Abstract: Methods of peak power management (PPM) for a storage system having multiple memory dies are disclosed. Each memory die includes a first PPM circuit and a second PPM circuit. First PPM circuits of the multiple memory dies are electrically connected to form a first PPM group. Similarly, second PPM circuits are electrically connected to form a second PPM group. Peak power operations can be managed by switching on a first pull-down driver of the first PPM circuit on a selected memory die when a first PPM enablement signal of the first PPM group is zero; waiting for a first delay period; switching on a second pull-down driver of the second PPM circuit on the selected memory die when a second PPM enablement signal of the second PPM group is zero. The first and second PPM enablement signals depend on the current flowing through each pull-down driver in the first and second PPM groups.

Abstract: When programming and verifying a memory device which includes a plurality of memory cells and a plurality of word lines, a first coarse programming is first performed on a first memory cell among the plurality of memory cells which is controlled by a first word line among the plurality of word lines, and then a second coarse programming is performed on a second memory cell among the plurality of memory cells which is controlled by a second word line among the plurality of word lines. Next, a first coarse verify current is used for determining whether the first memory cell passes a coarse verification and a second coarse verify current is used for determining whether the second memory cell passes a second coarse verification, wherein the second coarse verify current is smaller than the first coarse verify current.

Abstract: Three-dimensional (3D) NAND memory devices and methods are provided. In one aspect, a 3D NAND memory device includes a substrate, a layer stack over the substrate, a first epitaxial layer, a second epitaxial layer, first array common sources (ACS's), and second ACS's. The layer stack includes first stack layers and second stack layers that are alternately stacked. The first epitaxial layer is deposited on a side portion of a channel layer that extends through the layer stack. The second epitaxial layer is deposited on the substrate. The first ACS's and a portion of the layer stack are between the second ACS's.

Abstract: Embodiments of semiconductor devices and fabrication methods thereof are disclosed. In an example, a semiconductor device includes a first semiconductor structure including a programmable logic device, an array of static random-access memory (SRAM) cells, and a first bonding layer including a plurality of first bonding contacts. The semiconductor device also includes a second semiconductor structure including an array of dynamic random-access memory (DRAM) cells and a second bonding layer including a plurality of second bonding contacts. The semiconductor device further includes a bonding interface between the first bonding layer and the second bonding layer. The first bonding contacts are in contact with the second bonding contacts at the bonding interface.

Abstract: A programming method for a three-dimensional ferroelectric memory device is disclosed. The programming method includes applying a first voltage on a selected word line of a target memory cell. The target memory cell has a first logic state and a second logic state corresponding to a first threshold voltage and a second threshold voltage, respectively. The first and second threshold voltages are determined by two opposite electric polarization directions of a ferroelectric film in the target memory cell. The programming method also includes applying a second voltage on a selected bit line, where a voltage difference between the first and second voltages has a magnitude larger than a coercive voltage of the ferroelectric film such that the target memory cell is switched from the first logic state to the second logic state.

Abstract: A packaging method includes providing a substrate structure, including a core substrate, a plurality of first conductive pads at a first surface of the core substrate, and a plurality of packaging pads at a second surface of the core substrate; and packaging a plurality of semiconductor chips onto the substrate structure at the second surface of the core substrate, including forming a first metal wire to connect with a chip-contact pad of a semiconductor chip, and forming a molding compound on the second surface of the core substrate to encapsulate the plurality of semiconductor chips. One end of the first metal wire connects to the chip-contact pad, and another end of the first metal wire is exposed at the surface of the molding compound. The packaging method further includes forming a first metal pad on the surface of the molding compound to electrically connect with the first metal wire.

Abstract: In a method for forming an integrated structure, a top dielectric layer is formed over a top surface of a substrate. The top dielectric layer includes a plurality of vias that are formed through the top dielectric layer and extend into the substrate. A bottom dielectric layer is formed on a bottom surface of the substrate. An isolation opening and a plurality of contact openings are further formed in the bottom dielectric layer and the substrate, where the isolation opening passes through the bottom dielectric layer and extends from the bottom surface to the top surface of the substrate. The isolation opening is filled with an insulating layer to form an isolation trench. The plurality of contact openings are filled with a conductive layer to form a plurality of through silicon contacts (TSCs). A conductive plate is further formed over the bottom dielectric layer.

Abstract: A memory device includes a plurality of pins, a controller die coupled to the isolation pin, and a memory die. The plurality of pins include an isolation pin, a test mode select pin configured to switch an operation mode of the memory die, a test clock pin configured to receive a test clock, and a test data pin configured to perform a data transmission. The controller die is coupled to the isolation pin. The memory die is coupled to the test mode select pin, the test clock pin, and the test data pin.

Abstract: A semiconductor device is provided. For example, the semiconductor device can include a plurality of transistors that are arranged in an array in an X-Y plane. Each of the transistors can include a channel extending in Z direction. The semiconductor device can further include a plurality of word lines. Each of the word lines can electrically connect neighboring some of the transistors that are arranged in a column in X direction at lateral walls of the channels thereof. The semiconductor device can further include one or more electromagnetic shielding elements. At least one of the electromagnetic shielding elements can be disposed between neighboring two of the transistors that are disposed in a row in Y direction.

Abstract: A semiconductor device is provided. For example, the semiconductor device can include a plurality of transistors that are arranged in an array in an X-Y plane. Each of the transistors can include a channel extending in Z direction. The semiconductor device can further include a plurality of word lines. Each of the word lines can electrically connect neighboring some of the transistors that are arranged in a column in X direction at lateral walls of the channels thereof. The semiconductor device can further include one or more electromagnetic shielding elements. At least one of the electromagnetic shielding elements can be disposed between neighboring two of the transistors that are disposed in a row in Y direction.

Abstract: Embodiments of bonded semiconductor structures and fabrication methods thereof are disclosed. In an example, a method for forming a semiconductor device is disclosed. A first device layer is formed on a first substrate. A first bonding layer including a first bonding contact is formed above the first device layer. A first capping layer is formed at an upper end of the first bonding contact. The first capping layer has a conductive material different from a remainder of the first bonding contact. A second device layer is formed on a second substrate. A second bonding layer including a second bonding contact is formed above the second device layer. The first substrate and the second substrate are bonded in a face-to-face manner, so that the first bonding contact is in contact with the second bonding contact by the first capping layer.

Abstract: A semiconductor device is provided. The semiconductor device includes word line layers and insulating layers that are alternatingly stacked along a vertical direction perpendicular to a substrate of the semiconductor device. The semiconductor device includes a channel structure that extends along the vertical direction through the word line layers and the insulating layers. A cross-section of the channel structure that is perpendicular to the vertical axis includes channel layer sections that are spaced apart from one another.

Abstract: Embodiments of three-dimensional (3D) memory devices having through stair contacts (TSCs) and methods for forming the same are disclosed. In an example, a 3D memory device includes a memory stack and a TSC. The memory stack includes a plurality of interleaved conductive layers and dielectric layers. Edges of the interleaved conductive layers and dielectric layers define a staircase structure on a side of the memory stack. The TSC extends vertically through the staircase structure of the memory stack. The TSC includes a conductor layer and a spacer circumscribing the conductor layer.

Abstract: Three-dimensional (3D) NAND memory devices and methods are provided. In one aspect, a fabrication method includes depositing a cover layer over a substrate, depositing a sacrificial layer over the cover layer, depositing a layer stack over the sacrificial layer, forming a channel layer extending through the layer stack and the sacrificial layer, performing a first epitaxial growth to deposit a first epitaxial layer on a side portion of the channel layer that is close to the substrate, removing the cover layer, and performing a second epitaxial growth to simultaneously thicken the first epitaxial layer and deposit a second epitaxial layer on the substrate. The layer stack includes first stack layers and second stack layers that are alternately stacked.

Abstract: In certain aspects, a memory device includes a memory cell array having rows of memory cells, word lines respectively coupled to the rows of memory cells, and a peripheral circuit coupled to the memory cell array through the word lines. The peripheral circuit is configured to program a row of memory cells using a first program voltage and verify the programmed row of memory cells using a verify voltage and a sample voltage smaller than the verify voltage. The peripheral circuit is also configured to obtain a first number of memory cells of the programmed row of memory cells based on the sample voltage. The peripheral circuit is further configured to predict, based on the first number of memory cells and the sample voltage, a second number of memory cells of the programmed row of memory cells that fail to pass the verification.

Abstract: A method for forming a 3D memory device is provided. The method includes forming a dielectric stack including interleaved initial insulating layers and initial sacrificial layers over a substrate, and forming at least one slit structure extending vertically and laterally in the dielectric stack and dividing the dielectric stack into block regions. The at least one slit structure each includes slit openings exposing the substrate and an initial support structure between adjacent slit openings. Each block region may include interleaved insulating layers and sacrificial layers, and the initial support structure may include interleaved insulating portions and sacrificial portions. Each insulating portion and sacrificial portion may be in contact with respective insulating layers and sacrificial layers of a same level from adjacent block regions.

Abstract: Embodiments of 3D memory structures and methods for forming the same are disclosed. The fabrication method includes forming multiple openings in staircase regions, periphery device regions, and substrate contact regions of a 3D NAND memory device. The openings can be formed by a photolithography process followed by multiple etching processes. The openings can include complete openings that expose the underlying layer and mid-way openings where a remaining portion of the photoresist still exists between the opening and the underlying layer. The remaining portion of the photoresist can delay the etching process in the shorter openings for the upper level staircase structure during the formation of the deeper openings for the lower level staircase structure. Conductive material is deposited into the openings to form contact structures for structures such as substrate contact pads, upper and lower level staircase structures, and/or peripheral devices.

Abstract: A fabricating method of a semiconductor device is provided. A temporary semiconductor structure is provided. The temporary semiconductor structure includes a temporary substrate and a conductive layer, the temporary substrate has a first surface, the conductive layer is disposed on the first surface of the temporary substrate, and the conductive layer includes one or more first trace. Then, a recess is formed in the temporary semiconductor structure to form a first semiconductor structure and a first substrate. The recess penetrates through the first substrate and expose the one or more first trace. Thereafter, an input/output pad is formed in the recess and on the one or more first trace.

Abstract: A 3D memory device may include a first set of memory layers, a second set of memory layers above the first set of memory layers, and a first dummy memory layer between the first and second memory layers. The 3D memory device may include a plurality of NAND memory strings each extending through the first and second set of memory layers and the first dummy memory layer. The 3D memory device may include a word line (WL) driving circuit that, when programming one of the first set of memory layers, may be configured to apply a second pre-charge voltage to the first dummy memory layer during the pre-charge period. The second pre-charge voltage may overlap with the first pre-charge voltage and ramp down prior to the first pre-charge voltage.

Abstract: Embodiments of three-dimensional (3D) memory devices and methods for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack on the substrate, a plurality of channel structures each extending vertically through the memory stack, an isolation structure, and an alignment mark. The memory stack includes a plurality of interleaved conductive layers and dielectric layers. An outmost one of the conductive layers toward the substrate is a source select gate line (SSG). The isolation structure extends vertically into the substrate and surrounds at least one of the channel structures in a plan view to separate the SSG and the at least one channel structure. The alignment mark extends vertically into the substrate and is coplanar with the isolation structure.