Abstract: A method of scanning probe microscopy includes using a cantilever having a planar body, generally opposed first and second ends, and a tip disposed generally adjacent the second end and extending downwardly towards a surface of a sample. Preferably, the sample is disposed on a support surface. The method includes directing a beam of light onto the second end in a direction substantially parallel to the support surface. In operation, the second end directs the beam towards a detector apparatus at a particular angle. Then, the method monitors a change in the angle of deflection of the beam of light caused by deflection of the cantilever as the cantilever tip traverses the surface of the sample, the change being indicative of a characteristic of the surface. Preferably, the second end includes a flat reflective surface, with the flat reflective surface being generally non-planar with respect to the planar body of the cantilever.

Abstract: A reference signal is used to track the actual behavior of the scanner in an interferometer to produce scanner-position data that can be used to correct errors introduced by scanner nonlinearities and other error sources. A narrow-band light source is advantageously utilized to cover the entire range of operation of the scanner. Because of the independent reference channel, the invention is suitable for implementation with all types of conventional interferometric techniques. The concept is preferably implemented by utilizing an additional light source and the same scanner used for the measurement, so that the OPD varies in synchronization of both the reference-signal and data-collection procedures. Alternatively, a high temporal-coherence filter may be used with the same light source and optical path used for the interferometric measurement.

Abstract: Interferometric measurements are carried out in conventional manner to produce a correlogram corresponding to successive scanner steps. An approximation of the actual scan-step size between frames is calculated from multiple-frame intensity data collected around the frame of interest using common irradiance algorithms. The scan-step size so measured is then used in standard PSI, VSI or PSIOTF algorithms, instead of the scanner's nominal phase step. According to one embodiment, the invention utilizes a five-frame PSI algorithm to produce an average scan-step size of four scan steps. According to another embodiment, the phase step between frames is calculated directly utilizing a novel five-frame algorithm that produces an approximation of actual phase step for a given frame, rather than an average value of four steps around the frame. The method requires reduced data processing and can advantageously be applied “on-the fly” as intensity data are acquired during scanning.

Abstract: An improved metrology apparatus, such as a scanning probe microscope (SPM), has an actuator that controls motion in three orthogonal directions when it is selectively and electrically stimulated. The X-Y section of the actuator, preferably a piezoelectric actuator, controls motion in the X and Y-directions and the Z-section of the actuator controls motion in the Z-direction. A flexure is attached to the actuator and is mounted on a reference structure to prevent unwanted X and Y-motion by the Z-section of the actuator from moving a probe attached to the flexure. Preferably, two mirrors are mounted on the flexure. In operation of the SPM, a light beam is directed towards these mirrors. When the flexure moves in the Z-direction, one of the mirrors is deflected and causes the reflected light to move across a detector, generating a signal representative of a change in the Z-position of the flexure and the probe.

Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

Abstract: A balanced momentum probe holder in an apparatus for characterizing a sample surface has first and second members each having extensible and retractable distal ends. The distal ends extend or retract substantially simultaneously in response to a signal from a detector thus balancing the momentums of the first and second members and reducing the net momentum of the probe holder to essentially zero. Balancing the momentum of the probe holder reduces parasitic oscillations in the apparatus thus enhancing performance.

Abstract: A force scanning probe microscope (FSPM) and associated method of making force measurements on a sample includes a piezoelectric scanner having a surface that supports the sample so as to move the sample in three orthogonal directions. The FSPM also includes a displacement sensor that measures movement of the sample in a direction orthogonal to the surface and generates a corresponding position signal so as to provide closed loop position feedback. In addition, a probe is fixed relative to the piezoelectric scanner, while a deflection detection apparatus is employed to sense a deflection of the probe. The FSPM also includes a controller that generates a scanner drive signal based on the position signal, and is adapted to operate according to a user-defined input that can change a force curve measurement parameter during data acquisition.

Abstract: A dual collimation deposition apparatus and method are disclosed in which the dual collimation apparatus includes at least a long-throw collimator in combination with one or more physical collimators. A new physical collimator and shield design are also disclosed for improved process uniformity and increased equipment productivity.

Abstract: A pulsed light source in used conjunction with a ramping scanning mechanism for phase-shift and vertical-scanning interferometry. The pulse length and the scanning velocity are selected such that a minimal change in OPD occurs during the pulse. As long as the duration of the pulse is shorter than the detector's integration time, the effective integration time and the corresponding phase shift are determined by the length of the pulse, rather than the detector's characteristics. The resulting minimal phase shift produces negligible loss of fringe modulation, thereby greatly improving signal utilization during phase-shifting and vertical-scanning interferometry.

Abstract: A vertical probe card assembly containing a plurality of vertical probe cards is mounted within a central corridor or opening within a magnetic field generator. Each of the vertical probe cards has a multiplicity of probe needles extending downwardly therefrom for electrically contacting test pads of a device under test that is positioned below the magnetic field generator.

Abstract: Average fringe contrast is determined by PSI measurements at each step of relatively large translations of the reference optics and mirror of a white-light Linnik interference objective and the resulting data are used to minimize the OPD between the reference and test beam paths of the instrument. Utilizing the same algorithms used in the art to perform conventional vertical scanning interferometry, the position of minimum OPD is determined by finding the position of maximum average fringe contrast. Furthermore, by automating the system with a precise translation mechanism, operator-to-operator variations are completely eliminated and the precision of the process of OPD minimization is greatly improved. In another embodiment of the invention, the optimal focal position of the reference mirror is found at the same time by calculating the average lateral variation of fringe contrast as a function of OPD and focal position.

Abstract: A method and apparatus are provided for supporting a semiconductor wafer in a vacuum and transferring heat by gas conduction between the wafer and a wafer chuck to facilitate wafer processing. The wafer substrate is loaded onto a seat plate, and then a clamp ring is lowered against the force of compression springs that bias the seat plate upward on guides extending upward from the body of the chuck. The clamp ring touches the wafer on the front or top side with an inner O-ring that is attached to the bottom of the clamp ring, and forces the wafer and the seat plate down to a lower position parallel to a heat transfer surface of the chuck, spaced therefrom by a narrow gap. In the lower position, an outer O-ring that is also attached to the bottom of the clamp contacts an outer sealing surface that surrounds the heat transfer surface, thereby enclosing a cavity that includes an annular chamber around the outside of the chuck and the narrow gap. Gas is supplied to the passage and thus to the gap.

Abstract: A laser interferometer is embedded into an interference microscope to precisely determine the in-focus position of the microscope objective's reference mirror. A collimated laser beam is introduced into the microscope system and split into two beams directed toward a calibration reference surface and the interference objective. The light reflected from the calibration reference surface is returned to the camera. The light into the interference objective is focused onto the reference mirror and returned to the camera. For the purpose of calibration, the two beams are combined at the camera to produce interference fringes. When the reference mirror is in focus, the returned beam is collimated; if the mirror is on either side of focus, the beam is either converging or diverging. Accordingly, the interferogram produced at the camera reflects the in-focus or out-of-focus condition of the reference mirror.

Abstract: An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.

Abstract: A method and apparatus for monitoring and controlling reactive sputter deposition, particularly useful for depositing insulating compounds (e.g., metal-oxides, metal-nitrides, etc.). For a given nominal cathode power level, target material, and source gases, the power supplied to the cathode (target) is controlled to stabilize the cathode (target) voltage at a specified value or within a specified range corresponding to a partial pressure or relative flow rate value or range of the reactive gas. Such an operating point or range, characterized by a specified voltage value or range and corresponding reactive gas relative-flow/partial-pressure value or range, may be determined empirically based on measuring the cathode voltage as a function of reactive gas relative-flow/partial-pressure for the given nominal power.

Abstract: An metrology apparatus includes an actuator with a first actuator stage to controllably move in first and second orthogonal directions, and a second actuator stage adjacent to the first actuator stage to controllably move in a third direction orthogonal to the first and second orthogonal directions. A coupling is coupled to the second actuator stage and to a multi-bar linkage assembly fixed to a second end of a reference structure. The second actuator stage and the coupling move the linkage in the third orthogonal direction in a manner that substantially isolates the linkage from any second actuator stage motion in the first and second directions. An objective is fixed to the second end of the reference structure and located between a light source and a position sensor. The position sensor measures first actuator stage motion in the first and second directions.

Abstract: Bat wings are removed at step discontinuities within the coherence length of the light source of a vertical-scanning interferometer. A first height profile is obtained from a correlogram using a coherence-sensing technique. A second height profile is obtained from phase measurements at the best-focus frame position of the scanner. The two profiles are compared, and phase ambiguities are removed in conventional manner. In addition, during unwrapping the differences in height between two adjacent pixels obtained both by coherence sensing and by phase measurements are compared to f&lgr;/4. Where the inter-pixel height difference calculated by coherence sensing is smaller and the inter-pixel height difference calculated by phase is larger than f&lgr;/4, the phase measurement is corrected by 2&pgr; increments until both coherence and phase inter-pixel height differences are within f&lgr;/4. This additional step removes bat-wing effects from profiles obtained by phase measurement.

Abstract: A method is provided for a repetitive deposition and etch of a substrate using a carbon containing ion beam in a gridded ion source. The method includes the actual ion beam processing step combined with the thermal and chemical conditioning of the ion source and a special cleaning step(s). The special cleaning step(s) effect robust removal of the precipitates accumulated in the operating source due to the decomposition of carbon containing gases such as hydrocarbons and halocarbons Precipitate removal is achieved by employing ions and radicals formed in an inert gas plasma or a mixture of inert gas and oxygen to reactively etch or bombard the precipitates.

Abstract: An electronic template representing the topography of a magnetic head being tested and delineating distinct patterns corresponding to particular regions of interest, such as ABS surfaces, is provided in order to limit analysis of the sample's surface to such regions. The outline of the slider positioned within the field of view of an interferometric microscope is identified by measuring the modulation of incident light at each pixel inside and outside the contour of the sample using the loci of perceivable fringe contrast as the criterion for establishing the location of such edges. Once the outline of the slider within the plastic tray is so established, the slider is shifted within the field of view to match the position of the template, thereby automatically achieving a precise alignment of the template with the boundary of the slider.

Abstract: A method and apparatus for manipulating the surface of a sample including a cantilever, a first tip mounted on the cantilever, and a second tip mounted on the cantilever, the first and the second tip being configured to combine to form an imaging probe and to separate to form a manipulation probe. The first and second tips are configured to form a first position characterized in that the tips combine to form an imaging tip and the first and the second tip are configured to form a second position characterized in that the tips separate to manipulate particles on a surface of a sample. The tips can be configured to form the first position when a voltage is applied across the tips, and preferable extend downwardly from the cantilever substantially perpendicular thereto.