain a substituent; X represents a hydrocarbon group of 3 to 30 carbon atoms which may contain a substituent; and A+ represents an organic cation).
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: May 29, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Koji Yonemura, Makiko Irie, Hideo Hada
  • Patent number: 8187798
    Abstract: It is disclosed a method of forming fine patterns comprising: subjecting a substrate having photoresist patterns to a hydrophilic treatment, covering the substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing between adjacent photoresist patterns is lessened by the resulting thermal shrinking action, and removing the over-coating agent substantially completely.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: May 29, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshiki Sugeta, Fumitake Kaneko, Toshikazu Tachikawa
  • Publication number: 20120126841
    Abstract: A probe apparatus includes a movable mounting table for supporting an object to be tested; a probe card disposed above the mounting table and having a plurality of probes to come into contact with electrodes of the object; a support body for supporting the probe card; and a control unit for controlling the mounting table. Electrical characteristics of the object are tested based on a signal from a tester by bringing the object and the probes into electrical contact with each other by overdriving the mounting table in a state where a test head is electrically connected with the probe card by a predetermined load. Further, one or more distance measuring devices for measuring a current overdriving amount of the mounting table are provided at one or more locations of the test head or the probe card.
    Type: Application
    Filed: January 26, 2012
    Publication date: May 24, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi Yamada, Tomoya Endo, Shinya Koizumi
  • Publication number: 20120130529
    Abstract: Even in case that a wafer is so greatly deviated that a peripheral portion of the wafer cannot be detected, position determination of the wafer can be performed without inflicting a damage on the wafer. The wafer peripheral portion, which is a target, is detected based on output images from a plurality of imaging units disposed along a peripheral portion shape of the wafer (step S210), and a wafer position deviation correcting step (step S220) or a rough correcting step (step 230) is performed according to the number of the imaging units capable of detecting the wafer peripheral portion. In case that the wafer peripheral portion cannot be detected by all the imaging units, a wafer position adjusting step (step 240) for moving the wafer is performed in a position adjusting direction acquired by a combination of the output images by each imaging unit.
    Type: Application
    Filed: February 3, 2012
    Publication date: May 24, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Takehiro Shindo
  • Publication number: 20120129354
    Abstract: A method for performing a selective etching process is described. The method includes preparing a substrate having a silicon layer (Si) and a silicon-germanium (SiGex) layer, and selectively etching the silicon layer relative to the silicon-germanium layer using a dry plasma etching process.
    Type: Application
    Filed: November 22, 2010
    Publication date: May 24, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Vinh LUONG
  • Publication number: 20120128942
    Abstract: A method for double patterning a substrate is described. The double patterning method may include a litho/freeze/litho/etch (LFLE) technique that includes a first (critical dimension) CD slimming process to reduce the first CD to a first reduced CD and a second CD slimming process to reduce the second CD to a second reduced CD.
    Type: Application
    Filed: June 13, 2011
    Publication date: May 24, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shannon W. DUNN, Dave HETZER
  • Publication number: 20120128694
    Abstract: To provide a therapeutic drug for Alzheimer's disease and/or a cancer. The therapeutic drug for Alzheimer's disease and/or a cancer contains an anti-nicastrin antibody, a derivative of the antibody, or a fragment of the antibody or the derivative.
    Type: Application
    Filed: October 19, 2011
    Publication date: May 24, 2012
    Applicants: PERSEUS PROTEOMICS INC., THE UNIVERSITY OF TOKYO
    Inventors: TAKESHI IWATSUBO, TATSUHIKO KODAMA, TAKAO HAMAKUBO, TAISUKE TOMITA, IKUO HAYASHI, YASUOMI URANO, HIROKO IWANARI, MASAO OHKUCHI
  • Publication number: 20120128935
    Abstract: A method for patterning a substrate is described. The patterning method may include performing a lithographic process to produce a pattern and a critical dimension (CD) slimming process to reduce a CD in the pattern to a reduced CD. Thereafter, the pattern is doubled to produce a double pattern using a sidewall image transfer technique.
    Type: Application
    Filed: June 13, 2011
    Publication date: May 24, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shannon W. DUNN, Dave HETZER
  • Publication number: 20120126376
    Abstract: To produce a silicon dioxide film having concentration of hydrogen atoms below or equal to 9.9×1020 atoms/cm3 in the silicon dioxide film, as measured by using secondary ion mass spectrometry (SIMS), a plasma CVD, which generate plasma by introducing microwaves into a process chamber by using a planar antenna having a plurality of apertures and forms a film, is performed by setting the pressure inside the process chamber within a range from 0.1 Pa to 6.7 Pa and by using a gas of a compound composed of silicon atoms and chlorine atoms and an oxygen containing gas.
    Type: Application
    Filed: September 29, 2009
    Publication date: May 24, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Minoru Honda, Toshio Nakanishi, Masayuki Kohno, Junya Miyahara
  • Publication number: 20120128892
    Abstract: A disclosed surface processing method includes a first processing step, wherein a gas cluster beam is generated from a source material that does not contain nitrogen, and irradiated to a member to be processed, and a second processing step, wherein a nitrogen gas cluster beam is generated and irradiated to the member to be processed.
    Type: Application
    Filed: May 24, 2011
    Publication date: May 24, 2012
    Applicants: Tokyo Electron Limited, HYOGO PREFECTURE
    Inventors: Noriaki TOYODA, Isao Yamada, Masaki Narushima, Masayuki Harashima, Eisuke Morisaki
  • Publication number: 20120130064
    Abstract: This invention provides a method for hydrophilic treatment of cellulose fibers that can prevent coloring or decrease in fiber strength. The hydrophilic treatment method comprises a first oxidation step of oxidizing cellulose fibers in a first reaction solution containing an N-oxyl compound and a re-oxidizing agent for the N-oxyl compound; and a second oxidation step of oxidizing oxycellulose fibers obtained in the first oxidation step in a second reaction solution containing an oxidizing agent for oxidizing aldehyde groups.
    Type: Application
    Filed: August 24, 2010
    Publication date: May 24, 2012
    Applicants: GUNZE LIMITED, THE UNIVERSITY OF TOKYO
    Inventors: Akira Isogai, Tsuguyuki Saito, Chiaki Tanaka, Yoshinari Yui
  • Publication number: 20120128111
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Applicants: THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Kabushiki Kaisha Toshiba
    Inventors: Masato OKAMURA, Tetsuo OOSATO, Seiji YAMAMOTO, Tadasu YOTSUYANAGI, Nagayoshi ICHIKAWA, Kenji YAMAZAKI, Junichi TAKAGI, Hidehiro URATA, Shunichi SUZUKI, Kenro TAKAMORI, Junichi SUZUKI
  • Publication number: 20120128678
    Abstract: [Problem to be Solved] An object of the present invention is to provide novel means for the treatment and diagnosis of cancer. [Solution] The present inventors have obtained a monoclonal antibody against TMPRSS11E and found that this antibody binds to a native form of TMPRSS11E, and TMPRSS11E is highly expressed on the cell membranes of cancer cell lines in flow cytometry. This antibody exhibits antibody-dependent cell-mediated cytotoxicity activity (ADCC activity) and antitumor effect based on internalization activity and is promising as a therapeutic target. Moreover, this antibody has neutralization activity against protease activity and is also expected to have effect brought about by the inhibition of TMPRSS11E functions.
    Type: Application
    Filed: April 15, 2010
    Publication date: May 24, 2012
    Applicants: Forerunner Pharma Research Co., Ltd., The University of Tokyo
    Inventors: Hiroyuki Aburatani, Shunpei Ishikawa, Kiyataka Nakano
  • Publication number: 20120128886
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Applicants: THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Kabushiki Kaisha Toshiba
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Publication number: 20120125889
    Abstract: A cluster beam generating apparatus that generates a cluster beam includes a mixer that mixes a gas source material and a liquid source material; a nozzle that supplies a cluster beam including clusters originating from the gas source material and the liquid source material that are mixed in the mixer; and a temperature adjusting portion that adjusts a temperature of the nozzle, thereby controlling a ratio of the clusters originating from the gas source material and the clusters originating from the liquid source material in the cluster beam.
    Type: Application
    Filed: May 23, 2011
    Publication date: May 24, 2012
    Applicants: Tokyo Electron Limited, HYOGO PREFECTURE
    Inventors: Noriaki TOYODA, Isao Yamada, Masaki Narushima