Patents Assigned to Veeco Instruments
  • Patent number: 6945099
    Abstract: An apparatus and method of operating a probe-based instrument in a torsional mode. The method includes providing a probe having a cantilever defining a longitudinal axis and supporting a tip. In operation, the method torsionally oscillates the probe generally about the longitudinal axis at a resonance. In addition, the method changes a separation distance between the tip and a surface of a sample so the tip interacts with the surface during data acquisition. By detecting a change in the torsional oscillation of the cantilever in response to the interaction between the tip and the surface, forces, including shear forces and shear force gradients, between the tip and the surface can be measured to determine sub-nanometer features.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: September 20, 2005
    Assignee: Veeco Instruments Inc.
    Inventors: Chanmin Su, Kenneth L. Babcock, Lin Huang
  • Patent number: 6941823
    Abstract: A method to compensate for stress deflection in a compound microprobe that includes a substrate, a microcantilever extending outwardly from the substrate, and a film formed on the microcantilever. The method preferably comprises the steps of determining an amount of stress-induced deflection of the microcantilever, and then mounting the microprobe so as to compensate for the stress-induced deflection. The mounting step preferably includes selecting a compensation piece based upon the amount of stress-induced deflection, where the compensation piece is a wedge generally aligning the microcantilever with a deflection detection apparatus. In general, the step of selecting the compensation piece includes correcting an angle between a longitudinal axis of the microcantilever and the substrate so as to insure that light reflected from the microcantilever during operation contacts a detector of a deflection detection apparatus.
    Type: Grant
    Filed: November 7, 2001
    Date of Patent: September 13, 2005
    Assignee: Veeco Instruments Inc.
    Inventors: Jonathan W. Lai, Hector B. Cavazos, Stephen C. Minne, Dennis M. Adderton
  • Patent number: 6934131
    Abstract: A thermally stable spin valve sensor having an increased GMR ratio by virtue of an AP pinned layer structure in which the first and second pinned layers are separated by an AP coupling layer having a nano-oxide layer formed as an oxidized surface portion of the AP coupling layer. The nano-oxide layer provides an increase in the specular scattering, and in turn, an increase in the GMR ratio.
    Type: Grant
    Filed: January 13, 2003
    Date of Patent: August 23, 2005
    Assignee: Veeco Instruments, Inc.
    Inventors: Ming Mao, Adrian J. Devasahayam, Jacques C. S. Kools, Chih-Ling Lee, Chih-Ching Hu, Patricia L. Cox
  • Patent number: 6928863
    Abstract: A metrology apparatus includes an actuator with a first actuator stage to controllably move in first and second orthogonal directions, and a second actuator stage adjacent to the first actuator stage to controllably move in a third direction orthogonal to the first and second orthogonal directions. A coupling is coupled to the second actuator stage and to a multi-bar linkage assembly fixed to a second end of a reference structure. The linkage supports a sample holder and transmits appropriate displacements generated by the actuator thereof The second actuator stage and the coupling move the linkage in the third orthogonal direction in a manner that substantially isolates the linkage from any second actuator stage motion in the first and second directions. An objective is fixed to the reference structure and is located between a light source and a position sensor. The position sensor measures first actuator stage motion in the first and second directions.
    Type: Grant
    Filed: July 22, 2003
    Date of Patent: August 16, 2005
    Assignee: Veeco Instruments Inc.
    Inventor: James R. Massie
  • Publication number: 20050166843
    Abstract: An apparatus for fabricating a conformal thin film on a substrate are disclosed. The apparatus includes a top shield having a top surface and a bottom surface and a bottom shield having an aperture formed therein and a thickness. The bottom shield is coupled to the bottom surface of the top shield such that the top shield covers the aperture. The apparatus further includes a substrate holder that may hold a substrate. The substrate holder is in contact with the bottom shield such that a reaction chamber is formed having a volume defined by the aperture and the thickness of the bottom shield.
    Type: Application
    Filed: February 3, 2005
    Publication date: August 4, 2005
    Applicant: Veeco Instruments, Inc.
    Inventors: Jacques Kools, Randhir Bubber, Ming Mao, Thomas Schneider, Jinsong Wang
  • Patent number: 6919690
    Abstract: A modular ion source design relies on relatively short modular anode layer source (ALS) components, which can be coupled together to form a longer ALS. For long ion sources, these shorter modular components allow for easier manufacturing and further result in a final assembly having better precision (e.g., a uniform gap dimensions along the longitudinal axis of the ion source). Modular components may be designed to have common characteristics so as to allow use of these components in ion sources of varying sizes. A modular gas distribution system uniformly distributes a working gas to the ionization region of the module ion source. For each gas distribution module, gas distribution channels and baffles are laid out relative to the module joints to prevent gas leakage. Furthermore, gas manifolds and supply channels are used to bridge module joints while uniformly distributing the working gas to the ALS.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: July 19, 2005
    Assignee: Veeco Instruments, Inc.
    Inventors: Daniel E. Siegfried, David Matthew Burtner, Scott A. Townsend, John Keem, Mark Krivoruchko, Valery Alexeyev, Vsevolod Zelenkov
  • Patent number: 6912893
    Abstract: A method of operating a probe-based instrument includes providing a probe assembly and a probe holder and oscillating a probe of the probe assembly with an actuator that generates oscillation energy. The method also includes mounting the probe assembly on the probe holder so as to lessen interference with the oscillation energy coupled to the tip of the probe. A corresponding probe assembly includes a base having two substantially opposed surfaces and a cantilever extending from the base and supporting a tip. The probe assembly is mounted in a probe holder such that a probe holder surface contacts one of the opposed surfaces. The one opposed surface preferably includes at least one opening such that the surface area of the one opposed surface is substantially less than the surface area of the probe holder surface.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: July 5, 2005
    Assignee: Veeco Instruments Inc.
    Inventors: Stephen C. Minne, Hector B. Cavazos
  • Patent number: 6902623
    Abstract: A reactor for growing epitaxial layers includes reaction chamber having a passthrough opening for inserting and removing wafer carriers from the reaction chamber. A reactor also includes a cylindrical shutter located inside the reaction chamber for selectively closing the passthrough opening. The cylindrical shutter is movable between a first position for closing the passthrough opening and a second position for opening the passthrough opening. The cylindrical shutter includes an internal cavity adapted to receive a cooling fluid and tubing for introducing the cooling fluid into the internal cavity. The tubing is permanently secured to the shutter and moves simultaneously therewith. The cylindrical shutter and the internal cavity of the shutter surrounds an outer perimeter of the wafer carrier, thereby minimizing nonuniformity in the temperature and flow field characteristics of the reactant gases.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: June 7, 2005
    Assignee: Veeco Instruments Inc.
    Inventors: Alexander Gurary, Scott Elman, Keng Moy, Vadim Boguslavskiy
  • Patent number: 6886395
    Abstract: A method of making a probe having a cantilever and a tip include providing a substrate having a surface and forming a tip extending substantially orthogonally from the surface. The method includes depositing an etch stop layer on the substrate, whereby the etch stop layer protects the tip during process. A silicon nitride layer is then deposited on the etch stop layer. An etch operation is used to release the cantilever and expose the etch stop layer protecting the tip. Preferably, the tip is silicon and the cantilever supporting the tip, preferably via the etch stop layer, is silicon nitride. A probe for a surface analysis instrument made according to the method includes a tip and a silicon nitride cantilever having a thickness defined during the deposition process.
    Type: Grant
    Filed: January 16, 2003
    Date of Patent: May 3, 2005
    Assignee: Veeco Instruments Inc.
    Inventor: Stephen C. Minne
  • Patent number: 6870164
    Abstract: In accordance with one specific embodiment of the present invention, a Hall-current ion source is operated in a pulsed mode where the pulse duration is short compared to the time for discharge fluctuations to develop. For a reduced loss of neutral gas, the time between pulses should be less than, or about equal to, the fill time for the ionizable gas in the discharge volume of the Hall-current ion source.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: March 22, 2005
    Assignees: Kaufman & Robinson, Inc., Veeco Instruments Inc.
    Inventors: David A. Baldwin, Boris Ciorneiu, Harold R. Kaufman
  • Patent number: 6864486
    Abstract: A closed loop exit hole is formed in a magnetically permeable end wall (2) of an enclosure (1) of a closed electron drift ion source. Parts of this end wall separated by the exit hole serve as pole pieces (7 and 8) of the magnetic system and define the first pole gap. The magnetic system includes pole pieces (9 and 10), which define the second pole gap made in the form of a closed loop exit hole and arranged along the direction of ion emission. Magnetomotive force sources (5 and 6) are located in space between two groups of magnetic terminals. The ratio of width of each pole gap and distance between pole pieces of the first (7 and 8) and second (9 and 10) magnetic gaps along the direction of ion emission is not less than 0.05. The invention allows the intensity of the generated ion beam and the energy of ions to be increased, and this is provided by the homogeneous distribution of ion current density across the ion beam section.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: March 8, 2005
    Assignee: Veeco Instruments, Inc.
    Inventors: Valery V. Alekseev, Vsevolod V. Zelenkov, Mark M. Krivoruchko, John E. Keem
  • Patent number: 6862921
    Abstract: A method and apparatus for manipulating the surface of a sample including a cantilever, a first tip mounted on the cantilever, and a second tip mounted on the cantilever, the first and the second tip being configured to combine to form an imaging probe and to separate to form a manipulation probe. The first and second tips are configured to form a first position characterized in that the tips combine to form an imaging tip and the first and the second tip are configured to form a second position characterized in that the tips separate to manipulate particles on a surface of a sample. The tips can be configured to form the first position when a voltage is applied across the tips, and preferable extend downwardly from the cantilever substantially perpendicular thereto.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: March 8, 2005
    Assignee: Veeco Instruments Inc.
    Inventors: Ami Chand, Kevin J. Kjoller, Kenneth L. Babcock, Michael K. Harris
  • Patent number: 6861649
    Abstract: A balanced momentum probe holder in an apparatus for characterizing a sample surface has first and second members each having extensible and retractable distal ends. The distal ends extend or retract substantially simultaneously in response to a signal from a detector thus balancing the momentums of the first and second members and reducing the net momentum of the probe holder to essentially zero. Balancing the momentum of the probe holder reduces parasitic oscillations in the apparatus thus enhancing performance.
    Type: Grant
    Filed: July 7, 2003
    Date of Patent: March 1, 2005
    Assignee: Veeco Instruments, Inc.
    Inventor: James R. Massie
  • Patent number: 6847460
    Abstract: An electronic template delineating distinct selected patterns corresponding to predetermined regions of interest in a sample part is used to limit analysis to those regions. The surface of the sample is first measured using conventional techniques. The data so acquired are used to identify boundaries between distinct regions, which are then compared to a predetermined pattern boundary in the template to find a best-fit match. The position of the pattern is then shifted to overlay the match, thereby automatically aligning the template's selected patterns with the regions of interest in the sample surface. As a result, profilometric analysis can be limited to the regions of interest. Correction factors are also assigned to each selected pattern in the template to account for physical differences in the corresponding regions of interest of the sample part that affect the profilometric measurement.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: January 25, 2005
    Assignee: Veeco Instruments, Inc.
    Inventors: Colin T. Farrell, Anthony L. Martinez, Joanna Schmit, Michael B. Krell
  • Patent number: 6843891
    Abstract: In one embodiment of this invention, the apparatus for sputter deposition within an evacuated volume comprises a compact gridless ion source into which an ionizable gas is introduced and from which ions leave with directed energies at or near the sputtering threshold and a sputter target near that source, biased negative relative to the surrounding vacuum enclosure, and located within the beam of ions leaving that source. Particles sputtered from the target are deposited on a deposition substrate spaced from both the ion source and the sputter target. An energetic beam of electrons can be generated by the incident ions striking the negatively biased sputter target and the deposition substrate is located either within or outside of this beam, depending on whether the net effect of bombardment by energetic electrons is beneficial or detrimental to that particular deposition process.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: January 18, 2005
    Assignees: Kaufman & Robinson, Inc., Veeco Instruments Inc.
    Inventors: James R. Kahn, Harold R. Kaufman, Viacheslav V. Zhurin, David A. Baldwin, Todd L. Hylton
  • Patent number: 6838389
    Abstract: A multi-step etching process for a lead overlay structure such as a thin-film magnetic head structure using secondary ion mass spectroscopy (SIMS) whereby high selectivity of a lead material or other high conductivity metal layer is realized versus that of a metallic mask material and stopping layer. The first step includes patterning the mask layer using IBE or RIE. Advantageously, a photoresist layer is present over a portion of the mask layer and is left in place to be removed in a subsequent step. The second step includes etching the high conductivity metal layer using CAIBE or RIBE with an inert/reactive gas mixture and using SIMS to detect when the stopping layer is reached.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: January 4, 2005
    Assignee: Veeco Instruments, Inc.
    Inventors: Kurt E. Williams, Hariharakeshara Hegde
  • Patent number: 6838889
    Abstract: A method and apparatus for reducing the parachuting of a probe used in an atomic force microscope. The apparatus includes an oscillating probe, a phase detection circuit coupled to the oscillating probe, and a probe drive boosting circuit coupled to the phase detection circuit and the probe, wherein the phase detection circuit detects a reduction of a variation of a phase signal from the probe and the probe drive boosting circuit boosts a signal to the probe based on the phase signal detected by the phase detection circuit to produce a boosted probe drive signal. The phase detection circuit includes a precision full wave rectifier, and an envelope detector coupled to the precision full wave rectifier, wherein the precision full wave rectifier rectifies a phase signal of the probe to produce a rectified phase signal and the envelope detector detects the rectified phase signal to produce an envelope detected signal.
    Type: Grant
    Filed: January 17, 2001
    Date of Patent: January 4, 2005
    Assignee: Veeco Instruments Inc.
    Inventors: Quanmin C. Su, William I. Russell
  • Patent number: 6816806
    Abstract: A method of characterizing a sample surface having a surface anomaly region includes the steps of profiling the sample surface to generate surface characteristic data, and generating a histogram based on the profiling step. Then, the method measures a surface anomaly in the surface anomaly region based on the generating step. The method further includes the step of selecting a zone of interest from the surface characterization data. The zone of interest preferably includes the surface anomaly region, wherein the surface anomaly region includes one of erosion and dishing. Preferably, the histogram includes a first peak corresponding to a generally planar portion of the sample surface, and a second peak corresponding to the surface anomaly. Moreover, the measuring step includes determining a distance between the first and second peaks, the distance being indicative of the depth of the surface anomaly.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: November 9, 2004
    Assignee: Veeco Instruments Inc.
    Inventor: Stanislaw M. Kocimski
  • Patent number: 6810720
    Abstract: An AFM that combines an AFM Z position actuator and a self-actuated Z position cantilever (both operable in cyclical mode and contact mode), with appropriate nested feedback control circuitry to achieve high-speed imaging and accurate Z position measurements. A preferred embodiment of an AFM for analyzing a surface of a sample in either ambient air or fluid includes a self-actuated cantilever having a Z-positioning element integrated therewith and an oscillator that oscillates the self-actuated cantilever at a frequency generally equal to a resonant frequency of the self-actuated cantilever and at an oscillation amplitude generally equal to a setpoint value.
    Type: Grant
    Filed: December 5, 2002
    Date of Patent: November 2, 2004
    Assignee: Veeco Instruments Inc.
    Inventors: Dennis M. Adderton, Stephen C. Minne
  • Patent number: 6810354
    Abstract: A method of extracting the shape of a probe tip of a probe-based instrument from data obtained by the instrument is provided. The method generates an image using the data wherein the data is indicative of a characteristic of a surface of a sample. The method then calculates a slope of the image at a particular region and determines, using the slope, a probe contact point between the tip and the sample at that region. In addition, the method further includes the steps of translating the image point based on the probe contact point and repeating the above steps for at least two points in the image data so as to generate a corrected image plot.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: October 26, 2004
    Assignee: Veeco Instruments Inc.
    Inventor: Gregory A. Dahlen