Abstract: A balanced momentum probe holder in an apparatus for characterizing a sample surface has first and second members each having extensible and retractable distal ends. The distal ends extend or retract substantially simultaneously in response to a signal from a detector thus balancing the momentums of the first and second members and reducing the net momentum of the probe holder to essentially zero. Balancing the momentum of the probe holder reduces parasitic oscillations in the apparatus thus enhancing performance.

Abstract: An interferometric profiler includes an opening adapted to receive a removable compensating element in the reference arm. The compensating element is mounted on a holder adapted for slidable engagement within the opening. A retaining mechanism keeps the holder firmly in place in the opening. The reference mirror of the profiler is mounted on a slidable stage urged away from the compensating element by a spring-loaded mechanism. A knob is provided to manually push the stage inward to its operating position proximate to the compensating element. A stop ensures that the travel of the stage is limited to a safe distance from the compensating element and a lock is provided to releasably hold the stage in place during use. Multiple objectives with different magnifications may be coupled to the module for alternative use according to the needs of particular applications. An illumination module may also be coupled to the reference-arm module.

Abstract: A characterizer for determining the shape of a probe tip for an atomic force microscope and methods of fabricating and using the characterizer. The characterizer includes a micromachined crystalline structure with opposed edges separated by a width suitable for characterizing a dimension of the probe tip. At least one of the opposed edges overhangs an undercut region of the micromachined crystalline structure by an overhang distance that is greater than one third of the width. The probe tip is scanned across the edges of the characterizer for shape determination. The characterizer is formed by serially deep reactive ion etching and anisotropic etching (100) single crystal silicon. The opposed edges may be oxidation sharpened for use in profiling an end or side of the probe tip.

Abstract: A scanning probe microscope method and apparatus that modifies imaging dynamics using an active drive technique to optimize the bandwidth of amplitude detection. The deflection is preferably measured by an optical detection system including a laser and a photodetector, which measures cantilever deflection by an optical beam bounce technique or another conventional technique. The detected deflection of the cantilever is subsequently demodulated to give a signal proportional to the amplitude of oscillation of the cantilever, which is thereafter used to drive the cantilever.

Abstract: In a rotating disk reactor (1) for growing epitaxial layers on substrate (3), gas directed toward the substrates at different radial distances from the axis of rotation of the disk has substantially the same velocity. The gas directed toward portions of the disk remote from the axis (10a) may include a higher concentration of a reactant gas (4) than the gas directed toward portions of the disk close to the axis (10d), so that portions of the substrate surfaces at different distances from the axis (14) receive substantially the same amount of reactant gas (4) per unit area. A desirable flow pattern is achieved within the reactor while permitting uniform deposition and growth of epitaxial layers on the substrate.

Abstract: An improved planetary sputter deposition method for sputter depositing an alloy on a substrate wherein the sputter deposited amount, or thickness, of a specific material of the alloy can be controlled so that different substrates can be provided with an alloy having a different composition, i.e. having different percentages of the same materials, thus, reducing the costs of stockpiling multiple alloy targets. The method generally includes providing a substrate and a plurality of targets with each of the plurality of targets being composed of one or more magnetic materials. The targets are sputtered, in sequence, to deposit each of the materials of the plurality of targets on the substrate to provide at least one laminate defining an alloy.

Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

Abstract: A method of operating a scanning probe microscope includes using a probe having a cantilever, and oscillating the probe at a torsional resonance frequency thereof. In addition, the method includes substantially increasing torsional drive efficiency with dual actuators disposed on the probe or the probe base. First and second actuators may be driven by corresponding first and second drive signals, the first and second drive signals being about 180° out of phase. The maximizing step includes altering at least one of the amplitudes of the first and second drive signals to maximize torsional oscillation. Torsional and flexural oscillation of the cantilever probe can be excited concurrently, sequentially or independently by adjusting the phase of the corresponding drive signals. A pair of cantilever components can be used to form a nanotweezer by rotating the respective arms having corresponding tip portions at the distal ends.

Abstract: The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) including oscillating a probe of the SPM at a torsional resonance of the probe, and generally simultaneously measuring an electrical property, e.g., a current, capacitance, impedance, etc., between a probe of the SPM and a sample at a separation controlled by the torsional resonance mode. Preferably, the measuring step is performed while using torsional resonance feedback to maintain a set-point of SPM operation.

Abstract: An apparatus and method of determining a potential at a surface of a sample in a polar liquid, for example, across an electrical double layer, includes the step of immersing the sample in a polar solution to form a potential gradient at the surface. A tip of a scanning probe microscope probe is then positioned in the solution generally adjacent the surface. During operation, the method includes measuring a potential of the probe. Relative scanning movement between the sample and the probe may be provided, and, in one mode of operation, a feedback signal is generated based on the measured potential. In that case, the tip may be moved generally orthogonal to the surface in response to the feedback signal to maintain a generally constant separation therebetween. The polar solution may have an associated ionic concentration, and the ionic concentration can be modified to tune the operation of the SEPM.

Abstract: Method and process for fabricating a device structure for a read head of a mass storage device. A polish stop layer formed of a relatively hard material, such as diamond-like carbon, is positioned between a layer stack and a resist mask used to mask regions of the layer stack during ion milling that removes portions of the layer stack to define a read sensor. The resist mask is removed, after the read sensor is defined, by a planarization process, which eliminates the need to lift-off the resist mask with a conventional chemical-based process. An electrical isolation layer of a material, such as Al2O3, is formed on the masked read sensor. In addition or alternatively, the electrical isolation layer may be formed using an atomic layer deposition (ALD) process performed at an elevated temperature that would otherwise hard bake the resist mask.

Abstract: A method of extracting the shape of a probe tip of a probe-based instrument from data obtained by the instrument is provided. The method employs algorithms based on the principle that no reconstructed image points can physically occupy the same region as the tip during imaging. Sequential translates of the tip shape or volume sweep out an area or volume that is an “exclusion zone” similar to morphological erosion. The embodiments of the alternative method use either the region defined by the tip boundary or simply the tip boundary.

Abstract: Two threshold parameters are used to identify the intensity modulation peaks corresponding to the interfaces of the two sides of a thin film with the adjacent media. The first parameter is used to distinguish modulation data from noise and is set on the basis of actual background noise data measured during the interferometric scan. The second parameter is used to separate actual contrast data from signals of relatively high modulation that satisfy the first parameter but do not in fact result from interference fringes. Data that satisfy both parameters are considered valid modulation data and the peak of each modulation envelope is then calculated using conventional means. The thickness of the film at each pixel is obtained by dividing the scanning distance corresponding to the two peaks by the group index of refraction of the film material.

Abstract: A characterizer for determining the shape of a probe tip for an atomic force microscope and methods of fabricating and using the characterizer. The characterizer includes a micromachined crystalline structure with opposed edges separated by a width suitable for characterizing a dimension of the probe tip. At least one of the opposed edges overhangs an undercut region of the micromachined crystalline structure by an overhang distance that is greater than one third of the width. The probe tip is scanned across the edges of the characterizer for shape determination. The characterizer is formed by serially deep reactive ion etching and anisotropic etching (100) single crystal silicon. The opposed edges may be oxidation sharpened for use in profiling a bottom surface of the probe tip.

Abstract: A system and method for calibrating a pyrometer used in temperature detection in a chemical vapor deposition system is provided. A calibration wafer with a reference region including a metal such as Al or Ag for forming a eutectic, and an exposed non-reference region without such a metal, are provided. Reflectivity measurements are taken from the reference region, and temperature measurements are taken from the non-reference region, over a range of temperatures including a known melting point for the metal eutectic. The pyrometer is calibrated based on the correlation of the known eutectic melting point with the change in reflectivity data obtained in the reference region, in light of the temperature data obtained from the non-reference region.

Abstract: An apparatus and method of analyzing a sample to be scanned within a hermetically sealed housing of an atomic force microscope (AFM) while the interior of the housing is maintained at one of a number of various environmental conditions. The AFM includes an XYZ stage assembly on which a sample holder supporting the sample may be releasably positioned. The stage assembly allows for the manipulation of the sample and sample holder in the X, Y and Z axes without disturbing any environmental condition present within the chamber due to the hermetic seal maintained between the stage assembly and the AFM during the motion of the stage assembly. The ability of the stage assembly to manipulate the sample in each of the three directions while the sample is enclosed within the AFM also allows the AFM to compensate for non-parallel scanning planes and for drift in all three directions occurring in the sample because of the different environmental conditions in which the sample may be scanned.

Abstract: A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.

Abstract: A calibration method for calibrating a parts-handling device with respect to a computer vision camera includes the steps of moving a parts-handling device into contact with a touch-off block, and storing a value indicative of the position of the parts-handling device when it is in contact with the touch-off block. In addition, there may be two orthogonal surface on the touch-off block. By touching the parts-handling device against both surfaces, the parts-handling device can be calibrated for position offset in two orthogonal directions. For parts-handling devices that are rotatable, the parts-handling device may be rotated to a succession of predetermined angular positions and brought into contact with the touch-off block in each position. By combining the measured positions of the parts-handling device in each rotational position, the system can be calibrated to compensate for the offset from the camera to the parts-handling device as a function of rotational position as well.

Abstract: Dynamic nanomechanical analysis of a sample is performed by using a cantilever probe that interacts with the sample using a force applied across a wide range of frequencies that includes frequencies greater than 300 Hz. The motion of the cantilever probe is detected in response to the applied force over the range of frequencies and analyzed over at least a portion of the wide range of frequencies to determine a mechanical response of the sample, preferably including quality factor and modulus of the sample. The analysis of the motion of the cantilever probe is preferably performed in terms of amplitude, phase, and frequency of both the probe and the sample and preferably, where the applied force is analyzed to determine both a real and an imaginary modulus of a mechanical response of the sample. Preferably, the force is applied so as to produce a minimum of phase and amplitude response variation in the absence of the sample.

Abstract: A force scanning probe microscope (FSPM) and associated method of making force measurements on a sample includes a piezoelectric scanner having a surface that supports the sample so as to move the sample in three orthogonal directions. The FSPM also includes a displacement sensor that measures movement of the sample in a direction orthogonal to the surface and generates a corresponding position signal so as to provide closed loop position feedback. In addition, a probe is fixed relative to the piezoelectric scanner, while a deflection detection apparatus is employed to sense a deflection of the probe. The FSPM also includes a controller that generates a scanner drive signal based on the position signal, and is adapted to operate according to a user-defined input that can change a force curve measurement parameter during data acquisition.