Abstract: A transport device is particularly suitable for use in a vacuum chamber for the transportation of a flat substrate through the vacuum chamber and comprises a belt conveyor with at least one flexible infinite belt guided around at least two deflection rollers, whereby at least one deflection roller can be driven, and further including a filling element positioned for filling at least the space contained by the infinite belt or belts. The air volume enclosed by the transport device is significantly reduced in comparison to conventional solutions by incorporating the filling element in the transport element. As a result, the volume to be evacuated from the vacuum chamber is reduced. The vacuum chamber can be evacuated and ventilated more rapidly. Nevertheless, the transport device is constructed so as to be maintenance-friendly. Maintenance work can be carried out easily, because the infinite belts and the deflection rollers are easily accessible.

Abstract: A measuring instrument, in particular for transmission measurement with transparent substrates, comprises a measuring head with a light emitting element for emitting a light beam and a light receiver element for recording an incident light beam, and a retro-reflector for reflection of the emitted light beam. The measuring instrument allows transmission measurements to be carried out on transparent substrates with only one reflection measuring head. The measuring instrument also allows reflection measurements to be carried out, for example on non-transparent substrates or by tilting the measuring head and covering the retro-reflector. The measuring instrument only requires one measuring head and can therefore be produced more cost-effectively. It does not require calibration, as the retro-reflector also reflects the light in the original direction in the case of oblique incidence and in the event of positional changes caused by process or operational factors (vibrations etc.).

Abstract: The invention concerns an apparatus for vacuum coating of substrates of various sizes that consists of lock chambers at the entrance and at the exit and several processing chambers arranged one behind the other as well as of a conveying system for the sequential transport of substrates with a certain substrate width through the lock chambers and for their continuous transport through the coating chambers. The lock and processing chambers each have a chamber width that corresponds to the substrate width, and the lock chamber is characterized by a loading area AL having a width b and a length l that indicates the size of substrate that can be accommodated. The object of the apparatus according to the invention is to better utilize the coatable area of each processing chamber so that less coating material is wasted. The object is solved by making the ratio R of width to length R=w/l greater than a minimum ratio Rmin where Rmin =0.95?0.019 AL.

Abstract: A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the ends and any resultant arcing, resulting in a more reliable magnetron requiring less service and a magnetron that produces more consistent coatings.

Abstract: A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.

Abstract: A support assembly for the magnetic array in a cylindrical magnetron that greatly reduces the stress placed on the assembly and on the end blocks of the magnetron. The support assembly and method also reduce the time necessary for properly positioning the magnetic array in relation to the target tube, and result in uniform positioning of the magnetic array along the length of the target tube. A cylindrical magnetron incorporating such an assembly produces uniform coatings and requires less adjustment and maintenance.

Abstract: An AC/DC cylindrical magnetron with a drive system that absorbs large variations in the rotation of the target tube, an efficient high capacity electrical transfer system, and improved electrical isolation.

Abstract: An AC/DC cylindrical magnetron with a drive system that absorbs large variations in the rotation of the target tube, an efficient high capacity electrical transfer system, and improved electrical isolation.

Abstract: An optical coating and a method of coating a substrate are provided. A first layer is deposited adjacent to a substrate. The first layer has an optical thickness of about 0.27 &lgr;0 to about 0.31 &lgr;0, where &lgr;0 is a reference wavelength corresponding to a spectral region bound by or in the visible spectrum. A second layer having an optical thickness of about 0.1 &lgr;0 to about 0.125 &lgr;0 and a refractive index from about 2.2 to about 2.6 is deposited. A third layer having a refractive index from about 1.46 to about 1.52 is deposited. The optical coating provides broadband anti-reflection performance, and the thin second layer facilitates high throughput production of the optical coating.

Abstract: A sputtering installation has two longitudinally extended magnetrons disposed next to one another and each has a target on an upper side thereof. Increasing utilization of the targets in the sputtering installation is accomplished by homogenizing the discharge resistance of the magnetrons along the directrix such that a partial discharge resistance of a target point on the directrix has the same magnitude as the partial discharge resistance of a different target point on the directrix.

Abstract: The invention is an electron-beam vaporization installation for coating structural components made of extreme-heat-resistant alloys (super alloys), especially turbine blades, with so-called thermal barrier coatings. The invention divides the continuous process principle for this coating task with extreme thermal stress for the substrata. The invention divides the thermally high stressed chambers by a partition with a slot. As a result of this the heating chamber and the coating chamber are thermally decoupled from the room for the transport system of the substrata carriage. A further characteristic of the invention is that the carriage for the transport of the substrata through the installation is cooled. For this purpose at the specific work positions the cooling system of the carriage is coupled with the exterior cooling circuits by a leakproof coupling system. The movement of the substrata is done hydraulically and is coupled with the exterior hydraulic circuits in a similar manner as the cooling system.

Abstract: The invention which relates to a device for the generating of electron beams with a vacuum chamber, in which a massive cathode (10) is arranged with a wire cathode (14) arranged above and a aperture anode (17) below the massive cathode (10) and whom below the aperture anode (17) focusing and/or deflecting magnet arrangements are provided which direct an electron beam (23) emitted by the massive cathode (10) and accelerated by the aperture anode (17) to a processing location (22), has the basic task to make the power of such devices variable over a large range using simple mechanical means. According to the invention the task is solved by arranging the aperture anode (17) rigidly and the massive cathode (10) and the wire cathode (14) axially movable within the vacuum chamber (1). For the movements of the massive cathode (10) and the wire cathode (14) contact means are provided which follow their movements and lead to the outside of the vacuum chamber (1).