Abstract: Disposed are a semiconductor structure, a manufacturing method thereof and a flash memory. The semiconductor structure includes a substrate, first isolation structures, a gate structure and an oxide layer. The first isolation structures define a first active area in a peripheral region of the substrate. The oxide layer is disposed on the substrate in the first active area and covered by the first isolation structures. The oxide layer and the first isolation structures define an opening exposing the substrate. The gate structure is disposed on the substrate in the first active area and includes a gate dielectric layer disposed in the opening and a gate disposed on the gate dielectric layer. The oxide layer is located around the gate dielectric layer. The width of the bottom surface of the gate is less than that of the top surface of the first active area.

Abstract: The disclosure provides a semiconductor device and a programming method capable of programming with reduced power consumption. The programming method of the NAND flash memory of the disclosure prepares high-speed programming blocks and copy back block for final data storage, responding to an external input programming command while in an power-saving mode, program 1/2 pages of data in even-numbered pages and odd-numbered pages of the high-speed programming blocks respectively, then the data is read out from the high-speed programming blocks, and the read data is normally programmed into the copy back block.

Abstract: A semiconductor structure includes a trunk portion and a branch portion. The trunk portion extends in a first direction. The branch portion is connected to the trunk portion. The branch portion includes a handle portion and a two-pronged portion. The handle portion is connected to the trunk portion and extends in a second direction. The second direction intersects the first direction. The two-pronged portion is connected to the handle portion. A line width of the handle portion is greater than a line width of the two-pronged portion.

Abstract: A semiconductor structure includes a substrate and a buried gate structure in the substrate. The buried gate structure includes a gate dielectric layer, a first work function layer, a barrier layer, and a second work function layer. The gate dielectric layer is formed on the sidewalls and the bottom surface of a trench. The work function layer is formed in the trench and contacts the sidewalls and the bottom surface of the gate dielectric layer. The barrier layer is formed on the top surface of the first work function layer. The second work function layer is formed on the barrier layer, and the sidewall of the second work function layer is separated from the gate dielectric layer by a distance. The semiconductor structure further includes an insulating layer in the trench and on the second work function layer.

Abstract: A semiconductor structure includes: a plurality of calibration reference features disposed on a substrate and spaced apart from each other in a first direction; and a plurality of columns of first active features and a plurality of columns of second active features respectively disposed on opposite sides of the calibration reference features, wherein each of the columns of first active features is spaced apart from each other in a second direction, each of the columns of second active features is spaced apart from each other in the second direction, and the calibration reference features, the first active features, and the second active features are disposed on the same layer and are a portion of the substrate.

Abstract: A semiconductor memory device includes a memory cell array, a memory apparatus and a power-on operation apparatus, and is capable of knowing whether a reading of the setting information which is set during the power-on operation had been completed correctly or not. The flash memory reads the fuse memory when it is detected that the power supply has reached the power-on detection level, and determines whether the reading of the fuse memory had been completed correctly. When not completed correctly, the fuse memory is read again within the maximum read count, and the setting information (which was read from the fuse memory) is written into the CF register. The identification information (that identifies whether the reading of the fuse memory has been completed correctly or not) is stored in the register.

Abstract: Provided is a memory device including a plurality of stack structures disposed on a substrate; and a dielectric layer. Each stack structure includes a first conductive layer, a second conductive layer, an inter-gate dielectric layer, a metal silicide layer, and a barrier layer. The second conductive layer is disposed on the first conductive layer. The inter-gate dielectric layer is disposed between the first and second conductive layers. The metal silicide layer is disposed on the second conductive layer. The barrier layer is disposed between the metal silicide layer and the second conductive layer. The dielectric layer laterally surrounds a lower portion of the plurality of stack structures to expose a portion of the metal silicide layer of the plurality of stack structures.

Abstract: A DRAM including following components is provided. A bit line stack structure includes a bit line structure and a hard mask layer. The bit line structure is located on the substrate. The hard mask layer is located on the bit line structure. A dielectric layer is located on the bit line stack structure and has an opening. A contact structure is located on the substrate and includes an active region contact and a capacitor contact. The active region contact is located on the substrate. The top surface of the active region contact is exposed by the opening. The capacitor contact is located in the opening over the active region contact. An isolation layer is located between the hard mask layer and the dielectric layer and between the capacitor contact and the bit line stack structure. An etch stop layer is located between the dielectric layer and the isolation layer.

Abstract: A memory array and its operation method are provided. The array includes plural sets of word lines; plural bit lines; and plural memory cell each arranged at intersection of the plural sets of word lines and the plural bit lines. Each memory cell has first and second conductive filament component and a switch circuit, and one ends of the first and the second conductive filament components are coupled to corresponding bit lines and the other ends thereof are coupled to the switch circuit. In the differential mode, read is performed based on the reading currents of the first and the second conductive filament components. In the single-ended mode, read is performed based on a reference current and a reading current of the first or the second conductive filament component that is formed successfully.

Abstract: A semiconductor structure includes a semiconductor substrate including a first active region and a chop region. The semiconductor structure also includes a source/drain region disposed in the first active region, an isolation structure disposed in the chop region, and a gate structure extending at least across the isolation structure in the chop region. The gate structure includes a gate electrode layer and a gate lining layer lining on the gate electrode layer. The gate lining layer includes a first portion having an upper surface that is lower than a bottom surface of the source/drain region.

Abstract: An anti-fuse device including a substrate, a doped region, a dielectric layer, a first contact, an anti-fuse material layer, and a second contact is provided. The doped region is located in the substrate. The dielectric layer is located on the substrate and has a first opening and a second opening. The first opening and the second opening respectively expose the doped region. The first contact is located in the first opening. The anti-fuse material layer is located between the first contact and the doped region. The second contact is located in the second opening and is electrically connected to the doped region.

Abstract: A power-on read circuit includes a power voltage detector, a first voltage booster, a voltage selector, a reference voltage generator and a read voltage generator. The power voltage detector detects a power voltage to generate a control signal. The first voltage booster generates a first boosted voltage according to the control signal. The voltage selector selects the power voltage or the first boosted voltage to generate a selected voltage. The reference voltage generator receives the selected voltage as an operating power source, and generates a reference voltage based on the selected voltage according to the control signal. The read voltage generator generates a second boosted voltage according to the reference voltage and a clock signal, and generate a read voltage based on the second boosted voltage according to the control signal. The read voltage is provided to a memory cell array to perform a data reading operation.

Abstract: A memory device coupled to a memory controller and including a memory array and an access circuit is provided. The memory array includes a plurality of cells. Each of the cells is coupled to a word-line. The access circuit is coupled between the memory controller and the memory array. In a normal mode, the access circuit executes a refresh action for the cells which are coupled to at least one word-line in response to the memory controller outputting an auto-refresh command. In a standby mode, the access circuit selects one of the word-lines and determines whether to execute the refresh action for the cells coupled to the selected word-line according to the retention capability of the selected word-line at regular time intervals.

Abstract: A multi-channel memory device includes N first memory blocks, a first redundancy memory block, and N first interface circuits. Each of the first interface circuits is coupled to two of the first memory blocks and the first redundancy memory block. The first interface circuits respectively select N first selected memory blocks in the first memory block and the first redundancy memory block according to a plurality of first selection signals, where N is a positive integer greater than 1.

Abstract: A semiconductor memory apparatus including a memory cell array, a switch circuit, and a sensing circuit is provided. The memory cell array includes multiple memory cells. The switch circuit includes at least one switch. Each of the switch receives a control signal and is turned on or off under control of the control signal. When an erase verification is performed, the sensing circuit sequentially receives an erase verification current generated by each of the memory cells through the switch circuit to verify an erase state of the each of the memory cells.

Abstract: A method for forming a semiconductor memory structure includes providing a semiconductor substrate; forming a hard mask layer on the semiconductor substrate; forming a contact opening corresponding to the pair of word lines through the hard mask layer and a portion of the semiconductor substrate; forming a pair of spacers on sidewalls of the contact opening; filling the contact opening with a conductive material to form a contact; forming a bit line directly above the contact and the pair of spacers, and forming a dielectric liner on sidewalls of the bit line. The pair of word lines is embedded in an active region of the semiconductor substrate and extends in a first direction. The bit line extends in a second direction. The first direction is perpendicular to the second direction.

Abstract: A temperature-sensing circuit is provided, which includes: a search-control circuit, a voltage-reference circuit, a CTAT (complementary to absolute temperature) circuit, a digital-to-analog converter (DAC) circuit, a comparison circuit, and an SAR (successive approximation register) circuit. The search-control circuit generates a reference-voltage selection signal according to a plurality of control signals. The voltage-reference circuit selects a first reference voltage from a plurality of candidate reference voltages according to the reference-voltage selection signal, and provides a second reference voltage. The CTAT circuit converts the second reference voltage into a first comparison voltage. The DAC circuit converts the first reference voltage into a second comparison voltage. The comparison circuit compares the first comparison voltage and the second comparison voltage to generate a comparison-result signal.

Abstract: Provided are a memory device and a method of manufacturing the same. The memory device includes: a stack structure; a first source/drain region and a second source/drain region located in a substrate beside the stack structure; a first self-aligned contact connected to the first source/drain region; a second self-aligned contact connected to the second source/drain region; a first liner structure located between the first self-aligned contact and a first sidewall of the stack structure; and a second liner structure located between the second self-aligned contact and a second sidewall of the stack structure. The first liner structure and the second liner structure are not connected and do not cover the stack structure.

Abstract: Provided is a method of manufacturing a memory device and a patterning method. The patterning method includes following steps. A control structure including stop layers and oxide layers stacked alternately, a hard mask layer, and a mask pattern are sequentially formed on a target layer. A photoresist layer is formed in the mask pattern on the hard mask layer. A portion of the hard mask layer and a portion of the control structure are removed to form first openings by using the photoresist layer and the mask pattern as a mask. The photoresist layer and the hard mask layer are removed to form a second opening having a bottom surface higher than that of the first openings. At least one etching process is performed so that the first and second openings extend into and divide the control structure and the target layer into stack structures.

Abstract: A memory storage device including a flash memory and a controller circuit is provided. The flash memory includes a plurality of memory cells. Each of the memory cells includes a substrate, a drain terminal, a source terminal, and a gate terminal. The controller circuit is coupled to the flash memory. The controller circuit is configured to perform a first erase operation on the memory cells to obtain a first erase threshold voltage distribution, and perform a program operation on the memory cells to obtain a program threshold voltage distribution. The first erase threshold voltage distribution is larger than a first target voltage. The program threshold voltage distribution is smaller than a second target voltage. The first target voltage is larger than the second target voltage. A writing method of a flash memory is also provided.